DE4190051T - - Google Patents

Info

Publication number
DE4190051T
DE4190051T DE19914190051 DE4190051T DE4190051T DE 4190051 T DE4190051 T DE 4190051T DE 19914190051 DE19914190051 DE 19914190051 DE 4190051 T DE4190051 T DE 4190051T DE 4190051 T DE4190051 T DE 4190051T
Authority
DE
Germany
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19914190051
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of DE4190051T publication Critical patent/DE4190051T/de
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70233—Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE19914190051 1990-01-09 1991-01-09 Withdrawn DE4190051T (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/462,251 US4980563A (en) 1990-01-09 1990-01-09 VUV lithography

Publications (1)

Publication Number Publication Date
DE4190051T true DE4190051T (de) 1992-01-30

Family

ID=23835752

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19914190051 Withdrawn DE4190051T (de) 1990-01-09 1991-01-09

Country Status (5)

Country Link
US (1) US4980563A (de)
JP (1) JPH04505077A (de)
DE (1) DE4190051T (de)
GB (1) GB2245991B (de)
WO (1) WO1991011020A1 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2775844B2 (ja) * 1989-05-01 1998-07-16 ソニー株式会社 紫外光照射プロジェクターを用いた光学的像形成装置
JPH0616485B2 (ja) * 1989-12-26 1994-03-02 広島大学長 単収束ミラーによる反射型２次元パターン縮小転写法および装置
US5206515A (en) * 1991-08-29 1993-04-27 Elliott David J Deep ultraviolet photolithography and microfabrication
US5559338A (en) * 1994-10-04 1996-09-24 Excimer Laser Systems, Inc. Deep ultraviolet optical imaging system for microlithography and/or microfabrication
US5637962A (en) * 1995-06-09 1997-06-10 The Regents Of The University Of California Office Of Technology Transfer Plasma wake field XUV radiation source
US6133577A (en) * 1997-02-04 2000-10-17 Advanced Energy Systems, Inc. Method and apparatus for producing extreme ultra-violet light for use in photolithography
US6065203A (en) * 1998-04-03 2000-05-23 Advanced Energy Systems, Inc. Method of manufacturing very small diameter deep passages
US6180952B1 (en) 1998-04-03 2001-01-30 Advanced Energy Systems, Inc. Holder assembly system and method in an emitted energy system for photolithography
US6194733B1 (en) 1998-04-03 2001-02-27 Advanced Energy Systems, Inc. Method and apparatus for adjustably supporting a light source for use in photolithography
US6105885A (en) * 1998-04-03 2000-08-22 Advanced Energy Systems, Inc. Fluid nozzle system and method in an emitted energy system for photolithography
EP1055155A1 (de) * 1998-12-14 2000-11-29 Koninklijke Philips Electronics N.V. Euv-beleuchtungssystem
GB2355337B (en) * 1999-10-12 2004-04-14 Applied Materials Inc Ion implanter and beam stop therefor
US7160671B2 (en) * 2001-06-27 2007-01-09 Lam Research Corporation Method for argon plasma induced ultraviolet light curing step for increasing silicon-containing photoresist selectivity
TWI237733B (en) * 2003-06-27 2005-08-11 Asml Netherlands Bv Laser produced plasma radiation system with foil trap
JP2005101537A (ja) * 2003-08-29 2005-04-14 Canon Inc 露光装置及びそれを用いたデバイスの製造方法
GB0324883D0 (en) * 2003-10-24 2003-11-26 Boc Group Plc Extreme ultra violet lithography
WO2006002859A2 (de) * 2004-07-01 2006-01-12 Carl Zeiss Smt Ag Beleuchtungsquelle, wellenfrontvermessungsvorrichtung und mikrolithografie-projektionsbelichtungsanlage
US8999610B2 (en) * 2012-12-31 2015-04-07 Taiwan Semiconductor Manufacturing Company, Ltd. Lithography mask repairing process
CN112687520B (zh) * 2020-12-16 2021-09-24 中山大学 一种空间电子激发的反射式深紫外光源

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4151008A (en) * 1974-11-15 1979-04-24 Spire Corporation Method involving pulsed light processing of semiconductor devices
US4498009A (en) * 1982-09-22 1985-02-05 Honeywell Inc. Optical lithographic system having a dynamic coherent optical system
US4450358A (en) * 1982-09-22 1984-05-22 Honeywell Inc. Optical lithographic system
US4516253A (en) * 1983-03-15 1985-05-07 Micronix Partners Lithography system
US4526034A (en) * 1984-05-07 1985-07-02 Campbell Scientific, Inc. Krypton hygrometer

Also Published As

Publication number Publication date
WO1991011020A1 (en) 1991-07-25
GB9116552D0 (en) 1991-09-11
US4980563A (en) 1990-12-25
GB2245991A (en) 1992-01-15
JPH04505077A (ja) 1992-09-03
GB2245991B (en) 1993-11-24

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Legal Events

Date Code Title Description
8139 Disposal/non-payment of the annual fee