DE3071052D1 - Improved step-and-repeat projection alignment and exposure system - Google Patents

Improved step-and-repeat projection alignment and exposure system

Info

Publication number
DE3071052D1
DE3071052D1 DE8080101307T DE3071052T DE3071052D1 DE 3071052 D1 DE3071052 D1 DE 3071052D1 DE 8080101307 T DE8080101307 T DE 8080101307T DE 3071052 T DE3071052 T DE 3071052T DE 3071052 D1 DE3071052 D1 DE 3071052D1
Authority
DE
Germany
Prior art keywords
exposure system
improved step
projection alignment
repeat projection
repeat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8080101307T
Other languages
English (en)
Inventor
Edward H Phillips
Karl-Heinz Johannsmeier
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eaton Optimetrix Inc
Original Assignee
Eaton Optimetrix Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eaton Optimetrix Inc filed Critical Eaton Optimetrix Inc
Application granted granted Critical
Publication of DE3071052D1 publication Critical patent/DE3071052D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Eye Examination Apparatus (AREA)
DE8080101307T 1979-04-03 1980-03-13 Improved step-and-repeat projection alignment and exposure system Expired DE3071052D1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US2672279A 1979-04-03 1979-04-03
US5399579A 1979-07-02 1979-07-02

Publications (1)

Publication Number Publication Date
DE3071052D1 true DE3071052D1 (en) 1985-10-10

Family

ID=26701583

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8080101307T Expired DE3071052D1 (en) 1979-04-03 1980-03-13 Improved step-and-repeat projection alignment and exposure system

Country Status (3)

Country Link
EP (3) EP0111660A3 (de)
CA (2) CA1162777A (de)
DE (1) DE3071052D1 (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4573791A (en) * 1979-04-03 1986-03-04 Optimetrix Corporation Step-and-repeat projection alignment and exposure system
US4473293A (en) * 1979-04-03 1984-09-25 Optimetrix Corporation Step-and-repeat projection alignment and exposure system
EP0032716A3 (de) * 1980-01-18 1982-09-01 Eaton-Optimetrix Inc. Beleuchtungssystem für eine Halbleiterscheibe
US4597664A (en) * 1980-02-29 1986-07-01 Optimetrix Corporation Step-and-repeat projection alignment and exposure system with auxiliary optical unit
DE3173163D1 (en) * 1980-02-29 1986-01-23 Eaton Optimetrix Inc Alignment apparatus
US4452526A (en) * 1980-02-29 1984-06-05 Optimetrix Corporation Step-and-repeat projection alignment and exposure system with auxiliary optical unit
EP0055620B1 (de) * 1980-12-29 1985-12-18 Fujitsu Limited Verfahren zum Projizieren von Schaltkreismustern
US4443096A (en) * 1981-05-18 1984-04-17 Optimetrix Corporation On machine reticle inspection device
FR2523323A1 (fr) * 1982-03-09 1983-09-16 Euromask Dispositif d'alignement pour machines de fabrication de circuits integres
US4577958A (en) * 1982-06-18 1986-03-25 Eaton Optimetrix, Inc. Bore-sighted step-and-repeat projection alignment and exposure system
DE3231447C2 (de) * 1982-08-24 1987-04-23 Perkin-Elmer Censor Anstalt, Vaduz Verfahren zum Projektionskopieren von Masken auf ein Werkstück
JPS5979527A (ja) * 1982-10-29 1984-05-08 Hitachi Ltd パタ−ン検出装置
US4620785A (en) * 1982-12-01 1986-11-04 Canon Kabushiki Kaisha Sheet-like member having alignment marks and an alignment apparatus for the same
US4577957A (en) * 1983-01-07 1986-03-25 Eaton-Optimetrix, Inc. Bore-sighted step-and-repeat projection alignment and exposure system
JPS6045252A (ja) * 1983-08-23 1985-03-11 Canon Inc 投影露光装置の照明系
US5262822A (en) * 1984-11-09 1993-11-16 Canon Kabushiki Kaisha Exposure method and apparatus
US4623608A (en) * 1985-03-14 1986-11-18 Rca Corporation Method and apparatus for coating a selected area of the surface of an object
NL8600639A (nl) * 1986-03-12 1987-10-01 Asm Lithography Bv Werkwijze voor het ten opzichte van elkaar uitrichten van een masker en een substraat en inrichting voor het uitvoeren van de werkwijze.
GB8803171D0 (en) * 1988-02-11 1988-03-09 English Electric Valve Co Ltd Imaging apparatus

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1522525C3 (de) * 1965-12-06 1975-01-16 Siemens Ag, 1000 Berlin Und 8000 Muenchen Verfahren zum Herstellen einer Photolackmaske
US3442587A (en) * 1965-12-06 1969-05-06 Martin Marietta Corp Match stepping camera and method for matching registration and reduction of stepped photographic images to existing patterns on semiconductors
US3476476A (en) * 1967-03-28 1969-11-04 Optomechanisms Inc Alignment means for photo repeat machine
US3704946A (en) * 1969-02-20 1972-12-05 Opt Omechanisms Inc Microcircuit art generating means
US3984186A (en) * 1969-02-27 1976-10-05 Canon Kabushiki Kaisha Projection masking system
FR2082213A5 (de) * 1970-03-06 1971-12-10 Delmas Jean Raymond
US3716296A (en) * 1970-05-06 1973-02-13 Molekularelektronik Method and electronic circuit arrangement for producing photomasks
US3947126A (en) * 1973-10-09 1976-03-30 Oxy Metal Industries Corporation Method for image alignment
JPS51111076A (en) * 1975-03-26 1976-10-01 Hitachi Ltd Exposure device
JPS593791B2 (ja) * 1975-04-07 1984-01-26 キヤノン株式会社 物体の像認識方法
DD128165B1 (de) * 1976-11-09 1979-12-27 Erhard Jaksch Vorrichtung zum ueberdecken von masken und substratscheiben
FR2388371A1 (fr) * 1977-04-20 1978-11-17 Thomson Csf Procede d'alignement, dans un photorepeteur, d'une plaquette semi-conductrice et des motifs a y projeter et photorepeteur mettant en oeuvre un tel procede

Also Published As

Publication number Publication date
EP0111660A2 (de) 1984-06-27
CA1162777A (en) 1984-02-28
EP0017759A3 (en) 1981-01-14
CA1162776A (en) 1984-02-28
EP0111661A3 (de) 1984-09-26
EP0111660A3 (de) 1984-10-03
EP0111661A2 (de) 1984-06-27
EP0017759B1 (de) 1985-09-04
EP0017759A2 (de) 1980-10-29

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee