DE3750158T2 - Dünnschicht-Festkörperanordnung. - Google Patents
Dünnschicht-Festkörperanordnung.Info
- Publication number
- DE3750158T2 DE3750158T2 DE3750158T DE3750158T DE3750158T2 DE 3750158 T2 DE3750158 T2 DE 3750158T2 DE 3750158 T DE3750158 T DE 3750158T DE 3750158 T DE3750158 T DE 3750158T DE 3750158 T2 DE3750158 T2 DE 3750158T2
- Authority
- DE
- Germany
- Prior art keywords
- thin
- film solid
- state arrangement
- arrangement
- state
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/488—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor consisting of soldered or bonded constructions
- H01L23/498—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers
- H01L23/49866—Leads, i.e. metallisations or lead-frames on insulating substrates, e.g. chip carriers characterised by the materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/702—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof of thick-or thin-film circuits or parts thereof
- H01L21/707—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof of thick-or thin-film circuits or parts thereof of thin-film circuits or parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
- H01L23/14—Mountings, e.g. non-detachable insulating substrates characterised by the material or its electrical properties
- H01L23/147—Semiconductor insulating substrates
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N50/00—Galvanomagnetic devices
- H10N50/80—Constructional details
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/11—Magnetic recording head
- Y10T428/1193—Magnetic recording head with interlaminar component [e.g., adhesion layer, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12806—Refractory [Group IVB, VB, or VIB] metal-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12806—Refractory [Group IVB, VB, or VIB] metal-base component
- Y10T428/12819—Group VB metal-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12931—Co-, Fe-, or Ni-base components, alternative to each other
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12944—Ni-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12861—Group VIII or IB metal-base component
- Y10T428/12951—Fe-base component
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Electrodes Of Semiconductors (AREA)
- Semiconductor Integrated Circuits (AREA)
- Hall/Mr Elements (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/939,316 US5019461A (en) | 1986-12-08 | 1986-12-08 | Resistive overlayer for thin film devices |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3750158D1 DE3750158D1 (de) | 1994-08-04 |
DE3750158T2 true DE3750158T2 (de) | 1994-11-10 |
Family
ID=25472943
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE3750158T Expired - Fee Related DE3750158T2 (de) | 1986-12-08 | 1987-12-04 | Dünnschicht-Festkörperanordnung. |
Country Status (4)
Country | Link |
---|---|
US (1) | US5019461A (de) |
EP (1) | EP0271018B1 (de) |
JP (1) | JP2583431B2 (de) |
DE (1) | DE3750158T2 (de) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10150233B4 (de) * | 2001-10-11 | 2009-01-29 | Sensitec Gmbh | Dünnschichtbauelement mit einer in einer ersten Ebene über einem Substrat befindlichen resistiven dünnen Schicht |
US9076717B2 (en) | 2006-12-08 | 2015-07-07 | Infineon Technologies Ag | Semiconductor component comprising magnetic field sensor |
DE102006057970B4 (de) * | 2006-12-08 | 2020-01-02 | Infineon Technologies Ag | Halbleiterbauteil mit einem Magnetfeldsensor und Verfahren zur Herstellung |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0304280B1 (de) * | 1987-08-21 | 1996-05-29 | Nippondenso Co., Ltd. | Anordnung zur Detektion von Magnetismus |
US6343032B1 (en) | 1999-07-07 | 2002-01-29 | Iowa State University Research Foundation, Inc. | Non-volatile spin dependent tunnel junction circuit |
US6542000B1 (en) | 1999-07-30 | 2003-04-01 | Iowa State University Research Foundation, Inc. | Nonvolatile programmable logic devices |
US6693826B1 (en) | 2001-07-30 | 2004-02-17 | Iowa State University Research Foundation, Inc. | Magnetic memory sensing method and apparatus |
US7126330B2 (en) * | 2004-06-03 | 2006-10-24 | Honeywell International, Inc. | Integrated three-dimensional magnetic sensing device and method to fabricate an integrated three-dimensional magnetic sensing device |
US20090315554A1 (en) * | 2008-06-20 | 2009-12-24 | Honeywell International Inc. | Integrated three-dimensional magnetic sensing device and method to fabricate an integrated three-dimensional magnetic sensing device |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL113780C (de) * | 1957-10-23 | |||
US3125743A (en) * | 1958-03-19 | 1964-03-17 | Nondestructive readout of magnetic cores | |
US3375503A (en) * | 1963-09-13 | 1968-03-26 | Ibm | Magnetostatically coupled magnetic thin film devices |
US3461438A (en) * | 1964-04-06 | 1969-08-12 | Ibm | Memory element having two orthogonally disposed magnetic films |
US3587069A (en) * | 1964-10-31 | 1971-06-22 | Zaidan Hojin Parametron Kenkyu | Ferromagnetic thin-film memory element and a method of recording information therein |
US3452334A (en) * | 1964-12-28 | 1969-06-24 | Ibm | Magnetic film memories with an intermediate conductive element as a drive line return path |
US3382053A (en) * | 1965-04-05 | 1968-05-07 | Western Electric Co | Tantalum films of unique structure |
US3525023A (en) * | 1965-08-05 | 1970-08-18 | Sperry Rand Corp | Multilayer thin film magnetic memory element |
FR1541256A (fr) * | 1966-12-07 | Ibm | Dispositif de mémoire associative | |
US3524173A (en) * | 1967-05-22 | 1970-08-11 | Ampex | Process for electrodeposition of anisotropic magnetic films and a product formed by the process |
US3701983A (en) * | 1969-12-19 | 1972-10-31 | Sylvania Electric Prod | Magnetostatically coupled thin-film magnetic memory devices |
US3623038A (en) * | 1969-12-19 | 1971-11-23 | Gte Sylvania Inc | Pheral layer magnetic thin film element |
US3617816A (en) * | 1970-02-02 | 1971-11-02 | Ibm | Composite metallurgy stripe for semiconductor devices |
US3701931A (en) * | 1971-05-06 | 1972-10-31 | Ibm | Gold tantalum-nitrogen high conductivity metallurgy |
US3847658A (en) * | 1972-01-14 | 1974-11-12 | Western Electric Co | Article of manufacture having a film comprising nitrogen-doped beta tantalum |
BE791139A (fr) * | 1972-01-14 | 1973-03-01 | Western Electric Co | Procede pour le depot de beta-tantale dope par l'azote |
US4000055A (en) * | 1972-01-14 | 1976-12-28 | Western Electric Company, Inc. | Method of depositing nitrogen-doped beta tantalum |
US3825802A (en) * | 1973-03-12 | 1974-07-23 | Western Electric Co | Solid capacitor |
FR2276658A1 (fr) * | 1974-06-25 | 1976-01-23 | Tecsi | Poste de lecture pour un registre a propagation de domaines magnetiques sur une couche mince |
JPS576962Y2 (de) * | 1974-07-26 | 1982-02-09 | ||
US4097802A (en) * | 1975-06-30 | 1978-06-27 | International Business Machines Corporation | Magnetoresistive field sensor with a magnetic shield which prevents sensor response at fields below saturation of the shield |
US4307132A (en) * | 1977-12-27 | 1981-12-22 | International Business Machines Corp. | Method for fabricating a contact on a semiconductor substrate by depositing an aluminum oxide diffusion barrier layer |
US4208725A (en) * | 1979-02-23 | 1980-06-17 | Sperry Corporation | Magneto-resistive detector for cross-tie wall memory system |
DE3063506D1 (en) * | 1979-08-31 | 1983-07-07 | Fujitsu Ltd | A tantalum thin film capacitor and process for producing the same |
EP0035118B1 (de) * | 1980-02-28 | 1985-11-21 | Kabushiki Kaisha Toshiba | Lichtemittierendes Halbleiterelement der III-V-Verbindung und Verfahren zu seiner Herstellung |
JPS584992A (ja) * | 1981-07-01 | 1983-01-12 | Hitachi Ltd | 磁気電気変換素子 |
-
1986
- 1986-12-08 US US06/939,316 patent/US5019461A/en not_active Expired - Lifetime
-
1987
- 1987-12-04 DE DE3750158T patent/DE3750158T2/de not_active Expired - Fee Related
- 1987-12-04 EP EP87117951A patent/EP0271018B1/de not_active Expired - Lifetime
- 1987-12-08 JP JP62308841A patent/JP2583431B2/ja not_active Expired - Fee Related
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10150233B4 (de) * | 2001-10-11 | 2009-01-29 | Sensitec Gmbh | Dünnschichtbauelement mit einer in einer ersten Ebene über einem Substrat befindlichen resistiven dünnen Schicht |
US9076717B2 (en) | 2006-12-08 | 2015-07-07 | Infineon Technologies Ag | Semiconductor component comprising magnetic field sensor |
DE102006057970B4 (de) * | 2006-12-08 | 2020-01-02 | Infineon Technologies Ag | Halbleiterbauteil mit einem Magnetfeldsensor und Verfahren zur Herstellung |
Also Published As
Publication number | Publication date |
---|---|
EP0271018A3 (en) | 1990-03-14 |
JP2583431B2 (ja) | 1997-02-19 |
JPS63232470A (ja) | 1988-09-28 |
EP0271018B1 (de) | 1994-06-29 |
DE3750158D1 (de) | 1994-08-04 |
US5019461A (en) | 1991-05-28 |
EP0271018A2 (de) | 1988-06-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |