DE3215966A1 - Process for eliminating finely divided residues of a silver-containing solder - Google Patents
Process for eliminating finely divided residues of a silver-containing solderInfo
- Publication number
- DE3215966A1 DE3215966A1 DE19823215966 DE3215966A DE3215966A1 DE 3215966 A1 DE3215966 A1 DE 3215966A1 DE 19823215966 DE19823215966 DE 19823215966 DE 3215966 A DE3215966 A DE 3215966A DE 3215966 A1 DE3215966 A1 DE 3215966A1
- Authority
- DE
- Germany
- Prior art keywords
- silver
- parts
- ammonia
- hydrogen peroxide
- ceramic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/38—Exhausting, degassing, filling, or cleaning vessels
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0075—Cleaning of glass
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/53—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone involving the removal of at least part of the materials of the treated article, e.g. etching, drying of hardened concrete
- C04B41/5338—Etching
- C04B41/5353—Wet etching, e.g. with etchants dissolved in organic solvents
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Ceramic Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Geochemistry & Mineralogy (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Structural Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
- Detergent Compositions (AREA)
Abstract
Description
Beschreibungdescription
Verfahren zum Entfernen von fein verteilten Rückständen eines silberhaltigen Lotes.Process for removing finely divided residues of a silver-containing Plumb bobs.
Die vorliegende Erfindung betrifft ein Verfahren zum Entfernen von fein verteilten Rückständen eines silberhaltigen Lotes auf mit Metallteilen verlöteten Glas- oder Keramikteilen durch Waschen mit einer wässerigen Lösung.The present invention relates to a method for removing finely distributed residues of a silver-containing solder soldered to metal parts Glass or ceramic parts by washing with an aqueous solution.
Es ist bekannt, optoelektronische Bauelemente, wie Bildverstärkerröhren und dergleichen, in Glasmetall- bzw.It is known, optoelectronic components, such as image intensifier tubes and the like, in glass metal resp.
Metallkeramik-Technik herzustellen. Zum Herstellen der Vakuumgehäuse, insbesondere zur Herstellung von Vebindungen zwischen Metall- und Isolierteilen, werden üblicherweise Kupfer-Silber-Lote verwendet. Bei den für die Lötung erforderlichen Temperaturen ist nicht auszuschließen, daß geringe Mengen des Lotes abdampfen und sich in unerwünschter Weise auf den Oberflächen der Glas- bzw.Manufacture of metal-ceramic technology. To manufacture the vacuum housing, especially for making connections between metal and insulating parts, Usually copper-silver solders are used. With the for the soldering required temperatures cannot be ruled out that small amounts of solder evaporate and in an undesirable way on the surfaces of the glass or
Keramikteile niederschlagen. Solche Niederschläge auf den inneren Oberflächen von optoelektronischen Röhren führen zu Betriebsstörungen und müssen vermiedern werden. Da andererseits solche optoelektronischen Röhren chemisch sehr empfindliche Elektroden, wie z. B. Fotokathoden oder Leuchschirme enthalten, ist die Entfernung solcher Niederschläge von silberhaltigen Loten auf Isolierteilen schwierig. Kaliumcyanidlösungen, die beispielsweise für solche Fälle brauchbar wären, erforden zusätzliche umfangreiche Spülvorgänge, sollen nicht störende Cyanidreste zurückbleiben.Knock down ceramic parts. Such precipitation on the interior Surfaces of optoelectronic tubes lead to malfunctions and must will avoid. On the other hand, such optoelectronic tubes are very chemically sensitive electrodes, such as B. photocathodes or fluorescent screens are included the removal of such deposits from solder containing silver on insulating parts difficult. Potassium cyanide solutions, which would be useful for such cases, for example, If additional, extensive rinsing processes are required, cyanide residues should not be a problem lag behind.
Der vorliegenden Erfindung liegt die Aufgabe zugrunde, ein Verfahren anzugeben, mit welchem insbesondere bei optoelektronischen Röhren Niederschläge von silberhaltigen Loten auf Glas- oder Keramikteilen entfernbar sind.The present invention is based on the object of a method indicate with which precipitation, especially in the case of optoelectronic tubes can be removed from solders containing silver on glass or ceramic parts.
Diese Aufgabe wird gemäß der Erfindung dadurch gelöst, daß die verlöteten Teile mit einer wässerigen Lösung gewaschen werden, die zumindest zu einem Drittel aus einem Gemisch von Ammoniak und Wasserstoffperoxid besteht.This object is achieved according to the invention in that the soldered Parts are washed with an aqueous solution that is at least one third consists of a mixture of ammonia and hydrogen peroxide.
Es zeigte sich, daß durch die Anwendung einer wässerigen Lösung mit einem Gemisch aus Wasserstoffperoxid und Ammoniak auch hoch silberhaltige Kupfer-Silber-Lote, die als Niederschläge auf Keramik- oder Glasteilen vorhanden sind, in einfacher Weise entfernbar sind, ohne daß Rückstände zu befürchten sind, die z. B. die Herstellung und den Betrieb von Fotokathoden oder ähnlich empfindlichen Elektroden stören könnten.It was found that by using an aqueous solution with a mixture of hydrogen peroxide and ammonia also high-silver copper-silver solders, which are present as deposits on ceramic or glass parts, in simple Way can be removed without the fear of residues that z. B. the production and could interfere with the operation of photocathodes or similar sensitive electrodes.
Die Anwendung erfolgt zweckmäßig in der Weise, daß die noch nicht endgütlig verschlossenen, aber bereits mit Kupfer-Silber-Loten verlöteten Vakuumgefäße von optoelektronischen Röhren mit einer wässerigen Lösung gewaschen werden, die mindestens zu einem Drittel aus einem Gemisch aus Ammoniak und Wasserstoffperoxid enthält. Dieses Waschen kann bei normalen Zimmertemperaturen erfolgen. Ganz besonders bewährt hat sich eine Waschlösung, die Wasser, Ammoniak und Wasserstoffperoxid etwa zu je einem Volumensdrittel enthält. Eine solche Lösung entfernt fein verteilte Niederschläge von Kupfer-Silber-Loten rasch und sorgfältig, ohne daß die eigentlichen Lötnähte in störendem Maße zu stark angegriffen würden. Die Kupfer-Silber-Lote können dabei einen sehr hohen Anteil von Silber, beispielsweise etwa zu 75% aus Silber bestehen.The application is expedient in such a way that the not yet finally closed, but already soldered with copper-silver solder from optoelectronic tubes to be washed with an aqueous solution containing the at least one third from a mixture of ammonia and hydrogen peroxide contains. This washing can be done at normal room temperatures. Most notably A washing solution that contains water, ammonia and hydrogen peroxide has proven itself contains one third of the volume each. Such a solution removes finely divided Deposits of copper-silver solders quickly and carefully, without affecting the actual Soldered seams would be attacked too severely to a disruptive extent. The copper-silver solders can a very high proportion of silver, for example about 75% silver exist.
Claims (6)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19823215966 DE3215966A1 (en) | 1982-04-29 | 1982-04-29 | Process for eliminating finely divided residues of a silver-containing solder |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19823215966 DE3215966A1 (en) | 1982-04-29 | 1982-04-29 | Process for eliminating finely divided residues of a silver-containing solder |
Publications (2)
Publication Number | Publication Date |
---|---|
DE3215966A1 true DE3215966A1 (en) | 1983-11-03 |
DE3215966C2 DE3215966C2 (en) | 1990-05-17 |
Family
ID=6162261
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19823215966 Granted DE3215966A1 (en) | 1982-04-29 | 1982-04-29 | Process for eliminating finely divided residues of a silver-containing solder |
Country Status (1)
Country | Link |
---|---|
DE (1) | DE3215966A1 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0209950A2 (en) * | 1985-07-23 | 1987-01-28 | Micronix Corporation | Process for making a mask used in x-ray photolithography |
EP0327880A2 (en) * | 1988-02-06 | 1989-08-16 | Degussa Aktiengesellschaft | Apparatus and process for removing a wash coat from the channels of a freshly coated monolithic or honeycomb catalyst support, and its use |
WO1991009987A1 (en) * | 1989-12-20 | 1991-07-11 | Hughes Aircraft Company | Peroxide composition for removing organic contaminants and method of using same |
EP0560324A1 (en) | 1992-03-11 | 1993-09-15 | Mitsubishi Gas Chemical Company, Inc. | Cleaning fluid for semiconductor substrate |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1289720B (en) * | 1964-01-16 | 1969-02-20 | Collardin Gmbh Gerhard | Preparations for removing copper from and cleaning metal surfaces |
US3860423A (en) * | 1973-08-24 | 1975-01-14 | Rca Corp | Etching solution for silver |
-
1982
- 1982-04-29 DE DE19823215966 patent/DE3215966A1/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1289720B (en) * | 1964-01-16 | 1969-02-20 | Collardin Gmbh Gerhard | Preparations for removing copper from and cleaning metal surfaces |
US3860423A (en) * | 1973-08-24 | 1975-01-14 | Rca Corp | Etching solution for silver |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0209950A2 (en) * | 1985-07-23 | 1987-01-28 | Micronix Corporation | Process for making a mask used in x-ray photolithography |
EP0209950A3 (en) * | 1985-07-23 | 1989-01-11 | Micronix Corporation | Process for making a mask used in x-ray photolithography |
EP0327880A2 (en) * | 1988-02-06 | 1989-08-16 | Degussa Aktiengesellschaft | Apparatus and process for removing a wash coat from the channels of a freshly coated monolithic or honeycomb catalyst support, and its use |
EP0327880A3 (en) * | 1988-02-06 | 1990-05-30 | Degussa Aktiengesellschaft | Apparatus and process for removing a wash coat from the channels of a freshly coated monolithic or honeycomb catalyst support, and its use |
WO1991009987A1 (en) * | 1989-12-20 | 1991-07-11 | Hughes Aircraft Company | Peroxide composition for removing organic contaminants and method of using same |
EP0560324A1 (en) | 1992-03-11 | 1993-09-15 | Mitsubishi Gas Chemical Company, Inc. | Cleaning fluid for semiconductor substrate |
US5705089A (en) * | 1992-03-11 | 1998-01-06 | Mitsubishi Gas Chemical Company, Inc. | Cleaning fluid for semiconductor substrate |
Also Published As
Publication number | Publication date |
---|---|
DE3215966C2 (en) | 1990-05-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8120 | Willingness to grant licences paragraph 23 | ||
8110 | Request for examination paragraph 44 | ||
D2 | Grant after examination | ||
8364 | No opposition during term of opposition | ||
8339 | Ceased/non-payment of the annual fee |