DE3669489D1 - Herstellung von silizium nach einem plasmaschmelzverfahren. - Google Patents

Herstellung von silizium nach einem plasmaschmelzverfahren.

Info

Publication number
DE3669489D1
DE3669489D1 DE8686117555T DE3669489T DE3669489D1 DE 3669489 D1 DE3669489 D1 DE 3669489D1 DE 8686117555 T DE8686117555 T DE 8686117555T DE 3669489 T DE3669489 T DE 3669489T DE 3669489 D1 DE3669489 D1 DE 3669489D1
Authority
DE
Germany
Prior art keywords
silicon
production
melting process
plasma melting
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8686117555T
Other languages
English (en)
Inventor
Vishu Dutt Dosaj
Alvin William Rauchholz
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dow Silicones Corp
Original Assignee
Dow Corning Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/813,330 external-priority patent/US4680096A/en
Application filed by Dow Corning Corp filed Critical Dow Corning Corp
Application granted granted Critical
Publication of DE3669489D1 publication Critical patent/DE3669489D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

DE8686117555T 1985-12-26 1986-12-17 Herstellung von silizium nach einem plasmaschmelzverfahren. Expired - Fee Related DE3669489D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/813,330 US4680096A (en) 1985-12-26 1985-12-26 Plasma smelting process for silicon

Publications (1)

Publication Number Publication Date
DE3669489D1 true DE3669489D1 (de) 1990-04-19

Family

ID=25212071

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686117555T Expired - Fee Related DE3669489D1 (de) 1985-12-26 1986-12-17 Herstellung von silizium nach einem plasmaschmelzverfahren.

Country Status (2)

Country Link
DE (1) DE3669489D1 (de)
PT (1) PT84948B (de)

Also Published As

Publication number Publication date
PT84948A (en) 1989-05-31
PT84948B (pt) 1992-07-31

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee