DE3174887D1 - Fabrication of microminiature devices using plasma etching of silicon with fluorine-containing gaseous compounds - Google Patents

Fabrication of microminiature devices using plasma etching of silicon with fluorine-containing gaseous compounds

Info

Publication number
DE3174887D1
DE3174887D1 DE8181901056T DE3174887T DE3174887D1 DE 3174887 D1 DE3174887 D1 DE 3174887D1 DE 8181901056 T DE8181901056 T DE 8181901056T DE 3174887 T DE3174887 T DE 3174887T DE 3174887 D1 DE3174887 D1 DE 3174887D1
Authority
DE
Germany
Prior art keywords
fabrication
fluorine
silicon
plasma etching
containing gaseous
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8181901056T
Other languages
German (de)
Inventor
Daniel Lawrence Flamm
Dan Maydan
David Nin-Kou Wang
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/138,083 external-priority patent/US4310380A/en
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Application granted granted Critical
Publication of DE3174887D1 publication Critical patent/DE3174887D1/en
Expired legal-status Critical Current

Links

DE8181901056T 1980-04-07 1981-03-20 Fabrication of microminiature devices using plasma etching of silicon with fluorine-containing gaseous compounds Expired DE3174887D1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/138,083 US4310380A (en) 1980-04-07 1980-04-07 Plasma etching of silicon
PCT/US1981/000349 WO1981002947A1 (en) 1980-04-07 1981-03-20 Fabrication of microminiature devices using plasma etching of silicon and resultant products

Publications (1)

Publication Number Publication Date
DE3174887D1 true DE3174887D1 (en) 1986-08-07

Family

ID=26764408

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8181901056T Expired DE3174887D1 (en) 1980-04-07 1981-03-20 Fabrication of microminiature devices using plasma etching of silicon with fluorine-containing gaseous compounds

Country Status (1)

Country Link
DE (1) DE3174887D1 (en)

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

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