DE2967026D1 - Light-sensitive polyamide resin composition - Google Patents

Light-sensitive polyamide resin composition

Info

Publication number
DE2967026D1
DE2967026D1 DE7979901613T DE2967026T DE2967026D1 DE 2967026 D1 DE2967026 D1 DE 2967026D1 DE 7979901613 T DE7979901613 T DE 7979901613T DE 2967026 T DE2967026 T DE 2967026T DE 2967026 D1 DE2967026 D1 DE 2967026D1
Authority
DE
Germany
Prior art keywords
light
resin composition
polyamide resin
sensitive polyamide
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE7979901613T
Other languages
English (en)
Inventor
Kazumasa Chiba
Keiichi Egawa
Toshio Muraki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26478254&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DE2967026(D1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from JP14783378A external-priority patent/JPS5574537A/ja
Priority claimed from JP15313978A external-priority patent/JPS5950051B2/ja
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Application granted granted Critical
Publication of DE2967026D1 publication Critical patent/DE2967026D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polyamides (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE7979901613T 1978-12-01 1979-11-30 Light-sensitive polyamide resin composition Expired DE2967026D1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP14783378A JPS5574537A (en) 1978-12-01 1978-12-01 Photosensitive polyamide resin composition
JP15313978A JPS5950051B2 (ja) 1978-12-13 1978-12-13 感光性ポリアミド樹脂組成物
PCT/JP1979/000307 WO1980001212A1 (en) 1978-12-01 1979-11-30 Light-sensitive polyamide resin composition

Publications (1)

Publication Number Publication Date
DE2967026D1 true DE2967026D1 (en) 1984-07-05

Family

ID=26478254

Family Applications (1)

Application Number Title Priority Date Filing Date
DE7979901613T Expired DE2967026D1 (en) 1978-12-01 1979-11-30 Light-sensitive polyamide resin composition

Country Status (4)

Country Link
US (1) US4323639A (de)
EP (1) EP0020782B1 (de)
DE (1) DE2967026D1 (de)
WO (1) WO1980001212A1 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58117537A (ja) * 1982-01-06 1983-07-13 Toray Ind Inc 感光性樹脂組成物
EP0273113B1 (de) * 1986-12-26 1991-01-23 Toray Industries, Inc. Lichtempfindliche Photopolymerzusammensetzung und Druckplatte
WO1995028665A1 (fr) * 1994-04-13 1995-10-26 Toray Industries, Inc. Composition de resine photosensible pour formes et materiel de cliches en resine photosensible
EP1504060B1 (de) * 2002-05-14 2008-01-16 E.I. Du Pont De Nemours And Company Vernetzbare polyamidzusammensetzungen für beschichtungsanwendungen, verahren, welche solche zusammensetzungen verwenden, und daraus hergestellte gegenstände
US20080305349A1 (en) * 2007-06-05 2008-12-11 Sun Chemical Corporation Energy-curing breathable coatings (combined)
EP2692748B1 (de) 2012-08-03 2015-01-21 Philipps-Universität Marburg Hydro- und oleophobe Polymerblends
CN103059292B (zh) * 2013-02-05 2015-08-26 苏州瀚海化学有限公司 水溶性共聚酰胺及其制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1488914A (de) * 1965-08-13 1967-10-26
DE1447931A1 (de) * 1965-09-08 1968-12-12 Basf Ag Verfahren zum Herstellen von Reliefformen fuer Druckzwecke
DE1522463C3 (de) * 1966-03-22 1978-09-28 Basf Ag, 6700 Ludwigshafen Verfahren zum Herstellen von Reliefdruckformen
JPS465475B1 (de) * 1967-09-13 1971-02-10
US3882090A (en) * 1973-06-04 1975-05-06 Eastman Kodak Co Water-soluble polyamides from alkyleneoxy bis(propyl-amine)

Also Published As

Publication number Publication date
EP0020782A1 (de) 1981-01-07
WO1980001212A1 (en) 1980-06-12
EP0020782B1 (de) 1984-05-30
EP0020782A4 (de) 1982-04-22
US4323639A (en) 1982-04-06

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Legal Events

Date Code Title Description
8365 Fully valid after opposition proceedings