DE3827996C2 - Process for the removal of covalent hydrides of the elements of III. to VI. Main group of the periodic table as well as trialkyl pniktides and dialkyl chalcogenides from exhaust gases - Google Patents
Process for the removal of covalent hydrides of the elements of III. to VI. Main group of the periodic table as well as trialkyl pniktides and dialkyl chalcogenides from exhaust gasesInfo
- Publication number
- DE3827996C2 DE3827996C2 DE19883827996 DE3827996A DE3827996C2 DE 3827996 C2 DE3827996 C2 DE 3827996C2 DE 19883827996 DE19883827996 DE 19883827996 DE 3827996 A DE3827996 A DE 3827996A DE 3827996 C2 DE3827996 C2 DE 3827996C2
- Authority
- DE
- Germany
- Prior art keywords
- exhaust gases
- chalcogenides
- trialkyl
- dialkyl
- iii
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
Description
Die Erfindung liegt auf dem Gebiet der Abgasentgiftung und bezieht sich auf ein Verfahren zur Entfernung von kovalenten Hydriden der Elemente der III-, IV-, V- und VI-Hauptgruppe des Periodensystems sowie von Trialkyl-Pniktiden (Pnik = N, P, As, Sb, Bi) und von Dialkyl- Chalkogeniden (Cha = O, S, Se, Te).The invention is in the field of exhaust gas detoxification and refers to a method of removing covalent Hydrides of the elements of the III, IV, V and VI main group of the periodic table and trialkyl pnictides (Pnik = N, P, As, Sb, Bi) and of dialkyl Chalcogenides (Cha = O, S, Se, Te).
Anwendung findet das Verfahren vorwiegend in der Halbleitertechnologie.The method is mainly used in the Semiconductor technology.
Der Stand der Technik über das Verfahren ist ausführlich in der deutschen Offenlegungsschrift 33 42 816 beschrieben.The state of the art on the process is extensive described in German Offenlegungsschrift 33 42 816.
Bei dem bekannten Verfahren werden in einer ersten Stufe kovalente Hydride und Element-organische Verbindungen mittels Brom- oder Jodsäure oder Lösungen von Bromat- oder Jodatsalzen oder wäßriger oder organischer Lösungen von Brom oder Jod in spontaner Reaktion aufoxidiert und vollständig in wasserlösliche Säuren umgesetzt und in einer zweiten Stufe mittels einer basischen Lösung das in der ersten Stufe ent standene Brom bzw. Jod zu Bromid und Bromat bzw. Jodid und Jodat umgesetzt und gelöst sowie Halogen- und Pseudo halogen-Wasserstoffe aus Prozeßabgasen vollständig neutralisiert.In the known method in a first stage covalent hydrides and organic elements Compounds using bromic or iodic acid or Solutions of bromate or iodate salts or aqueous or organic solutions of bromine or iodine in spontaneous Reaction oxidized and completely soluble in water Acids reacted and in a second stage a basic solution in the first stage stood bromine or iodine to bromide and bromate or iodide and implemented and dissolved iodate as well as halogen and pseudo Halogenated hydrogen from process gases completely neutralized.
Dem Gegenstand des Patents liegt die Aufgabe zugrunde, das aus der deutschen Offenlegungsschrift 33 42 816 bekannte Verfahren dahingehend zu verbessern, daß die Reinigungswirkung optimiert wird und Störfälle möglichst vermieden werden. The object of the patent is based on the task that known from German Offenlegungsschrift 33 42 816 To improve the process in such a way that the cleaning effect is optimized and accidents are avoided as far as possible.
Die Lösung dieser Aufgabe erfolgt durch das im Anspruch 1 angegebene Verfahren.This task is solved by the method specified in claim 1.
Gegenüber der Verwendung von Bromat bzw. Iodat hat man mit Periodat einen um 40% höheren molaren Stoffumsatz, wobei die Oxidationsreaktion nach den Reaktionsgleichungen (1) und (2) erfolgt.Compared to the use of bromate or iodate, periodate is a thing of the past 40% higher molar metabolism, the oxidation reaction after the Reaction equations (1) and (2) are carried out.
