DE3475969D1 - Light-sensitive composition - Google Patents
Light-sensitive compositionInfo
- Publication number
- DE3475969D1 DE3475969D1 DE8484101299T DE3475969T DE3475969D1 DE 3475969 D1 DE3475969 D1 DE 3475969D1 DE 8484101299 T DE8484101299 T DE 8484101299T DE 3475969 T DE3475969 T DE 3475969T DE 3475969 D1 DE3475969 D1 DE 3475969D1
- Authority
- DE
- Germany
- Prior art keywords
- light
- sensitive composition
- sensitive
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/77—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom ortho- or peri-condensed with carbocyclic rings or ring systems
- C07D307/78—Benzo [b] furans; Hydrogenated benzo [b] furans
- C07D307/79—Benzo [b] furans; Hydrogenated benzo [b] furans with only hydrogen atoms, hydrocarbon or substituted hydrocarbon radicals, directly attached to carbon atoms of the hetero ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/77—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom ortho- or peri-condensed with carbocyclic rings or ring systems
- C07D307/78—Benzo [b] furans; Hydrogenated benzo [b] furans
- C07D307/82—Benzo [b] furans; Hydrogenated benzo [b] furans with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to carbon atoms of the hetero ring
- C07D307/84—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen
- C07D307/85—Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen attached in position 2
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D413/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms
- C07D413/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings
- C07D413/04—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings directly linked by a ring-member-to-ring-member bond
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D413/00—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms
- C07D413/02—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings
- C07D413/06—Heterocyclic compounds containing two or more hetero rings, at least one ring having nitrogen and oxygen atoms as the only ring hetero atoms containing two hetero rings linked by a carbon chain containing only aliphatic carbon atoms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/675—Compositions containing polyhalogenated compounds as photosensitive substances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/117—Free radical
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/126—Halogen compound containing
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Materials Engineering (AREA)
- Plural Heterocyclic Compounds (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
- Heterocyclic Carbon Compounds Containing A Hetero Ring Having Oxygen Or Sulfur (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58019689A JPS59148784A (ja) | 1983-02-10 | 1983-02-10 | 5―置換―2―ハロメチル―1,3,4―オキサジアゾール化合物及び該化合物を含有する光反応開始剤 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3475969D1 true DE3475969D1 (en) | 1989-02-09 |
Family
ID=12006207
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8484101299T Expired DE3475969D1 (en) | 1983-02-10 | 1984-02-08 | Light-sensitive composition |
Country Status (4)
Country | Link |
---|---|
US (1) | US4840869A (US06256357-20010703-M00001.png) |
EP (1) | EP0118766B1 (US06256357-20010703-M00001.png) |
JP (1) | JPS59148784A (US06256357-20010703-M00001.png) |
DE (1) | DE3475969D1 (US06256357-20010703-M00001.png) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60138539A (ja) * | 1983-12-27 | 1985-07-23 | Konishiroku Photo Ind Co Ltd | 感光性組成物 |
JPS61143748A (ja) * | 1984-12-17 | 1986-07-01 | Fuji Photo Film Co Ltd | 感光性組成物 |
JPS63115693U (US06256357-20010703-M00001.png) * | 1987-01-23 | 1988-07-26 | ||
JP2623309B2 (ja) * | 1988-02-22 | 1997-06-25 | ユーシービー ソシエテ アノニム | レジストパターンを得る方法 |
US5219700A (en) * | 1988-10-03 | 1993-06-15 | Mitsubishi Kasei Corporation | Photosensitive composition containing 1,2-naphthoquinone-2-diazido-4-sulfonic acid ester, alkali-soluble resin, halomethyloxadiazole compound and a dye |
JPH02275956A (ja) * | 1988-12-23 | 1990-11-09 | Oki Electric Ind Co Ltd | フォトレジスト組成物 |
JP2567282B2 (ja) * | 1989-10-02 | 1996-12-25 | 日本ゼオン株式会社 | ポジ型レジスト組成物 |
EP0455228B1 (en) * | 1990-05-02 | 1998-08-12 | Mitsubishi Chemical Corporation | Photoresist composition |
US5437952A (en) * | 1992-03-06 | 1995-08-01 | Konica Corporation | Lithographic photosensitive printing plate comprising a photoconductor and a naphtho-quinone diazide sulfonic acid ester of a phenol resin |
EP0720052A1 (en) * | 1994-12-27 | 1996-07-03 | Mitsubishi Chemical Corporation | Photosensitive composition and photosensitive lithographic printing plate |
AU1309800A (en) * | 1998-09-28 | 2000-04-17 | Kimberly-Clark Worldwide, Inc. | Novel photoinitiators and applications therefor |
US6296982B1 (en) * | 1999-11-19 | 2001-10-02 | Kodak Polychrome Graphics Llc | Imaging articles |
DE102008049848A1 (de) * | 2008-10-01 | 2010-04-08 | Tesa Se | Mehrbereichsindikator |
JP6702251B2 (ja) * | 2017-04-17 | 2020-05-27 | 信越化学工業株式会社 | ポジ型レジストフィルム積層体及びパターン形成方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL291628A (US06256357-20010703-M00001.png) * | 1962-04-17 | |||
BE634233A (US06256357-20010703-M00001.png) * | 1962-06-30 | |||
US3987037A (en) * | 1971-09-03 | 1976-10-19 | Minnesota Mining And Manufacturing Company | Chromophore-substituted vinyl-halomethyl-s-triazines |
US4192677A (en) * | 1976-05-18 | 1980-03-11 | Ricoh Co., Ltd. | 1,3,4-Oxadiazole derivatives and use thereof |
DE2641100A1 (de) * | 1976-09-13 | 1978-03-16 | Hoechst Ag | Lichtempfindliche kopierschicht |
US4212970A (en) * | 1977-11-28 | 1980-07-15 | Fuji Photo Film Co., Ltd. | 2-Halomethyl-5-vinyl-1,3,4-oxadiazole compounds |
JPS5474728A (en) * | 1977-11-28 | 1979-06-15 | Fuji Photo Film Co Ltd | Photosensitive composition |
JPS5577742A (en) * | 1978-12-08 | 1980-06-11 | Fuji Photo Film Co Ltd | Photosensitive composition |
DE3120402A1 (de) * | 1981-05-22 | 1982-12-16 | Hoechst Ag, 6000 Frankfurt | Neue cumarinverbindungen, verfahren zu ihrer herstellung und ihre verwendung als farbstoffe |
GB2114766B (en) * | 1982-02-05 | 1985-05-22 | Konishiroku Photo Ind | Electrophotographic photoreceptor |
JPS5978339A (ja) * | 1982-10-28 | 1984-05-07 | Fuji Photo Film Co Ltd | 光重合性組成物 |
-
1983
- 1983-02-10 JP JP58019689A patent/JPS59148784A/ja active Granted
-
1984
- 1984-02-08 EP EP84101299A patent/EP0118766B1/en not_active Expired
- 1984-02-08 DE DE8484101299T patent/DE3475969D1/de not_active Expired
-
1987
- 1987-08-10 US US07/083,879 patent/US4840869A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0118766B1 (en) | 1989-01-04 |
JPS6353992B2 (US06256357-20010703-M00001.png) | 1988-10-26 |
US4840869A (en) | 1989-06-20 |
EP0118766A2 (en) | 1984-09-19 |
EP0118766A3 (en) | 1986-06-25 |
JPS59148784A (ja) | 1984-08-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |