DE3804380A1 - Method for protecting IR-detectors against laser radiation - Google Patents
Method for protecting IR-detectors against laser radiationInfo
- Publication number
- DE3804380A1 DE3804380A1 DE3804380A DE3804380A DE3804380A1 DE 3804380 A1 DE3804380 A1 DE 3804380A1 DE 3804380 A DE3804380 A DE 3804380A DE 3804380 A DE3804380 A DE 3804380A DE 3804380 A1 DE3804380 A1 DE 3804380A1
- Authority
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- Germany
- Prior art keywords
- radiation
- optical
- intensity
- titanate
- materials
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 230000005855 radiation Effects 0.000 title claims abstract description 21
- 238000000034 method Methods 0.000 title claims abstract description 13
- 230000003287 optical effect Effects 0.000 claims abstract description 26
- 239000000463 material Substances 0.000 claims abstract description 21
- 230000007246 mechanism Effects 0.000 claims abstract description 6
- 230000003993 interaction Effects 0.000 claims abstract description 3
- 230000000694 effects Effects 0.000 claims description 6
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 5
- 230000010287 polarization Effects 0.000 claims description 5
- 230000001681 protective effect Effects 0.000 claims description 4
- 230000004044 response Effects 0.000 claims description 4
- 238000010521 absorption reaction Methods 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 3
- 230000003313 weakening effect Effects 0.000 claims description 3
- 229910004613 CdTe Inorganic materials 0.000 claims description 2
- 229910000673 Indium arsenide Inorganic materials 0.000 claims description 2
- 230000005374 Kerr effect Effects 0.000 claims description 2
- 238000006073 displacement reaction Methods 0.000 claims description 2
- 108010067216 glycyl-glycyl-glycine Proteins 0.000 claims description 2
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 claims description 2
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 claims description 2
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 claims description 2
- 239000004973 liquid crystal related substance Substances 0.000 claims description 2
- 229910052744 lithium Inorganic materials 0.000 claims description 2
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 claims description 2
- 229910000402 monopotassium phosphate Inorganic materials 0.000 claims description 2
- 235000019796 monopotassium phosphate Nutrition 0.000 claims description 2
- PJNZPQUBCPKICU-UHFFFAOYSA-N phosphoric acid;potassium Chemical compound [K].OP(O)(O)=O PJNZPQUBCPKICU-UHFFFAOYSA-N 0.000 claims description 2
- 230000002441 reversible effect Effects 0.000 claims description 2
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 claims description 2
- DKDQMLPMKQLBHQ-UHFFFAOYSA-N strontium;barium(2+);oxido(dioxo)niobium Chemical compound [Sr+2].[Ba+2].[O-][Nb](=O)=O.[O-][Nb](=O)=O.[O-][Nb](=O)=O.[O-][Nb](=O)=O DKDQMLPMKQLBHQ-UHFFFAOYSA-N 0.000 claims description 2
- GZXOHHPYODFEGO-UHFFFAOYSA-N triglycine sulfate Chemical compound NCC(O)=O.NCC(O)=O.NCC(O)=O.OS(O)(=O)=O GZXOHHPYODFEGO-UHFFFAOYSA-N 0.000 claims description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 1
- 229910000661 Mercury cadmium telluride Inorganic materials 0.000 claims 1
- 208000031481 Pathologic Constriction Diseases 0.000 claims 1
- 238000003384 imaging method Methods 0.000 claims 1
- 230000000704 physical effect Effects 0.000 abstract description 2
- 238000003780 insertion Methods 0.000 abstract 1
- 230000037431 insertion Effects 0.000 abstract 1
- 230000035484 reaction time Effects 0.000 abstract 1
- 230000006378 damage Effects 0.000 description 5
- 230000005540 biological transmission Effects 0.000 description 4
- 239000000126 substance Substances 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 230000004313 glare Effects 0.000 description 2
- 230000002427 irreversible effect Effects 0.000 description 2
- 230000009993 protective function Effects 0.000 description 2
- 230000005697 Pockels effect Effects 0.000 description 1
- 239000006117 anti-reflective coating Substances 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000009022 nonlinear effect Effects 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 230000001960 triggered effect Effects 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/10—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void
- G01J1/20—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void intensity of the measured or reference value being varied to equalise their effects at the detectors, e.g. by varying incidence angle
- G01J1/22—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void intensity of the measured or reference value being varied to equalise their effects at the detectors, e.g. by varying incidence angle using a variable element in the light-path, e.g. filter, polarising means
- G01J1/24—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void intensity of the measured or reference value being varied to equalise their effects at the detectors, e.g. by varying incidence angle using a variable element in the light-path, e.g. filter, polarising means using electric radiation detectors
- G01J1/26—Photometry, e.g. photographic exposure meter by comparison with reference light or electric value provisionally void intensity of the measured or reference value being varied to equalise their effects at the detectors, e.g. by varying incidence angle using a variable element in the light-path, e.g. filter, polarising means using electric radiation detectors adapted for automatic variation of the measured or reference value
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
- G01J1/0418—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings using attenuators
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0232—Optical elements or arrangements associated with the device
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J2001/0276—Protection
- G01J2001/0285—Protection against laser damage
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
- Optical Modulation, Optical Deflection, Nonlinear Optics, Optical Demodulation, Optical Logic Elements (AREA)
Abstract
Description
Die Erfindung betrifft ein IR-Detektoren gegen intensive Laserstrahlung schützendes Verfahren nach dem Oberbegriff des Anspruchs 1.The invention relates to an IR detector against intensive laser radiation protective method according to the preamble of claim 1.
Untersuchungen über die Relation zwischen Zerstörschwelle - das heißt diejenige Laserintensität am Ort eines Detektors, bei der eine irrever sible Schädigung auftritt - und der Impulsdauer des Laserstrahls sind z.B. aus "Irreversible laser damage in ir detector materials" von F. Bartoli et al, APPLIED OPTICS, Vol. 16 No. 11, Nov. 1977, S. 2934-2937 bekannt.Studies on the relation between destruction threshold - that is the laser intensity at the location of a detector where an irrever sensitive damage occurs - and the pulse duration of the laser beam are e.g. from "Irreversible laser damage in ir detector materials" by F. Bartoli et al, APPLIED OPTICS, vol. 16 no. 11, Nov. 1977, pp. 2934-2937 known.
Aus der DE-PS 15 89 721 ist eine Schutzvorrichtung für das Auge oder ein empfindliches Instrument vor extrem intensiver und in ihrer Intensität extrem schnell ansteigender Laserstrahlung bekannt, bei der ein Filter system die Strahlung selbsttätig intensitätsabhängig schwächt. Dasselbe besteht aus zwei verschiedenartigen Materialien, die bei den für eine optische Informationsübertragung üblichen Strahlungsintensitäten über einen größeren Wellenlängenbereich gleiche, bei hoher Strahlungsintensität dagegen auf Grund nichtlinearer optischer Effekte mit minimaler Ver zögerung verschieden große Brechungsindizes annehmen. Außerdem sind die Grenzflächen zwischen den Materialien so gestaltet, daß bei hohen Inten sitäten durch die Brechungsindexunterschiede der Materialien eine Streuung der Strahlung derart erfolgt, daß ihre hinreichende Schwächung in Ein fallsrichtung bewirkt wird. From DE-PS 15 89 721 is a protective device for the eye or a sensitive instrument before extremely intense and in their intensity extremely fast increasing laser radiation known in which a filter system automatically weakens the radiation depending on the intensity. The same thing consists of two different materials, the one for one optical information transmission over usual radiation intensities a larger wavelength range, with high radiation intensity on the other hand due to nonlinear optical effects with minimal Ver delay take different sized refractive indices. Besides, they are Interfaces between the materials designed so that at high Inten due to differences in the refractive index of the materials the radiation takes place in such a way that its sufficient attenuation in one if direction is effected.
Die DE-OS 27 35 985 enthält sodann noch ein weiteres Verfahren und eine Vorrichtung zum Schutz vor der Wirkung elektromagnetischer Strahlung. Auch hier wird die Strahlung mit Hilfe von optisch nichtlinearen Sub stanzen, die große nichtlineare optische Konstanten aufweisen, geschwächt oder aber durch Selbstfokussierung unterdrückt.DE-OS 27 35 985 then contains yet another method and one Device for protection against the effects of electromagnetic radiation. Here, too, the radiation is sub-optically non-linear punches that have large nonlinear optical constants weakened or suppressed by self-focusing.
Infrarotdetektoren können durch intensive Laserstrahlung in ihrer Funktion beeinträchtigt werden, wobei die ausgelösten Effekte - je nach Intensität und Dauer der Lasereinwirkung - von einer temporären Blendung bis zur irreversiblen Zerstörung des Detektors reichen. Die Aufgabe der Erfindung besteht daher in einer Verbesserung des gattungsgemäßen Verfahrens der art, daß die Schutzfunktion für kurze Laserimpulse höherer Intensität und für lange Impulse bzw. CW-Betrieb (CW = continuing wave) bei niedrigerer Intensität sensibilisiert wird. Diese Aufgabe wird gemäß der Erfindung durch die im Kennzeichen des Anspruchs 1 genannten Merkmale gelöst.The function of infrared detectors can be impaired by intensive laser radiation, the effects triggered - depending on the intensity and duration of the laser exposure - ranging from temporary glare to irreversible destruction of the detector. The object of the invention is therefore to improve the generic method of the type that the protective function for short laser pulses of higher intensity and for long pulses or CW operation (CW = continuing wave) at lower intensity is sensitized. This object is achieved according to the invention by the features mentioned in the characterizing part of claim 1.
Zum Schutz eines Detektors vor Zerstörung und Blendung kann ein optisches Element verwendet werden, das in das optische System vor dem Detektor an geeigneter Stelle integriert wird, ohne dabei Qualität und Transmission dieses optischen Systems zu beeinflussen. Dieses Element ändert seine optischen Eigenschaften bei Einwirkung von intensiver Laserstrahlung der art, daß es oberhalb eines Intensitätsschwellwerts die Strahlung abblockt oder abschwächt, wobei der auslösende Mechanimus passiv, d.h. allein durch interne Wechselwirkung der Strahlung mit dem optischen Material oder aktiv, d.h. durch äußere physikalische Einwirkungen auf das Element her vorgerufen wird. Solche physikalische Einwirkungen sind z.B. elektrischer, magnetischer oder optischer Art, z.B. Elektrostriktion, Kerr- oder Pockels effekt. Diese Wirkungen sind reversibel, d.h. der Strahl wird nicht mehr abgeblockt oder abgeschwächt sobald die Laserintensität wieder unter den Schwellwert sinkt. Das optische Verhalten ist mit dem eines bistabilen elektronischen Schaltelements vergleichbar.To protect a detector from destruction and glare, an optical Element used in the optical system in front of the detector suitable place is integrated, without sacrificing quality and transmission to influence this optical system. This element changes its optical properties when exposed to intense laser radiation art that it blocks the radiation above an intensity threshold or weakening, the triggering mechanism being passive, i.e. alone through internal interaction of the radiation with the optical material or active, i.e. due to external physical influences on the element is called. Such physical effects are e.g. electric magnetic or optical type, e.g. Electrostriction, kerr or pockels effect. These effects are reversible, i.e. the beam is no longer blocked or weakened as soon as the laser intensity again below the Threshold value drops. The optical behavior is that of a bistable electronic switching element comparable.
Natürlich kann auch ein Material mit umgekehrtem Verhalten - Blockung und Abschwächung im niederenergetischen Bereich, Durchlaß bei hohen Energien - als optischer Schalter genutzt werden. Of course, a material with reversed behavior - blocking and weakening in the low-energy range, passage at high energies - can also be used as an optical switch.
Die Substanzen, die sich als optische Schalter eignen, sind sog. optisch nichtlineare Materialien. Unter Einwirkung hoher Laserintensitäten oder anderer physikalischer Mechanismen ändern sich eine oder mehrere ihrer optischen Eigenschaften als nichtlineare Funktion der Intensität der Einwirkung. Materialien, die ein solches Verhalten zeigen, können u.a. den Stoffgruppen Halbleiter, Flüssigkristalle oder andere organische Stoffe, Ferroelektrika, photochrome und phototrope Materialen angehören. Zu den hierfür verwendbaren Halbleitern zählen z.B. InSb, InAs, CdTe, HgCd Te oder ZnSe und zu den Ferroelektrika z.B. Blei-Zirkon-Titanat (= PZT), lanthaniertes Blei-Zirkon-Titanat (= PLZT), Kalium-Dihydrogen- Phosphat, Lithium-Niobat, Lithium-Titanat, Triglycinsulfat, Barium- Strontium-Niobat oder Titanat. Reaktionszeit, Einsatzschwelle und Wirkungs grad (Dynamikbereich) dieser Substanzen sind materialabhängig und zeigen eine sehr große Streubreite. Für Strahlungsintensitäten, die unterhalb der Einsatzschwelle solcher nichtlinearer Materialien liegen, ist eine Erweiterung der Schutzfunktion erforderlich.The substances that are suitable as optical switches are so-called optical nonlinear materials. Under the influence of high laser intensities or other physical mechanisms change one or more of them optical properties as a nonlinear function of the intensity of the Impact. Materials that show such behavior can include the groups of semiconductors, liquid crystals or other organic Belong to substances, ferroelectrics, photochromic and phototropic materials. The semiconductors that can be used for this include e.g. InSb, InAs, CdTe, HgCd Te or ZnSe and to the ferroelectrics e.g. Lead zircon titanate (= PZT), lanthanized lead zirconium titanate (= PLZT), potassium dihydrogen Phosphate, lithium niobate, lithium titanate, triglycine sulfate, barium Strontium niobate or titanate. Response time, threshold and effectiveness degrees (dynamic range) of these substances depend on the material and show a very large spread. For radiation intensities below the application threshold of such nonlinear materials is one Extension of the protective function required.
Es wird daher vorgeschlagen gleichzeitig Materialien und Verfahren anzu wenden, deren Funktionsbereiche bezüglich Einsatzschwelle und Reaktions zeiten sich lückenlos überdecken, derart, daß verschiedenartige optische Schalter in geeigneter Reihenfolge in den Strahlengang des optischen Systems eingebracht werden (Schalterkaskade), wobei die einzelnen Schalter aktiv oder passiv arbeiten können.It is therefore proposed to use materials and processes at the same time turn, their functional areas regarding threshold and response times overlap completely, so that different optical Switches in a suitable order in the beam path of the optical Systems are introduced (switch cascade), the individual switches can work actively or passively.
Diese nichtlinearen optischen Materialien lassen sich in vielfältiger Weise - auch in Form von Komponenten eines optischen Systems - einsetzen, und zwar z.B. als Planscheiben, Linsen, Spiegel, Strahlteiler, Prismen, Gitter oder lnterferenzfilter, wenn dadurch die Strahlungsintensitäten oberhalb der Einsatzschwelle eine zusätzliche Reduzierung der Strahlungs intensität am Ort des Detektors ermöglichen. Zusätzlich ist es denkbar, die nichtlinearen Effekte von Laserintensität auf den Brechungsindex, die Absorption, das Streuverhalten, die Polarisation, die Drehung der Polari sationsebene, die Totalreflexion ohne Behinderung der Totalreflexion, auf thermische Effekte, die Elektrostriktion, die Selbstfokussierung oder auf eine Kombination von wenigstens zwei dieser Eigenschaften auszunutzen. Diese Effekte können sowohl passiv als auch aktiv genutzt werden. These nonlinear optical materials can be used in a variety of ways - including in the form of components of an optical system - for example as faceplates, lenses, mirrors, beam splitters, prisms, gratings or interference filters, if this means that the radiation intensities above the application threshold further reduce the Allow radiation intensity at the location of the detector. In addition, it is conceivable that the nonlinear effects of laser intensity on the refractive index, absorption, scattering behavior, polarization, rotation of the polarization plane, total reflection without hindrance to total reflection, on thermal effects, electrostriction, self-focusing or on a combination of exploit at least two of these properties. These effects can be used both passively and actively.
Änderungen des Brechungsindex führen bei Planscheiben und Linsen zu Schnittweitenveränderungen und damit zur Defokussierung; bei Prismen bewirken sie eine Strahlablenkung und bei Strahlteilern verändern sie das Verhältnis von reflektierter zu durchgelassener lntensität. Än derungen der Absorption bewirken in einem Trägermaterial für ein dielek trisches Filter (Antireflexbeschichtung o.ä.) Änderungen des Transmis sions- und Reflexionsverhaltens dieses Filters. Polarisation von Element paaren wird dazu ausgenutzt, die Transmission zu reduzieren, während die Drehung der Polarisationsebene eines Elements in einem Analysator mit geeigneter Orientierung zur Abschwächung der Intensität benutzt wird.Changes in the refractive index result in face plates and lenses Focal length changes and thus for defocusing; with prisms they cause beam deflection and change in beam splitters the ratio of reflected to transmitted intensity. Än Changes in absorption cause a substrate for a dielek trical filter (anti-reflective coating or similar) changes in the transmis sions and reflection behavior of this filter. Element polarization pairing is used to reduce transmission while the rotation of the plane of polarization of an element in an analyzer is used with a suitable orientation to attenuate the intensity.
Schließlich können verstärkend zu den optischen auch mechanische Schutz maßnahmen hinzugezogen werden, z.B. die axiale Verschiebung optisch ab bildender Elemente, die zu einer Defokussierung und damit Reduzierung der Intensität am Ort des Detektors führt.Finally, mechanical protection can also reinforce the optical measures are involved, e.g. the axial displacement optically forming elements that lead to defocusing and thus reduction the intensity at the location of the detector.
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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DE3804380A DE3804380A1 (en) | 1988-02-12 | 1988-02-12 | Method for protecting IR-detectors against laser radiation |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE3804380A DE3804380A1 (en) | 1988-02-12 | 1988-02-12 | Method for protecting IR-detectors against laser radiation |
Publications (1)
Publication Number | Publication Date |
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DE3804380A1 true DE3804380A1 (en) | 1989-08-24 |
Family
ID=6347278
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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DE3804380A Ceased DE3804380A1 (en) | 1988-02-12 | 1988-02-12 | Method for protecting IR-detectors against laser radiation |
Country Status (1)
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DE (1) | DE3804380A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2407745A1 (en) * | 2010-07-15 | 2012-01-18 | LFK-Lenkflugkörpersysteme GmbH | Seeker for a missile |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3495893A (en) * | 1966-10-17 | 1970-02-17 | Bell Telephone Labor Inc | Optical limiter utilizing multiphoton absorbing material |
US4093353A (en) * | 1976-12-17 | 1978-06-06 | Honeywell Inc. | Optical radiation limiter |
DE2735985A1 (en) * | 1977-08-10 | 1979-03-01 | Eltro Gmbh | Protection unit for human eye against electromagnetic beam - comprises liq. crystal unit with absorbent compound between two optically polarised glass plates |
DE3536678A1 (en) * | 1984-10-16 | 1986-07-10 | Kabushiki Kaisha Sensor Gijutsu Kenkyujo, Tokio/Tokyo | METHOD AND DEVICE FOR PROTECTING THE EYES AGAINST THE ARC WELDING LIGHT |
-
1988
- 1988-02-12 DE DE3804380A patent/DE3804380A1/en not_active Ceased
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3495893A (en) * | 1966-10-17 | 1970-02-17 | Bell Telephone Labor Inc | Optical limiter utilizing multiphoton absorbing material |
US4093353A (en) * | 1976-12-17 | 1978-06-06 | Honeywell Inc. | Optical radiation limiter |
DE2735985A1 (en) * | 1977-08-10 | 1979-03-01 | Eltro Gmbh | Protection unit for human eye against electromagnetic beam - comprises liq. crystal unit with absorbent compound between two optically polarised glass plates |
DE3536678A1 (en) * | 1984-10-16 | 1986-07-10 | Kabushiki Kaisha Sensor Gijutsu Kenkyujo, Tokio/Tokyo | METHOD AND DEVICE FOR PROTECTING THE EYES AGAINST THE ARC WELDING LIGHT |
Non-Patent Citations (3)
Title |
---|
Applied Optics, Vol. 26, No. 2, 15.Jan.1987 * |
Meyers Lexikon der Technik und der exakten Naturwissenschaften, 2. Bd., F-N, Biblio- graphisches Institut, Mannheim 1970, S. 1424 * |
S. 211-234 * |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2407745A1 (en) * | 2010-07-15 | 2012-01-18 | LFK-Lenkflugkörpersysteme GmbH | Seeker for a missile |
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