7 H₃Pnik + 8 H₅IO₆ → 4 I₂ + 7 H₃PnikO₄ + 20 H₂O (1)7 H₃Pnik + 8 H₅IO₆ → 4 I₂ + 7 H₃PnikO₄ + 20 H₂O (1)
7 H₂Chal + 8 H₅IO₆ → 4 I₂ + 7 H₂ChalO₄ + 20 H₂O (2)7 H₂Chal + 8 H₅IO₆ → 4 I₂ + 7 H₂ChalO₄ + 20 H₂O (2)
Seit der Inbetriebnahme von Abgasreinigungs-Anlagen, welche mit Iodsäure betrieben wurden, sind mehrere Störfälle in der Form aufgetreten, daß die Gaswäscher Überdruck bekamen und zerbarsten.Since the commissioning of exhaust gas cleaning systems, which were operated with iodic acid are several Incidents occurred in the form of gas scrubbers Got overpressure and burst.
Bei der patentgemäßen Verwendung von Lithiumhydroxid treten diese Störfälle nicht mehr auf.With the patented use of lithium hydroxide these accidents no longer occur.
Eine Erklärung besteht darin, daß die beknanten Anlagen in ihrer zweiten Stufe mit Kalilauge oder Natronlauge betrieben wurden. Die Löslichkeiten von Natrium- bzw. Kaliumjodat sind 9,2 g/100 ml und 4,74 g/100 ml. Einige Anlagen wurden zu lange Zeit ohne Lösungswechsel in Betrieb gehalten, so daß sich gesättigte Lösungen bildeten. Nach Überschreitung der Löslichkeits- Gleichgewichts-Linie entstanden Kristallite von KIO₃ bzw. NaIO₃ am Eintauchrohr, bedingt durch die dort ablaufende Disproportionierungs-Reaktion im alkalischen Medium. Diese erhielten laufend neue Nährlösung durch einströmenden Iod-Dampf. Durch die Kristall bildung wurde das Eintauchrohr verschlossen, es kam zum Überdruck und der Waschtank wurde zerstört.One explanation is that the known plants in their second stage operated with potassium hydroxide solution or sodium hydroxide solution were. The solubilities of sodium or potassium iodate are 9.2 g / 100 ml and 4.74 g / 100 ml. Some plants have been without solution change for too long kept in operation so that saturated solutions formed. After exceeding the solubility Equilibrium line, crystallites of KIO₃ were formed or NaIO₃ on the immersion tube, due to the there ongoing disproportionation reaction in alkaline Medium. These constantly received new nutrient solutions by inflowing iodine vapor. Through the crystal education, the immersion tube was closed, it came to overpressure and the wash tank was destroyed.
Lithiumiodat hat hingegen eine Löslichkeit von 80,3 g/100 ml und somit bildet Lithium das höchstlösliche Iodat im ganzen Periodensystem.Lithium iodate, on the other hand, has a solubility of 80.3 g / 100 ml and thus lithium forms the most soluble iodate in whole periodic table.
Daraus folgt, daß es die beste Lauge für das patentgemäße Abgasreinigungsverfahren ist.It follows that it is the best lye for is the patented exhaust gas purification process.
Claims (2)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19883827996 DE3827996C2 (en) | 1988-08-15 | 1988-08-15 | Process for the removal of covalent hydrides of the elements of III. to VI. Main group of the periodic table as well as trialkyl pniktides and dialkyl chalcogenides from exhaust gases |
| PCT/DE1989/000529 WO1990001365A1 (en) | 1988-08-15 | 1989-08-10 | Two-step oxidizing gas washing system for covalent hydrids |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19883827996 DE3827996C2 (en) | 1988-08-15 | 1988-08-15 | Process for the removal of covalent hydrides of the elements of III. to VI. Main group of the periodic table as well as trialkyl pniktides and dialkyl chalcogenides from exhaust gases |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE3827996A1 DE3827996A1 (en) | 1990-03-08 |
| DE3827996C2 true DE3827996C2 (en) | 1995-04-13 |
Family
ID=6361082
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19883827996 Expired - Fee Related DE3827996C2 (en) | 1988-08-15 | 1988-08-15 | Process for the removal of covalent hydrides of the elements of III. to VI. Main group of the periodic table as well as trialkyl pniktides and dialkyl chalcogenides from exhaust gases |
Country Status (2)
| Country | Link |
|---|---|
| DE (1) | DE3827996C2 (en) |
| WO (1) | WO1990001365A1 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL9002428A (en) * | 1990-11-08 | 1992-06-01 | Hoogovens Groep Bv | METHOD AND APPARATUS FOR REMOVING SULFUR DIOXIDE FROM A GAS |
| DE19523493A1 (en) * | 1995-06-28 | 1997-01-02 | Hoechst Ag | Process exhaust gas purification processes |
| DE69629258T2 (en) * | 1995-10-06 | 2004-04-22 | Enitecnologie S.P.A. | Catalyst and method for removing nitrogen oxides in exhaust gas |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2820617A1 (en) * | 1978-05-11 | 1979-11-22 | Wacker Chemitronic | PROCESS FOR PROCESSING HYDROLYSISABLE AND / OR WATER-SOLUBLE COMPOUNDS AND PREFERRED USE |
| DE2942383A1 (en) * | 1979-10-19 | 1981-05-14 | Siemens AG, 1000 Berlin und 8000 München | Removing silicon and boron (halogenated) hydride and halide from gas - esp. vacuum pump exhaust gas in semiconductor mfr., by alkaline hydrolysis |
| JPS5949822A (en) * | 1982-09-14 | 1984-03-22 | Nippon Sanso Kk | Treatment of gas comtaining volatile inorganic hydride or the like |
| DE3342816C2 (en) * | 1983-11-24 | 1986-12-18 | Heinrich-Hertz-Institut für Nachrichtentechnik Berlin GmbH, 1000 Berlin | Process for removing pollutants from process exhaust gases |
| DE3603511A1 (en) * | 1986-02-05 | 1987-08-06 | Standard Elektrik Lorenz Ag | METHOD AND DEVICE FOR REMOVING DUST AND GASEOUS POLLUTANTS FROM EXHAUST GAS, ESPECIALLY EXHAUST GASES IN THE LIGHTWAVE LEAD PREFORMING |
-
1988
- 1988-08-15 DE DE19883827996 patent/DE3827996C2/en not_active Expired - Fee Related
-
1989
- 1989-08-10 WO PCT/DE1989/000529 patent/WO1990001365A1/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO1990001365A1 (en) | 1990-02-22 |
| DE3827996A1 (en) | 1990-03-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OP8 | Request for examination as to paragraph 44 patent law | ||
| D2 | Grant after examination | ||
| 8364 | No opposition during term of opposition | ||
| 8339 | Ceased/non-payment of the annual fee | ||
| 8322 | Nonbinding interest in granting licenses declared | ||
| 8327 | Change in the person/name/address of the patent owner |
Owner name: FABIAN, WERNER, 81677 MUENCHEN, DE |
|
| 8370 | Indication of lapse of patent is to be deleted | ||
| 8339 | Ceased/non-payment of the annual fee | ||
| 8370 | Indication of lapse of patent is to be deleted | ||
| 8339 | Ceased/non-payment of the annual fee | ||
| 8370 | Indication of lapse of patent is to be deleted | ||
| 8339 | Ceased/non-payment of the annual fee | ||
| 8327 | Change in the person/name/address of the patent owner |
Owner name: FABIAN, WERNER, 86343 KOENIGSBRUNN, DE Owner name: FABIAN, WERNER, 86343 KÖNIGSBRUNN, DE |
|
| 8370 | Indication of lapse of patent is to be deleted | ||
| 8339 | Ceased/non-payment of the annual fee |