DE3263356D1 - Method and arrangement for internally coating a tube by reactive deposition from a gas mixture activated by a plasma - Google Patents
Method and arrangement for internally coating a tube by reactive deposition from a gas mixture activated by a plasmaInfo
- Publication number
- DE3263356D1 DE3263356D1 DE8282200486T DE3263356T DE3263356D1 DE 3263356 D1 DE3263356 D1 DE 3263356D1 DE 8282200486 T DE8282200486 T DE 8282200486T DE 3263356 T DE3263356 T DE 3263356T DE 3263356 D1 DE3263356 D1 DE 3263356D1
- Authority
- DE
- Germany
- Prior art keywords
- plasma
- tube
- arrangement
- gas mixture
- reactive deposition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011248 coating agent Substances 0.000 title 1
- 238000000576 coating method Methods 0.000 title 1
- 230000008021 deposition Effects 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 239000000203 mixture Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/507—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using external electrodes, e.g. in tunnel type reactors
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
- C03B37/01815—Reactant deposition burners or deposition heating means
- C03B37/01823—Plasma deposition burners or heating means
- C03B37/0183—Plasma deposition burners or heating means for plasma within a tube substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Metallurgy (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Chemical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL8102149A NL8102149A (nl) | 1981-05-01 | 1981-05-01 | Werkwijze en inrichting voor de inwendige bedekking van een buis door reactieve afscheiding uit een gasmengsel onder invloed van een plasma. |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE3263356D1 true DE3263356D1 (en) | 1985-06-05 |
Family
ID=19837429
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE8282200486T Expired DE3263356D1 (en) | 1981-05-01 | 1982-04-23 | Method and arrangement for internally coating a tube by reactive deposition from a gas mixture activated by a plasma |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4405655A (OSRAM) |
| EP (1) | EP0064785B1 (OSRAM) |
| JP (1) | JPS57190667A (OSRAM) |
| CA (1) | CA1178553A (OSRAM) |
| DE (1) | DE3263356D1 (OSRAM) |
| NL (1) | NL8102149A (OSRAM) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL8302127A (nl) * | 1983-06-15 | 1985-01-02 | Philips Nv | Werkwijze en inrichting voor de vervaardiging van optische vezels. |
| EP0173659B1 (en) * | 1984-07-03 | 1989-03-08 | Stiftelsen Institutet För Mikrovägsteknik Vid Tekniska Högskolan I Stockholm | Method and apparatus for heating thick-walled glass tubes |
| US4761170A (en) * | 1985-06-20 | 1988-08-02 | Polaroid Corporation | Method for employing plasma in dehydration and consolidation of preforms |
| US5188648A (en) * | 1985-07-20 | 1993-02-23 | U.S. Philips Corp. | Method of manufacturing optical fibres |
| US4990372A (en) * | 1987-09-03 | 1991-02-05 | Air Products And Chemicals, Inc. | Method for producing wear resistant internal surfaces of structures |
| DE4212602A1 (de) * | 1992-04-15 | 1993-10-21 | Sel Alcatel Ag | Lichtwellenleiter sowie Verfahren und Vorrichtung zu seiner Herstellung |
| US6215092B1 (en) * | 1999-06-08 | 2001-04-10 | Alcatel | Plasma overcladding process and apparatus having multiple plasma torches |
| US6460379B2 (en) * | 1999-10-25 | 2002-10-08 | Fitel Usa Corp. | MCVD apparatus having two opposing motors to eliminate backlash in burner motion |
| EP1126504A1 (en) * | 2000-02-18 | 2001-08-22 | European Community | Method and apparatus for inductively coupled plasma treatment |
| WO2002084362A1 (en) | 2001-04-12 | 2002-10-24 | Omniguide Communications Inc. | High index-contrast fiber waveguides and applications |
| US6901775B2 (en) * | 2001-09-21 | 2005-06-07 | Corning Incorporated | Method and apparatus for providing a uniform coating thickness along an axial direction within a substrate tube |
| JP2006507545A (ja) * | 2002-11-22 | 2006-03-02 | オムニガイド コミュニケーションズ インコーポレイテッド | 誘電体導波路およびその製造方法 |
| US20050022561A1 (en) * | 2003-08-01 | 2005-02-03 | Guskov Michael I. | Ring plasma jet method and apparatus for making an optical fiber preform |
| US8252387B2 (en) * | 2007-12-10 | 2012-08-28 | Ofs Fitel, Llc | Method of fabricating optical fiber using an isothermal, low pressure plasma deposition technique |
| NL2007831C2 (en) * | 2011-11-21 | 2013-05-23 | Draka Comteq Bv | Apparatus and method for carrying out a pcvd deposition process. |
| CN103204635A (zh) * | 2013-04-25 | 2013-07-17 | 江福兴 | 管件内腔镀膜工艺 |
| DE102014019238A1 (de) * | 2014-12-19 | 2016-06-23 | Hochschule München | Beschichtung der Innenwandung von schlauchförmigen Substraten |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR91083E (fr) * | 1964-05-08 | 1968-04-05 | Int Standard Electric Corp | Perfectionnements aux méthodes de formation de couches |
| DE1646924B1 (de) * | 1965-02-24 | 1970-06-04 | Quartz & Silice | Verfahren und Vorrichtung zum UEberziehen eines Fadens mit Graphit |
| US4145456A (en) * | 1974-09-14 | 1979-03-20 | Dieter Kuppers | Method of producing internally coated glass tubes for the drawing of fibre optic light conductors |
| DE2444100C3 (de) | 1974-09-14 | 1979-04-12 | Philips Patentverwaltung Gmbh, 2000 Hamburg | Verfahren zur Herstellung von innenbeschichteten Glasrohren zum Ziehen von Lichtleitfasern |
| GB1578826A (en) | 1976-03-25 | 1980-11-12 | Western Electric Co | Methods for fabricating optical fibre preforms |
| GB1603949A (en) * | 1978-05-30 | 1981-12-02 | Standard Telephones Cables Ltd | Plasma deposit |
-
1981
- 1981-05-01 NL NL8102149A patent/NL8102149A/nl not_active Application Discontinuation
-
1982
- 1982-04-23 US US06/371,093 patent/US4405655A/en not_active Expired - Fee Related
- 1982-04-23 EP EP82200486A patent/EP0064785B1/en not_active Expired
- 1982-04-23 DE DE8282200486T patent/DE3263356D1/de not_active Expired
- 1982-04-29 CA CA000401982A patent/CA1178553A/en not_active Expired
- 1982-04-30 JP JP57071604A patent/JPS57190667A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57190667A (en) | 1982-11-24 |
| JPS6411713B2 (OSRAM) | 1989-02-27 |
| EP0064785B1 (en) | 1985-05-02 |
| NL8102149A (nl) | 1982-12-01 |
| US4405655A (en) | 1983-09-20 |
| CA1178553A (en) | 1984-11-27 |
| EP0064785A1 (en) | 1982-11-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| DE3263356D1 (en) | Method and arrangement for internally coating a tube by reactive deposition from a gas mixture activated by a plasma | |
| JPS56139672A (en) | Method for coating inner surface of glass pipe by gas discharging pulse | |
| GB8919480D0 (en) | Nozzle for plasma torch and method for introducing powder into the plasma plume of a plasma torch | |
| DE3374644D1 (en) | Single gas plasma torch | |
| EP0171793A3 (en) | Plasma spray torch for internal coatings | |
| GB2106939B (en) | Installation for the deposition of thin layers in the reactive vapour phase by plasma | |
| EP0415122A3 (en) | Method and apparatus for film formation by high pressure microwave plasma chemical vapour deposition | |
| GB8920049D0 (en) | Plasma coating process | |
| ZA813778B (en) | Mechanical protection coating for coated pipe | |
| AU7783981A (en) | Gas operated gun | |
| ZA903022B (en) | Process for forming diamond coating using a silent discharge plasma jet process | |
| DE3164346D1 (en) | Process for cleaning a gas stream | |
| EP0244773A3 (en) | Gas distribution ring for plasma gun | |
| GB2156384B (en) | Apparatus for vapour deposition by arc discharge | |
| EP0276796A3 (en) | Gas feeding nozzle for a chemical vapor deposition apparatus | |
| DE3563985D1 (en) | A method of gas plasma depositing a film of insulating material | |
| IE882488L (en) | Coating flat glass by chemical vapour deposition. | |
| GB2159132B (en) | Process for the removal of hydrogen cyanide from a gas stream | |
| DE3275470D1 (en) | Method and apparatus for coating by glow discharge | |
| GB9211242D0 (en) | Plasma deposition process | |
| GB8823194D0 (en) | Process for field coating pipe | |
| ZA829520B (en) | A process for removing solid particles from a gas | |
| EP0188207A3 (en) | System for generating uniform gas flow in a plasma reactor chamber | |
| GB2181460B (en) | Apparatus and method for chemical vapor deposition using an axially symmetric gas flow | |
| AU584677B2 (en) | Method for the reprocessing of purge gas from a low-pressure methanol synthesis operation |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8339 | Ceased/non-payment of the annual fee |