DE3674939D1 - Flache magnetron-penning-entladungszerstaeubungsvorrichtung. - Google Patents

Flache magnetron-penning-entladungszerstaeubungsvorrichtung.

Info

Publication number
DE3674939D1
DE3674939D1 DE8686302478T DE3674939T DE3674939D1 DE 3674939 D1 DE3674939 D1 DE 3674939D1 DE 8686302478 T DE8686302478 T DE 8686302478T DE 3674939 T DE3674939 T DE 3674939T DE 3674939 D1 DE3674939 D1 DE 3674939D1
Authority
DE
Germany
Prior art keywords
penning discharge
flat magnetron
discharge sprayer
sprayer
magnetron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8686302478T
Other languages
English (en)
Inventor
John C Helmer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Varian Medical Systems Inc
Original Assignee
Varian Associates Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Varian Associates Inc filed Critical Varian Associates Inc
Application granted granted Critical
Publication of DE3674939D1 publication Critical patent/DE3674939D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/3426—Material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/345—Magnet arrangements in particular for cathodic sputtering apparatus
    • H01J37/3458—Electromagnets in particular for cathodic sputtering apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Physical Vapour Deposition (AREA)
  • Thin Magnetic Films (AREA)
DE8686302478T 1985-04-03 1986-04-03 Flache magnetron-penning-entladungszerstaeubungsvorrichtung. Expired - Fee Related DE3674939D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/719,182 US4629548A (en) 1985-04-03 1985-04-03 Planar penning magnetron sputtering device

Publications (1)

Publication Number Publication Date
DE3674939D1 true DE3674939D1 (de) 1990-11-22

Family

ID=24889075

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686302478T Expired - Fee Related DE3674939D1 (de) 1985-04-03 1986-04-03 Flache magnetron-penning-entladungszerstaeubungsvorrichtung.

Country Status (4)

Country Link
US (1) US4629548A (de)
EP (1) EP0197770B1 (de)
JP (1) JPS61231170A (de)
DE (1) DE3674939D1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4810347A (en) * 1988-03-21 1989-03-07 Eaton Corporation Penning type cathode for sputter coating
US5089746A (en) * 1989-02-14 1992-02-18 Varian Associates, Inc. Production of ion beams by chemically enhanced sputtering of solids
US5080772A (en) * 1990-08-24 1992-01-14 Materials Research Corporation Method of improving ion flux distribution uniformity on a substrate
DE4218115A1 (de) * 1992-06-02 1993-12-09 Guenter Lauer Verfahren sowie Aufbereitungsvorrichtung zur Reinwasserherstellung
DE19540794A1 (de) * 1995-11-02 1997-05-07 Leybold Ag Vorrichtung zum Beschichten eines Substrats von einem elektrisch leitfähigen Target
US6352626B1 (en) 1999-04-19 2002-03-05 Von Zweck Heimart Sputter ion source for boron and other targets
EP1509633B1 (de) * 2002-04-25 2015-12-02 University Of Virginia Patent Foundation Verfahren zur schnellen einheitlichen beschichtung auch ohne sichtverbindung
US20060275624A1 (en) * 2005-06-07 2006-12-07 General Electric Company Method and apparatus for airfoil electroplating, and airfoil
WO2008007095A1 (en) * 2006-07-13 2008-01-17 Teer Coatings Limited Coating apparatus and method

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL50072C (de) * 1935-12-28
US3117065A (en) * 1959-09-02 1964-01-07 Magnetic Film And Tape Company Method and apparatus for making magnetic recording tape
US3353054A (en) * 1964-06-09 1967-11-14 Edwards High Vacuum Int Ltd Penning type vacuum pumps
US3447072A (en) * 1966-12-22 1969-05-27 Nat Res Corp Cold cathode penning type gauge for monitoring vacuum level in a sputtering process
US3412310A (en) * 1967-03-06 1968-11-19 Varian Associates Power supply for glow discharge type vacuum pumps employing a voltagedoubler bridge-rectifier and a soft transformer
US3566185A (en) * 1969-03-12 1971-02-23 Atomic Energy Commission Sputter-type penning discharge for metallic ions
US3898496A (en) * 1974-08-12 1975-08-05 Us Energy Means for obtaining a metal ion beam from a heavy-ion cyclotron source
HU179482B (en) * 1979-02-19 1982-10-28 Mikroelektronikai Valalat Penning pulverizel source
US4324631A (en) * 1979-07-23 1982-04-13 Spin Physics, Inc. Magnetron sputtering of magnetic materials
CH648690A5 (de) * 1980-10-14 1985-03-29 Balzers Hochvakuum Kathodenanordnung zur abstaeubung von material von einem target in einer kathodenzerstaeubungsanlage.
US4344019A (en) * 1980-11-10 1982-08-10 The United States Of America As Represented By The United States Department Of Energy Penning discharge ion source with self-cleaning aperture
CH649578A5 (de) * 1981-03-27 1985-05-31 Ulvac Corp Hochgeschwindigkeits-kathoden-zerstaeubungsvorrichtung.
JPS58141433A (ja) * 1982-02-16 1983-08-22 Teijin Ltd 磁気記録媒体とその製造方法
DE3223245C2 (de) * 1982-07-23 1986-05-22 Nihon Shinku Gijutsu K.K., Chigasaki, Kanagawa Ferromagnetische Hochgeschwindigkeits-Kathodenzerstäubungs-Vorrichtung
US4391697A (en) * 1982-08-16 1983-07-05 Vac-Tec Systems, Inc. High rate magnetron sputtering of high permeability materials
US4431505A (en) * 1982-08-16 1984-02-14 Vac-Tec Systems, Inc. High rate magnetron sputtering of high permeability materials
US4414087A (en) * 1983-01-31 1983-11-08 Meckel Benjamin B Magnetically-assisted sputtering method for producing vertical recording media
US4500409A (en) * 1983-07-19 1985-02-19 Varian Associates, Inc. Magnetron sputter coating source for both magnetic and non magnetic target materials
US4564435A (en) * 1985-05-23 1986-01-14 Varian Associates, Inc. Target assembly for sputtering magnetic material

Also Published As

Publication number Publication date
EP0197770B1 (de) 1990-10-17
EP0197770A2 (de) 1986-10-15
US4629548A (en) 1986-12-16
EP0197770A3 (en) 1988-01-07
JPS61231170A (ja) 1986-10-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee