DE3770760D1 - Probentraeger fuer ein spektralellipsometer mit hoher seitlicher aufloesung. - Google Patents

Probentraeger fuer ein spektralellipsometer mit hoher seitlicher aufloesung.

Info

Publication number
DE3770760D1
DE3770760D1 DE8787201919T DE3770760T DE3770760D1 DE 3770760 D1 DE3770760 D1 DE 3770760D1 DE 8787201919 T DE8787201919 T DE 8787201919T DE 3770760 T DE3770760 T DE 3770760T DE 3770760 D1 DE3770760 D1 DE 3770760D1
Authority
DE
Germany
Prior art keywords
spectralellipsometer
sample carrier
lateral resolution
high lateral
resolution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE8787201919T
Other languages
English (en)
Inventor
Bris Jean Societe Civile S Le
Marko Societe Civile S P Erman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Application granted granted Critical
Publication of DE3770760D1 publication Critical patent/DE3770760D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N21/211—Ellipsometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G01N21/03—Cuvette constructions
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/01—Arrangements or apparatus for facilitating the optical investigation
    • G01N21/03—Cuvette constructions
    • G01N2021/0339—Holders for solids, powders
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N2021/178—Methods for obtaining spatial resolution of the property being measured
    • G01N2021/1785—Three dimensional

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
DE8787201919T 1986-10-10 1987-10-07 Probentraeger fuer ein spektralellipsometer mit hoher seitlicher aufloesung. Expired - Lifetime DE3770760D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8614124A FR2605106B1 (fr) 1986-10-10 1986-10-10 Porte-echantillon pour un ellipsometre spectroscopique a haute resolution laterale

Publications (1)

Publication Number Publication Date
DE3770760D1 true DE3770760D1 (de) 1991-07-18

Family

ID=9339749

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8787201919T Expired - Lifetime DE3770760D1 (de) 1986-10-10 1987-10-07 Probentraeger fuer ein spektralellipsometer mit hoher seitlicher aufloesung.

Country Status (5)

Country Link
US (1) US4834539A (de)
EP (1) EP0266814B1 (de)
JP (1) JPH0692917B2 (de)
DE (1) DE3770760D1 (de)
FR (1) FR2605106B1 (de)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0374348U (de) * 1989-11-20 1991-07-25
US5166752A (en) * 1990-01-11 1992-11-24 Rudolph Research Corporation Simultaneous multiple angle/multiple wavelength ellipsometer and method
JP2574720Y2 (ja) * 1990-10-15 1998-06-18 富士ゼロックス株式会社 傷検査用光学装置の位置調整装置
US5129724A (en) * 1991-01-29 1992-07-14 Wyko Corporation Apparatus and method for simultaneous measurement of film thickness and surface height variation for film-substrate sample
JPH06281567A (ja) * 1992-02-29 1994-10-07 New Oji Paper Co Ltd 複屈折測定装置
US5608526A (en) * 1995-01-19 1997-03-04 Tencor Instruments Focused beam spectroscopic ellipsometry method and system
US6734967B1 (en) * 1995-01-19 2004-05-11 Kla-Tencor Technologies Corporation Focused beam spectroscopic ellipsometry method and system
US5581350A (en) * 1995-06-06 1996-12-03 Tencor Instruments Method and system for calibrating an ellipsometer
US5866900A (en) * 1996-01-05 1999-02-02 Raytheon Ti Systems, Inc. Method and apparatus for calibrating a focal plane array of an image detector
JP4168543B2 (ja) * 1998-10-08 2008-10-22 株式会社ニコン 光学特性測定ユニット
US7230699B1 (en) * 2002-10-15 2007-06-12 J.A. Woollam Co., Inc. Sample orientation system and method
US6642066B1 (en) 2002-05-15 2003-11-04 Advanced Micro Devices, Inc. Integrated process for depositing layer of high-K dielectric with in-situ control of K value and thickness of high-K dielectric layer
US7978252B2 (en) * 2005-03-30 2011-07-12 Kyocera Corporation Imaging apparatus, imaging system, and imaging method
JP6426202B2 (ja) * 2015-01-23 2018-11-21 京セラ株式会社 測定装置および測定方法
US10444140B1 (en) * 2019-03-18 2019-10-15 J.A. Woollam Co., Inc. Theta-theta sample positioning stage with application to sample mapping using reflectometer, spectrophotometer or ellipsometer system
CN110044613B (zh) * 2019-04-18 2020-04-28 大连理工大学 基于轴盘的转子六自由度运动测试及其运动参数解耦方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2947214A (en) * 1958-06-02 1960-08-02 Sylvania Electric Prod Crystal orientation device
FR1575196A (de) * 1967-08-05 1969-07-18
US3564240A (en) * 1969-07-22 1971-02-16 Charles Supper Co Inc Goniometer head for x-ray diffraction apparatus with improved z-motion mechanism
US4210401A (en) * 1978-07-28 1980-07-01 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Visible and infrared polarization ratio spectroreflectometer

Also Published As

Publication number Publication date
EP0266814A1 (de) 1988-05-11
JPS63108236A (ja) 1988-05-13
US4834539A (en) 1989-05-30
EP0266814B1 (de) 1991-06-12
FR2605106A1 (fr) 1988-04-15
JPH0692917B2 (ja) 1994-11-16
FR2605106B1 (fr) 1988-12-09

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: PHILIPS ELECTRONICS N.V., EINDHOVEN, NL

8339 Ceased/non-payment of the annual fee