DE3505318C2 - - Google Patents
Info
- Publication number
- DE3505318C2 DE3505318C2 DE3505318A DE3505318A DE3505318C2 DE 3505318 C2 DE3505318 C2 DE 3505318C2 DE 3505318 A DE3505318 A DE 3505318A DE 3505318 A DE3505318 A DE 3505318A DE 3505318 C2 DE3505318 C2 DE 3505318C2
- Authority
- DE
- Germany
- Prior art keywords
- workpiece
- pulses
- electrolyte
- voltage
- voltage source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/02—Electroplating of selected surface areas
- C25D5/024—Electroplating of selected surface areas using locally applied electromagnetic radiation, e.g. lasers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/20—Electroplating using ultrasonics, vibrations
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/241—Reinforcing the conductive pattern characterised by the electroplating method; means therefor, e.g. baths or apparatus
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/243—Reinforcing the conductive pattern characterised by selective plating, e.g. for finish plating of pads
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S204/00—Chemistry: electrical and wave energy
- Y10S204/09—Wave forms
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Optics & Photonics (AREA)
- Electroplating Methods And Accessories (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59028199A JPS60174896A (ja) | 1984-02-16 | 1984-02-16 | 電解装置 |
JP26893484A JPS61147897A (ja) | 1984-12-20 | 1984-12-20 | 電解めっき方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3505318A1 DE3505318A1 (de) | 1985-08-14 |
DE3505318C2 true DE3505318C2 (fr) | 1989-06-08 |
Family
ID=26366249
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19853505318 Granted DE3505318A1 (de) | 1984-02-16 | 1985-02-15 | Elektrolysegeraet |
Country Status (2)
Country | Link |
---|---|
US (1) | US4608138A (fr) |
DE (1) | DE3505318A1 (fr) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3706124A1 (de) * | 1987-02-25 | 1988-09-08 | Agie Ag Ind Elektronik | Verfahren zum elektroerosiven bearbeiten von elektrisch schwach oder nicht leitenden werkstuecken sowie elektroerosionsmaschine zur durchfuehrung des verfahrens |
US5202004A (en) * | 1989-12-20 | 1993-04-13 | Digital Instruments, Inc. | Scanning electrochemical microscopy |
US5292418A (en) * | 1991-03-08 | 1994-03-08 | Mitsubishi Denki Kabushiki Kaisha | Local laser plating apparatus |
KR940005622B1 (ko) * | 1991-10-22 | 1994-06-21 | 현대전자산업 주식회사 | 화합물 반도체의 광전기 화학적 식각장치 |
US5595637A (en) * | 1995-11-17 | 1997-01-21 | Rockwell International Corporation | Photoelectrochemical fabrication of electronic circuits |
US6146515A (en) * | 1998-12-16 | 2000-11-14 | Tecnu, Inc. | Power supply and method for producing non-periodic complex waveforms |
GB2372041B (en) * | 2000-09-23 | 2004-12-01 | Univ Cambridge Tech | Electrochemical surface treatment of metals and metallic alloys |
US20030075455A1 (en) * | 2001-10-19 | 2003-04-24 | Cambridge University Technical Services Ltd. | Electrochemical treatment of metals |
US20060141157A1 (en) * | 2003-05-27 | 2006-06-29 | Masahiko Sekimoto | Plating apparatus and plating method |
SE0403047D0 (sv) * | 2004-12-14 | 2004-12-14 | Polymer Kompositer I Goeteborg | Pulse-plating method and apparatus |
CN100388997C (zh) * | 2006-09-18 | 2008-05-21 | 南京航空航天大学 | 喷射液束电解-激光复合加工方法及其装置 |
DE102009029551B4 (de) * | 2009-09-17 | 2013-12-24 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren und Vorrichtung zur galvanischen Beschichtung von Substraten |
DE102009051688A1 (de) * | 2009-10-23 | 2011-04-28 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur lichtinduzierten galvanischen Pulsabscheidung zur Ausbildung einer Saatschicht für einen Metallkontakt einer Solarzelle und zur nachfolgenden Verstärkung dieser Saatschicht bzw. dieses Metallkontakts sowie Anordnung zur Durchführung des Verfahrens |
CN101856753B (zh) * | 2010-04-27 | 2012-08-15 | 江苏大学 | 激光空泡空化的光电化学三维加工方法及装置 |
US9039887B2 (en) * | 2012-05-14 | 2015-05-26 | United Technologies Corporation | Component finishing method and assembly |
US10115599B2 (en) | 2012-09-28 | 2018-10-30 | The Board Of Trustees Of The University Of Illinois | Spectrally and temporally engineered processing using photoelectrochemistry |
EP3485068A4 (fr) | 2016-07-13 | 2020-04-22 | Iontra LLC | Procédés, dispositifs et compositions électrochimiques |
WO2018044930A1 (fr) * | 2016-08-29 | 2018-03-08 | Board Of Trustees Of The University Of Arkansas | Structuration électrochimique dirigée par la lumière de structures en cuivre |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE953758C (de) * | 1954-05-22 | 1956-12-06 | Reich Robert W | Verfahren zum galvanischen Abscheiden metallischer UEberzugsschichten unter Einwirkung von Ultraschall |
US3622804A (en) * | 1970-08-19 | 1971-11-23 | Udylite Corp | System for periodically reversing electrical energy through a load |
US3886053A (en) * | 1973-11-01 | 1975-05-27 | James M Leland | Programmable pulse electroplating process |
SU633938A1 (ru) * | 1974-04-08 | 1978-11-25 | Минский радиотехнический институт | Способ электролитического серебрени изделий |
US3975254A (en) * | 1974-08-13 | 1976-08-17 | Westinghouse Electric Corporation | Forward-reverse pulse cycling anodizing and electroplating process power supply |
JPS5243769A (en) * | 1975-10-02 | 1977-04-06 | Katsuharu Hayata | Method of removing offensive odor with s.i.t. agent |
JPS5817274B2 (ja) * | 1977-09-01 | 1983-04-06 | 株式会社井上ジャパックス研究所 | 電着加工方法 |
US4127183A (en) * | 1978-02-17 | 1978-11-28 | American Air Filter Company, Inc. | Silencer device |
US4283259A (en) * | 1979-05-08 | 1981-08-11 | International Business Machines Corporation | Method for maskless chemical and electrochemical machining |
US4217183A (en) * | 1979-05-08 | 1980-08-12 | International Business Machines Corporation | Method for locally enhancing electroplating rates |
US4369099A (en) * | 1981-01-08 | 1983-01-18 | Bell Telephone Laboratories, Incorporated | Photoelectrochemical etching of semiconductors |
US4415414A (en) * | 1982-09-10 | 1983-11-15 | Bell Telephone Laboratories, Incorporated | Etching of optical surfaces |
US4414066A (en) * | 1982-09-10 | 1983-11-08 | Bell Telephone Laboratories, Incorporated | Electrochemical photoetching of compound semiconductors |
-
1985
- 1985-02-13 US US06/701,219 patent/US4608138A/en not_active Expired - Fee Related
- 1985-02-15 DE DE19853505318 patent/DE3505318A1/de active Granted
Also Published As
Publication number | Publication date |
---|---|
US4608138A (en) | 1986-08-26 |
DE3505318A1 (de) | 1985-08-14 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
OR8 | Request for search as to paragraph 43 lit. 1 sentence 1 patent law | ||
8105 | Search report available | ||
8110 | Request for examination paragraph 44 | ||
D2 | Grant after examination | ||
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |