DE3481786D1 - Negativer elektronenlack fuer trockenentwicklung. - Google Patents

Negativer elektronenlack fuer trockenentwicklung.

Info

Publication number
DE3481786D1
DE3481786D1 DE8484112183T DE3481786T DE3481786D1 DE 3481786 D1 DE3481786 D1 DE 3481786D1 DE 8484112183 T DE8484112183 T DE 8484112183T DE 3481786 T DE3481786 T DE 3481786T DE 3481786 D1 DE3481786 D1 DE 3481786D1
Authority
DE
Germany
Prior art keywords
dry development
electronic paint
negative electronic
negative
paint
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8484112183T
Other languages
English (en)
Inventor
Leon H Kaplan
Richard Dean Kaplan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE3481786D1 publication Critical patent/DE3481786D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
DE8484112183T 1983-10-25 1984-10-11 Negativer elektronenlack fuer trockenentwicklung. Expired - Fee Related DE3481786D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/545,032 US4497891A (en) 1983-10-25 1983-10-25 Dry-developed, negative working electron resist system

Publications (1)

Publication Number Publication Date
DE3481786D1 true DE3481786D1 (de) 1990-05-03

Family

ID=24174607

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8484112183T Expired - Fee Related DE3481786D1 (de) 1983-10-25 1984-10-11 Negativer elektronenlack fuer trockenentwicklung.

Country Status (4)

Country Link
US (1) US4497891A (de)
EP (1) EP0141311B1 (de)
JP (1) JPS60102735A (de)
DE (1) DE3481786D1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60114575A (ja) * 1983-11-28 1985-06-21 Tokyo Ohka Kogyo Co Ltd 乾式パタ−ン形成方法
US4988284A (en) * 1986-10-08 1991-01-29 Hewlett-Packard Company Method for compensating for the E-beam proximity effect
US5981143A (en) * 1997-11-26 1999-11-09 Trw Inc. Chemically treated photoresist for withstanding ion bombarded processing

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2726813C2 (de) * 1976-06-17 1984-02-23 Motorola, Inc., 60196 Schaumburg, Ill. Verfahren zur Herstellung eines mit einem Muster versehenen Substrats
US4267257A (en) * 1976-07-30 1981-05-12 Rca Corporation Method for forming a shallow surface relief pattern in a poly(olefin sulfone) layer
US4289845A (en) * 1978-05-22 1981-09-15 Bell Telephone Laboratories, Inc. Fabrication based on radiation sensitive resists and related products
US4241165A (en) * 1978-09-05 1980-12-23 Motorola, Inc. Plasma development process for photoresist
US4307178A (en) * 1980-04-30 1981-12-22 International Business Machines Corporation Plasma develoment of resists
JPS5746241A (en) * 1980-09-04 1982-03-16 Mitsubishi Electric Corp Reversal dry developing method
US4476216A (en) * 1981-08-03 1984-10-09 Amdahl Corporation Method for high resolution lithography
JPS5852638A (ja) * 1981-09-24 1983-03-28 Hitachi Ltd 放射線感応性組成物
US4398001A (en) * 1982-03-22 1983-08-09 International Business Machines Corporation Terpolymer resist compositions

Also Published As

Publication number Publication date
US4497891A (en) 1985-02-05
EP0141311B1 (de) 1990-03-28
JPH0337295B2 (de) 1991-06-05
JPS60102735A (ja) 1985-06-06
EP0141311A3 (en) 1987-06-16
EP0141311A2 (de) 1985-05-15

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee