DE202012008505U1 - Magnetic radiation absorber - Google Patents

Abstract

Radiation absorber, characterized in that; that a textile fleece which touches on a ferromagnetic caloric metallization process.

Description

Including carbon fibers, nanotubes and graphene nanoplates of metal insulated gas plasma absorber.

description

Introduction of EMC shielding through textiles with metal layers as a screening absorber Transponder for sub-molecular EMC for multiple devices.

1. Basic idea and state of the art

In our external environment we are daily covered by cosmic rays, sunlight, light and optical radiation. These radiations are free energy, high energy, and known to be useful as energy transponders by Photovoltaic Technologies. The main treatment is to use the magnetic wave fields trapped by electro-magnetic (EMV) shielding as a source of micro-electron voltages to bundle them and to allow a huge electron current in DC for the uses of electrical equipment Stand-alone device.

Basic idea: Ferromagnetic caloric metals are metals, such as rare earth metals, MU metals and / or normal metals. Their entropy, the temperature and charge change under the influence of a magnetic pulse. These phase change reactions change the physical state of the electron charge or micro-electron voltage load and temperature, affect in heat or cold and can normally be identified in the external nature as Farraday cages, and these effects are very small. However, based on the design of the ferromagnetic alloy of FeMn and / or CuZn and other alloys exist. The invention relates to a device for EM absorbers for electromagnetic radiation.

The invention relates to a radiation absorber device and comprises a carrier element made of plastic or polymer construct and is supported by at least one alloy formation. The EM absorber conductor, a flexible carrier element as a support element and consists of electrically insulating plastic material and the at least one alloying element consists of a plurality of flexible carbon fiber covers. A plurality of bundles of carbon polymer fibers formed EM conductors are disposed one upon the other from the support member and either individually or in multiple groups of at least two EM absorber elements with possible placement of the electrical connectors to obtain the micro-electron voltages by conversion.

Such metal structures and formations which have the ability to absorb EM radiation are very high and very interesting because they operate at the lowest frequency rates and / or lowest magnetic impulses. The main thesis is that the magnetic caloric entrotopies (MCE metals), and also shape memory alloys (SMA metals), ferromagnetic shape memory alloy (FSMA) have properties. The SMA hold a group of useful contradictions. This means that the knowledge of SMA metals is necessary to define stable caloric and baloric MCE metals.

These magnetic caloric entrotopies have great opportunities for electro-yield devices, through the quantum physical entrotopies. The metal alloy (SMA) dies are closed in nano polyamide / polyester fibers and polyaramides to prevent any oxidation and / or rust formation, so that the electroplated molecular has anti-rust aging, thus avoiding rusting in NaCl water, or osmotic blistering in sweet water. (This is not part of this invention) This technological based on a new way of covering and coating of gradual metal or gas cells in a highly flexible and lightweight woven fabric where pico metals are closed in the nano-paletes or nano-fibers. This ensures stability and has the ability to absorb electromagnetic radiation.

Based on this invention, which has already been developed, a new way of covering and coating metal or gas trapped cells in a highly flexible and lightweight material, with the ability to absorb electromagnetic radiation, such as the mobile network, radar or sonar beaming as well Infrared light radiation protection. The most important technology is the programming of PICO Metals in nano- and paletes or nano-fibers, in woven textiles. This technological is based on "nano-polymer fibers with metal-gas capabilities". This technology enables new cooling and heating systems that are cheaper, simpler and more economical to produce.

An invention is known, which relates to a method and an apparatus for producing a nonwoven fabric which consists of 100% metal fibers. The fabric with deformed metal fibers which by creating a secure restoring force with needle hook inserted in the region of the compound, so that a uniform formation of mesh and sufficient strength of the Metallfaservlieses is guaranteed. The recovery power is realized by means of specially shaped elements with specific mobility. The invention relates to a method and an apparatus for producing a metal nonwoven fabric through the formation of meshes of metal fibers consolidated from a non-spun nonwoven fabric or metal filaments.

The solidification of the textile is known. "Knitting technique of the fleece by means of fiber webs". DE 42 39 469 describes, for example, a method of increasing the uniformity of nonwoven webs of transversely oriented webs by applying pressure to the web over the stitching to create an indirect tension in the web that the fibers will necessarily slide.

Textile " is in the sense of understanding fibers of natural and synthetic polymers. In these processes, the fibers are shaped without prior threading so that they interlock and thus can be consolidated in a film. The processing of metal filaments in the production of the nonwoven fabric due to the stiffness of the metal fibers or metal filaments is overcome with considerable difficulty in the formation of stitches. These metal fibers are, for example, in the shell and cold drawing process ( US 3,379,000 ), a metal-cutting process (peeling off the rolled edge of a metal film roll after US 4,930,199 ) or directly from the melt, for example by extrusion, as in U.S. Patent 5,524,704 described.

The formation of 100% woven metal fibers according to the current mechanical nonwoven manufacture of the "carding mill web forming process" and the "wet laying process" requires special expertise. Disadvantages in the production of ribbons, worsted and carded yarns of metal fiber in particular the fact that it is necessary to maintain the filament formation process necessarily the textile carrier fibers. Here, the threads can be realized with homogeneous blends over the yarn cross-section, as well as the production of multifilament wrap yarns with metal fibers in the core and textile "are practiced in the coat.

Also known is the production of fabrics from such filaments form as in patent DE 699 01 941 T2 described where yarn is knitted with different metal fiber. Here too, in addition to the complicated process of the strings, the maintenance of the fiber materials in the required textile knitting process is used. The solidification of the aerodynamically shaped webs, after the needle process is also known. In DE 698 03 085 T2 where described, with a fuel membrane at least one metal fiber layer is needled. The production of nonwoven fabric with metal fiber fleece by knitting technique has been known only by using a high proportion of textile "fibers. This case is a small amount, e.g. B. 2-4% metal fibers in the textiles. The mechanical mixtures form a homogeneous surface. Such technology is manageable and without further major problems. The processing of metal fibers in a mixture of up to 50 polyester fibers (PES Bekinox ^® 12/50) is known for this loop forming bonding method. As higher the percentage of metal fibers, the greater difficulty in processing occurs.

Increasingly, it also becomes necessary to access non-woven fabrics made of 100% metal fibers for special applications. The nonwoven fabric, made from 100% metal fibers according to the well-known fabric weft technique, was subjected to an uneven and incomplete loop formation, displaced by the needle pressure and not provided in the permanent deformation and the absence of restoring forces. In this situation, the metal fibers remain out of the needles and sway to be picked up by the low mounted needle hooks. Accordingly, the resulting unfavorable properties such as homogeneity, strength, elongation, etc.

The object of the invention is therefore the production of a metal fiber fleece from fabric, which with high uniformity and sufficient strength without the use of additional textile fiber carrier and without labor-intensive and time-consuming fiber formation. This object is solved by the features of this claim.

Another important advantage is the use of the metal fiber material, which works primarily as a filtering technique for the EMC and EMF field and is used for the dissipation of static electricity formation.

The nanocomposites, loaded with various types of microorganisms / nanofillers, are being developed for use in electromagnetic absorbing materials with a minimum thickness. It is shown that the adaptation of the desired EM properties can be achieved by the proper selection and combination of both the filler and the matrix. In particular, the distributed graphene nanoplates in a bisphenol-A based epoxy matrix function which has a loss factor less than a few percent and tailored dielectric constant. The developed double-layer absorbers, made complete with nanocomposites, have a thickness of 2 mm for the X-band and 1.5 mm and the Ku-band. Index AGB carbon nanotubes, carbon nanofibers, graphene, nanocomposites, EM absorbers.

In recent years, radar-absorbing materials (RAM) have gained a fundamental role in civilian and military applications where "requiring absorbing material" (RAS) is used to control and evaluate surface electromagnetic radiation (EM) , Such materials are capable of high electromagnetic field shielding at radio frequencies (RF, RF, SVF, VHF, etc.) but also at the same time having low reflection coefficients over a defined frequency range. There is great interest in the use of these new technologies and new materials for the realization of innovative radar absorbing materials. They are lighter, thinner and have multifunctional properties. In particular, reinforced polymeric composites are widely used in the design and realization of RAMs to achieve simultaneously controlled mechanical properties and tailored broadband EM absorbing performances.

Short Carbon Fiber Reinforced Composites (CFRC) and Short or Polyurea Fiber Reinforced Plastics (SPRC) are particularly suitable for producing thin multifunctional RAM, although their biggest drawback is that of being microscopically inhomogeneous materials. We choose to use this idea as a basis and to develop it into a new technology standard.

Polymer composites and carbon based nanofillers have attracted considerable attention in research and industry due to their high mechanical, electrical and thermal properties, at relatively low concentrations. Compared to traditional engineering materials, carbon nanostructures of filled composites have several advantages, which are compromised by their ability to adjust dielectric properties and facilitate structure without compromising mechanical properties. The excellent electrical properties of CNTs on the high aspect ratios are generally attributed to the range of 10-1000. Such high aspect ratios enable the occurrence of electrical percolation of CNTs within polymers at very low levels.

Various studies have shown that the combined use of multilayer carbon nanotubes (MWCNTs) and Ni-coated carbon microfibers (Ni-CFS) can yield highly absorbent bilayer nanocomposite panels in the X and Ku bands , with band width of (-10 dB to 5 GHz), with a minimum reflection coefficient lower than -40 dB. allowed. The developed panels were formed by a spacer made of ROHACELL or glass fiber reinforced composite and by a lossy matrix on the film. This technology only allows 5 GHz EM shielding. According to the invention, 40 GHz, THz structures and higher focussed as well as including the fact of the unknown effects of THz leak and micro waves as well as infra-red area shape.

The scope of the new double-layer filled absorbent film which is completely filled with various types of nano-composites consisting of carbon micro- and nanostructures (especially metals), such as MWCNTs, Ni-CFS, and the new multilayer graphene plates (GNPs) in The nano-shielding nonwoven synthesized by Pico Metal fused cells to absorb the electromagnetic fields as and convert this into electricity. According to the invention, the correct choice of the filler and the polymeric matrix of the nano-materials is realized with the desired properties. The GHZ and even TeraHerz protection is secured for 99.9999997% and the radiation absorption of the EM is fully solved.

The structure of the matrix consists of several thin nano fibers where the pico metal gas cells are enclosed. This realizes a perfect electrical conductor (PEC). The second layer is the spacer made of a lossless dielectric material. The third layer is the lossy foil and has the function of absorbing the EM energy associated with the incident field. All are enclosed in a polyamide fiber, and fully insulated by the transponder. The PET fiber is fully insulated at the surface into a nano-electric wire. See picture 6.

The invention consists of a combined use of multi-layered carbon nanotubes (MWCNTs) and Ni-coated carbon microfibers (Ni-CFS) of highly absorbent two-layer panels in the X and Ku band, with band widths of (-30 dB ) to 20 GHz, with a minimum reflection coefficient of <-60 dB with the nano material.

An already made, with the nano-material 11-GHz nonwoven which would be modified and evaluated at 40-GHz, the reflection coefficient <-60 dB. and the attenuation is higher than 80 dB. Today's technologies offer a range of more than 40 dB. The lossy film is filled by the epoxy-based nanocomposite with an unsaturated polyester resin with Ni-coated carbon fibers (NiCFs) and MWCNTs, as before described carried out. The spacer is made with a low loss tangent nanocomposite filled with a bisphenol A based epoxy resin with BSP. and so that the metal gases do not react with each other. The choice of the resin as a base is necessary for the nanocomposite to minimize the loss of the tangent of the material.

A. Materials, filler and methods

The filler, consisting of Ni-coated carbon fibers, from the Sulzer Metco (E-Fill 2901) are finely ground or chopped. According to the manufacturer they have an actual density of 3.8 g / cm3 (67Ni / 33C% by weight). With a diameter in the range of 6 to 9 microns, and an average length of 500 microns. The thickness of the Ni layer is about 250 to 280 nm. MWCNTs are obtained from nanoledge in a 1% acetone solution. According to the manufacturer's entry, the mean diameter of the MWCNTs is about 10 nm and the lengths are in the range 0.1-10 μm, with a density of 2 g / cm3 followed by a synthesized mean particle size of 350 μm.

The interstitial compound of the feedstock is subjected to thermal shock driven expansion in air at 1110-1130 ° C for ~ 10 seconds, thereby increasing the volume of expanded flakes by about 200 times. After the thermal treatment, the graphite expandate is ultrasonicated using an ultrasonic processor (Sonics & Materials Vibracell VC500) to achieve an average thickness in the range of 10-20 nm. The metals, Cu, Co, Zn and Al, etc., are available from the company Rheinmetall Defense GmbH / KMW Germany, and already ground in size of 85 microns and are supplied in vacuum containers.

B. Production of Nanocomposites

• 1) Ein kommerziell erhältliches ungesättigtes Polyesterharz Nano-Draht; (PET-Draht als PEC)
• 2) ein Bisphenol-A Epoxidharz hergestellt auf der Basis von Gurit Ltd (SP 106), hergestellt, was die Basis Polyamid-Material, wobei die Metall-Gas-phuses (MWCNTs) mittels Ionen-Plasma-Sputtern isoliert werden.

Die Nano Verbundstoffen werden in einem Verarbeitungsverfahren, durch Lösung unter Verwendung von Aceton hergestellt für alle verschiedenen Arten von Füllstoffen. Danach wird das lose Nanokomposit mit ungesättigtem Polyesterharz in die MWCNTs bei 1% Gewicht und Ni-CFs gefüllt mit 4% Gewicht konkretisiert.Two different thermosets were used:

• 1) A commercially available unsaturated polyester resin nano-wire; (PET wire as PEC)
• 2) A bisphenol-A epoxy resin manufactured on the basis of Gurit Ltd (SP 106), produced what is the base polyamide material, wherein the metal gas phuses (MWCNTs) are isolated by means of ion plasma sputtering.

The nanocomposites are produced in a processing process by solution using acetone for all different types of fillers. Thereafter, the loose nanocomposite with unsaturated polyester resin is concretized into the MWCNTs at 1% weight and Ni-CFs filled at 4% weight.

For the spacers, the nano composite is used together with the epoxy, and GNPs of 0.5% and 1% weight. The SEM analysis was performed in two different ways, FEG (Field Emission Gun) and SEM (FEI Nova NanoSEM 630 and Zeiss Supra 35), using an acceleration voltage between 5 and 30 KeV, depending on the type of sample (non-conducting samples were broken in liquid nitrogen and metallized prior to examination). It goes well, a good uniformity of the composite, which gives the good degree of dispersion of nano-filler. This gives the possibility of having a highly sensitive EM absorber, including absorption of the microwave and infrared sections in their wavelengths and a functioning device for generating electricity.

C. Nano-composites EM characterization

The measurements of complex effective permittivity were performed and a new standard defined using the waveguide method. Here, the samples were placed directly in the flanges and then processed to get the desired thickness and complete cross-linking. Effective complex permittivity of the composites was extracted from the measurement of the scattering parameters according to the above-mentioned standard, with two different sets of waveguides, each for the X-bands (8.2 to 12.4 GHz) and Ku bands (12.4 to 18 GHz). The scattering parameters were measured with a Vector Network Analyzer (Anritsu vector star MS4647A) 20-40 GHz frequency and real part frequency of 20 GHz relative permittivity of pure resin samples GNP 0.5% BSP 1%. Frequency spectra of the real (a) and imaginary part (b) parts of the effective relative dielectric constant of the pure resin and the nanocomposites loaded with BSP of 0.5% and 1% weight and each set made up of two X-band and two Ku-band waveguides.

The measured frequency spectrum of the real and imaginary parts of the nanocomposite materials is used for the lossy film. The loss tangent is almost at 0.5. The discontinuity at the frequency of 12.4 GHz is due to the fact that the X- and Ku-band measurements were measured by two different experimental setups. Subsequently, the real and imaginary parts of the low pressure loss tangents, the nanocomposite filled with recovered BSP, are measured and reported. The real and imaginary parts of the permittivity of the pure resin (for reference) is observed to have the loss tangent as needed at about 0.03. It is also observed that the real part of the effective permittivity is nearly constant. The 40 GHz and Tera heart Absorber would be technically developed and invented.

EM absorbing screen film, modeling and execution.

The transmission line corresponding design is used for the two-layer plate with the EM metallization of an ion-full cell in a woven textile Abschirmvlies. With the aid of a transfer matrix, the matrices are calculated from the input to the output field of the two-layer plate. The cascade effect on the EM fields, on the lossy textile film, is done with the ion sputtering gun, in a plasma metallization setup.

Summary

Here a process of metallization of polypropylene (PP) nonwovens is presented. The influence of the force is dissipated to the efficiency of shielding a flat electromagnetic wave. Tissue metallization was performed using standard magnetron sputtering of Zn-Bi metal targets in an argon environment. A pulse power source with a changing frequency group was used to power the target. The metallic layers obtained, by a good adhesion to polypropylene (PP) a shielding of 45 dB. Technically, we can reach up to 200 dB, and up to 40 GHz and up in the terahertz area. The metals were altered in their entirety in full-metal gas cells and manipulated in their ironic clouds, by magnetron sputtering techniques for plasma metallization. Magnetron sputtering with Zn / Cu / Co shields electromagnetic fields.

Some polymer fiber materials, such as polypropylene (PP) or polytetrafluoroethylene fluoroethylene (PTFE), are very difficult to metallise due to their surface properties. Classical methods of the metallic layer and deposition (vacuum evaporation, electron beam evaporation or chemical deposition of metal organic compounds) in this case do not give the desired results. A deposited layer has a very poor adhesion and is therefore subject to high wear. The only possibility is plasma activation of the surface by the deposition of a metal layer followed by vapor deposition in vacuo. However, it is a two-step process. The magnetron sputtering process itself also consists of two stages. However, it is a fast and environmentally friendly process. By this method, it is possible to deposit metallic, semiconductor and dielectric layers. The deposition rates of the layers are much higher than in cathode sputtering; For metals of several microns / min, and for them oxides from 40 nm / min to 600 nm / min. An additional advantage of this method is good adhesion of the deposited layers to the substrates.

Plasma process of polypropylene nonwoven metallization

Plasma process of polypropylene nonwoven metallization nonwovens, especially polypropylene nonwovens are commonly used in technical applications mainly because of their low cost. The process for metallizing PP fabric (nonwoven fabric) is equipped and performed by sputtering metallic objects with the compositions 0.9Zn-0.1Bi and 0.96Zn-0.04Bi, in a magnetron gun, the WMK-10 type. The targets are powered by a 12 kW DPS unit equipped to supply the plasma gun with an AC current of M and provided with f = 80 kHz ( ) or a unidirectional DC current of M f = 160 kHz ( ). In both cases, the current is modulated in groups of rectangular pulses with the frequency of 100 Hz to 5 kHz. The highest voltage of the current is 1.2 kV. In conventional systems, the power is dissipated in the target by controlling the current supply of the magnetron. In our case, a magnetron pulse is applied and the power is adjusted by the pulse width in the range of 10 to 0.2 ms. Under such conditions, the stability of the reactive processes is ensured. The stability is achieved by eliminating the unconditional settings and effects.

Sputter deposition:

Is a "physical vapor deposition" (PVD) method of depositing thin metal strips into gas-fused cells by sputtering which deposits on a "substrate", such as a silicon or polyamide disk. Backsputter is a reemission of the deposited material during deposition by ion or atom bombardment. Atomized atoms have a broad energy distribution, typically up to 10 eV (100,000 K). The sputtered ions (usually just a small fraction - by 1% - the emitted particles are ionized) will fly ballistically from the target in straight lines and the effects will energetically impact the substrates or vacuum chamber (causing sputtering). Alternatively, at higher gas pressures, the ions collide with the gas atoms, acting as a moderator and moving diffusely. After a wander of the substrates, they reach the vacuum chamber wall and after they are condensed. The entire range of high energy ballistic to low energy thermalized movement can be changed by the gas pressure. The sputtering gas is a noble gas, like argon. For efficient momentum transfer, the atomic weight of the sputtering gas should be close to the target's atomic weight, and neutone is preferable for sputtering, while krypton or xenon are used for heavy elements. Reactive gases can also be used to sputter compounds. The connection may be formed on the target surface or on the substrate during the process, depending on the process parameters. The availability of many parameters such as control sputter deposition make it a complex process, even experts allow a high degree of control over the growth and microstructure of the film. An important advantage of sputter deposition is that even materials with very high melting points are easy to sputter, and while the evaporation of these materials evaporates in a resistor, in the Knudsen cell it is problematic or impossible. Sputter-deposited layers have a composition close to that of the starting material.

The difference is that different elements are disseminated differently because of their different mass (light elements are easier to divert through the gas), but this difference is constant. Sputtered layers usually have better adhesion to the substrate like vapor deposition of layers. The target contains a large amount of material, is maintenance-free and the technology is suitable for ultra-high vacuum applications. Sputtering sources contain no hot parts (they are typically water cooled to avoid heating) and are compatible with reactive gases such as oxygen. Sputtering can be done from top to bottom while performing evaporation from bottom to top. Extended procedures such as epitaxial growth are possible. Some disadvantages of the sputtering process are that the process is more difficult to combine with a lift-off process for patterning the film. This is because characteristic sputtering, makes a full shadow. Thus, one can not completely limit it when atoms are lost, which can lead to contamination. In addition, active control for layer-by-layer growth is more difficult compared to pulsed laser deposition and noble gas sputtering in which the growing layer is built as an impuritie.

Types of sputter deposition:

The sputtering sources are usually magnetrons that trap strong electric and magnetic electron fields near the surface of the magnetron, and use this as a target. The electrons helically follow the magnetic field lines and undergo multiple ionizing collisions with the neutral gas near the target surface. (Since the target material is depleted and displays an erosion profile on the surface of the target) sputter-inert gas is, typically argon. The extra argon ions generated due to the collisions lead to a higher deposition rate. It also means that the plasma can be maintained at a lower pressure. The sputtered atoms are neutrally charged, thus remaining in the magnetic trap. Charging on the insulating targets using RF sputtering when the anode-cathode bias voltage sign is varied at a high rate can be avoided. RF sputtering works well to produce highly insulating oxide films but only with the added expense of RF power supplies and impedance matching networks. Leaking stray magnetic fields from ferromagnetic targets also interfere with the sputtering process. Specially designed sputtering guns with unusually strong permanent magnets are used as compensation.

Ion Beam Sputtering (IBS)

We use the ion beam sputter to introduce metal gas cells into the polyamide or polyurethane compounds, as a dielectric EM absorber. Ion Beam Sputtering (IBS) is a process where the target is outside the ion source. A source can operate without a magnetic field as in a hot filament ionization gauge. In the "Kaufman ion source" is described, which is limited by collisions with electrons generated by a magnetic field in a magnetron. They are then accelerated from an electric field network to a target. When the ions leave the source they are neutralized by electrons from a second external filament. IBS has the advantage that the energy and ion flux can be controlled independently. Since the flux that hits the target is made up of neutral atoms, and either insulating or conductive targets can be sputtered. IBS has found application in the production of thin-film heads for hard disks. A pressure differential between the ion source and the sample chamber is created by placing the gas inlet at the origin and shooting through a tube in the measurement chamber. This saves gas and prevents dirt from entering UHV applications. The main disadvantage of IBS is that a large amount of maintenance is required to keep the ion source operating.

In reactive sputter, a gas is introduced into the deposited polymer matrix, a gas in the vacuum chamber, and a chemical reaction is formed. Oxide and nitride films are often formed using reactive sputtering. The composition of the layer can be controlled by varying the relative pressures of the inert and reactive gases. Film stoichiometry is an important one Parameters for the optimization of functional properties such as stress in SiNx and the refractive index of SiOx. The transparent indium tin oxide conductor used in optoelectronics and solar cells is made by reactive sputtering.

In ion assisted deposition (IAD), the substrate is exposed to a secondary ion beam with a lower power than the sputtering gun. Normally, the "Kaufman ion source" as used in IBS provides the secondary beam which is used in IAD to deposit carbon in diamond-like form on a substrate, and to connect carbon atoms on the substrate, which are not properly embedded in the substrate of the diamond crystal lattice will be discarded by the secondary beam. This technique of diamond coatings on turbine blades used by NASA / ESA and Airbus Industries dates back to the 1980s. Other important industrial applications such as the creation of tetrahedral amorphous carbon surface coatings on plate surface and hard transition metal nitride coatings are used on medical implants.

Pulse magnetron sputtering is used in high vacuum without the sputtering gas being used at all times. Sustained self-sputtering is initiated by multiply charged ions from a short vacuum arc. Copper ion currents measured to an ion collector greater than 30 A, which means a plasma density of about 6 × 10 18 m 3. This technology is useful for metallic coatings, free of noble gas inclusions and that operate magnetrons in a vacuum.

"A programmable metallization device includes, the first electrodes, a storage layer electrically coupled to the first electrode and adapted for electrolytic formation and destruction of a conductive bridge. An ION-providing layer that is a source of IONs of a first metal constituent is diffusible in and out of the storage layer. A conducting ION buffer layer between the ION supplying layer and the storage layer, this allows the coupling of the diffusion of the ions, and a second electrode with the ION supplying layer. The circuits are applied to the device, biasing to the first and second electrodes, and apply to the creation and destruction of conductive bridges, including the first metal element in the memory layer. The ION buffer layer may further grant the conductive bridge by reducing the first metal element which is absorbed into the ION supply layer.

It allows to increase the ratio of sputtered material to control the impurities and arch discharges. To evaluate the performance of delivery, we know two electrical values: the actual power-P, and the circulating power-P _c . The first defines the efficiency of the layer deposition, the second characterizing the supply system. It reflects changes in plasma properties (change in impedance) associated with the change in concentration, and the nature of the charged particles. It is especially clear when sputtering in an oxygen environment.

The sputtering process is carried out under argon pressure (5 N) in the range of 10-2 Pa to 10-1 Pa. The dissipated power in the target is changed from 100 W to 1 kW. The frequency of the modulation group is 5 kHz. The distance target to the substrate is 10 cm. At less than 1kW, all applied layers are characterized by a good adhesion to PP fabric, as well as a uniform thickness on metallic paint. For power over 1 kW, the color of the layer becomes darker, the result of heating the PP with zinc and bismuth ions is also linked to the effect of gas desorption on the surface.

Surface morphology studies were made with a Quanta 200 Scanning Electron Microscope with the low vacuum mode (without coating the sample surface with a gold layer, ie, in a natural state). A 15.0 kV acceleration voltage was applied to the electron beam and SSD detector. In order to evaluate the structure of the deposited metal layer, the surface and its cross section were examined at magnifications of 300 ×, 1000 × and 5000 ×. The studies showed that the deposited layers were not uniform. This comes through the metal penetration in the spaces between the fibers. With increased performance, the average thickness of the layer increases significantly. The number of breaks and delamination in the deposited layer is very low and its adhesion is very good. At low power levels, the layer is not continuous. In such samples, the metal grains are recognizable by the individual fibers.

Results of the test PP; Metal composite damping

Results of the test PP; Metal Composite Damping Screen attenuation measurements were made in accordance with the ASTM D4935-99 method produced. The measuring system consists of an HP 8711A-type multimeter of Hewlett-Packard (with measuring frequencies from 300 kHz to 1300 MHz) and a measuring adapter in the form of a section a coaxial air line with a characteristic impedance of 50 Ω and a diameter ratio of 76/33 mm. dB attenuation well above the 100 dB, and an estimated maximum capability at 160 dB. The adapter is equipped with a flange of 133 mm diameter. In a properly established measurement system, the inaccuracy will not be more than ± 2 dB in a frequency range of 30 MHz to 1.5 GHz. The dynamics of the measuring system is more than 100 dB.

Attenuation factor.

The target was deployed in the DC-M mode. It can be seen that as the level of power dissipation increases, the value of the damping factor also increases as the thickness of the metallic layer increases. When the AC-M mode is applied, the final thickness of the deposited layers is lower. Also, the damping factor is two times lower than that for a similar range of power input. The resistance of the sputtered samples evaluated, according to the Standard EN 1149-1 , show a similar level of the order of 103 Ω. Again, it is confirmed that the value of the measured resistance is a necessary but not exhaustive factor for obtaining a good damping effect. The second condition is the formation of a conductive mesh on the surface of the substrate, with good contacts at the joints.

Conclusions

Metallization of PP fabric by pulse magnetron sputtering gives the possibility of obtaining metallic layers with very good adhesion, previously impossible by other methods. The Martindale method is used to assess the resistance, such as drying and rubbing of metallic layers. The layer formed is very fine and measured in nanometers (decimal order of magnitude). No visible defects (in the SEM) appear when the deflection of the samples occurs. The flexural strength is tested to the correct scale only after the acquisition of the larger samples. The DC-M mode ensures greater efficiency. It is associated with the increased deposition rates of the metallic layer. It is confirmed by verification that the necessary value of durability is the inconclusive factor in achieving good damping. The second condition is to form a conductive network on the support surface with good contacts at the joints.

Current Research on Developments of Energy Absorber, Black Body Absorber as TeraHertz Absorber, "Ultrafast, THz, Graphite, Nanorhoe, Plasma, Ionized Gases"

The electromagnetic spectrum covers a broad spectrum, from X-rays with UV light to visible light, heat radiation, micro- and radio waves. But between the infrared and microwaves, is an area that was previously difficult to access, even if it can provide extremely fascinating insights - it is the area of terahertz waves between 100 GHz and about 30 THz (1 THz = 10 ¹² oscillations per second) , Although it is already possible to record and produce terahertz waves, but this is possible only with great effort and therefore not economical. The applications of submillimeter waves are far from it and limited to astronomical observations. The particular properties of the radiation are of particular interest to a wide range of applications. These include new imaging technologies in medicine, some of which include X-rays, aerospace material and structural analysis, saving plastic explosives or ceramic weapons at airports, and last but not least, new research methods in biology and medicine that can be replaced.

The radiation is emitted by the matter in general, because it can be found the typical frequencies of vibrations in molecules and also certain crystal vibrations in this frequency range. In astronomy, provides new insights into the processes that are responsible for the formation of stars and galaxies. A study of the Leibnitz University in Hannover, Germany, and "nuclear physics institute Karlsruhe", expect new insights into the processes in the atmosphere, especially the chemical processes which involved in ozone depletion, and T-ray radiation to protect ions in the areas of 30 THz to 300 THz.

But especially in medicine, opens up new methods of investigation, here offers a method that allows non-ionizing radiation Dental X-rays in the future through a THz. Waves camera to be replaced, or at least complement. But even for skin cancer diagnosis, THz waves can provide clues as to whether or not there is a skin abnormality. Each substance has its own specific spectrum in the terahertz range, it is not only possible to differentiate as in x-rays of different densities, but can actually identify different materials, which may be important for saving plastic explosives or powders, for example, in envelopes can be.

The investigations revealed deposits in the ultrafast dynamics carriers of graphite, carbon nanotubes and optically ionized gases using the time-resolved THz spectroscopy. In this so-called pump-probe technique, the sample is excited by a visible laser pulse after a variable delay time of a THz pulse. This has complete information about the amplitude and phase of the probe pulse and thus to translate the current complex dielectric function of the sample in the spectral range of about 10 to 300 THz.

• 1. Erstens können wir die Elektronen als reine Energie absorbieren wie in Photovoltaik,
• 2. Zweitens, eine hohe Wärme von den wenigen Photonen ist zu sehen, und könnte eine mögliche Mikrowellenerhitzer möglich sein.
• 3. Eine molekulare Sub-Kühler ist realisierbar.

Metallization of semimetals in nano-pallets, with plasma sputtering, results in data analysis that more than 90% of the absorbed excitation energy within the electron system 500 fs are transferred into the crystal lattice. This is surprising since only ~ <1% of all photon waves Vector can participate in the electron-photon scattering. Model calculations show that the energy transfer of optical photons with very high quantum energies and strong coupling is dominated by the electrons. There are now several effects:

• 1. First, we can absorb the electrons as pure energy as in photovoltaic,
• 2. Second, high heat from the few photons can be seen, and could a possible microwave heater be possible.
• 3. A molecular sub-cooler is feasible.

These few phonon modes heat up, and cool on a time scale of 5 hp through other still cold phonons. These results show a way to selectively heat the semi-metals and lattice vibrations using a short laser pulse. In the sample with the carbon nanotubes and the graphene nano-pallets, both semiconducting tubes have an excitation pulse with a bandwidth of ~ 1 eV and "metallic" tubes with a bandgap of 0 or ~ 20 meV, absorbed. The measured THz spectra show no drawing of free charge carriers. This is a clear sign that semiconducting nanotubes are mainly strong in bound excitons, rather than creating free electron-hole pairs. Spectral components with reduced absorption cause blocking of the optical transitions in the "metallic" tubes. Analogous to graphite, the decay with a time constant of 1 ps is due to the cooling of the hot optical phonons. The spectral components with increased absorption show a distinct dichroism that can be localized and closed on a length scale of 100 nm within the exciton transitions. His decay time of 150 feet per second is thus in the time scale for the desolation of the higher-lying excitement level.

It uses ionized gas, with an intense excitation pulse of about 1% of all molecules. In Ar. The free electrons disappear on a time scale of more than 1 ns. This is an order of magnitude slower than in O2 and due to lack of dielectric loss factor channels for the kinetic energy and binding energy of the electron (string theory). The addition of Ar SF6 of the inert gas accelerates recombination. In pure S6, the electron density relaxes with a time constant of only 12 hp at an electron energy of about 20,000 K. The electronic drude of the scattering rate is monotonic with the electron density and is much larger compared to the predicted based model on the Boltzmann equation and electron ion scattering. This suggests that other effects, such as electron scattering and dynamic shielding of the Coulomb interaction, have to be taken into account in the theoretical treatment of gas plasma conductivity in the THz range.

Carbon and Polymer Nanotubes:

Exzitons, localized and delocalized metal ion carriers, and would be examined for the mid-infrared response of an optically excited carbon nanotube carrier. In contrast to graphite, the data lacks a free carrier, as a clear reaction indicates that strongly bound excitons of the optical excitation in the tubes with energy gaps in the eV area. A spectral feature that enhances blocking of the transmission that originates from optical transitions originating in tubes with a small or vanishing energy of graphene, structureless background of increased absorption shows a large optical anisotropy and a direct evidence for the localization of charge carriers on a length scale of 100 nm.

motivation

• • NTs Zugfestigkeit, die oft aus Kohlenstoffstahl, sind thermisch stabil bei Temperaturen von mehr als 1000°C in Luft, und haben eine thermische Leitfähigkeit vergleichbar wie der von einen Diamant, als stark gebundenen kovalentes Material welche sich typischerweise nur zeigen nach einen Mängel der Polyharnstoff Matrizen.
• • Sie sind nah an einem echten 1-dimensionalen System, da ihre Durchmesser in der Regel nur 1 bis 3 nm sind, und bis zu 1 Millimeter lang und bilden somit einen Spielplatz für die Erforschung der Eigenschaften der 1-dimensionalen Feststoffe.
• • Abhängig von ihrer Geometrie, werden NTs mit einem elektronischen Energie und eine halbleitende Lücke von 1 eV fast metallisch. Zum Beispiel können halbleitenden Röhrchen eingesetzt werden, um einen NT-basiertes Transistor-Feldeffekt zu bauen. Die Lücken-Größe ist kleiner als die aktuellen Silizium-basierten Transistoren. Außerdem verfügen NTs eine hohe Schwelle für den elektrischen Durchschlag. solcher Vorrichtungen.

Single-walled carbon nanotubes or polymer (NTs) are hollow cylinders of carbon atoms. Since their discovery in 1991, they have tremendous importance in fundamental and applied research because of their unique properties:

• • NT's tensile strength, often made of carbon steel, are thermally stable at temperatures in excess of 1000 ° C in air, and have a thermal conductivity comparable to that of a diamond, as strongly bonded covalent material which typically only shows up after a shortcoming of the polyurea matrices.
• • They are close to a true 1-dimensional system, as their diameters are typically only 1 to 3 nm, and up to 1 millimeter long, thus forming a playground for exploring the properties of 1-dimensional solids.
• • Depending on their geometry, NTs with an electronic energy and a semiconducting gap of 1 eV become almost metallic. For example, semiconducting tubes can be used to build an NT-based transistor field effect. The gap size is smaller than the current silicon-based transistors. In addition, NTs have a high threshold for electrical breakdown. such devices.

Metallization by magnetron sputtering ion:

The PICO ionizing gas electrons are absorbed in the EM and radar sonar and other spectrum of magnetic light packets by the terahertz shielding, including light radioactive radiation of strontium and cesium radiation. The first application of the THz-SPECTRO shield, powered by the magnetron magnified sputtering gun, is used to ionize the intense impulses of this sputtering system around the various gases. The THz signal of the resulting gas plasma is dominated by the drude, which provides the free electron dynamics and their density and drude collision rate. The electron in argon decays and proves to be much slower than in O ₂ due to a lack of internal power loss of the energy lost by the electrons. However, it can be accelerated enormously by the electron scavenger SF ₆ Ar. The Drude collision (or current relaxation) decreases monotonically with decaying electron density. We discuss two possible scenarios that may explain this behavior. The first scenario assumes that electron-ion scattering is the dominant mechanism for the current relaxation, while the second is the favors of electron-electron scattering.

motivation

• • Durch Funken in Hochspannungs-Geräte kann zu Kurzschlüssen in den Geräten welche zu Korrosion und Materialkosten führen kann. Um Kurzschlüsse zu verhindern und/oder zu unterbrechen, sind die Geräte mit isolierenden Gasen wie der Elektronen Fänger SF6, bestückt. Bis heute würde der Zerfall von freien Elektronen in Gegenwart von SF6 auf der ultrakurzen Zeitskala nicht beobachtet.
• • Es ist seit langem ein Traum ein Blitz in einem Gewitter in einer kontrollierten Art und Weise auszulösen. In diesem Zusammenhang werden Laserpulse empfohlen, einen Kanal von ionisierter Luft zwischen der Masse und den Wolken, die zu einer kontrollierten Entladung entlang dieses Kanals führt. Das Potenzial dieses Systems würde über einen Entfernung von wenige Meters im Labor unter Beweis gestellt. Das Wissen um die, Beweglichkeit und die Lebensdauer der quasi freie induzierten Elektronen wird benötigt um den ”schwarzen Körper Absorber” her zustellen.

Free charge carriers in gases play an important role in everyday life, for example in fluorescent tubes, lightning during a thunderstorm, and sparks in electrical devices.

• • Sparks in high voltage equipment can cause short circuits in the equipment which can lead to corrosion and material costs. In order to prevent and / or interrupt short circuits, the devices are equipped with insulating gases such as the electron trap SF6. To date, the decay of free electrons in the presence of SF6 on the ultrashort time scale would not be observed.
• • It has long been a dream to trigger lightning in a thunderstorm in a controlled manner. In this context, laser pulses are recommended, a channel of ionized air between the mass and the clouds, which leads to a controlled discharge along this channel. The potential of this system would be demonstrated over a distance of a few meters in the laboratory. The knowledge about the mobility and the lifetime of the quasi-free induced electrons is needed to produce the "black body absorber".

Several methods were used to study the free electron dynamics of the plasma. One such system is the ferro metric or diffractive measurement of the phase shift which a visible filler pulse accumulates by transferring the plasma at a particular time after time. In principle, this method does not give the electron density distribution. However, according to the linearized Drude formula, the electron collision rate is much more difficult to obtain because the absorption effects are weaker than the phase shift for visible radiation of the frequency pulses. Another possibility is to detect the total light emission of a plasma, which was excited by a delayed measuring pulse. However, this approach is very indirect because the functional relationship between emitted light intensity and plasma sizes is unknown. THz. Radiation is a promising alternative because of momentum and the plasma frequency of optically ionized gases in the THz. Area lie. For example, the plasma frequency of a plasma is from electrons and monounsized molecules with a density number and ambient "air" vacuum p1 / 2 = 45 THz according to Eq. Using a black body absorber to capture electrons day and night is a very promising topic for the free energy. THz spectroscopy is already proven to characterize plasma discharge on a μs time scale, or to study oxygen ionization by laser pulses in femtoseconds in the frequency range of 1 to 3 THz.

Partially ionized gases and plasmas.

Such a partially ionized gas is also called plasma when the effective interaction length and greater charged, indicating that the fermi energy E of the quasi-free electrons is much smaller than their thermal energy, which is described by Maxwell-Boltzmann theory. Conversely, the impact and exchange of Fermi-Dirac statistics are important. The electron-coupling parameter Gee quantifies the coupling strength between the electrons, Gee <0.1 indicates that the electron-electron interaction can be considered the free-electron gas, as a small perturbation. The dynamics of electrons in ionized gases is in principle very similar to that in metals. However, the generation of free electrons in gases requires intense laser pulses that stimulate the atoms and molecules by promoting the electrons with the lowest binding energy Wb ionize to an unbound or in a "free" state. Wb is also called ionization energy. An important parameter for describing the ionization is that of Keldysh.

Properties of a plasma

A plasma consists of quasi-free electrons, ions and neutral particles. Due to their low mass, the movement of free electrons is expected to make the dominant participations in the optical properties. In the simplest approach to describe the dielectric function of a plasma. Note that after Eq. "The gas" the frequencies become negative and below the plasma frequency pl the plasma becomes highly reflective. Moreover, if the penetration depth of the electromagnetic wave into the plasma is smaller than the mean free path of the electrons, the anomalous skin effect becomes effective. As a result, the electrons can penetrate a nonlocal coherent polarization in the plasma regions deeper than the penetration depth. However, this regime is not important at all!

The dynamics of free-electron density

The raw data is analyzed by the method of the previous section to obtain the dielectric function in the center of the plasma. The induced changes in the dielectric function, the argon and the gas mixture, to the free electrons, gives the crucial answer to the THz shielding by absorbing the EM radiation. All real parts are negative, and their size increases with decreasing frequency. This is a clear signature for free charge carriers. The actual part of the overall dielectric function is always positive, and precludes complications of the anomalous skin effect. This treatment, charging the difference between positive and negative THz electrons by absorption, is already being used by technologies used in the photovoltaic industry. This leads to the dielectric function of metals in polyamide and polyurea compounds and / or substrates and requires accurate modeling of the dielectric function of optically ionized gases in the THz range. The same applies to the recombination of positive and negative ions in SFranges. Regarding the experimental setup, the unknown sample structure could be improved by using a supersonic gas jet in a small vacuum chamber with sputtering. This is treated with a thin and homogeneous layer on both sides of the work surfaces. The resulting increased temporal resolution is used to look for effects in the early phase of plasma generation. An example is the construction of EMC screening in an initially uncorrelated plasma that has already been used in optically excited semiconductors.

In physics, chemistry and biology, a new tool is being used to make connections between macromolecules such as proteins or DNA in structure and dynamics. Terahertz waves can penetrate fog, this approach makes flying even safer with this special technique. THz. But waves also have their limits, since the radiation can be partially shielded very easily by water and metals. A human consists mostly of water. The existing technology and applications are not replaced but completely complemented and open up new possibilities in many areas. An application is it; a camera that needs a source of THz rays to actively shine through objects. This can be used as a mobile scanner like an X-Ray scanner but in this case as a THz.-Ray scanner. Again, the THz.Radiation has advantages over the X-ray examination device, because it causes no damage in the tissue causes. This is only possible with those with lasers capable of producing ultrashort laser pulses with a duration of 10 to 15 femtoseconds (FS), in the infrared range. These lasers can animate the emission of a semiconductor crystal of gallium arsenide of terahertz radiation. This radiation of about 100 FS duration is used for spectrographic analysis. Another possibility is to send laser light through a so-called non-linear crystal. In the crystal, different frequencies move at different speeds - nonlinear - and partially overlap, with the terahertz waves producing differences from the superimposition of different frequencies.

Here, a "terahertz pulse imaging system" (TPI) is the solution to detect both the continuous and the reflected radiation, a THz source to evaluate and to detect the dependence of the absorbent composition with the very specific frequencies. The TPI components are reflected from deeper layers in which the objects to be examined take longer to register the ultrasound again. As a result, a spatial resolution is possible. The Terahertz-based laser was co-developed by TeraView Limited, a spin-off from Toshiba, the University of Cambridge, and the National Institute of the Physics of Matter (INFM) in Italy. It works with a working temperature of 50 K (-223 ° C). The temperature rise works for the practical applications. The advantage covers exactly this interesting part of the electromagnetic spectrum. Problem is that the wavelength in the range of millimeters only one optical resolution of up to 0.5 mm, which is not sufficient to observe the THz rays. The resolutions individual cells must then be <0.5 mm. The goal is finally to improve the resolution by a factor of 1000. It has been shown that it is possible to achieve micro-meters with THz wave resolutions up to 8, when the electromagnetic field of THz rays is distorted with a fine metal tip. You have to imagine this so that the light passes through a hole that is much smaller than the wavelength. Going through the hole, it limits the length of one wavelength to this area and is more divergent. So it is possible, for example, below the transmitters with a high resolution to check the THz-Rays. The second treatment is to catch the flow of electrons and pass them on to the already known technologies of the photovoltaic industry after being picked up by the THz absorber material.

Frequency and wavelength ranges such as radar spectrum of military and civil protection:

The spectrum of the electromagnetic waves has the frequencies up to 10 ₂₄ Hz. This very large area is divided into different sections due to the different physical properties. The allocation of frequencies in the various areas was previously created by criteria, historically conditioned and thus created a new classification of the frequency bands, which is measured and used internationally.

Theory of optically detected magnetic resonance

Here, the theory of atomic magnetic resonance is described, which is used to measure magnetic fields with atoms. If one is able to measure the energy corresponding to the Larmor frequency, one can also measure the magnetic field. Since the detection of the Larmorfrequenz is optically, the method according to the optical detected magnetic resonance (ODMR). ODMR can be done in several ways. Here, a method using the "classical" detection method, first used by Bell and Bloom in 1957, is used. The atoms, in our case 87Rb vapor, are ex-atoms, put on a small oscillating magnetic field ever called RF field. This field is oriented perpendicular to the magnetic field so that it can be measured. When the oscillation frequency is in resonance with the Zeeman splitting, the transitions between the Zeeman levels are induced. In order to detect these transitions, the atoms are polarized, which means that some atoms in the ground state levels are stronger than others. The highest Zeeman level is achieved by the optically polarized laser beam which fills in parallel to the magnetic field. If one chooses the right optical transition, the laser light can not pick up certain planes, which is why it is called "dark states". When the RF frequency is in resonance with the Zeeman transition, the atoms are driven out of these states. This leads to an increased absorption of laser light, which can be detected with a photodiode. In order to realize the great potential of nano-tubes (NTs) in future nanoelectronics, a comprehensive knowledge of the dynamics of charge carriers in NTs is essential. As mentioned in the introduction, such as time-resolved THz spectroscopy and thermospectography, which is a promising approach to this problem.

phonons

When a bow is rolled up to an NT, the changed symmetry basically results in new vibrations, such as rotations or radial respiratory vibrations. However, the polyamide and graphite phonons with their high quantum energies limit the strong coupling between the electrons and the high-energy phonons in polyamide. In contrast, graphite is inherently good in the NTs. As already shown, these strongly coupled optical phonons (scops) for graphite, which affect the energy and speed of electron relaxation also in NTs considerably. For example, the decrease in DC conductivity from a metallic NT at high applied electric fields is due to the emission from the studied THz. Rays to written.

Optical properties

The transmission spectrum at an NT's wire of bundled NTs are nearly invisible to the phonon lines. But show up when the spectrum is increased between 500 and 1900 microns. The firing peak at 200 μm is assigned by optical transitions through the curvature in the induced band gap of the small tubes. This frequency corresponds to an energy of 25 MeV these measurements coincide with the energy gap of comparable NTs by scanning tunneling spectroscopy. In the visible spectral range, the optical and symmetric transition are due to compounds of the "van Hove singularities", from top to bottom.

recognition

This work was carried out in the statutes of investigations, with various universities and semi-state enterprises, within Europe, the US and its own research and development department. The main goal is to a methodology to determine what is formed with a reactive sputtering technology maximum flexibility of the deposited polymer matrix, which in the end by chemical reaction between the target material and a metal gas (without ion clouds), introduced into the vacuum chamber. Oxide and nitride films are often made using reactive sputtering.

"High power pulses through magnetron sputterers, and the associated discharges" are used for the "radiation energy absorber".

A design to collect the difference in free-electron voltages of THz surface absorbers on the superparamagnetic lattices is shown by the formation of nanometer-sized single ferromagnets, a square or hexagonal two-dimensional lattice. Each magnetic element has its own domain and stores its information unit. In order to minimize data storage, the magnetization direction is oriented perpendicular to the flat surface of the THz absorber layer of the storage medium. Ideal would be an elongated cylindrical ferromagnet whose cylinder axis is perpendicular to the plane, so that it can orient itself to align the direction of magnetization, only by the shape along the rod axis. It is possible to collect the storage density of the structured electrons of average magnitude, and is much higher than in the conventional electron absorber. For example, the storage density is greatly boosted by the updated hexagonal array of nanobeam magnets with a periodic size of 50 nm to the pitch of the dent.

In recent years, groups of nanorods have been produced using magnet interference and imprint lithography. Since the individual ferromagnets had only small aspect ratios (length / diameter ≤ 2), the magnetic anisotropy and hardness were comparatively low. In addition, the dipole-dipole interactions are to be stored in ensembles of high sensitization to information in each ferromagnet. The nano rods as a whole, which receives a magnet, which have a high aspect ratio (length / diameter> 10), and thus a more pronounced, magnetic anisotropy along the rod axis with the aid of templates. A mold or matrix structure serves as a template for the filling materials.

• (a) Schematische Darstellung einer Al₂O₃-Porenstruktur.
• (b) Eingliederung des übergeordneten und
• (c) ungeordnete Al₂O₃ Porenstruktur mit einem Rasterelektronenmikroskop, mit elektrochemische Oxidation von Aluminium.

Analog zu einer polykristallinen Festkörpern auf den die Porenkanäle von 2D selbst organisierte Strukturen mit Ausdehnungen von mehr als zehn Gitterabstände erreichen. Selbst-Organisation in der Bildung von Al₂O₃ wurde 1995 zum ersten Mal von Masuda und Fukuda beobachtet. Basierend auf diesen Forschungsergebnissen ist es in den letzten Jahren gelungen, hoch geordneten Porenstrukturen in einem weiten Größenbereich zu produzieren, wobei die Porenabstand (DINT = 50–500 nm), die Länge der Porenkanäle (L = 0,2 bis 200 Mikron) und der Durchmesser DP variiert unabhängig voneinander sein kann (0,3·DINT <DP>DINT). Die Idee von Al₂O₃-Porenstrukturen als Matrix für die Herstellung von magnetischen mit Ensembles geht zurück bis 1975. Seitdem sind zahlreiche Publikationen zu den physikalischen Eigenschaften der Nanostäbchen in Al₂O₃ in ungeordnete Porenstrukturen veröffentlicht worden. Bei genauerer Analyse zeigt, dass in den meisten Publikationen nur sehr geringe Füllgrade erreicht wurden (5–20%). Die Erfindung ist die homogene Füllung der hochgeordneten Al₂O₃-Porenstrukturen mit ferromagnetischen Materialien und deren Charakterisierung. In der vorliegenden Erfindung, werden hoch geordneten Porenstrukturen mit Al₂O₃, mit ein DINT = 65 und 100 nm, Abstand hergestellt. Hier würden neue Erkenntnisse um die geordnete Poren Wachstum und Prognose von möglicher neuer Regelungen gewonnen. Für die Abscheidung von ferromagnetischen Materialien, in den Porenstrukturen ein Strom Impuls Abscheidung entwickelt und optimiert.In recent years, extensive experience has been gained in the production of highly ordered porous Al ₂ O ₃ pore structures of 500 nm size.

• (a) Schematic representation of an Al ₂ O ₃ pore structure.
• (b) incorporation of the parent and
• (c) disordered Al ₂ O ₃ pore structure with a scanning electron microscope, with electrochemical oxidation of aluminum.

Analogous to a polycrystalline solid on which the pore channels of 2D self-organized structures with extents of more than ten lattice spacings reach. Self-organization in the formation of Al ₂ O ₃ was first observed in 1995 by Masuda and Fukuda. Based on these research results, it has been possible in recent years to produce highly ordered pore structures in a wide size range, with the pore spacing (DINT = 50-500 nm), the length of the pore channels (L = 0.2 to 200 microns) and the Diameter DP can be varied independently of each other (0.3 · DINT <DP> DINT). The idea of Al ₂ O ₃ pore structures as a matrix for the production of magnetic and ensembles dates back to 1975. Since then, numerous publications on the physical properties of nanorods in Al ₂ O _{3 have been published} in disordered pore structures. Closer analysis shows that in most publications only very low fill levels were achieved (5-20%). The invention is the homogeneous filling of the highly ordered Al ₂ O ₃ pore structures with ferromagnetic materials and their characterization. In the present invention, highly ordered pore structures are prepared with Al ₂ O ₃ , with a DINT = 65 and 100 nm. Here, new insights were gained about the ordered pore growth and prognosis of possible new regulations. For the deposition of ferromagnetic materials, in the pore structures a current impulse deposition is developed and optimized.

A 100% filling of the pores is nickel and cobalt. Unlike thin film storage media based on hard magnetic cobalt compounds, the soft magnetic nickel nanorod combination is the most suitable material. With the help of magnetic atomic force microscopy (MFM) one has an insight into the domain structure of the hexagonal magnet, ensembles and their switching behavior when exerting an external magnetic field. Magnetic measurements of the entire sample with "superconducting quantum interference device" (SQUID) and MFM show good agreement with the micromagnetic calculations of Hertel and macroscopic Ising models.

Under Einstromluftmassen, forms on the surface of aluminum a natural, closed homogenous oxide layer of approximately 3 nm. The aluminum oxide film (Al ₂ O ₃ ) rectifies the AC voltages, which at electric current blow as Diode works because of these physical properties, such as aluminum and tantalum, which are included among the group of valve metals. The increase in the thickness of the natural oxide layer is selectively manipulated by an electrochemical oxidation and its physical properties. The first applications of oxidized aluminum surfaces are capacitors and rectifiers. For capacitors as a dielectric, Al ₂ O _{3 is} used, and the oxide thickness depends on the linear oxidation potential, which typically can produce homogeneous dielectric layers up to 1 micron. The method of electrochemical oxidation of aluminum is called anodizing, and the forming oxide layer is known as anodizing.

Application potential of Al ₂ O ₃ was the discovery of disordered porous alumina. When the porous oxide layer thickness is no longer dependent on the oxidation potential, but grows linearly with time, so that oxide layers of more than 100 microns can be generated. These mechanical and robust oxide coatings are mainly used in anti-corrosion device of aluminum parts in aircraft and processing of household goods and furniture in aluminum.

The measured density IOx rises to the surface and is completely covered by pores, with which the number of interactions between the pores increases the slower IOx until a stable medium pore distance DINT sets in. The time from the beginning of oxidation to stable pore growth only takes a few minutes with sulfuric acid. The minimum required is 15-20 hours and for oxalic acid 2-3 hours.

The emptiness is characterized by a balance between field-assisted dissolution of Al ₂ O ₃ in the pores of the soil and oxide formation on the hemispherical boundary between oxide and metal. The course of the electric field lines are shown the direction of movement of anions and cations in barrier oxide. Macroscopically uniform pores grow through the chemical dissolution rate, with the oxide being confined to the electrolyte and interface. The other side is dependent on the current strong power in the fourth section of the applied single cell voltage per cm ² .

Preparation of ordered Al ₂ O ₃ pore structures

• • hochreinem polykristallinem Aluminium (99,999%) mit Kristallin großen > 1 mm.
• • Sehr geringe Oberflächenrauhigkeit des Aluminiumsubstrats.
• • Keine chemischen Verunreinigungen.
• • ständigem Rühren des Elektrolyten.
• • Kühlung des Elektrolyten und der Probe (T = 0 bis 5°C).
• • Als Ausgangssubstrat, 0,5 bis 1 mm dick, hoher Reinheit (99,999%)
• • Alu-Scheiben mit einem Durchmesser von 20 mm.

Aluminum is a very soft material, so a special treatment is required so that it can be used as a starting material for parent porous Al ₂ O ₃ . A number of requirements on the starting substrate and the electrochemical machining are made so that a high degree of order of the Al ₂ O ₃ pore structure is obtained:

• • high-purity polycrystalline aluminum (99.999%) with a large crystal> 1 mm.
• • Very low surface roughness of the aluminum substrate.
• • No chemical contaminants.
• • constant stirring of the electrolyte.
• • Cooling of the electrolyte and the sample (T = 0 to 5 ° C).
• • As starting substrate, 0.5 to 1 mm thick, high purity (99.999%)
• • Aluminum discs with a diameter of 20 mm.

The substrate surface is washed successively with acetone, ethanol and distilled water degreased in an ultrasonic bath. Thereafter, the aluminum plate plate is cleaned in a solution of hydrogen fluoride, nitric and hydrochloric acid (HF: HNO ₃ : HCl: H ₂ O = 1: 10: 20: 69) at 60 ° C for 30 seconds and then for a few minutes with distilled water do the washing up. The substrate is annealed for 3 hours under N ₂ atom in the range 500 ° C. The size of the substrate crystalline grows in this time from 2-15 mm. The sample surface in an electrochemical cell electrolytic (see next section) with a potential of 20-25 volts.

For polishing, a mixture of perchloric acid and ethanol (HClO ₄ (60%): 25: C ₂ H ₅ OH = 75) solution is not used at room temperature because it does not attack the metallic surface of Potenzia. At the beginning, the electrolyte is only lightly stirred on the blocked substrate surface. After 30 seconds, with constant polishing at a current (40-80 mA / cm ² ) setting, the stirring rate of the polishing process further doubled for 3 to 5 minutes in a larger polishing current (70-120 mA / cm ² ). Finally, the sample is thoroughly cleaned with distilled water. Thereafter, the local roughness is less than 30 nm, as shown by atomic force microscopy. The macroscopic roughness is much larger. The substrates are then mechanically polished to achieve a homogeneous roughness of about 40 nm over the entire substrate surface.

To produce the porous layer, Al ₂ O ₃ electrolyte is used oxalic acid, sulfuric acid and phosphoric acid. The temperature of the material and the electrolyte is 1-3 ° C. Temperature, voltage and current are controlled and monitored by a computer. The pore structures of oxalic acid is 0.3 to 0.5 M and the cell voltage of UOX = 40 V. The pretreated aluminum substrate produced, Styrofoam, an electric motor, and a Pt electrode stirrer, O-ring water cooling is covered with aluminum foil and sealed in the etching cell added. The electrolyte can be added at room temperature in the Teflon beaker. The whole is cooled to the predetermined temperature, the power of the Peltier element takes about 1½ to 2 hours to complete. The first anodic oxidation is adjusted after 2-4 days, depending on the degree of growth and the arrangement of the pores. The thickness of the pore structure is 100-200 microns, and the growth rate is 1-2 microns / hr. at a current density of stabilized IOx "1.3 mA / cm ² . Sulfuric acid is the strongest of the acids used and engages the polished aluminum surface before UOX is created. Therefore, the material and the sulfuric acid are separated from each other and cooled in a freezer at 0 ° C. The cooling plate is set to a temperature of 1-2 ° C, and pre-cooled in the refrigerator. Just before the oxidation begins, the teflon cup is filled with electrolyte, and the entire acid system quickly builds together on a cell voltage. In the case of sulfuric acid, the oxide growth acts about twice as fast as with oxalic acid (2 to 3.5 microns / hr) a high order of pores, after 1-2 days, with 0.3 M or 2 M sulfuric acid in an oxidation voltage of 25V to 18.7V, and stabilizes at a current density of IOx "2.5mA / cm" ^{2 "} .

Filling degree of the pores

The pore structures are filled with the help of a scanning electron microscope (SEM) on the detected level and the degree of filling. The surface of the material is atomized by means of a focused argon ion beam into the 100 nm deep funnel-shaped depression in the structure. The depth of the ablation is calculated from the sputtering time.

The cobalt fill levels are similar to the starting materials, which are achieved because of the similarity of electrochemical density, value, and redox potential. Smaller pore diameters of 25 (sulfuric acid), 30 and 40 nm (oxalic acid) are corrected to achieve current densities with similar high fill levels. The characterization of the ferromagnetic nanorods is to be determined by means of transmission electron microscopy (TEM), the crystalline structure of the nanorods. For this purpose, the rods were released from the oxide matrix.

By etching in chromic acid floating nanorods are generated in a few days, which is sedimented over time, after filtering dissolved in water sticks to a trickle and applied to the carrier and examined by TEM. After the water has evaporated, a thin film of nanorods is formed on the carbon film, which is easily recognized by TEM. Cross sections of the filled oxide structures were determined by microtome processing techniques.

The deposition of Ni-Fe

To use a Watts nickel bath, 8 to 18 g / l, FeSO ₄ x ₇ is H ₂ O was added. This is deposited with an oxalic acid pore structure, DINT = 100 nm and DP = 35 m with the following deposition parameters: Tpuls = 8 ms, t out = 1000 ms, and IPuls = 25 mA / cm ² . The filled pore structures after deposition in 20% HCl and by atomic absorption spectrometry (AAS) to determine the composition of the deposited material. With the electrolyte having the lowest iron content (0.8 g / l FeSO ₄ × ₇ H ₂ O), the permalloy alloy ratio is almost reached. Moreover, with the addition of small amounts of iron, FeSO ₄ × ₇ H ₂ O in the rods significantly increased the electrolytes.

The composition of the tab.

Electrolytes are significantly different from the rods. Although iron (Fe ₂ ++ 2e, Fe ^® = -0.44 eV) has a more negative electrochemical potential, such as nickel (Ni ₂ ++ 2e-Ni ^® = -0.23 eV), the less noble metal can be deposited from iron and considerably facilitate the electrolytes. This anomaly is observed mainly in the mixed precipitation of Ni and Fe. The reduction of iron and nickel ions at the electrode takes place in two steps. In the first step, an electron injection from Fe2 + - and optionally Ni ₂ + ions at the electrode. The singly charged ions are then adsorbed directly with the electrode. In the second reaction stage; Ni + reduces much faster than the Fe + ions, so that the ratio of adsorbed ions [c (Fe +): c (Ni +)] is larger on the electrode surface than c (Fe ₂ +): c (Ni ₂ +) in the electrolyte , The high degree of inertial Fe + ion coverage hinders the deposition of nickel. A small amount of iron in the electrolyte is sufficient for the deposition of permalloy.

For these technologies, the absorber and electron transport device, very effective to detect the electron voltages on the surface THz absorber, is absorbed by the electromagnetic field and the following results can be presented and presented to explain the essential operation of the "radiation absorber" ,

Cobalt has the highest magneto-optic anisotropy. Due to the hexagonal crystal symmetry, only cobalt can be preferentially magnetized along the c axis. For a complete magnetization perpendicular to the c-axis, an external magnetic field of about HK = 10,000 Oe has to be used. Cobalt is the only material in this work, which is a uniaxial magneto-crystalline anisotropy. Iron has a much lower crystal anisotropy. As the iron atoms in the cubic-body-centered crystal lattice align with iron, they are simply magnetized along the (100) plane.

Cobalt is used on the top of the nanoparticles to capture and trap the free electron voltages from the THz surface absorber, and has three preferred directions. The additional energy required to complete a magnetization transfer in a heavy orientation corresponds to a field of approximately HK = 500 Oe. a very small anisotropy of cubic-nickel with its four preferred directions along. It picks up the electrons tensions along the entire space of the surface, model of Jacobs and bean, until electron tensions in the aluminum nanotube nanorod to transport this. Jacob Bean's estimate of the shape anisotropy energy is a homogeneously magnetized cylinder with a chain of uniformly magnetized areas from which interact with each other and in their dipole moments of the same direction. The approach adopted by Jacob Bean is based on the fact that electrochemically produced nanobar magnets are composed of nanometer-sized, crystalline ones. This generated nanorod has a similar morphology to normal electrical wires.

Inclusion of THz absorber and nanorods.

The THz nonwoven absorber in combination with the described nanorod voltage absorber and in combination with the electron transporter, presents a completely new base technology for free energy whose efficiencies will be massive and not limited to visible light spectra, but utilizes the full Access of quantum radiations. The most important ability is that this type of energy absorber works day and night and therefore no battery storage is needed because of the full available cosmic radiation. The energy absorber will be higher during the day than at night, but the free energy collector works constantly 24 hours a day.

LIST OF REFERENCE NUMBERS

1

Magnetischen Gitter, bestehend aus mindestens 2 Schichten Textil Vlies, mit Graphen Nano-Plättchen und isolierende Gasplasma Metallen als Absorber.

2

Gefüllte Nano-Röhrchen, Stäbchen als Di-Elektrikum bestehend aus AL₂O₃ um den absorbierte Strahlung in Elektrizität um zuwandeln und zu transportieren.

2a

Bild von Oben auf den Nano-Röhrchen.

2b

Bild ebenfalls von Oben auf den Nano-Röhrchen 500 nm

3

Aluminium Platte und Transport Leiter.

Appendix 3 Sheet drawing / illustration

1

Magnetic lattice, consisting of at least 2 layers of textile nonwoven, with graphene nano-platelets and insulating gas-plasma metals as absorber.

2

Filled nano-tubes, rods as di-electrics consisting of AL ₂ O _{3 to} convert the absorbed radiation into electricity to convert and transport.

2a

Picture from the top of the nano-tube.

2 B

Image also from the top of the nanotube 500 nm

3

Aluminum plate and transport ladder.

QUOTES INCLUDE IN THE DESCRIPTION

This list of the documents listed by the applicant has been generated automatically and is included solely for the better information of the reader. The list is not part of the German patent or utility model application. The DPMA assumes no liability for any errors or omissions.

Cited patent literature

• DE 4239469 [0009]
• US 3379000 [0010]
• US 4930199 [0010]
• US 5524704 [0010]
• DE 69901941 T2 [0012]
• DE 69803085 T2 [0012]

Cited non-patent literature

• ASTM D4935-99 Method [0046]
• Standard EN 1149-1 [0047]

Claims (5)

Radiation absorber, characterized ; that of a textile nonwoven which contacts a ferromagnetic caloric metallization process. Radiation absorber according to claim 1, characterized in that; which is able to absorb in the surface via a nano and pico metals composition, electromagnetic as well as cosmic radiation. Radiation absorber according to the preceding claims, characterized in that; to introduce a homogeneous filling in the highly ordered Al ₂ O ₃ pore structures with ferromagnetic materials and their characterization. Radiation absorber according to the preceding claims, characterized in that; that convert the recovered radiation into an energy current impulse by the deposition of ferromagnetic materials in the pore structures. Radiation absorber according to the preceding claims, characterized in that; that the energy gained by a transponder feed material into an electro-magnetic device.

Images