DE3219310A1 - TARGET FOR A SPRAYING DEVICE - Google Patents

Description

Glawe, DeIfs, Moll & Partner - "ρ 10 * 332/82 - page 6

description

The invention relates to a target (target for bombardment with ions) an atomization device (sputtering device), with the help of which it is possible to produce a To apply a metal film to the surface of a workpiece which contains at least chromium and iron.

With the aid of the sputtering process, e.g. a substrate such as glass or plastic can be coated with a metal or metals to create a decoratively attractive, protective, wear-resistant surface or surface with other functions.

The sputtering is carried out under vacuum conditions using a technique called "magnetic increased atomization "is known. In contrast to other methods of applying materials in the Vacuum does not require the sputtering process to melt and then evaporate the metal to be deposited.

The target has the metal that will be deposited should, and can be tubular. A typical tubular target can be approximately 180 mm in diameter and 2000 mm in length. On the other hand, a target can also have the shape of a flat plate.

With known sputtering processes, individual metals can be sputtered in order to have a coating

Glawe, DeIfs, Moll "& Partner '- ρ ib'332 / 82 - page 7

an alloy on the substrate. It is possible to have two or more in a suitable vacuum chamber Provide more targets to allow the materials that are to be applied to a workpiece to complete the coating with an alloy can be atomized at the same time. It is therefore possible to apply an alloy to a workpiece, whose Components of metals cannot be easily applied to the workpiece using other conventional application techniques can be applied. In some cases, of course, it may be desirable to use a conventional alloy to be applied to a workpiece; in this case there is no problem with the tubular To coat the carrier of the target accordingly beforehand. If, however, as described above, a workpiece is provided Can be coated with a number of different metals to form a coating with an alloy such a coating cannot be effected in a simple manner. The previous coating of the carrier that the Target forms is therefore very expensive and it is difficult to achieve good heat conduction between the alloy and the support reach. In addition, there are conditions where it is impossible to make a target from an alloy that contains the desired combination of metals in alloy form. Then there is the coating of an individual Carrier with the alloy that is to be applied to the workpiece, not possible.

The object of the invention is to create a target that does not have these disadvantages.

One solution of the invention is that a target for a sputtering device for use in a Sputtering process for applying a metal film to the surface of a workpiece is created, the

Glawe, Delfs, Moll S Partner - ¹ ρ 10332/82 - page 8

a major portion of non-magnetic stainless steel is plated has _r of a portion of its surface with chromium, the percentage area of the plated main part between 60 and 80% of the area of the main part is located.

Another solution according to the invention is that a target for a sputtering device for use in a sputtering process for applying a Metal film is created on the surface of a workpiece, the target being a major part non-magnetic stainless steel plated with chromium on part of its surface and which is covered with titanium in separate areas on another part of its surface, the percentage being on the total area of the target on which the three metals are arranged on the surface, for chromium in the area from 60 to 75%, for stainless steel in the range from 38 to 19% and for titanium in the range up to 5%.

According to a further solution according to the invention, a Target for a sputtering device for use in a sputtering process for applying a metal film created on the surface of a workpiece, the target having a major portion of titanium which over one. Part of its surface is plated with chrome and carries separate pieces of stainless steel or iron, where the percentage of the total area of the target on which the three metals are on the surface, for chromium in the range of 60 to 75%, for stainless steel or iron in the range of 38 to 19% and for titanium in the range of up to 5%.

A preferred embodiment of the invention can be

Glawe, Delfs, Moll S Pa * rfnfer: - ρ ΊΟ332- / 82 - Since ^. ^{IJO IU}

or have more of the following advantageous features.

(a) The percentage of the total area of the target to which the three metals are on the surface are about 76% for chromium, about 19.7% for stainless steel and about 4.3% for titanium.

(b) The percentage of the total area of the target to which the three metals are on the surface are in the range from 60 to 75% for chromium and in the range from 38 to for stainless steel or iron 19% and for titanium in the range of up to 5%.

(c) The percentage of the total area of the target to which the three metals are on the surface are about 73% for chromium, about 25.5% for stainless steel and about 1.5% for Titanium.

(d) The percentage of the total area of the Targets with the three metals on the surface are roughly 69.5% for chromium, 28.75% for stainless steel and 1.75% for titanium.

(e) The percentage of the total area of the target to which the three metals are on the surface are about 65% for chromium, about 33% for stainless steel, and about 2.0% for Titanium.

(f) The percentage of the total area of the target to which the three metals are on the surface are about 60% for chromium, about 38% for stainless steel and about 2% for titanium.

10

Glawe, DeIf s, MoILiB-tfartnW ~ ■ ρ ίθ 3 * 3ΐ / β2 - page 10

(g) Part of the main stainless steel part has been plated by placing the part of the main part, which is not to be plated, is covered, the main part then being placed in a bath for Electroplating has been immersed and then the covering material has been removed, so as to underneath expose the non-plated stainless steel areas.

(h) The separated areas where titanium are provided are in the form of bumps attached to the unplated areas of the main part made of stainless steel are welded.

(i) The separate pieces of stainless steel or iron are cusp-shaped and welded to the titanium areas.

(j) The separate pieces of stainless steel or iron have a hump shape and are attached to the chrome-plated areas welded on.

(k) The main part is plate-shaped.
(1) The main part is tubular.

The invention is described below, for example, on the basis of advantageous embodiments with reference on the accompanying drawings. Show it:

Fig. 1 is a side view of an inventive Targets;

FIG. 2 is a side view of part of the target of FIG. 1 on an enlarged scale;

... 11

Glawe, Delfs, Moll & Partner - ρ 10332/82 - page 11

3 shows a further embodiment according to the invention of the target in the form of a rectangular plate; and

4 shows a target in the form of a circular plate.

In the embodiment shown in FIGS. 1 and 2, the target has a hollow tubular support 1 made of non-magnetic stainless steel on which a helical strip 2 made of chrome is applied. The stainless steel is not magnetic, so as to have any undesirable effects on the process Avoid sputtering with magnetic enhancement while using the target. It becomes stainless steel with a relatively high chromium content is preferably used. In particular, it has been found to give good results with stainless steel that meets British B.S. 1501 Pt.4 304 and B.S. 1501 Pt.3 310S is sufficient.

The helical chrome strip 2 is advantageously applied to the main part tube 1 by electroplating. The desired area of the outer surface the tube 1 is covered for this by placing a strip of uniform width of covering material around the tube is wrapped in a helix. The tube 1 thus partially covered is then placed in an electroplating bath immersed and electroplated with chrome to a thickness of e.g. 2 mm. After the tube is out The bath is removed, the covering material is removed, leaving a spiral of unplated stainless steel underneath is exposed. This spiral is denoted by the reference number 3 in FIGS. 1 and 2. To complete of the target, stools 4 made of titanium are welded onto this spiral 3 made of stainless steel. It is extremely difficult to weld titanium. However, the welded joint is of such a nature that an

... 12

Glawe, Delfs, Molir.Ä .Parther -'ρ T.Q3X2 / 82 - page 12

A sufficient thermal connection is obtained, although no mechanical connection is achieved which one

would normally call it good. However, it is |

the thermal connection and not the mechanical §

Compound essential for the atomization process |

is borrowed. It has been found to be extremely beneficial in the 1st

the entire atomization process has proven the necessary '

Amount of titanium in this way on the target ί

see. ':].

In the sputtering process, the target is vtsr- _s

turns, on a workpiece substrate a chromium 3

of acceptable gloss and quality to %

produce. This chrome plating contains the individual. * '

Elements that are present on the target although this s

not necessarily be the case in the same proportion i

got to. This is because the atomization rates are not |

only on the size of the available surface f

of the metal, but also on the metal itself, |

that is atomized. In addition, since the stainless steel of the |

Main part tube 1 itself from several components.

and contains a relatively large amount of chromium, it can be

waiting for the stainless steel to also go to f

Chromium on the workpiece contributes, and not only |

the iron supplies. ; yy

Although under most conditions a certain percentage of 1 If titanium is desired on the workpiece and therefore on the target, the titanium does not need J in all cases to be essential. Relatively small amounts of other metals can also be present, e.g. nickel in particular in stainless steel. The size of the surfaces of the main metals in the target is in the following ranges:

Chrome stainless titanium

stole

60 - 80% 18 - 40% 0 - 5% |

. . . 13th

I Glawe, Delfs, Moll'α -Partner - ρ 10-3327 * 82 - page 13

Within these ranges, the following relationships have proven to be particularly advantageous: which again reflect the proportion of the total area.

% Chromium % stainless steel % Titanium 76 19.7 4.3 75 23.5 1.5 73 25.5. 1.5 69.5 28.75 1.75 65 33.0 2.0 60 38.0 2.0

; The target described is used as usual in attached to a vacuum chamber. Magnetic reinforcement is achieved by placing permanent magnets inside the

J tube 1 can be arranged. When these magnets get stuck

i stand, the magnetic field will be along the

; change the axial length of the tube. Through this change

ί the uniformity of the erosion is adversely affected

:; flows. To counteract this, the magnets

ι back and forth in the axial direction within the tube

I be moved away to the magnetic field in the axial direction of the

.; Tube to vary in time. The work pieces to be coated

I pieces are usually rotated around the target,

ί to ensure that all workpieces are coated similarly

I will be.

I The target may have a shape different from that described

§ deviates. Instead of a spiral, chrome plating can be used

I have three form of spaced rings that

I ··· ¹⁴

Glawe, Delfs, ΜοΙΓ V Pttitner -ρ 1O33 "27S2 - page 14

are arranged around the tube 1 in the direction of the uni. In the event that the magnets are reciprocated, the amplitude of these reciprocations should not be be larger than the width of the neighboring rings. Targets that have a planar shape can also be used. They are shown in Figures 3 and 4, for example. FIG. 3 shows a rectangular flat target and FIG. 4 a circular one flat target. In Fig. 3, the main rectangular part 31 made of non-magnetic stainless steel has been chromium plated Strips 32 applied thereon. In the embodiment of Figure 4, the circular plate 41 of non-magnetic stainless steel has rings 42 applied thereon a chromaplating. Titanium bumps 34 are on the unplated Stainless steel strip 33 welded on; Titanium bumps 44 are made of stainless steel on the unplated rings 43 Welded on steel. When used in the usual vacuum chamber, such a flat target is attached in such a way that that it covers a plurality of magnets, and the workpieces to be coated are moved over the target and rotated if necessary.

As a further variant, the chromium can be applied in a similar manner to the inner surface of a tubular target how the outer surface is plated. With such a target, the workpieces are inside of the tube while the magnets are placed outside.

In all of the embodiments discussed so far, the material of the main part is non-magnetic, more rustproof Stole. Such steel is readily available in tubular or plate form; at least in this regard, the production of the targets does not cause any difficulties. But titanium is also in Tubular shape or plate shape readily available.

15th

Glawe, DeIf s, MoIL * 4 Sartrfer * - ■ ρ Τθ332 / · 82 - page 15

Although it is significantly more expensive than stainless steel, other embodiments of the invention are possible with it.

In these embodiments, the main part is made of titanium (in a tubular shape or a plate shape) and is coated with chrome Electroplated as in previous embodiments. Stainless steel or iron bumps are then either welded onto the chrome plating or onto the titanium. In this case, because of the proportionate Small dimensions of the stool magnetic stainless steel or magnetic iron can be used because of the distortion of the magnetic field generated by this stool when using the Targets is effected, is also relatively small and can normally be tolerated. An advantage of the embodiments With the main part made of titanium is that the target can be used until the chrome plating has practically disappeared. Since only a relatively small amount of titanium has been sputtered from the main part, the main part then cleaned of any residue of the chrome plating and the stools removed. The main part can then be reused by re-plating and humping it to create a new one Target to manufacture. This can be done over and over, creating the originally expensive main body made of titanium can be used very effectively and economically.

It will be understood that the ranges of the area proportions and their values used in connection with the embodiments of Figures 1 and 2 have been specified, also apply to the last-mentioned embodiments.

Claims (18)

Claims 2. Target for a nebulizer for use in a sputtering process for applying a metal film to the surface a workpiece, the target having a main part made of non-magnetic stainless steel, characterized in that the main part (1,31,41) on a part (2, 32, 42) of its surface with Chromium plated, with the plated area of the major part being between 60 and 80% of the total area of the Main part is. Target for a sputtering device for use in a sputtering process for applying a Metal film on the surface of a workpiece, Glawe, DeIfs, Moll * Partner - ρ 10332/82 - page 2 - the target having a main part made of non-magnetic steel, characterized in that part of the surface of the main part (1, 31, 41) is plated with chromium and that other separate parts of the surface are covered with titanium (4, 34, 44) , wherein the percentage of the total area of the target on which the three metals are on the surface, for chromium in the range of 60-75%, for stainless steel in the range of 38-19% and for titanium in the range up to 5% . 3. Target for a sputtering device for use in a sputtering process for applying a metal film to the surface of a workpiece, characterized in that it has a main part (1,31,41) made of titanium, which on part of its surface (2,32,42) is plated with chrome and consists of separate, separate pieces (4,34,44) stainless steel or iron, being the percentage · of the total area of the target at which the three metals are on the surface, for chromium in the range of 60 - 75%, for stainless steel or Iron in the range of 38-19% and for titanium in the range of up to 5%. 4. Target for a sputtering device according to claim or 3, characterized in that the percentage of the total area of the target for the three metals is about 76% for chromium, about 19.7% for stainless steel, and about 4.3% for titanium. Glawe, DeIf s, Moll '"&' Partner - ρ 10332/82 - page 3 5. Device for an atomizing device according to claim 2 or 3, characterized in that the percentage of the total area of the target for the three metals about 75% for chromium, about 23.5% for stainless steel, and about 1.5% for titanium amounts to. 6. Target for a sputtering device according to claim 2 or 3, characterized in that the percentage of the total area of the target
for the three metals is about 73% for chromium, about 25.5% for stainless steel and about 1.5% for titanium. 7. Target for a sputtering device according to claim 2 or 3, characterized in that the percentage of the total area of the target for the three metals is approximately 69.5% for chromium, 28.7% for stainless steel, and 1.75% for titanium. 8. Target for a sputtering device according to claim 2 or 3, characterized in that the percentage of the total area of the target for the three metals is about 65% for chromium, about 33% for stainless steel, and about 2.0% for titanium. 9. Target for a sputtering device according to claim 2 or 3, characterized in that the percentage of the total area of the target for the three metals about 60% for chromium, about 38% for stainless steel and approximately 2% for titanium. Glawe, Delfs, Moll & Partner - ρ 10332/82 - page 4 10. Target for a sputtering device according to one of claims 1 to 8, characterized in that a part of the main part (1,31,41) made of stainless steel is plated in that the part which is not is to be plated, then immersed the main part in an electroplating bath and then the covering material has been removed, leaving the unplated areas (3,33,4 3) stainless steel are exposed. 11. Target for a sputtering device according to claim 2 or according to one of claims 4 to 10, insofar as they relate to claim 2, thereby characterized in that the separate titanium regions are in the form of bumps (4,34,44) which at the unplated areas (3,33,43) of the main part are welded on from stainless steel. 12. Target for a sputtering device according to claim 3 or according to one of claims 4 to 10, insofar as the same are referred back to claim 3, characterized in that the separate pieces (4,34,44) made of stainless steel or iron have the shape of bumps and are attached to the titanium areas (3,33,43) are welded on. 13. Target for a sputtering device according to claim 3 or according to one of claims 4 to 10, insofar as the same are referred back to claim 3, characterized in that the separate pieces (4,34,44) made of stainless steel or iron have the shape of bumps and are attached to the chrome areas (2, 32, 42) are welded on. 14. Target for a sputtering device according to one of claims 1 to 13, characterized in that the main part has the shape of a plate (31,41). Glawe, Delfs, Moll "4th. Partner - ρ 1θ · 3 * 32 / '82 - Page 5 15. Target for a sputtering device according to a of claims 1 to 13, characterized in that the main part is in the form of a tube (1). 16- Target for a sputtering device according to a of claims 1 to 15, characterized in that the stainless steel meets the requirements of the British Standards BS 1501 Pt.4 304 or B.S. 1501 Pt 310S Fulfills. 17. Sputtering process for applying a metal layer on a workpiece, characterized in that it is carried out according to one of Claims 1 to 16 will. 18. Workpiece, characterized in that it is one of the claims with the aid of a target 1 to 16 is provided with a metal layer.