DE3370880D1 - Light and heat-sensitive recording material - Google Patents

Light and heat-sensitive recording material

Info

Publication number
DE3370880D1
DE3370880D1 DE8383307041T DE3370880T DE3370880D1 DE 3370880 D1 DE3370880 D1 DE 3370880D1 DE 8383307041 T DE8383307041 T DE 8383307041T DE 3370880 T DE3370880 T DE 3370880T DE 3370880 D1 DE3370880 D1 DE 3370880D1
Authority
DE
Germany
Prior art keywords
heat
light
recording material
sensitive recording
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8383307041T
Other languages
German (de)
Inventor
Toshimasa Usami
Toshiharu Tanaka
Masato Satomura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Application granted granted Critical
Publication of DE3370880D1 publication Critical patent/DE3370880D1/en
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/002Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using materials containing microcapsules; Preparing or processing such materials, e.g. by pressure; Devices or apparatus specially designed therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/28Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using thermochromic compounds or layers containing liquid crystals, microcapsules, bleachable dyes or heat- decomposable compounds, e.g. gas- liberating
    • B41M5/287Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using thermochromic compounds or layers containing liquid crystals, microcapsules, bleachable dyes or heat- decomposable compounds, e.g. gas- liberating using microcapsules or microspheres only
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274Photolithographic processes
    • H01L21/0276Photolithographic processes using an anti-reflective coating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/30Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/30Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers
    • B41M5/323Organic colour formers, e.g. leuco dyes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/30Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers
    • B41M5/333Colour developing components therefor, e.g. acidic compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/30Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers
    • B41M5/337Additives; Binders
    • B41M5/3372Macromolecular compounds
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/30Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers
    • B41M5/337Additives; Binders
    • B41M5/3375Non-macromolecular compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Optics & Photonics (AREA)
  • Heat Sensitive Colour Forming Recording (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE8383307041T 1982-11-17 1983-11-17 Light and heat-sensitive recording material Expired DE3370880D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57201743A JPS5991438A (en) 1982-11-17 1982-11-17 Photosensitive thermosensitive recording material

Publications (1)

Publication Number Publication Date
DE3370880D1 true DE3370880D1 (en) 1987-05-14

Family

ID=16446198

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8383307041T Expired DE3370880D1 (en) 1982-11-17 1983-11-17 Light and heat-sensitive recording material

Country Status (4)

Country Link
US (1) US4529681A (en)
EP (1) EP0109838B1 (en)
JP (1) JPS5991438A (en)
DE (1) DE3370880D1 (en)

Families Citing this family (77)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH062430B2 (en) * 1983-06-10 1994-01-12 株式会社リコー Thermal recording material
US4632899A (en) * 1983-12-01 1986-12-30 Fuji Photo Film Co., Ltd. Photopolymerizable image-recording process of producing a visible image
JPS60121442A (en) * 1983-12-06 1985-06-28 Canon Inc Photosensitive record memory medium and recording/ reproducing method
EP0153616B1 (en) * 1984-02-07 1991-04-03 Kanzaki Paper Manufacturing Company Limited Heat-sensitive recording materials
JPS60214990A (en) * 1984-03-26 1985-10-28 Fuji Photo Film Co Ltd Photosensitive thermal recording material
GB2160992B (en) * 1984-04-20 1987-04-01 Fuji Photo Film Co Ltd Heat-sensitive recording material
JPS60240491A (en) * 1984-05-16 1985-11-29 Fuji Photo Film Co Ltd Thermal recording material
JPS60242094A (en) * 1984-05-17 1985-12-02 Fuji Photo Film Co Ltd Thermal recording material
JPS60264279A (en) * 1984-06-13 1985-12-27 Fuji Photo Film Co Ltd Recording material
GB2164166B (en) * 1984-07-31 1988-06-15 Fuji Photo Film Co Ltd Heat-sensitive recording material and recording method therefor
JPS6186283A (en) * 1984-10-05 1986-05-01 Fuji Photo Film Co Ltd Thermal recording material
JPS6192891A (en) * 1984-10-12 1986-05-10 Fuji Photo Film Co Ltd Thermal recording material
JPH0688461B2 (en) * 1984-12-27 1994-11-09 富士写真フイルム株式会社 Thermal recording material
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JPS6254248A (en) * 1985-04-30 1987-03-09 Mitsubishi Paper Mills Ltd Plain paper transfer type photosensitive and pressure-sensitive recording sheet
JPS61251838A (en) * 1985-04-30 1986-11-08 Mitsubishi Paper Mills Ltd Plain paper transfer type light and pressure sensitive recording sheet
JPS61251837A (en) * 1985-04-30 1986-11-08 Mitsubishi Paper Mills Ltd Plain paper transfer type light and pressure sensitive recording sheet
DE3666634D1 (en) * 1985-05-30 1989-11-30 Fuji Photo Film Co Ltd Light-sensitive material containing microcapsules and image-recording method using the same
DE3688948T2 (en) * 1985-06-03 1993-12-16 Canon Kk Recording methods and transfer recording material therefor.
US4737189A (en) * 1985-06-13 1988-04-12 Kawaguti & Partners Solvent of a chromogenic dye-precursor material for pressure-sensitive recording paper, the pressure-sensitive recording paper and process for producing the solvent
US4940645A (en) * 1985-07-16 1990-07-10 The Mead Corporation Imaging material employing photosensitive microcapsules containing tertiary amines as coinitiators
JPS6255191A (en) * 1985-09-04 1987-03-10 Fuji Photo Film Co Ltd Thermal recording material
JPH0698834B2 (en) * 1985-10-12 1994-12-07 富士写真フイルム株式会社 Thermal recording material
JPS6290285A (en) * 1985-10-12 1987-04-24 Fuji Photo Film Co Ltd Thermal recording material
JPH0619550B2 (en) * 1986-01-10 1994-03-16 富士写真フイルム株式会社 Image forming method and photosensitive material
US4701397A (en) * 1986-02-26 1987-10-20 The Mead Corporation Method for forming images on plain paper and an imaging sheet useful therein
JPH0619556B2 (en) * 1986-03-10 1994-03-16 富士写真フイルム株式会社 Photosensitive material for heat development
JPH0619555B2 (en) * 1986-03-10 1994-03-16 富士写真フイルム株式会社 Method for producing photosensitive microcapsules
JPH0619554B2 (en) * 1986-03-11 1994-03-16 富士写真フイルム株式会社 Photosensitive material manufacturing method
JPH0668622B2 (en) * 1986-04-23 1994-08-31 富士写真フイルム株式会社 Lithographic printing plate manufacturing method
JPS62250454A (en) * 1986-04-23 1987-10-31 Fuji Photo Film Co Ltd Production of lithographic printing plate
JPH0623845B2 (en) * 1986-06-23 1994-03-30 富士写真フイルム株式会社 Photosensitive image-receiving sheet material and image transfer method
EP0261394B1 (en) * 1986-08-22 1993-08-11 Canon Kabushiki Kaisha Image recording apparatus
US4905036A (en) * 1986-10-29 1990-02-27 Brother Kogyo Kabushiki Kaisha Image forming process and system, including heating step or device for increased density of images
JP2582817B2 (en) * 1986-12-09 1997-02-19 キヤノン株式会社 recoding media
DE3700551A1 (en) * 1987-01-10 1988-08-04 Du Pont Deutschland MATTED PHOTOGRAPHIC RECORDING MATERIALS
JPS63193882A (en) * 1987-02-06 1988-08-11 Fuji Photo Film Co Ltd Recording material
JPH0690450B2 (en) * 1987-05-13 1994-11-14 富士写真フイルム株式会社 Barcode label or ID card manufacturing method
JPH0687125B2 (en) * 1987-06-22 1994-11-02 富士写真フイルム株式会社 Light and heat sensitive recording material
US4804611A (en) * 1987-06-24 1989-02-14 The Mead Corporation Method for reducing short time-scale reciprocity failure effects of a microencapsulated acrylate system
US4816371A (en) * 1987-09-01 1989-03-28 The Mead Corporation Negative-working imaging method employing encapsulated photohardenable compositions
JPH07101314B2 (en) * 1987-09-03 1995-11-01 富士写真フイルム株式会社 Image recording method
US4855209A (en) * 1987-12-04 1989-08-08 Xerox Corporation Low melting encapsulated toners
JPH01176583A (en) * 1988-01-06 1989-07-12 Fuji Photo Film Co Ltd Thermal recording material
US5015549A (en) * 1988-03-23 1991-05-14 Olin Corporation Composition and electrophotographic use of microcapsular photoactive toner particles
JP2632004B2 (en) * 1988-06-15 1997-07-16 富士写真フイルム株式会社 Manufacturing method of microcapsules for pressure-sensitive recording sheet
EP0360533A3 (en) * 1988-09-20 1990-12-19 Seiko Instruments Inc. Photo-and-thermo-sensitive record material
JPH087398B2 (en) * 1988-09-29 1996-01-29 富士写真フイルム株式会社 Multicolor recording material
JPH02289856A (en) * 1989-01-18 1990-11-29 Fuji Photo Film Co Ltd Photosensitive and thermosensitive composition and recording material and image forming method using the same
CA2023112C (en) * 1989-08-11 2000-09-26 Jun Yamaguchi Light- and heat-sensitive recording material
JP2701994B2 (en) * 1990-01-30 1998-01-21 富士写真フイルム株式会社 Photosensitive and thermosensitive recording materials
JP2702004B2 (en) * 1990-06-14 1998-01-21 富士写真フイルム株式会社 Recording material
JPH0466949A (en) * 1990-07-04 1992-03-03 Fuji Photo Film Co Ltd Exposing device and image forming method
JP2639748B2 (en) * 1990-10-31 1997-08-13 富士写真フイルム株式会社 Photosensitive element and method for producing the same
JPH04177252A (en) * 1990-11-09 1992-06-24 Toyo Ink Mfg Co Ltd Image formation material
JP2618090B2 (en) * 1990-11-29 1997-06-11 富士写真フイルム株式会社 Photosensitive and thermosensitive recording materials
JPH04249256A (en) * 1991-02-05 1992-09-04 Fuji Photo Film Co Ltd Production of microcapsule and photosensitive and heat sensitive recording material
JPH04255849A (en) * 1991-02-07 1992-09-10 Fuji Photo Film Co Ltd Photosensitive and thermosensitive recording material
JPH04267942A (en) * 1991-02-25 1992-09-24 Fuji Photo Film Co Ltd Preparation of microcapsule and photosensitive material
JPH04323657A (en) * 1991-04-23 1992-11-12 Fuji Photo Film Co Ltd Color proofing method for color printed original
JPH04345886A (en) * 1991-05-23 1992-12-01 Toppan Printing Co Ltd Reversible thermal record medium and manufacture thereof
DE4129284A1 (en) * 1991-09-03 1993-03-04 Agfa Gevaert Ag IMAGE GENERATING ELEMENT WITH A PHOTOPOLYMERIZABLE MONOMER
JP2799094B2 (en) * 1991-10-09 1998-09-17 富士写真フイルム株式会社 Diazo type recording material
JP2966643B2 (en) * 1992-04-28 1999-10-25 富士写真フイルム株式会社 Diazo type recording material
US5340680A (en) * 1992-09-10 1994-08-23 Appleton Papers Inc. Desensitizable record material
CA2092232C (en) * 1992-09-10 2003-12-09 Robert E. Miller Latent image receiving sheet
JPH082106A (en) * 1994-06-24 1996-01-09 Nippon Kayaku Co Ltd Marking composition and laser marking method
DE69635297D1 (en) * 1995-12-04 2006-03-02 Konishiroku Photo Ind Light and heat sensitive recording material and recording method using this material
JPH09281641A (en) * 1996-04-18 1997-10-31 Fuji Photo Film Co Ltd Heat-developable copying material
KR20030053472A (en) * 2000-06-01 2003-06-28 사이픽스 이미징, 인코포레이티드 Imaging media containing heat developable photosensitive microcapsules
KR100651334B1 (en) * 2000-10-05 2006-11-28 에스케이 주식회사 Method for preparing unsaturated ketones for use in the preparation of Vitamin E
JP4159094B2 (en) * 2003-10-15 2008-10-01 東京応化工業株式会社 Photosensitive resin composition and photosensitive dry film using the same
US20060084005A1 (en) * 2004-10-19 2006-04-20 Eastman Kodak Company Means to enable slitting of micro-encapsulated media
DE102018126744A1 (en) * 2018-10-26 2020-04-30 Mitsubishi Hitec Paper Europe Gmbh Heat sensitive recording material with encapsulated color developer

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JPS5579442A (en) * 1978-12-13 1980-06-14 Sharp Corp Copying system by contact reflection exposure
JPS57124343A (en) * 1981-01-26 1982-08-03 Fuji Photo Film Co Ltd Microcapsule and photosensitive material using it
JPS58211488A (en) * 1982-06-03 1983-12-08 Fuji Photo Film Co Ltd Recording material

Also Published As

Publication number Publication date
JPS5991438A (en) 1984-05-26
EP0109838B1 (en) 1987-04-08
EP0109838A2 (en) 1984-05-30
EP0109838A3 (en) 1985-05-29
US4529681A (en) 1985-07-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Free format text: BARZ, P., DIPL.-CHEM. DR.RER.NAT., PAT.-ANW., 80803 MUENCHEN