DE1925194B2 - Stabiler metallfilm widerstand - Google Patents

Stabiler metallfilm widerstand

Info

Publication number
DE1925194B2
DE1925194B2 DE19691925194 DE1925194A DE1925194B2 DE 1925194 B2 DE1925194 B2 DE 1925194B2 DE 19691925194 DE19691925194 DE 19691925194 DE 1925194 A DE1925194 A DE 1925194A DE 1925194 B2 DE1925194 B2 DE 1925194B2
Authority
DE
Germany
Prior art keywords
metal film
film resistance
stable metal
stable
resistance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE19691925194
Other languages
English (en)
Other versions
DE1925194C (de
DE1925194A1 (de
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of DE1925194A1 publication Critical patent/DE1925194A1/de
Publication of DE1925194B2 publication Critical patent/DE1925194B2/de
Application granted granted Critical
Publication of DE1925194C publication Critical patent/DE1925194C/de
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques
    • H01C17/12—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin film techniques by sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/18—Metallic material, boron or silicon on other inorganic substrates
    • C23C14/185—Metallic material, boron or silicon on other inorganic substrates by cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/006—Thin film resistors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31678—Of metal
DE19691925194 1968-05-22 1969-05-17 Stabiler Metallfilm-Widerstand Expired DE1925194C (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US73118368A 1968-05-22 1968-05-22
US73118368 1968-05-22

Publications (3)

Publication Number Publication Date
DE1925194A1 DE1925194A1 (de) 1969-11-27
DE1925194B2 true DE1925194B2 (de) 1971-09-30
DE1925194C DE1925194C (de) 1973-04-12

Family

ID=

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2262022A1 (de) * 1971-12-30 1973-07-05 Western Electric Co Verfahren zur einstellung des widerstands-temperaturkoeffizienten

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2262022A1 (de) * 1971-12-30 1973-07-05 Western Electric Co Verfahren zur einstellung des widerstands-temperaturkoeffizienten

Also Published As

Publication number Publication date
BE729803A (de) 1969-08-18
GB1265069A (de) 1972-03-01
NL6907549A (de) 1969-11-25
FR2009104A1 (de) 1970-01-30
JPS524752B1 (de) 1977-02-07
US3627577A (en) 1971-12-14
CH495040A (de) 1970-08-15
DE1925194A1 (de) 1969-11-27

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Legal Events

Date Code Title Description
C3 Grant after two publication steps (3rd publication)
E77 Valid patent as to the heymanns-index 1977
8339 Ceased/non-payment of the annual fee