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Publication of DE282299CpublicationCriticalpatent/DE282299C/de
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
Landscapes
Physics & Mathematics
(AREA)
General Physics & Mathematics
(AREA)
Printing Methods
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Optical Elements Other Than Lenses
(AREA)
Manufacture Or Reproduction Of Printing Formes
(AREA)
Moulds For Moulding Plastics Or The Like
(AREA)
Application Of Or Painting With Fluid Materials
(AREA)
Verfahren zur Herstellung eines mehrschichtigen Hohlkörpers aus Kunststoff, Vorrichtung zur Durchführung des Verfahrens und nach diesem Verfahren hergestellter mehrschichtiger Hohlkörper
Verfahren zur Herstellung von Schriftzuegen, Abbildungen, Schutzmarken und aehnlichen Zeichen auf glasklarem oder undurchsichtigem, farblosem oder gefaerbtem Untergrund
Verfahren zum Überziehen oder Weichlöten von Materialien und Anwendung des Verfahrens zur Herstellung einer Kontaktschicht auf einer Materialoberfläche