DE3146961A1 - Anlass-vorrichtung - Google Patents
Anlass-vorrichtungInfo
- Publication number
- DE3146961A1 DE3146961A1 DE19813146961 DE3146961A DE3146961A1 DE 3146961 A1 DE3146961 A1 DE 3146961A1 DE 19813146961 DE19813146961 DE 19813146961 DE 3146961 A DE3146961 A DE 3146961A DE 3146961 A1 DE3146961 A1 DE 3146961A1
- Authority
- DE
- Germany
- Prior art keywords
- drift tube
- tube
- coil
- target
- electrons
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000010894 electron beam technology Methods 0.000 claims description 40
- 239000004065 semiconductor Substances 0.000 claims description 18
- 238000010438 heat treatment Methods 0.000 claims description 7
- 230000003111 delayed effect Effects 0.000 claims description 5
- 238000000137 annealing Methods 0.000 claims description 3
- 230000004907 flux Effects 0.000 claims description 3
- 238000000605 extraction Methods 0.000 claims 3
- 210000002435 tendon Anatomy 0.000 claims 1
- 239000013078 crystal Substances 0.000 description 10
- 230000001133 acceleration Effects 0.000 description 6
- 238000005496 tempering Methods 0.000 description 6
- 239000010410 layer Substances 0.000 description 4
- 230000033001 locomotion Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000005452 bending Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 230000035515 penetration Effects 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000001934 delay Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000006260 foam Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/210,488 US4371774A (en) | 1980-11-26 | 1980-11-26 | High power linear pulsed beam annealer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE3146961A1 true DE3146961A1 (de) | 1982-06-24 |
Family
ID=22783101
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19813146961 Withdrawn DE3146961A1 (de) | 1980-11-26 | 1981-11-26 | Anlass-vorrichtung |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US4371774A (enExample) |
| JP (1) | JPS57117247A (enExample) |
| DE (1) | DE3146961A1 (enExample) |
| FR (1) | FR2494905A1 (enExample) |
| GB (1) | GB2089110B (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1985004983A1 (en) * | 1984-04-20 | 1985-11-07 | Mta Központi Fizikai Kutató Intézete | Process and arrangement to irradiate solid state materials with ions |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4680474A (en) * | 1985-05-22 | 1987-07-14 | Varian Associates, Inc. | Method and apparatus for improved ion dose accuracy |
| DE69226360T2 (de) * | 1991-03-25 | 1999-02-25 | Commonwealth Scientific And Industrial Research Organisation, Campbell | Makroteilchenfilter in lichtbogenquelle |
| KR101843212B1 (ko) | 2010-05-28 | 2018-03-28 | 인스터튜트 오브 지오라지컬 앤드 뉴클리어 싸이언시즈 리미티드 | 자기 나노클러스터 |
| US9383460B2 (en) | 2012-05-14 | 2016-07-05 | Bwxt Nuclear Operations Group, Inc. | Beam imaging sensor |
| US9535100B2 (en) | 2012-05-14 | 2017-01-03 | Bwxt Nuclear Operations Group, Inc. | Beam imaging sensor and method for using same |
| GB2519511A (en) * | 2013-09-27 | 2015-04-29 | Zeiss Carl Microscopy Gmbh | Particle optical system having a liner tube and/or compensating coils |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3046936A (en) * | 1958-06-04 | 1962-07-31 | Nat Res Corp | Improvement in vacuum coating apparatus comprising an ion trap for the electron gun thereof |
| US3812319A (en) * | 1968-06-10 | 1974-05-21 | I Brukovsky | Automatic control of the duty cycle of an electron beam heating device |
| US3708722A (en) * | 1970-12-18 | 1973-01-02 | Erie Technological Prod Inc | Semiconductor device with soldered terminals and plastic housing and method of making the same |
| US4066863A (en) * | 1974-06-26 | 1978-01-03 | International Business Machines Corporation | Method and system for automatically correcting aberrations of a beam of charged particles |
| GB1454196A (en) * | 1974-07-04 | 1976-10-27 | Sokolov B G | Electron beam apparatus |
| US4127762A (en) * | 1974-09-24 | 1978-11-28 | Paton Boris E | Method for controlling and stabilizing fusion depth in electron-beam welding and device for effecting same |
| US4091256A (en) * | 1975-01-16 | 1978-05-23 | The United States Of America As Represented By The Secretary Of The Air Force | Pulsed atomic beam apparatus |
| DE2519537C2 (de) * | 1975-05-02 | 1982-11-04 | Leybold-Heraeus GmbH, 5000 Köln | Elektronenstrahlgerät für Heiz-, Schmelz- und Verdampfungszwecke mit Ablenksystemen |
| US3999097A (en) * | 1975-06-30 | 1976-12-21 | International Business Machines Corporation | Ion implantation apparatus utilizing multiple aperture source plate and single aperture accel-decel system |
| US4038484A (en) * | 1976-06-21 | 1977-07-26 | Airco, Inc. | Electron beam heating system |
| US4182958A (en) * | 1977-05-31 | 1980-01-08 | Rikagaku Kenkyusho | Method and apparatus for projecting a beam of electrically charged particles |
| US4199689A (en) * | 1977-12-21 | 1980-04-22 | Tokyo Shibaura Denki Kabushiki Kaisha | Electron beam exposing method and electron beam apparatus |
| US4283631A (en) * | 1980-02-22 | 1981-08-11 | Varian Associates, Inc. | Bean scanning and method of use for ion implantation |
-
1980
- 1980-11-26 US US06/210,488 patent/US4371774A/en not_active Expired - Lifetime
-
1981
- 1981-10-27 GB GB8132399A patent/GB2089110B/en not_active Expired
- 1981-11-25 FR FR8122064A patent/FR2494905A1/fr active Granted
- 1981-11-25 JP JP56189010A patent/JPS57117247A/ja active Pending
- 1981-11-26 DE DE19813146961 patent/DE3146961A1/de not_active Withdrawn
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1985004983A1 (en) * | 1984-04-20 | 1985-11-07 | Mta Központi Fizikai Kutató Intézete | Process and arrangement to irradiate solid state materials with ions |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57117247A (en) | 1982-07-21 |
| GB2089110A (en) | 1982-06-16 |
| US4371774A (en) | 1983-02-01 |
| FR2494905B1 (enExample) | 1985-04-19 |
| GB2089110B (en) | 1984-10-03 |
| FR2494905A1 (fr) | 1982-05-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| 8139 | Disposal/non-payment of the annual fee |