DE3067625D1 - Electron beam system - Google Patents
Electron beam systemInfo
- Publication number
- DE3067625D1 DE3067625D1 DE8080901880T DE3067625T DE3067625D1 DE 3067625 D1 DE3067625 D1 DE 3067625D1 DE 8080901880 T DE8080901880 T DE 8080901880T DE 3067625 T DE3067625 T DE 3067625T DE 3067625 D1 DE3067625 D1 DE 3067625D1
- Authority
- DE
- Germany
- Prior art keywords
- electron beam
- beam system
- electron
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3007—Electron or ion-optical systems
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/075,354 US4263514A (en) | 1979-09-13 | 1979-09-13 | Electron beam system |
PCT/US1980/001173 WO1981000784A1 (en) | 1979-09-13 | 1980-09-11 | Electron beam system |
Publications (1)
Publication Number | Publication Date |
---|---|
DE3067625D1 true DE3067625D1 (en) | 1984-05-30 |
Family
ID=22125151
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE8080901880T Expired DE3067625D1 (en) | 1979-09-13 | 1980-09-11 | Electron beam system |
Country Status (5)
Country | Link |
---|---|
US (1) | US4263514A (de) |
EP (1) | EP0035556B1 (de) |
JP (1) | JPS56501228A (de) |
DE (1) | DE3067625D1 (de) |
WO (1) | WO1981000784A1 (de) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3138896A1 (de) * | 1981-09-30 | 1983-04-14 | Siemens AG, 1000 Berlin und 8000 München | Elektronenoptisches system mit vario-formstrahl zur erzeugung und messung von mikrostrukturen |
US4550258A (en) * | 1982-07-27 | 1985-10-29 | Nippon Telegraph & Telephone Public Corporation | Aperture structure for charged beam exposure |
US4687940A (en) * | 1986-03-20 | 1987-08-18 | Hughes Aircraft Company | Hybrid focused-flood ion beam system and method |
JP3263920B2 (ja) * | 1996-02-01 | 2002-03-11 | 日本電子株式会社 | 電子顕微鏡用試料作成装置および方法 |
WO2006076036A2 (en) * | 2004-05-25 | 2006-07-20 | The Trustees Of The University Of Pennsylvania | Nanostructure assemblies, methods and devices thereof |
GB2421630B (en) * | 2004-12-21 | 2006-11-29 | Leica Microsys Lithography Ltd | Dual-mode electron beam column |
US8828086B2 (en) | 2008-06-30 | 2014-09-09 | Depuy (Ireland) | Orthopaedic femoral component having controlled condylar curvature |
US8236061B2 (en) | 2008-06-30 | 2012-08-07 | Depuy Products, Inc. | Orthopaedic knee prosthesis having controlled condylar curvature |
CN115206757A (zh) * | 2017-08-02 | 2022-10-18 | Asml荷兰有限公司 | 用于带电粒子浸没以增强电压对比缺陷信号的系统和方法 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5944743B2 (ja) * | 1974-04-16 | 1984-10-31 | 日本電子株式会社 | 走査電子顕微鏡等用照射電子レンズ系 |
US3956635A (en) * | 1975-06-13 | 1976-05-11 | International Business Machines Corporation | Combined multiple beam size and spiral scan method for electron beam writing of microcircuit patterns |
JPS5251871A (en) * | 1975-10-23 | 1977-04-26 | Rikagaku Kenkyusho | Projecting method for charge particle beams |
US4013891A (en) * | 1975-12-15 | 1977-03-22 | Ibm Corporation | Method for varying the diameter of a beam of charged particles |
DE2719800C3 (de) * | 1977-04-28 | 1980-10-23 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Korpuskularstrahloptisches Gerät zur Projektion einer Maske auf ein Präparat mit einer Einrichtung zur Justierung der Maske relativ zum Präparat und Verfahren zur Justierung |
GB1605087A (en) * | 1977-05-31 | 1981-12-16 | Rikagaku Kenkyusho | Method for shaping a beam of electrically charged particles |
US4158140A (en) * | 1977-06-15 | 1979-06-12 | Tokyo Shibaura Electric Co., Ltd. | Electron beam exposure apparatus |
US4167676A (en) * | 1978-02-21 | 1979-09-11 | Bell Telephone Laboratories, Incorporated | Variable-spot scanning in an electron beam exposure system |
-
1979
- 1979-09-13 US US06/075,354 patent/US4263514A/en not_active Expired - Lifetime
-
1980
- 1980-09-11 WO PCT/US1980/001173 patent/WO1981000784A1/en active IP Right Grant
- 1980-09-11 JP JP50219380A patent/JPS56501228A/ja active Pending
- 1980-09-11 DE DE8080901880T patent/DE3067625D1/de not_active Expired
-
1981
- 1981-03-23 EP EP80901880A patent/EP0035556B1/de not_active Expired
Also Published As
Publication number | Publication date |
---|---|
EP0035556A4 (de) | 1982-01-26 |
US4263514A (en) | 1981-04-21 |
JPS56501228A (de) | 1981-08-27 |
EP0035556A1 (de) | 1981-09-16 |
WO1981000784A1 (en) | 1981-03-19 |
EP0035556B1 (de) | 1984-04-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8339 | Ceased/non-payment of the annual fee |