DE3265191D1 - Alignment apparatus for x-ray or optical lithography - Google Patents

Alignment apparatus for x-ray or optical lithography

Info

Publication number
DE3265191D1
DE3265191D1 DE8282103338T DE3265191T DE3265191D1 DE 3265191 D1 DE3265191 D1 DE 3265191D1 DE 8282103338 T DE8282103338 T DE 8282103338T DE 3265191 T DE3265191 T DE 3265191T DE 3265191 D1 DE3265191 D1 DE 3265191D1
Authority
DE
Germany
Prior art keywords
ray
alignment apparatus
optical lithography
lithography
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8282103338T
Other languages
German (de)
English (en)
Inventor
Warren David Grobman
David Albert Nelson
John Michael Warlaumont
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Application granted granted Critical
Publication of DE3265191D1 publication Critical patent/DE3265191D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/18—Diffraction gratings
    • G02B5/1876—Diffractive Fresnel lenses; Zone plates; Kinoforms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Control Of Position Or Direction (AREA)
DE8282103338T 1981-05-20 1982-04-21 Alignment apparatus for x-ray or optical lithography Expired DE3265191D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/265,140 US4405238A (en) 1981-05-20 1981-05-20 Alignment method and apparatus for x-ray or optical lithography

Publications (1)

Publication Number Publication Date
DE3265191D1 true DE3265191D1 (en) 1985-09-12

Family

ID=23009187

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8282103338T Expired DE3265191D1 (en) 1981-05-20 1982-04-21 Alignment apparatus for x-ray or optical lithography

Country Status (4)

Country Link
US (1) US4405238A (enExample)
EP (1) EP0065115B1 (enExample)
JP (1) JPS57191502A (enExample)
DE (1) DE3265191D1 (enExample)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4765714A (en) * 1984-04-03 1988-08-23 Horner Joseph L Binary phase-only optical correlation system
JPH0726803B2 (ja) * 1984-11-26 1995-03-29 株式会社ニコン 位置検出方法及び装置
DE3704313A1 (de) * 1986-11-20 1988-06-01 Krupp Gmbh Beruehrungsloses optisches verfahren zur bestimmung von gegenstaenden
US4815854A (en) * 1987-01-19 1989-03-28 Nec Corporation Method of alignment between mask and semiconductor wafer
US4791482A (en) * 1987-02-06 1988-12-13 Westinghouse Electric Corp. Object locating system
JPH01285803A (ja) * 1988-05-13 1989-11-16 Fujitsu Ltd フレネル・ゾーン・プレートおよびそれを用いる位置合せ方法
JPH07119574B2 (ja) * 1988-09-12 1995-12-20 富士通株式会社 二次元位置検出方法
JP2666859B2 (ja) * 1988-11-25 1997-10-22 日本電気株式会社 目合せ用バーニヤパターンを備えた半導体装置
US5229617A (en) * 1989-07-28 1993-07-20 Canon Kabushiki Kaisha Position detecting method having reflectively scattered light prevented from impinging on a detector
JP2925168B2 (ja) * 1989-07-28 1999-07-28 キヤノン株式会社 位置検出装置及び方法
JP3008633B2 (ja) * 1991-01-11 2000-02-14 キヤノン株式会社 位置検出装置
JP2592369B2 (ja) * 1991-08-22 1997-03-19 富士通株式会社 多層配線回路基板の製造方法及び誘電体ミラーマスクの製造方法
US5504596A (en) * 1992-12-21 1996-04-02 Nikon Corporation Exposure method and apparatus using holographic techniques
US5864394A (en) * 1994-06-20 1999-01-26 Kla-Tencor Corporation Surface inspection system
US5576831A (en) * 1994-06-20 1996-11-19 Tencor Instruments Wafer alignment sensor
US5883710A (en) 1994-12-08 1999-03-16 Kla-Tencor Corporation Scanning system for inspecting anomalies on surfaces
US20040057044A1 (en) * 1994-12-08 2004-03-25 Mehrdad Nikoonahad Scanning system for inspecting anamolies on surfaces
US5825482A (en) * 1995-09-29 1998-10-20 Kla-Tencor Corporation Surface inspection system with misregistration error correction and adaptive illumination
DE19609399C2 (de) * 1996-03-01 2002-05-29 Infineon Technologies Ag Verfahren zum Bestimmen der Kristallorientierung in einem Wafer
EP0979398B1 (en) * 1996-06-04 2012-01-04 KLA-Tencor Corporation Optical scanning system for surface inspection
US5973316A (en) * 1997-07-08 1999-10-26 Nec Research Institute, Inc. Sub-wavelength aperture arrays with enhanced light transmission
US6040936A (en) * 1998-10-08 2000-03-21 Nec Research Institute, Inc. Optical transmission control apparatus utilizing metal films perforated with subwavelength-diameter holes
US6236033B1 (en) 1998-12-09 2001-05-22 Nec Research Institute, Inc. Enhanced optical transmission apparatus utilizing metal films having apertures and periodic surface topography
US6285020B1 (en) 1999-11-05 2001-09-04 Nec Research Institute, Inc. Enhanced optical transmission apparatus with improved inter-surface coupling
US6441298B1 (en) 2000-08-15 2002-08-27 Nec Research Institute, Inc Surface-plasmon enhanced photovoltaic device
CA2319898C (en) 2000-09-18 2006-05-16 Institut National D'optique Position encoding optical device and method
US6649901B2 (en) 2002-03-14 2003-11-18 Nec Laboratories America, Inc. Enhanced optical transmission apparatus with improved aperture geometry
US8225664B1 (en) * 2007-10-17 2012-07-24 Lsp Technologies Lamb waves for laser bond inspection
CN101694531B (zh) * 2009-10-15 2011-01-05 电子科技大学 过剩光载流子菲涅耳波带片
KR102695015B1 (ko) * 2018-09-17 2024-08-13 삼성전자주식회사 네가티브톤 현상용 포토마스크

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3545854A (en) * 1966-06-17 1970-12-08 Gen Electric Semiconductor mask making
JPS4842764A (enExample) * 1971-09-29 1973-06-21
US4037969A (en) * 1976-04-02 1977-07-26 Bell Telephone Laboratories, Incorporated Zone plate alignment marks
FR2436967A1 (fr) * 1978-09-19 1980-04-18 Thomson Csf Procede d'alignement optique de motifs dans deux plans rapproches et dispositif d'alignement mettant en oeuvre un tel procede
US4360586A (en) * 1979-05-29 1982-11-23 Massachusetts Institute Of Technology Spatial period division exposing
US4326805A (en) * 1980-04-11 1982-04-27 Bell Telephone Laboratories, Incorporated Method and apparatus for aligning mask and wafer members

Also Published As

Publication number Publication date
EP0065115B1 (en) 1985-08-07
EP0065115A1 (en) 1982-11-24
JPS57191502A (en) 1982-11-25
JPS6312522B2 (enExample) 1988-03-19
US4405238A (en) 1983-09-20

Similar Documents

Publication Publication Date Title
GB8300315D0 (en) Apparatus for imaging
GB8332416D0 (en) Optical position location apparatus
GB8418145D0 (en) X-ray exposure apparatus
JPS5789849A (en) X-ray photographing apparatus
EP0178660A3 (en) X-ray exposure apparatus
AU535305B2 (en) X-ray photography apparatus
GB8331280D0 (en) Exposure apparatus
GB2149692B (en) Apparatus for electrophotography
JPS56104355A (en) Exposure apparatus
GB2131187B (en) Exposure apparatus
DE3169087D1 (en) X-ray tube apparatus
JPS57136142A (en) Optical apparatus for fluorescent polaroid equipment
GB2112563B (en) X-ray source apparatus
JPS57155561A (en) Optical system for copying apparatus
EP0311058A3 (en) X-ray exposure apparatus
DE3262890D1 (en) X-ray apparatus
JPS57190921A (en) Optical apparatus
EP0071017A3 (en) Apparatus for examination by x-rays
JPS57155530A (en) Optical apparatus
IL67352A0 (en) Multiple lens for computerized tomography alignment device
JPS57130007A (en) Focusing apparatus for optical system
GB2099171B (en) Optical radiation directing apparatus
JPS57195444A (en) X-ray photographing apparatus
JPS576641A (en) X-ray photographing apparatus
GB2093213B (en) Optical radiation receiving apparatus

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee