DE3337303C2 - - Google Patents

Info

Publication number
DE3337303C2
DE3337303C2 DE19833337303 DE3337303A DE3337303C2 DE 3337303 C2 DE3337303 C2 DE 3337303C2 DE 19833337303 DE19833337303 DE 19833337303 DE 3337303 A DE3337303 A DE 3337303A DE 3337303 C2 DE3337303 C2 DE 3337303C2
Authority
DE
Germany
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE19833337303
Other languages
German (de)
Other versions
DE3337303A1 (de
Inventor
Yoichi Hiratsuka Kanagawa Jp Nakamura
Akihiro Shimizu
Hiroyoshi Kanagawa Jp Saito
Shirushi Isehara Kanagawa Jp Yamamoto
Akira Yamato Kanagawa Jp Yokota
Hisashi Kawasaki Kanagawa Jp Nakane
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of DE3337303A1 publication Critical patent/DE3337303A1/de
Application granted granted Critical
Publication of DE3337303C2 publication Critical patent/DE3337303C2/de
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE19833337303 1982-10-13 1983-10-13 Verfahren zur photolithographischen erzeugung von resistschichten und hierfuer verwendbare lichtempfindliche zusammensetzungen Granted DE3337303A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17932682A JPS5968735A (ja) 1982-10-13 1982-10-13 感光性組成物

Publications (2)

Publication Number Publication Date
DE3337303A1 DE3337303A1 (de) 1984-04-19
DE3337303C2 true DE3337303C2 (nl) 1987-03-26

Family

ID=16063877

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19833337303 Granted DE3337303A1 (de) 1982-10-13 1983-10-13 Verfahren zur photolithographischen erzeugung von resistschichten und hierfuer verwendbare lichtempfindliche zusammensetzungen

Country Status (2)

Country Link
JP (1) JPS5968735A (nl)
DE (1) DE3337303A1 (nl)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3726858A1 (de) * 1986-08-13 1988-02-25 Sony Corp Organosiliciumpolymere enthaltendes photoresistmaterial
US6210861B1 (en) 1992-08-29 2001-04-03 Klaus Uwe Schonfelder Tonable radiation sensitive recording material with balanced adhesive properties and process for using the same

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0211161B1 (en) * 1985-05-31 1990-02-28 International Business Machines Corporation Lithographic resists and method of using the same
JPS61289345A (ja) * 1985-05-31 1986-12-19 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション リソグラフイ用レジスト
JPS63291053A (ja) * 1987-05-25 1988-11-28 Nippon Zeon Co Ltd ポジ型フォトレジスト組成物
EP0464614B1 (en) * 1990-06-25 1999-09-29 Matsushita Electronics Corporation A composition having sensitivity to light or radiation
US5268256A (en) * 1990-08-02 1993-12-07 Ppg Industries, Inc. Photoimageable electrodepositable photoresist composition for producing non-tacky films

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5525418B2 (nl) * 1972-12-20 1980-07-05
JPS50137202A (nl) * 1974-04-22 1975-10-31
JPS516561A (nl) * 1974-07-04 1976-01-20 Yamamoto Kagaku Gosei Kk
US4200463A (en) * 1975-12-19 1980-04-29 Motorola, Inc. Semiconductor device manufacture using photoresist protective coating
DE3022473A1 (de) * 1980-06-14 1981-12-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3726858A1 (de) * 1986-08-13 1988-02-25 Sony Corp Organosiliciumpolymere enthaltendes photoresistmaterial
US6210861B1 (en) 1992-08-29 2001-04-03 Klaus Uwe Schonfelder Tonable radiation sensitive recording material with balanced adhesive properties and process for using the same

Also Published As

Publication number Publication date
DE3337303A1 (de) 1984-04-19
JPH0544665B2 (nl) 1993-07-07
JPS5968735A (ja) 1984-04-18

Similar Documents

Publication Publication Date Title
DE3374522D1 (nl)
FR2522144B1 (nl)
FR2524699B3 (nl)
DE3348031A1 (nl)
DE3303859C2 (nl)
DE3346466C2 (nl)
FR2520928B1 (nl)
CH670182GA3 (nl)
DE3346807C2 (nl)
DE3210204C2 (nl)
FR2522551B1 (nl)
FR2522552B1 (nl)
FR2524265B1 (nl)
DE3305709C2 (nl)
DE3242491C2 (nl)
DE3346536C2 (nl)
DE3302198C2 (nl)
DE3325058C2 (nl)
DE3220076C2 (nl)
DE3230792C3 (nl)
DE3224386C2 (nl)
FR2520342B1 (nl)
DE3337303C2 (nl)
FR2521037B1 (nl)
DE3221048C2 (nl)

Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee