DE2839586A1 - PHOTO INITIATORS - Google Patents
PHOTO INITIATORSInfo
- Publication number
- DE2839586A1 DE2839586A1 DE19782839586 DE2839586A DE2839586A1 DE 2839586 A1 DE2839586 A1 DE 2839586A1 DE 19782839586 DE19782839586 DE 19782839586 DE 2839586 A DE2839586 A DE 2839586A DE 2839586 A1 DE2839586 A1 DE 2839586A1
- Authority
- DE
- Germany
- Prior art keywords
- asf
- formula
- potoinitiator
- found
- group via
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 239000003999 initiator Substances 0.000 title claims description 5
- -1 aromatic radicals Chemical class 0.000 claims description 25
- 239000011669 selenium Substances 0.000 claims description 9
- 125000004432 carbon atom Chemical group C* 0.000 claims description 6
- 229910052717 sulfur Inorganic materials 0.000 claims description 6
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 229910052787 antimony Inorganic materials 0.000 claims description 4
- 229910052785 arsenic Inorganic materials 0.000 claims description 4
- 229910052698 phosphorus Inorganic materials 0.000 claims description 4
- 229910052711 selenium Inorganic materials 0.000 claims description 4
- 239000011593 sulfur Substances 0.000 claims description 4
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 claims description 3
- 125000001931 aliphatic group Chemical group 0.000 claims description 3
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 3
- 125000003118 aryl group Chemical group 0.000 claims description 2
- 125000000623 heterocyclic group Chemical group 0.000 claims description 2
- 150000003254 radicals Chemical class 0.000 claims 3
- 101150054111 Aspg gene Proteins 0.000 claims 1
- 150000005840 aryl radicals Chemical class 0.000 claims 1
- 125000003748 selenium group Chemical group *[Se]* 0.000 claims 1
- 150000003839 salts Chemical class 0.000 description 24
- YEOCHZFPBYUXMC-UHFFFAOYSA-L copper benzoate Chemical compound [Cu+2].[O-]C(=O)C1=CC=CC=C1.[O-]C(=O)C1=CC=CC=C1 YEOCHZFPBYUXMC-UHFFFAOYSA-L 0.000 description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 11
- 238000000034 method Methods 0.000 description 11
- 229910017008 AsF 6 Inorganic materials 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- RMVRSNDYEFQCLF-UHFFFAOYSA-N thiophenol Chemical compound SC1=CC=CC=C1 RMVRSNDYEFQCLF-UHFFFAOYSA-N 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- VUBUXALTYMBEQO-UHFFFAOYSA-N 2,2,3,3,3-pentafluoro-1-phenylpropan-1-one Chemical compound FC(F)(F)C(F)(F)C(=O)C1=CC=CC=C1 VUBUXALTYMBEQO-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 229910018286 SbF 6 Inorganic materials 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 150000001450 anions Chemical class 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- OECTYKWYRCHAKR-UHFFFAOYSA-N 4-vinylcyclohexene dioxide Chemical compound C1OC1C1CC2OC2CC1 OECTYKWYRCHAKR-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- AWMVMTVKBNGEAK-UHFFFAOYSA-N Styrene oxide Chemical compound C1OC1C1=CC=CC=C1 AWMVMTVKBNGEAK-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- LTYMSROWYAPPGB-UHFFFAOYSA-N diphenyl sulfide Chemical compound C=1C=CC=CC=1SC1=CC=CC=C1 LTYMSROWYAPPGB-UHFFFAOYSA-N 0.000 description 2
- 238000000921 elemental analysis Methods 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- VYQVAVNKQCPAOF-UHFFFAOYSA-M triphenylselanium;chloride Chemical compound [Cl-].C1=CC=CC=C1[Se+](C=1C=CC=CC=1)C1=CC=CC=C1 VYQVAVNKQCPAOF-UHFFFAOYSA-M 0.000 description 2
- QGHDLJAZIIFENW-UHFFFAOYSA-N 4-[1,1,1,3,3,3-hexafluoro-2-(4-hydroxy-3-prop-2-enylphenyl)propan-2-yl]-2-prop-2-enylphenol Chemical group C1=C(CC=C)C(O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(O)C(CC=C)=C1 QGHDLJAZIIFENW-UHFFFAOYSA-N 0.000 description 1
- YXALYBMHAYZKAP-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-ylmethyl 7-oxabicyclo[4.1.0]heptane-4-carboxylate Chemical compound C1CC2OC2CC1C(=O)OCC1CC2OC2CC1 YXALYBMHAYZKAP-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- 241000530268 Lycaena heteronea Species 0.000 description 1
- 241000282376 Panthera tigris Species 0.000 description 1
- YPWFISCTZQNZAU-UHFFFAOYSA-N Thiane Chemical compound C1CCSCC1 YPWFISCTZQNZAU-UHFFFAOYSA-N 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 125000000068 chlorophenyl group Chemical group 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 150000004292 cyclic ethers Chemical class 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
- 125000006501 nitrophenyl group Chemical group 0.000 description 1
- HVZWVEKIQMJYIK-UHFFFAOYSA-N nitryl chloride Chemical compound [O-][N+](Cl)=O HVZWVEKIQMJYIK-UHFFFAOYSA-N 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- ORQWTLCYLDRDHK-UHFFFAOYSA-N phenylselanylbenzene Chemical compound C=1C=CC=CC=1[Se]C1=CC=CC=C1 ORQWTLCYLDRDHK-UHFFFAOYSA-N 0.000 description 1
- MVXXTYYBNQKGKT-UHFFFAOYSA-N phenylsulfanium;chloride Chemical compound [Cl-].[SH2+]C1=CC=CC=C1 MVXXTYYBNQKGKT-UHFFFAOYSA-N 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 125000004076 pyridyl group Chemical group 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 229910001495 sodium tetrafluoroborate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- 238000001665 trituration Methods 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/02—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring
- C08G65/04—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from cyclic ethers by opening of the heterocyclic ring from cyclic ethers only
- C08G65/06—Cyclic ethers having no atoms other than carbon and hydrogen outside the ring
- C08G65/08—Saturated oxiranes
- C08G65/10—Saturated oxiranes characterised by the catalysts used
- C08G65/105—Onium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C381/00—Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
- C07C381/12—Sulfonium compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/66—Arsenic compounds
- C07F9/68—Arsenic compounds without As—C bonds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
- C07F9/90—Antimony compounds
- C07F9/902—Compounds without antimony-carbon linkages
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F236/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds
- C08F236/02—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds
- C08F236/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated
- C08F236/14—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen
- C08F236/16—Copolymers of compounds having one or more unsaturated aliphatic radicals, at least one having two or more carbon-to-carbon double bonds the radical having only two carbon-to-carbon double bonds conjugated containing elements other than carbon and hydrogen containing halogen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polymerisation Methods In General (AREA)
Description
Die Erfindung betrifft Oniumsalz-Fotoinitiatoren von Elementen der Gruppe VIa mit einem MFg-Anion, worin M ein Element ausgewählt aus P, As und Sb ist.The invention relates to onium salt photoinitiators of Group VIa elements with an MFg anion, wherein M is selected an element is made up of P, As and Sb.
Die Fotoinitiatoren nach der vorliegenden Erfindung können in Kombination mit verschiedenen fotopolymerisierbaren organischen Materialien benutzt v/erden, wie cyclischen Äthern, cyclischen Estern, Polyvinylacetalen, Epoxyharzen usw., um UV-härtbare und hitzehärtbare Massen zu erhalten. Die Fotoinitiatoren der vorliegenden Erfindung haben die folgende allgemeine FormelThe photoinitiators according to the present invention can be used in combination with various photopolymerizable organic Materials used v / grounds, such as cyclic ethers, cyclic esters, polyvinyl acetals, epoxy resins, etc. to be UV-curable and to obtain thermosetting compounds. The photoinitiators of the present invention have the following general formula
(D [(R)a (R1), (R2)c (D [(R) a (R 1 ), (R 2 ) c
worin R ein einwertiger aromatischer organischer Rest, R ein einwertiger organischer aliphatischer Rest, ausgewählt aus Alkyl,where R is a monovalent aromatic organic radical, R is a monovalent organic aliphatic radical selected from alkyl,
2
Cycloalkyl und deren Derivaten, R ein mehrwertiger organischer Rest aus aliphatischen und aromatischen Resten, die eine heterocyclische
oder kondensierte Ringstruktur bilden, X ein Element der Gruppe VIa aus Schwefel und Selen und M ausgewählt ist aus P, As
und Sb, a eine ganze Zahl von 0 bis einschließlich 3» b. eine
ganze Zahl von 0 bis einschließlich 2, c 0 oder 1 ist und die Summe von a + b + c einen Wert von 3 oder gleich der Valenz von
X hat.2
Cycloalkyl and its derivatives, R is a polyvalent organic radical composed of aliphatic and aromatic radicals which form a heterocyclic or condensed ring structure, X is an element of group VIa from sulfur and selenium and M is selected from P, As and Sb, a is an integer of 0 up to and including 3 » b. an integer from 0 up to and including 2, c is 0 or 1 and the sum of a + b + c has a value of 3 or equal to the valence of X.
Die für R stehenden Reste können gleiche oder verschiedene aromatische carbocyclische oder heterocyclische Reste mit 4-20 Kohlenstoffatomen sein, die mit 1-4 einwertigen Resten substituiert sein können, ausgewählt aus Alkoxy mit 1-8 Kohlenstoffatomen, Alkyl mit 1-8 Kohlenstoffatomen, Nitro, Chlor usw. Spezifische Beispiele für R sind Phenyl, Chlorphenyl, NitrophenylThe radicals for R can be identical or different aromatic carbocyclic or heterocyclic radicals with 4-20 Be carbon atoms which can be substituted with 1-4 monovalent radicals selected from alkoxy with 1-8 carbon atoms, Alkyl of 1-8 carbon atoms, nitro, chlorine, etc. Specific examples of R are phenyl, chlorophenyl, nitrophenyl
Methoxyphenyl, Pyridyl usw. Die für R stehenden Reste schließen Alkylreste mit 1-8 Kohlenstoffatomen ein, wie Methyl, Äthyl usw.s Methoxyphenyl, pyridyl, etc. The radicals for R include alkyl radicals having 1-8 carbon atoms, such as methyl, ethyl, etc. s
909812/097S909812 / 097S
substituierte Alkylreste, wie -C2H4OCH , -CH2COOC2H -CH2COCH7. usw. Die Reste für R schließen beispielhaft die folgenden Strukturen einsubstituted alkyl radicals, such as -C 2 H 4 OCH, -CH 2 COOC 2 H -CH 2 COCH 7 . etc. The radicals for R include, by way of example, the following structures
Spezifische Beispiele für Oniumsalze von Elementen der Gruppe VIa nach der Formel (1) sind die folgendenSpecific examples of onium salts of Group VIa elements according to the formula (1) are as follows
HOHO
fsfs
-ρ--ρ-
ClUClU
CH.CH.
CH,CH,
AsF,AsF,
( O >--C-CH2-S(O> - C-CH 2 -S
PF1 PF 1
909812/0911909812/0911
6 -6 -
AsF6-AsF 6 -
2 +/^t C-CH2-S I2 + / ^ t C-CH 2 -SI
Br-/ O V- C-CH9-Sv J SbF6 Br- / O V- C-CH 9 -S v J SbF 6
SbF6 SbF 6
*v* v
/oV~ Se+AsF6" oder -SbFg", etc./ oV ~ Se + AsF 6 "or -SbFg", etc.
Zur Herstellung dieser Fotoinitiatoren kann ein Aryljodoniumsalz^ wie Diphenyljodonium-Hexafluorarsenat, zusammen mit einer Verbindung eines Elementes der Gruppe VIa3 wie Diphenylsulfid, in Gegenwart eines Kupfersalzkatalysatorss z. B. Kupferbenzoats bei Temperaturen im Bereich von 50 - 25O°C für 1-5 Stunden umgesetzt werden.To produce these photoinitiators, an aryl iodonium salt such as diphenyl iodonium hexafluoroarsenate, together with a compound of an element from group VIa 3 such as diphenyl sulfide, in the presence of a copper salt catalyst s z. B. copper benzoate s at temperatures in the range of 50-25O ° C for 1-5 hours.
Andere Verfahren., die zur Herstellung der Fotoinitiatoren benutzt werden könnena sind beschrieben in J. W. Knapczyk und W.E.Other processes., Which can be used for the preparation of a photoinitiators are described in JW Knapczyk and WE
909812/097S909812 / 097S
J. Am. Chem. Soc, 9J, (1969): A.L. Maycock und G. A. Berchthold, J. Org. Chem., 35_ Nr. 8, 2532 (1970); US-PS 2 8O7 6H8, E. Goethals und P. De Radzetzky, BuI. Soc. Chim. BeIg., T3 5^6 (196*1); H.M. Leichester und P.W. Bergstrom, J.Am. Chem. Soc, jjl 3587 (1929) usw.J. Am. Chem. Soc, 9J, (1969): AL Maycock and GA Berchthold, J. Org. Chem., 35_ No. 8, 2532 (1970); U.S. Patent 2,8o7,6H8, E. Goethals and P. De Radzetzky, BuI. Soc. Chim. BeIg., T3 5 ^ 6 (196 * 1); HM Leichester and PW Bergstrom, J.Am. Chem. Soc, jjl 3587 (1929) etc.
Im folgenden wird die Erfindung anhand von Beispielen näher erläutert. Falls nichts anderes angegeben, sind alle Teile Gew.-Teile. The invention is explained in more detail below with the aid of examples. Unless otherwise stated, all parts are parts by weight.
Triphenylselenoniumchlorid wurde nach dem in Journal American Chem. Soc. 5.1 3587 (1929) beschriebenen Verfahren aus Diphenylselenid hergestellt. Durch Zugabe von Natriumhexafluorarsenat, Natriumtetrafluorborat bzw. Kaliumhexafluorantimonat zu einerTriphenylselenonium chloride was prepared according to the method described in Journal American Chem. Soc. 5.1 3587 (1929) described method from diphenyl selenide manufactured. By adding sodium hexafluoroarsenate, sodium tetrafluoroborate or potassium hexafluoroantimonate to a
wäßrigen Lösung von Triphenylselenoniumchlorid wurden die entsprechenden Salze hergestellt. Die erhaltenen weißen kristallinen Feststoffe wurden im Vakuum getrocknet.aqueous solution of triphenylselenonium chloride were the corresponding Salts made. The resulting white crystalline solids were dried in vacuo.
3 $ige Lösungen der vorgenannten Salze in 4-VinyIcyclohexendioxid wurden als 0,05 mm dicke Filme aus einem Abstand von etwa 15 cm mit einer GE H3T7~Lampe gehärtet, Es wurden die folgenden Hartungszeiten beobachtet.3 solutions of the aforementioned salts in 4-vinyl cyclohexene dioxide were cured as 0.05 mm thick films from a distance of about 15 cm with a GE H3T7 ~ lamp. The following Curing times observed.
(CCHC),Se+BF," 10 Sek.(C C H C ), Se + BF, "10 sec.
D 5 3 4D 5 3 4
(C6H5)3Se+AsF6" 5 (C6H5)3Se+SbF6~ 3 (C 6 H 5) 3 Se + AsF 6 "5 (C 6 H 5) 3 Se + SbF 6 ~ 3
Die vorstehenden Ergebnisse zeigen, daß das Hexafluorosalz verglichen mit dem Tetrafluoroboratsalz ein sehr viel besserer Foto initiator ist.The above results show that the hexafluoro salt compared with the tetrafluoroborate salt is a much better photo initiator.
Es wurden verschiedene Sulfoniumhexafluoroarsenat- a Sulfoniumhexafluoroantimonat- und Seleniumhexafluoroarsenat-Salze durchVarious sulfonium hexafluoroarsenate, a sulfonium hexafluoroantimonate and selenium hexafluoroarsenate salts were used
909812/0975909812/0975
Zugeben des entsprechenden Anions in Form der Säure oder des Salzes, wie Natriuinhexaf luoroarsenat zu dem entsprechenden Kation, wie einer wäßrigen Lösung von Tri(355-dimethy1-4-hydroxy)phenylsulfoniumchlorid hergestellt. Es wurde dabei das im J. Am. Chem. Soc. 51, 3587 (1929) beschriebene Verfahren angewendet. Die erhaltenen Ergebnisse sind in der folgenden Tabelle zusammengefaßt.Adding the corresponding anion in the form of the acid or the salt, such as sodium hexafluoroarsenate, to the corresponding cation, such as an aqueous solution of tri (3 5 5-dimethy1-4-hydroxy) phenylsulfonium chloride. It was the in J. Am. Chem. Soc. 51, 3587 (1929) are used. The results obtained are summarized in the following table.
909812/0975909812/0975
Kationcation
€0=€ 0 =
154 - 156154-156
300(3,000) 284(4,100) 279(4,600) 252(9,300)3.000 (300) 4.100 (284) 4.600 (279) 9.300 (252)
errechnet 33.20 4.15 8.75 gefunden 32.99 3.90 8.92 calculated 33.20 4.15 8.75 found 32.99 3.90 8.92
AsF,AsF,
245 - 251245-251
263(23,300) 280(20,708) 317(7,150)263 (23,300) 280 (20,708) 317 (7.150)
errechnet 49-3
gefunden 49-39 calculated 49-3
found 49-39
4.62 4.594.62 4.59
5.48 5.555.48 5.55
co cn ooco cn oo
Kation Anion MJL™Ll£l XMax (eMax) Elementar Analyse Cation Anion MJL ™ Ll £ l XMax (eMax) Elemental Analysis
C H SeC H Se
AsF," 184 - 187 258(10,900)AsF, "184-187 258 (10,900)
266( 2,841) errechnet 43.3 3.01 15.8266 (2.841) calculated 43.3 3.01 15.8
275( 2,145) gefunden 43.4 2.99 16.0275 (2.145) found 43.4 2.99 16.0
C HC H
SbF " 140 - 143 258(10,900)SbF "140 - 143 258 (10,900)
"* V ^^ J 266C 2,841) errechnet 39.6 2.75 "* V ^^ J 266 C 2.841) calculates 39.6 2.75
ο \ /3 275( 2,145) gefunden 39.9 2.98ο \ / 3 275 (2.145) found 39.9 2.98
- PF " 117 - 120' 300(·4,700) ,- PF "117-120 '300 (x 4,700),
248(10^200)248 (10 ^ 200)
AsF," 161 - 163 300( 4,700) 248(10,200)AsF, "161-163 300 (4,700) 248 (10,200)
SbF," 160 - 163 300( 4,700) ^0 SbF, "160-163 300 (4,700) ^ 0
0 248(10,200) OO 0 248 (10,200) OO
Es wurde festgestellt, daß die 4-Vinylcyclohexendioxid-Massen, die die obigen Oniumsalze enthielten, verglichen mit den Tetrafluoroborat-Oniumsalzen nach dem Stand der Technik.It was found that the 4-vinylcyclohexene dioxide masses, containing the above onium salts compared to the tetrafluoroborate onium salts According to the state of the art.
Eine Mischung von 11,75 Teilen Diphenyljodoniumhexafluorarsenat, 4,065 Teilen Diphenylsulfid und 0,2 Teilen Kupferbenzoat wurde unter Rühren für 3 Stunden auf eine Temperatur von 120 - 125 °C erhitzt. Dann goß man die Mischung noch heiß in einen Behälter, woraufhin das Produkt kristallisierte. Man extrahierte das Produkt drei'mal mit Diäthylather und trocknete es dann an der Luft. Es wurde TriphenyIsulfoniumhexafluorarsenat in 97 %iger Ausbeute erhalten. Das Salz hatte einen Schmelzpunkt(M. Pj von 195 - 197°C, nachdem es weiter aus 95 tigern Äthanol umkristallisiert worden war.A mixture of 11.75 parts of diphenyliodonium hexafluoroarsenate, 4.065 parts of diphenyl sulfide and 0.2 part of copper benzoate heated to a temperature of 120-125 ° C. for 3 hours with stirring. Then the mixture was poured into a container while it was still hot, whereupon the product crystallized. The product was extracted three times with diethyl ether and then dried in the air. It was triphenyl sulfonium hexafluoroarsenate in 97% yield obtain. The salt had a melting point (M. Pj of 195 - 197 ° C, after it had been further recrystallized from 95 tiger ethanol.
Eine Mischung einer 0,02 Mole des TriphenyIsulfoniumhexafluorarsenats enthaltenden Lösung in Styroloxid wurde bei 25°C in einem Glasgefäß unter Stickstoff mit einer 450 Watt-Hanovia-Lampe bestrahlt. Es wurde festgestellt, daß das Styroloxid nach 5 Minuten polymerisierte. Das gleiche Verfahren wurde mit einer Lösung in Tetrahydrofuran wiederholt.A mixture of a 0.02 mole of the triphenyl sulfonium hexafluoroarsenate containing solution in styrene oxide was at 25 ° C in a glass vessel under nitrogen with a 450 watt Hanovia lamp irradiated. It was found that the styrene oxide polymerized after 5 minutes. The same procedure was followed with a solution repeated in tetrahydrofuran.
Das Verfahren des Beispiels 3 wurde wiederholt, dabei jedoch 12,75 Teile Diphenyljodoniumhexafluorarsenat, 2,55 Teile Pentamethylensulfid und 0,2 Teile Kupferbenzoat benutzt. Man erhielt in 60 %iger Ausbeute Phenylpentamethylensulfoniumhexafluorarsenat nach Rekristallisieren des Produktes aus Methanol.The procedure of Example 3 was repeated, but using 12.75 parts of diphenyliodonium hexafluoroarsenate and 2.55 parts of pentamethylene sulfide and 0.2 part of copper benzoate used. Phenylpentamethylene sulfonium hexafluoroarsenate was obtained in 60% yield after recrystallization of the product from methanol.
Eine Mischung von 12,75 Teilen 4,41-Diisopropylphenyljodoniumhexafluorarsenat, 5 Teilen Phenoxanthen und 0,2 Teilen Kupferbenzoat wurde unter Stickstoff und Rühren für 3 Stunden auf 120 bis 125 °C erhitzt. Nach dem Abkühlen wurde das Produkt mit Diäthylather extrahiert. Das verbleibende Öl wurde in Methylen-A mixture of 12.75 parts of 4,4 1 -diisopropylphenyliodonium hexafluoroarsenate, 5 parts of phenoxanthene and 0.2 part of copper benzoate was heated to 120-125 ° C. for 3 hours under nitrogen and with stirring. After cooling, the product was extracted with diethyl ether. The remaining oil was dissolved in methylene
909812/0975909812/0975
chlorid gelöst und durch eine 15 cm lange Aluminium-Säule geschickt. Ein Zerreiben mit Äther, gefolgt von einem Abkühlen in einem Eisbad ergab als weißes Produkt in 4l i&iger Ausbeute 4-Isopropylphenylphenoxanthylium-hexafluorarsenat (m.p. 126-127°C) mit der Formelchloride dissolved and sent through a 15 cm long aluminum column. Trituration with ether followed by cooling in an ice bath gave the white product in 41% yield 4-isopropylphenylphenoxanthylium hexafluoroarsenate (m.p. 126-127 ° C) with the formula
H SH S
3,74 653O3.74 6 5 3O
3,82 6,253.82 6.25
Eine 3~$ige Lösung dieses Onium.salzes in 3,4-Epoxycyclohexylmethyl-3',4'-epoxycyclohexancarboxylat wurde mit einer GE H3T7~Lampe aus einem Abstand von etwa 25 cm bestrahlt. In 30 Sekunden erhielt man einen harten klebrigkeitsfreien Film.A 3 solution of this onium salt in 3,4-epoxycyclohexylmethyl-3 ', 4'-epoxycyclohexanecarboxylate was irradiated with a GE H3T7 ~ lamp from a distance of about 25 cm. Received in 30 seconds one hard tack-free film.
Nach dem Verfahren der Beispiele 3 und 5 wurden die in der folgenden Tabelle 1 gezeigten weiteren Oniumsalze von Elementen der Gruppe VIa der Formel (1) hergestellt.Following the procedure of Examples 3 and 5, those in the following were made Table 1 further onium salts of elements of group VIa of the formula (1) prepared.
909812/097S909812 / 097S
I+SaIzI + SaIz
[OH-I+AsF,[OH-I + AsF,
Verbindung des Elementes, der Gruppe VIaConnection of the element, the group VIa
[OH-S[OH S
Ausbeute CO Yield CO
[O>f S+AsF6- 97[O> f S + AsF 6-97
Salz desSalt des
ElementesElement
der Gruppe VIaof group VIa
M. P.
(6C) MP
( 6 C)
195-197195-197
Analyse %C %H Analysis % C% H
%S% S
errechnet 47,7 3,3 7,06 gefunden 47,78 3,41 7,06calculated 47.7 3.3 7.06 found 47.78 3.41 7.06
O)Hl+PF,O) Hl + PF,
[cH3^)}l+ASF6-[cH 3 ^)} l + A S F 6 -
CHo-KOJ-1"1AsF-CHo-KOJ-1 " 1 AsF-
[oH-s[Oh s
2'2 '
S CH,NS,
AsFn" 88AsF n "88
τ, Οτ, Ο
AsF6~ 10° AsF 6 ~ 10 °
133-136 errechnet 5&,9O 4,06 gefunden 57tO5 5,03 133-136 calculates 5 &, 9O 4.06 found 57 t O5 5.03
151-152 errechnet 51,01 4,25 gefunden 51,05 4,44151-152 calculated 51.01 4.25 found 51.05 4.44
120-125120-125
120-125120-125
errechnet 54'rO 4,0 gefunden 54,2 4,1calculated 54 ' r O 4.0 found 54.2 4.1
errechnet 50,0 3,9 gefunden 49,8 3,9calculated 50.0 3.9 found 49.8 3.9
6,90 7,096.90 7.09
6,43 6,446.43 6.44
7,6 7,77.6 7.7
6,7 6,76.7 6.7
I+AsF,I + AsF,
AsF,AsF,
143-145143-145
165-168165-168
errechnet 51,0 4,0 6,8calculated 51.0 4.0 6.8
gefunden 51,2 4,1 6,8found 51.2 4.1 6.8
errechnet 46,3 2,8 6,9calculated 46.3 2.8 6.9
gefunden 46,2 2,8 7,0found 46.2 2.8 7.0
Tabelle l (Fortsetzung)Table l (continued)
Ir Salz I r salt
Verbindung des Salz des AusElementes der Elementes beute Gruppe VIa der Gruppe VIa, '(%) Compound of the salt of the AusElementes of the element beute group VIa of group VIa, '(%)
AsF£" 41AsF £ "41
Analyseanalysis
%C %H %S% C% H% S
126-127 errechnet 49,1 3,74 6,30 gefunden 49,51 3,82 6,25126-127 calculated 49.1 3.74 6.30 found 49.51 3.82 6.25
I+AsF,I + AsF,
AsF,AsF,
95 165-167 errechnet 50,2 3,6 6,7 gefunden 50,25 3,6 6,6795 165-167 calculated 50.2 3.6 6.7 found 50.25 3.6 6.67
W'H- (G«W'H- (G «
L^I+ASF6-L ^ I + ASF 6 -
AsF,AsF,
9999
6767
Zusätzlich zu den nach Beispiel 6 hergestellten Oniumsalzen wurden die weiteren in der folgenden Tabelle II zusammengefaßten Oniumsalze unter Anwendung des Verfahrens der beiden Beispiele 3 und 5 hergestellt.In addition to the onium salts prepared according to Example 6, the others are summarized in Table II below Onium salts prepared using the procedure of both Examples 3 and 5.
909812/0975909812/0975
I+ SalzI + salt
Verbindung des Salz des Elementes der Elementes Gruppe VIa der Gruppe VIa Compound of the salt of the element of the element group VIa of group VIa
AsF,AsF,
beutethe end
prey
gefundencalculated
found
35.35.
69 3.9869 3.98
.63 .70
.63
CD O COCD O CO
CJCJ
AsF,AsF,
AsF, 151-153 errechnet 32.43 3.51 8.-65 gefunden 32.33 3.53 8.37 AsF, 151-153 calculated 32 .43 3.51 8.-65 found 32.33 3.53 8.37
120-125 errechnet 40.9 5.1 7.8
gefunden 40.9 5.1 7.8 120-125 calculated 40 .9 5.1 7.8
found 40.9 5.1 7.8
I+AsF,I + AsF,
AsF,AsF,
110-115 errechnet 33,9 3,7 9.0 110-115 calculates 33.9 3.7 9.0
gefunden 33.8 3.9 9.2 found 33.8 3.9 9.2
-S-CH.-NS.
(OHs-CH, 100-102 errechnet 40.0 3.33 8.21 gefunden 38.53 3.39 8.53 (OHs-CH, 100-102 calculated 40 .0 3.33 8.21 found 38.53 3.39 8.53
Ol 00 CDOl 00 CD
28395882839588
Es wurden Triary1-Oniumsalze eines Elementes der Gruppe VIa unter Verwendung von DiaryIjodoniumhexafluorarsenat, -hexafluorantimonat oder -hexafluorphosphat und einem Thiophenol-Koreaktanten in Kombination mit Kupferbenzοat und Triäthylamin als Kocatalysator hergestellt. Das Triphenyljodoniumhexafluorarsenat wurde nach dem in der US-PS 3 981 897 beschriebenen Verfahren erhalten. Andere hierfür brauchbare Verfahren sind z. B.in J. Am. Chem. Soc, _8_1 366 (1959) beschrieben. Ein typisches Verfahren zur Herstellung solcher TriaryIoniumsalze von Elementen der Gruppe VIa ist das folgende:There were Triary1 onium salts of a Group VIa element using diaryiodonium hexafluoroarsenate, hexafluoroantimonate or hexafluorophosphate and a thiophenol coreactant in combination with copper benzoate and triethylamine produced as a cocatalyst. The triphenyliodonium hexafluoroarsenate was made according to the procedure described in U.S. Patent 3,981,897 obtain. Other methods that can be used for this purpose are e.g. B. in J. Am. Chem. Soc, 8-1366 (1959). A typical procedure for the preparation of such triaryionium salts of elements of group VIa is the following:
Eine Mischung von 2,75 Teilen Thiophenol, 11,75 Teilen DiphenyΙΟ odoni umhexaf luorarsenat, 0,2 Teilen Kupferbenzoat und 4 Teilen Tri-n-butylamin wurde unter Rühren 3 Stunden lang auf eine Temperatur von 120-125°C unter Stickstoff erhitzt. Nach dem Abkühlen wurde das Produkt mit Diäthyläther gewaschen und getrocknet. Man erhielt eine 86 %ige Ausbeute von Triphenylsulfoniumhexafluorarsenat. Die weiter nach im wesentlichen den gleichen Verfahren hergestellten Triaryloniumsalze von Elementen der Gruppe VIa sind in der folgenden Tabelle III zusammengefaßt.A mixture of 2.75 parts of thiophenol, 11.75 parts of DiphenyΙΟ odoni umhexaf luorarsenat, 0.2 parts of copper benzoate and 4 parts Tri-n-butylamine was heated to temperature for 3 hours with stirring heated from 120-125 ° C under nitrogen. After cooling, the product was washed with diethyl ether and dried. An 86% yield of triphenylsulfonium hexafluoroarsenate was obtained. The triarylonium salts of elements of the group further prepared by essentially the same procedures VIa are summarized in Table III below.
909812/0975909812/0975
I+ SalzI + salt
Verbindung eines Elementes der Gruppe VIa Compound of an element of group VIa
Salz eines
Elementes der
Gruppe VIaSalt one
Element of the
Group VIa
Ausbeute M,PYield M, P
ο as coο as co
I+AsF,I + AsF,
I+AsFI + AsF
164-167164-167
:i AsF6" 12.1 123-127: i AsF 6 "12.1 123-127
I+AsF,I + AsF,
AsF6" 17 140-143AsF 6 "17 140-143
I+AsF,I + AsF,
OXL S^AsF,OX L S ^ AsF,
194-197194-197
Die in den Rahmen der Formel I fallenden Oniumsalze können auch durch die folgende allgemeine Formel wiedergegeben werden:The onium salts falling within the scope of formula I can can also be represented by the following general formula:
Z·Z
GG®GG®
X-X-
R MF6"R MF 6 "
worin M, X und R die vorgenannte Bedeutung haben und Z ausge-where M, X and R have the aforementioned meaning and Z is
0 0 0
wählt ist aus jjS-, -S-, -S-, -S-, -C-, -0-, -Se-, -CH3-, -C H1 0 0 0
is selected from jjS-, -S-, -S-, -S-, -C-, -0-, -Se-, -CH 3 -, -C H 1
ι
und -N-ι
and -N-
und R ausgewählt ist aus Alkylresten mit 1-8 undand R is selected from alkyl radicals with 1-8 and
Ary!resten mit 6-13 Kohlenstoffatomen.Ary! Residues with 6-13 carbon atoms.
909812/0975909812/0975
Claims (1)
die folgende Formel9. Photo initiator marked by
the following formula
Gruppe VIa ausgewählt aus Schwefel und Selen ist, R ein einwertiger organischer aliphatischer Rest, ausgewählt aus Alkyl,wherein M is selected from P, As and Sb, X is an element of
Group VIa is selected from sulfur and selenium, R is a monovalent organic aliphatic radical selected from alkyl,
0 0 0 P4Is cycloalkyl and its derivatives, Z is selected from
0 0 0 P 4
6-13 Kohlenstoffatomen.is selected from alkyl radicals with 1-8 and aryl radicals with
6-13 carbon atoms.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US05/833,146 US4161478A (en) | 1974-05-02 | 1977-09-14 | Photoinitiators |
Publications (1)
Publication Number | Publication Date |
---|---|
DE2839586A1 true DE2839586A1 (en) | 1979-03-22 |
Family
ID=25263563
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE19782839586 Pending DE2839586A1 (en) | 1977-09-14 | 1978-09-12 | PHOTO INITIATORS |
Country Status (5)
Country | Link |
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JP (1) | JPS5453181A (en) |
BE (1) | BE870430A (en) |
DE (1) | DE2839586A1 (en) |
FR (1) | FR2403351A1 (en) |
GB (1) | GB1596000A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3537401A1 (en) * | 1984-10-22 | 1986-04-24 | General Electric Co., Schenectady, N.Y. | Process for the preparation of triarylsulphonium salts |
US5466845A (en) * | 1992-06-12 | 1995-11-14 | Wacker-Chemie Gmbh | Sulfonium salts and process for their preparation |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59147001A (en) * | 1983-02-07 | 1984-08-23 | ゼネラル・エレクトリツク・カンパニイ | Photosettable composition |
US5399596A (en) * | 1988-03-03 | 1995-03-21 | Sanshin Kagaku Kogyo Co., Ltd. | Polyfluoride sulfonium compounds and polymerization initiator thereof |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1516512A (en) * | 1974-05-02 | 1978-07-05 | Gen Electric | Chalcogenium salts |
GB1518141A (en) * | 1974-05-02 | 1978-07-19 | Gen Electric | Polymerizable compositions |
IE42085B1 (en) * | 1974-09-18 | 1980-06-04 | Ici Ltd | Photopolymerisable compositions |
US4069054A (en) * | 1975-09-02 | 1978-01-17 | Minnesota Mining And Manufacturing Company | Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer |
GB1604954A (en) * | 1977-08-05 | 1981-12-16 | Gen Electric | Photocurable compositions and method for curing |
-
1978
- 1978-05-18 GB GB2043378A patent/GB1596000A/en not_active Expired
- 1978-09-12 DE DE19782839586 patent/DE2839586A1/en active Pending
- 1978-09-13 JP JP11184578A patent/JPS5453181A/en active Pending
- 1978-09-13 BE BE190440A patent/BE870430A/en not_active IP Right Cessation
- 1978-09-13 FR FR7826296A patent/FR2403351A1/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3537401A1 (en) * | 1984-10-22 | 1986-04-24 | General Electric Co., Schenectady, N.Y. | Process for the preparation of triarylsulphonium salts |
US5466845A (en) * | 1992-06-12 | 1995-11-14 | Wacker-Chemie Gmbh | Sulfonium salts and process for their preparation |
Also Published As
Publication number | Publication date |
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FR2403351B1 (en) | 1982-07-09 |
JPS5453181A (en) | 1979-04-26 |
FR2403351A1 (en) | 1979-04-13 |
BE870430A (en) | 1979-03-13 |
GB1596000A (en) | 1981-08-19 |
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