DE2807933A1 - Photopolymerisierbares gemisch - Google Patents

Photopolymerisierbares gemisch

Info

Publication number
DE2807933A1
DE2807933A1 DE19782807933 DE2807933A DE2807933A1 DE 2807933 A1 DE2807933 A1 DE 2807933A1 DE 19782807933 DE19782807933 DE 19782807933 DE 2807933 A DE2807933 A DE 2807933A DE 2807933 A1 DE2807933 A1 DE 2807933A1
Authority
DE
Germany
Prior art keywords
hoechst
dye
kalle
hoe
branch
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE19782807933
Other languages
German (de)
English (en)
Inventor
Walter Dr Deucker
Kurt Dipl Chem Dr Kluepfel
Heide Sprengel
Hansjoerg W Dipl Chem Vollmann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoechst AG
Original Assignee
Hoechst AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst AG filed Critical Hoechst AG
Priority to DE19782807933 priority Critical patent/DE2807933A1/de
Priority to DE7979100447T priority patent/DE2962247D1/de
Priority to EP79100447A priority patent/EP0003804B1/de
Priority to CA000321990A priority patent/CA1121645A/en
Priority to AT0138579A priority patent/AT373403B/de
Priority to JP1914579A priority patent/JPS54123186A/ja
Priority to US06/015,248 priority patent/US4241166A/en
Publication of DE2807933A1 publication Critical patent/DE2807933A1/de
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/163—Radiation-chromic compound

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
DE19782807933 1978-02-24 1978-02-24 Photopolymerisierbares gemisch Withdrawn DE2807933A1 (de)

Priority Applications (7)

Application Number Priority Date Filing Date Title
DE19782807933 DE2807933A1 (de) 1978-02-24 1978-02-24 Photopolymerisierbares gemisch
DE7979100447T DE2962247D1 (en) 1978-02-24 1979-02-15 Photopolymerizable composition containing a monoazo dye
EP79100447A EP0003804B1 (de) 1978-02-24 1979-02-15 Photopolymerisierbares Gemisch, das einen Monoazofarbstoff enthält
CA000321990A CA1121645A (en) 1978-02-24 1979-02-21 Photopolymerizable mixture comprising a monoazo dye
AT0138579A AT373403B (de) 1978-02-24 1979-02-22 Photopolymerisierbares gemisch
JP1914579A JPS54123186A (en) 1978-02-24 1979-02-22 Photopolymerizable mixture
US06/015,248 US4241166A (en) 1978-02-24 1979-02-26 Photopolymerizable composition comprising a monoazo dye as contrast colorant

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19782807933 DE2807933A1 (de) 1978-02-24 1978-02-24 Photopolymerisierbares gemisch

Publications (1)

Publication Number Publication Date
DE2807933A1 true DE2807933A1 (de) 1979-08-30

Family

ID=6032817

Family Applications (2)

Application Number Title Priority Date Filing Date
DE19782807933 Withdrawn DE2807933A1 (de) 1978-02-24 1978-02-24 Photopolymerisierbares gemisch
DE7979100447T Expired DE2962247D1 (en) 1978-02-24 1979-02-15 Photopolymerizable composition containing a monoazo dye

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE7979100447T Expired DE2962247D1 (en) 1978-02-24 1979-02-15 Photopolymerizable composition containing a monoazo dye

Country Status (6)

Country Link
US (1) US4241166A (US08124317-20120228-C00018.png)
EP (1) EP0003804B1 (US08124317-20120228-C00018.png)
JP (1) JPS54123186A (US08124317-20120228-C00018.png)
AT (1) AT373403B (US08124317-20120228-C00018.png)
CA (1) CA1121645A (US08124317-20120228-C00018.png)
DE (2) DE2807933A1 (US08124317-20120228-C00018.png)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3114931A1 (de) * 1981-04-13 1982-10-28 Hoechst Ag, 6000 Frankfurt Durch strahlung polymerisierbares gemisch und daraus hergestelltes photopolymerisierbares kopiermaterial
DE3144480A1 (de) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
DE3144499A1 (de) * 1981-11-09 1983-05-19 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und daraus hergestelltes lichtempfindliches kopiermaterial
US4448873A (en) * 1982-03-18 1984-05-15 American Hoechst Corporation Negative working diazo contact film
GB8314918D0 (en) * 1983-05-31 1983-07-06 Vickers Plc Radiation sensitive compositions
DE3602215A1 (de) * 1986-01-25 1987-07-30 Hoechst Ag Photopolymerisierbares gemisch und dieses enthaltendes photopolymerisierbares aufzeichnungsmaterial
US5262436A (en) * 1987-03-27 1993-11-16 Schering Corporation Acylamino acid antihypertensives in the treatment of congestive heart failure
US4837097A (en) * 1987-12-17 1989-06-06 Xerox Corporation Optical Shield for liquid crystal devices and method of fabrication
JP3102822B2 (ja) * 1992-05-29 2000-10-23 日本ジーイープラスチックス株式会社 レーザーマーキング用樹脂組成物
JP4979368B2 (ja) * 2005-12-27 2012-07-18 関西ペイント株式会社 活性エネルギー線硬化型樹脂組成物及びレジストパターン形成方法
US8034538B2 (en) * 2009-02-13 2011-10-11 Eastman Kodak Company Negative-working imageable elements
JP6367913B2 (ja) 2013-03-15 2018-08-01 スリーエム イノベイティブ プロパティズ カンパニー 染料としてのベンゾチアゾール−２−イルアゾ−フェニル化合物、前記染料を含む組成物、及びこのような組成物の硬化度を決定する方法
EP3090025A4 (en) 2013-12-30 2017-08-23 3M Innovative Properties Company Dye, filler made therefrom, compositions including the filler, and method of determining degree of cure of such compositions
JP6126314B2 (ja) 2013-12-30 2017-05-10 スリーエム イノベイティブ プロパティズ カンパニー ポリチオール、不飽和化合物、及び染料を含む組成物、並びにその組成物に関する方法
WO2017004015A1 (en) 2015-06-29 2017-01-05 3M Innovative Properties Company Compositions including a polythiol, an unsaturated compound, and a dye and methods relating to such compositions
CN114773289A (zh) * 2022-05-11 2022-07-22 辽宁庸信达染料化工有限公司 一种硝基苯并异噻唑类偶氮化合物及其应用

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE439901A (US08124317-20120228-C00018.png) * 1939-11-20
US3130050A (en) * 1960-01-18 1964-04-21 Gen Aniline & Film Corp Oil-dispersed dyes in photopolym-erization systems
DE1544375B1 (de) * 1965-06-10 1969-12-11 Basf Ag Wasserunloesliche Monoazofarbstoffe
DE1669723A1 (de) * 1967-09-22 1971-06-09 Basf Ag Indigoide Farbstoffe enthaltende Platten,Folien oder Filme aus photopolymerisierbaren Massen
CA1046826A (en) * 1973-05-25 1979-01-23 Koichi Kimoto Photo-sensitive composition for dry formation of image
JPS5179342A (US08124317-20120228-C00018.png) * 1974-12-26 1976-07-10 Fuji Photo Film Co Ltd
DE2524481A1 (de) * 1975-06-03 1976-12-23 Hoechst Ag Verfahren zum faerben von synthetischen fasermaterialien
DE2558812A1 (de) * 1975-12-27 1977-07-07 Hoechst Ag Lichtempfindliche kopiermassen und darin enthaltene photoinitiatoren

Also Published As

Publication number Publication date
JPS54123186A (en) 1979-09-25
EP0003804A1 (de) 1979-09-05
DE2962247D1 (en) 1982-04-08
EP0003804B1 (de) 1982-03-10
CA1121645A (en) 1982-04-13
ATA138579A (de) 1983-05-15
JPS6212801B2 (US08124317-20120228-C00018.png) 1987-03-20
AT373403B (de) 1984-01-25
US4241166A (en) 1980-12-23

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Legal Events

Date Code Title Description
8139 Disposal/non-payment of the annual fee