DE2700252A1 - Testing of structures on surfaces of electrical modules - has structures scanned and tested for observance of salient factors, e.g. spacing, angles, straightness - Google Patents

Testing of structures on surfaces of electrical modules - has structures scanned and tested for observance of salient factors, e.g. spacing, angles, straightness

Info

Publication number
DE2700252A1
DE2700252A1 DE19772700252 DE2700252A DE2700252A1 DE 2700252 A1 DE2700252 A1 DE 2700252A1 DE 19772700252 DE19772700252 DE 19772700252 DE 2700252 A DE2700252 A DE 2700252A DE 2700252 A1 DE2700252 A1 DE 2700252A1
Authority
DE
Germany
Prior art keywords
structures
structure
tested
observance
straightness
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19772700252
Other languages
German (de)
Other versions
DE2700252C2 (en
Inventor
Thomas Dr Rer Nat Ricker
Juergen Dr Ing Schuermann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Licentia Patent Verwaltungs-GmbH
Original Assignee
Licentia Patent Verwaltungs-GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Licentia Patent Verwaltungs-GmbH filed Critical Licentia Patent Verwaltungs-GmbH
Priority to DE19772700252 priority Critical patent/DE2700252C2/de
Publication of DE2700252A1 publication Critical patent/DE2700252A1/en
Application granted granted Critical
Publication of DE2700252C2 publication Critical patent/DE2700252C2/de
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01BMEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00Measuring arrangements characterised by the use of optical means
    • G01B11/24Measuring arrangements characterised by the use of optical means for measuring contours or curvatures
    • GPHYSICS
    • G06COMPUTING; CALCULATING; COUNTING
    • G06KRECOGNITION OF DATA; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
    • G06K9/00Methods or arrangements for reading or recognising printed or written characters or for recognising patterns, e.g. fingerprints
    • G06K9/36Image preprocessing, i.e. processing the image information without deciding about the identity of the image
    • G06K9/54Combinations of preprocessing functions
    • G06K9/56Combinations of preprocessing functions using a local operator, i.e. means to operate on an elementary image point in terms of the immediate surroundings of this point

Abstract

The structure testing method is applicable to structures on surfaces of electrical modules or to auxiliary means for production of the subassemblies. The existing actual structure is scanned and intermediately stored. The structure so obtained is tested for observance of specified constructional rules relating to the structure building, such as syntactic connection between adjacent picture elements. Deviations from the rules indicating structure faults are detected. A practical example is afforded by a mask structure consisting of black regions, in front of a white background. The factors to be tested are accuracy of corner angles, straightness of edges and min. separation of the black regions which can be isolated from each other or interdependent.
DE19772700252 1977-01-05 1977-01-05 Expired DE2700252C2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE19772700252 DE2700252C2 (en) 1977-01-05 1977-01-05

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19772700252 DE2700252C2 (en) 1977-01-05 1977-01-05

Publications (2)

Publication Number Publication Date
DE2700252A1 true DE2700252A1 (en) 1978-07-06
DE2700252C2 DE2700252C2 (en) 1985-03-14

Family

ID=5998154

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19772700252 Expired DE2700252C2 (en) 1977-01-05 1977-01-05

Country Status (1)

Country Link
DE (1) DE2700252C2 (en)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2439437A1 (en) * 1978-10-16 1980-05-16 Nippon Telegraph & Telephone Process and device for examining patterns such as those masks used in the manufacture of integrated circuits
FR2451602A1 (en) * 1976-11-15 1980-10-10 Environmental Research Inst Mi Shape analysis device
FR2455264A1 (en) * 1979-04-26 1980-11-21 Bosch Gmbh Robert Monitoring alignment and/or dimensions of moving parts - on assembly line using comparative evaluation of optical beam produced by LED
DE2929846A1 (en) * 1979-07-23 1981-03-12 Siemens Ag Opto-electronic testing system for automatic checking of characteristics, their intermediate products and printing tools
DE2937741A1 (en) * 1979-09-18 1981-05-27 Siemens Ag Opto-electronic dimension measurement for semiconductor mfr. - using video scanning focal integration, and integral differencing
DE3148121A1 (en) * 1980-12-11 1982-08-05 Gerhard Westerberg Method and device for controlling micromasks
EP0095517A1 (en) * 1982-05-28 1983-12-07 Ibm Deutschland Gmbh Process and device for an automatic optical inspection
EP0119198A1 (en) * 1982-09-20 1984-09-26 Contrex Inc. Automatic semiconductor surface inspection apparatus and method
EP0128107A1 (en) * 1983-05-04 1984-12-12 Optrotech Ltd. Apparatus and method for automatic inspection of printed circuit boards
EP0135302A1 (en) * 1983-07-25 1985-03-27 Lloyd Doyle Limited A method and apparatus for inspecting printed wiring boards
DE3427981A1 (en) * 1984-07-28 1986-02-06 Telefunken Electronic Gmbh Method for detecting errors on defined structures
DE2953303C2 (en) * 1978-10-30 1987-04-16 Fujitsu Ltd Pattern verification system
DE4410603C1 (en) * 1994-03-26 1995-06-14 Jenoptik Technologie Gmbh Detecting faults during inspection of masks, LCDs, circuit boards and semiconductor wafers
US6067153A (en) * 1996-05-21 2000-05-23 Hitachi, Ltd. Pattern defect inspecting apparatus
WO2001055737A2 (en) * 2000-01-31 2001-08-02 Advanced Micro Devices, Inc. Analysis of cd-sem signal to detect scummed/closed contact holes and lines

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3440473C2 (en) * 1984-11-06 1989-02-02 Karl Deutsch Pruef- Und Messgeraetebau Gmbh + Co Kg, 5600 Wuppertal, De

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2530606A1 (en) * 1974-07-22 1976-02-12 Philips Nv A method of testing a two-dimensional pattern by means of two synchronized receiving arrangements
DE2508992A1 (en) * 1974-03-08 1976-04-01 Westinghouse Electric Corp A method for checking the correct status of components
DE2546070A1 (en) * 1974-10-17 1976-04-22 Westinghouse Electric Corp Differential image analyzer
DE2514930A1 (en) * 1975-04-05 1976-10-14 Opto Produkte Ag Method for the optical determination and comparison of shapes and positions of objects

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2508992A1 (en) * 1974-03-08 1976-04-01 Westinghouse Electric Corp A method for checking the correct status of components
DE2530606A1 (en) * 1974-07-22 1976-02-12 Philips Nv A method of testing a two-dimensional pattern by means of two synchronized receiving arrangements
DE2546070A1 (en) * 1974-10-17 1976-04-22 Westinghouse Electric Corp Differential image analyzer
DE2514930A1 (en) * 1975-04-05 1976-10-14 Opto Produkte Ag Method for the optical determination and comparison of shapes and positions of objects

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2451602A1 (en) * 1976-11-15 1980-10-10 Environmental Research Inst Mi Shape analysis device
FR2439437A1 (en) * 1978-10-16 1980-05-16 Nippon Telegraph & Telephone Process and device for examining patterns such as those masks used in the manufacture of integrated circuits
DE2953303C2 (en) * 1978-10-30 1987-04-16 Fujitsu Ltd Pattern verification system
FR2455264A1 (en) * 1979-04-26 1980-11-21 Bosch Gmbh Robert Monitoring alignment and/or dimensions of moving parts - on assembly line using comparative evaluation of optical beam produced by LED
DE2929846A1 (en) * 1979-07-23 1981-03-12 Siemens Ag Opto-electronic testing system for automatic checking of characteristics, their intermediate products and printing tools
DE2937741A1 (en) * 1979-09-18 1981-05-27 Siemens Ag Opto-electronic dimension measurement for semiconductor mfr. - using video scanning focal integration, and integral differencing
DE3148121A1 (en) * 1980-12-11 1982-08-05 Gerhard Westerberg Method and device for controlling micromasks
EP0095517A1 (en) * 1982-05-28 1983-12-07 Ibm Deutschland Gmbh Process and device for an automatic optical inspection
EP0119198A1 (en) * 1982-09-20 1984-09-26 Contrex Inc. Automatic semiconductor surface inspection apparatus and method
EP0119198A4 (en) * 1982-09-20 1986-07-08 Contrex Inc Automatic semiconductor surface inspection apparatus and method.
EP0128107A1 (en) * 1983-05-04 1984-12-12 Optrotech Ltd. Apparatus and method for automatic inspection of printed circuit boards
US4635289A (en) * 1983-07-25 1987-01-06 Lloyd Doyle Limited Method and apparatus for inspecting printed wiring boards
EP0135302A1 (en) * 1983-07-25 1985-03-27 Lloyd Doyle Limited A method and apparatus for inspecting printed wiring boards
DE3427981A1 (en) * 1984-07-28 1986-02-06 Telefunken Electronic Gmbh Method for detecting errors on defined structures
DE4410603C1 (en) * 1994-03-26 1995-06-14 Jenoptik Technologie Gmbh Detecting faults during inspection of masks, LCDs, circuit boards and semiconductor wafers
US6067153A (en) * 1996-05-21 2000-05-23 Hitachi, Ltd. Pattern defect inspecting apparatus
WO2001055737A2 (en) * 2000-01-31 2001-08-02 Advanced Micro Devices, Inc. Analysis of cd-sem signal to detect scummed/closed contact holes and lines
WO2001055737A3 (en) * 2000-01-31 2002-05-02 Advanced Micro Devices Inc Analysis of cd-sem signal to detect scummed/closed contact holes and lines

Also Published As

Publication number Publication date
DE2700252C2 (en) 1985-03-14

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Legal Events

Date Code Title Description
OAM Search report available
OC Search report available
OD Request for examination
OF Willingness to grant licenses before publication of examined application
D2 Grant after examination
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee