DE3780747D1 - Vorrichtung zur gasabfuhr. - Google Patents
Vorrichtung zur gasabfuhr.Info
- Publication number
- DE3780747D1 DE3780747D1 DE8787307347T DE3780747T DE3780747D1 DE 3780747 D1 DE3780747 D1 DE 3780747D1 DE 8787307347 T DE8787307347 T DE 8787307347T DE 3780747 T DE3780747 T DE 3780747T DE 3780747 D1 DE3780747 D1 DE 3780747D1
- Authority
- DE
- Germany
- Prior art keywords
- gas exhaust
- exhaust
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/919,736 US4711197A (en) | 1986-10-16 | 1986-10-16 | Gas scavenger |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3780747D1 true DE3780747D1 (de) | 1992-09-03 |
DE3780747T2 DE3780747T2 (de) | 1993-01-14 |
Family
ID=25442565
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8787307347T Expired - Fee Related DE3780747T2 (de) | 1986-10-16 | 1987-08-19 | Vorrichtung zur gasabfuhr. |
Country Status (6)
Country | Link |
---|---|
US (1) | US4711197A (de) |
EP (1) | EP0264177B1 (de) |
JP (1) | JP2642936B2 (de) |
KR (1) | KR930007610Y1 (de) |
CA (1) | CA1277442C (de) |
DE (1) | DE3780747T2 (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4909185A (en) * | 1988-02-03 | 1990-03-20 | Weiss Scientific Glass Blowing Co. | Cantilever and cold zone assembly for loading and unloading an oven |
US4992044A (en) * | 1989-06-28 | 1991-02-12 | Digital Equipment Corporation | Reactant exhaust system for a thermal processing furnace |
JPH05326428A (ja) * | 1992-05-18 | 1993-12-10 | Nec Yamagata Ltd | 拡散炉用スカベンジャ |
US5370736A (en) * | 1992-10-26 | 1994-12-06 | Texas Instruments Incorporated | Horizontal reactor hardware design |
CN102732860B (zh) * | 2011-04-14 | 2015-01-14 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 反应腔及具有其的化学气相沉积设备 |
CN103160813B (zh) * | 2011-12-14 | 2015-10-21 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种反应腔室以及应用该反应腔室的等离子体加工设备 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3920404A (en) * | 1974-09-11 | 1975-11-18 | Ford Motor Co | Catalyst converter |
US3960509A (en) * | 1974-12-30 | 1976-06-01 | Abriany Raymond R | Catalytic muffler |
US4094644A (en) * | 1975-12-08 | 1978-06-13 | Uop Inc. | Catalytic exhaust muffler for motorcycles |
DE2654083A1 (de) * | 1976-11-29 | 1978-06-01 | Siemens Ag | Plasmaaetzverfahren |
DE3427057A1 (de) * | 1984-07-23 | 1986-01-23 | Standard Elektrik Lorenz Ag, 7000 Stuttgart | Anlage zum herstellen von halbleiter-schichtstrukturen durch epitaktisches wachstum |
JPS62206826A (ja) * | 1986-03-06 | 1987-09-11 | Nippon Texas Instr Kk | 半導体熱処理装置 |
-
1986
- 1986-10-16 US US06/919,736 patent/US4711197A/en not_active Expired - Fee Related
-
1987
- 1987-08-19 DE DE8787307347T patent/DE3780747T2/de not_active Expired - Fee Related
- 1987-08-19 EP EP87307347A patent/EP0264177B1/de not_active Expired - Lifetime
- 1987-08-21 CA CA000545025A patent/CA1277442C/en not_active Expired - Fee Related
- 1987-08-28 KR KR2019870014437U patent/KR930007610Y1/ko active IP Right Grant
- 1987-10-16 JP JP62261507A patent/JP2642936B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
EP0264177A2 (de) | 1988-04-20 |
EP0264177A3 (en) | 1990-05-23 |
KR880008706U (ko) | 1988-06-30 |
JPS63134665A (ja) | 1988-06-07 |
EP0264177B1 (de) | 1992-07-29 |
DE3780747T2 (de) | 1993-01-14 |
JP2642936B2 (ja) | 1997-08-20 |
KR930007610Y1 (ko) | 1993-11-05 |
US4711197A (en) | 1987-12-08 |
CA1277442C (en) | 1990-12-04 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |