DE3573175D1 - A photo resist and a process for manufacturing an integrated circuit - Google Patents
A photo resist and a process for manufacturing an integrated circuitInfo
- Publication number
- DE3573175D1 DE3573175D1 DE8585308229T DE3573175T DE3573175D1 DE 3573175 D1 DE3573175 D1 DE 3573175D1 DE 8585308229 T DE8585308229 T DE 8585308229T DE 3573175 T DE3573175 T DE 3573175T DE 3573175 D1 DE3573175 D1 DE 3573175D1
- Authority
- DE
- Germany
- Prior art keywords
- manufacturing
- integrated circuit
- photo resist
- resist
- photo
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Drying Of Semiconductors (AREA)
- Electron Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US67230384A | 1984-11-16 | 1984-11-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3573175D1 true DE3573175D1 (en) | 1989-10-26 |
Family
ID=24697998
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8585308229T Expired DE3573175D1 (en) | 1984-11-16 | 1985-11-12 | A photo resist and a process for manufacturing an integrated circuit |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP0182587B1 (de) |
JP (1) | JPS61125019A (de) |
DE (1) | DE3573175D1 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH083628B2 (ja) * | 1986-10-13 | 1996-01-17 | 三菱電機株式会社 | 非帯電性レジスト |
US5168030A (en) * | 1986-10-13 | 1992-12-01 | Mitsubishi Denki Kabushiki Kaisha | Positive type o-quinone diazide photo-resist containing antistatic agent selected from hydrazones, ethylcarbazole and bis(dimethylamino)benzene |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL125781C (de) * | 1959-02-04 | |||
FR2255629B1 (de) * | 1973-12-20 | 1976-10-22 | Ibm | |
US4196003A (en) * | 1974-02-01 | 1980-04-01 | Fuji Photo Film Co., Ltd. | Light-sensitive o-quinone diazide copying composition |
CA1120763A (en) * | 1977-11-23 | 1982-03-30 | James A. Carothers | Enhancement of resist development |
JPS5559456A (en) * | 1978-10-25 | 1980-05-02 | Fuji Photo Film Co Ltd | Electron beam recording method |
DE3066410D1 (en) * | 1979-10-10 | 1984-03-08 | Ibm | Photo, e-beam, and x-ray sensitive negative resists based on donor polymer-doped halocarbon acceptor transfer complexes and method for producing negative resist images |
CA1161685A (en) * | 1979-10-10 | 1984-02-07 | Ari Aviram | Class of x-ray resists based on donor polymer-doped halocarbon acceptor transfer complexes |
JPS56125833A (en) * | 1980-03-07 | 1981-10-02 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Exposing method for electron beam |
JPS57170526A (en) * | 1981-04-14 | 1982-10-20 | Fujitsu Ltd | Exposing method and device for charged beam |
JPS57188040A (en) * | 1981-05-15 | 1982-11-18 | Toshiba Corp | Electrophographic organic photoconductive composition |
JPS59116745A (ja) * | 1982-12-24 | 1984-07-05 | Fujitsu Ltd | パタ−ン形成方法 |
SU1115010A1 (ru) * | 1983-05-20 | 1984-09-23 | Всесоюзный Государственный Ордена Трудового Красного Знамени Научно-Исследовательский И Проектный Институт Химико-Фотографической Промышленности | Способ получени изображени |
JPS60260037A (ja) * | 1984-06-06 | 1985-12-23 | Nec Corp | X線レジスト材料 |
-
1985
- 1985-07-18 JP JP15714885A patent/JPS61125019A/ja active Pending
- 1985-11-12 DE DE8585308229T patent/DE3573175D1/de not_active Expired
- 1985-11-12 EP EP19850308229 patent/EP0182587B1/de not_active Expired
Also Published As
Publication number | Publication date |
---|---|
EP0182587B1 (de) | 1989-09-20 |
EP0182587A2 (de) | 1986-05-28 |
EP0182587A3 (en) | 1987-11-04 |
JPS61125019A (ja) | 1986-06-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |