DE1764098A1 - Ion source - Google Patents

Ion source

Info

Publication number
DE1764098A1
DE1764098A1 DE19681764098 DE1764098A DE1764098A1 DE 1764098 A1 DE1764098 A1 DE 1764098A1 DE 19681764098 DE19681764098 DE 19681764098 DE 1764098 A DE1764098 A DE 1764098A DE 1764098 A1 DE1764098 A1 DE 1764098A1
Authority
DE
Germany
Prior art keywords
ion source
electrode
takes place
ions
discharge
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19681764098
Other languages
German (de)
Inventor
Robert Evrard
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from FR101901A external-priority patent/FR1518219A/en
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of DE1764098A1 publication Critical patent/DE1764098A1/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
    • H01J41/18—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of cold cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
    • H01J41/18—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of cold cathodes
    • H01J41/20—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of cold cathodes using gettering substances

Description

Die Erfindung "bezieht sich auf eine Ionenquelle, bei der Ionen in einem hochfrequenten elektrischen Feld ersseugt werde».The invention "relates to an ion source at the ions are absorbed in a high-frequency electric field ».

Bei den "bekannten Ionenquelle» erfolgt die Hochfrequeas· entladung in einem Raum, der einen höheren Druck aufweist, als der Beschleuniguagaraum, weil sonst nioht genügend Ionen erzeugt werden» Dies erfordert die Einhaltung eines ständigen Öaaflussea vom Ioniala» rungarauo sum Beechleunlgungsraum. Dies bringt mit ei oh, dass im all·» gemeinen nur kleine Xonenextraktionsoffnungen angewandt werden können und dass die Ausbeute dieser lonenquellen ziemlich niedrig ist*With the "known ion source" the high frequency takes place discharge in a room that has a higher pressure than the Accelerator aga space, because otherwise not enough ions will be generated » This requires the maintenance of a constant flowa from the Ioniala » rungarauo sum acceleration space. This brings with ei oh that in space · » common only small Xonenextraction openings can be used and that the yield of these ion sources is quite low *

Die Erfindung bezweckt nun, eine gunstigere Anordnung zu achaffen.The invention now aims to achaffen a more favorable arrangement.

In einer Ionenquelle, in der Ionen in einer iioohfre*» quenten elektrischen Entladung gebildet werden, erfolgt naoh der I3r~ findusg dies« elektrische Jhtladung zwieohen uwei Elektroden, vo»In an ion source, in which ions are in an iioohfre * » quent electrical discharge is formed, takes place near the I3r ~ found this "electrical charge between and two electrodes, vo"

109817/0618109817/0618

BAD ORIGINAU 'BAD ORIGINAU '

PHH. 27 31. A.PHH. 27 31. A.

die ein· sekundär emittierend und die andere gitterformig ist, und wobei der gegenseitige Abstand, die Amplitude und die Frequenz des elektrischen Feldes derart sind, daaa emittierte SekundaVelektronen naoh nur einer Period« wieder auf die S©kunda"reaissio»aelektrode zuriiofckehre». one of which is secondary emitting and the other is lattice-shaped, and where the mutual distance, the amplitude and the frequency of the electric field are such that emitted secondary electrons After only one period "return to the S © kunda" reaissio "electrode".

Bei dieser Anordnung erfolgt die Bildung von Elektronen An einer Elektrode und evar unabhängig vom Gasdruck wenn die Entladung in Gas einaal gesundet ist. Bei der bekannten Anordnung let ein ziemlich hoher Gaedruafc erforderlich um die Entladung im Gange zu halten.With this arrangement the formation of electrons takes place at an electrode and evar independently of the gas pressure when the discharge is healed in gas once. With the known arrangement, let a pretty high pressure required to keep the discharge going.

Bei einer erfindungagetnÄssen Anordnung bietet ein Druok niedriger al·In an arrangement according to the invention, a pressure lower than

-4 beispielsweise 10 Torr keine Schwierigkeit fur die Einhaltung der-4 for example 10 torr no difficulty in complying with the

Elektronenbildung und damit der Ionisierung des Gases.Electron formation and thus the ionization of the gas.

lan Ausführungabeispiel der Erfindung ist in der Zeiohnung dargestellt und wird im folgenden näher beschrieben.An exemplary embodiment of the invention is shown in the drawing and is described in more detail below.

Die Zeiohnung zeigt einen Sohnltt durch eine eohematiMb· Elektrode»a»ardnung für eine erfindungsgamässe Ionenquelle.The newspaper shows a son through an eohematiMb · Electrode for an ion source according to the invention.

In der Figur ist 1 eine hohle Elektrode mit einem HaIbmeaeer von 12 cm, deren Oberfläche aua oxydiertem Silber besteht* 2 let ein weitmaschiges Kupfergitter, konzentrisch zu I1 mit einem HaIb- »eseer von 9 osu Eine zueätzliohe Elektrode 3 ist im Zentrum von 1 und 2 angeordnet und wird furch eine Quarzplatte 4 unteretStit. Eine Be-! •ohleunigumgielektrode ist mit 5 angedeutet* Im Baum awisehen den Elektrode» befindet sioh ein Deuteriua-Tritiua-Oemisch mit einem Druok von 10*"^ iPorr. 2^ieohen de» Elektroden 1 und 2 liegt eine Wechselspannung ton etwa 40 MB·· und IJjOT Amplitude. Elektrode 1 ist gegenüber 2 500 V negativ« 5 kann gegenüber 3 einige sehn kV negativ sein. Xk Raum «wischen 1 und 2 gebildete Ionen werden über Elektrode 3 in denIn the figure, 1 is a hollow electrode cm with a HaIbmeaeer of 12, whose surface is aua oxidized silver * 2 let a wide-mesh copper grids, concentric to I 1 with a HaIb- ESEER "of 9 Osu A zueätzliohe electrode 3 is in the center of 1 and 2 and is placed under a quartz plate 4. A be-! • ohleunigumgielektrode is indicated with 5 * In the tree awisehen the electrode "is SiOH a Deuteriua-Tritiua-Oemisch *" ^ iporr 2 ^ ieohen de "electrodes. 1 and 2 is a Druok 10 an AC voltage ton about 40 MB ·· and IJjOT amplitude. Electrode 1 is negative with respect to 2,500 V « 5 can be negative by a few kV compared to 3. Xk space« Ions formed between 1 and 2 are transferred via electrode 3 into the

Beeohleüttigungeraura der Elektrode 5 gebracht. Die Anordnung eignet »ichBrought to the electrode 5 anti-pollution aura. The arrangement is suitable »I

fttr eint» Bieutronengenerator.fttr eint »Bieutrongenerator.

109817/0618 BAB0RlQlNAL 109817/0618 BAB0RlQlNAL

Claims (1)

PM. 2731. A, P-ATE IT T A II S P H TJ C H .PM. 2731. A, P-ATE IT T A II S P H TJ C H. 1. Ionenquelle, in der in einer hochfrequenten elektrischen1. Ion source in which in a high frequency electrical Entladung Ionen gebildet werden, dadurch gekennzeichnet, dass diese Entladung zwischen zwei Elektroden erfolgt, von denen die eine sekundär emittierend und die andere gitterformig ist, und wobei der gegenseitige Abstand, die Amplitude und die Frequenz des elektrischen Feldes derart sind, dass emittierte Sekundärelektronen naGh nur einer Periode wieder auf die Sekundäremissionselektrode zurückkehren.Discharge ions are formed, characterized in that this discharge takes place between two electrodes, one of which is secondary emitting and the other is lattice-shaped, and wherein the mutual distance, the amplitude and the frequency of the electric field are such that emitted secondary electrons naGh only return to the secondary emission electrode one period. 10 9 8 17/0618 BAD10 9 8 17/0618 BAD LeerseiteBlank page copycopy
DE19681764098 1967-04-07 1968-04-02 Ion source Pending DE1764098A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR101901A FR1518219A (en) 1966-04-09 1967-04-07 Device for recording and reproducing a color television signal

Publications (1)

Publication Number Publication Date
DE1764098A1 true DE1764098A1 (en) 1971-04-22

Family

ID=8628387

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19681764098 Pending DE1764098A1 (en) 1967-04-07 1968-04-02 Ion source

Country Status (4)

Country Link
US (1) US3532915A (en)
DE (1) DE1764098A1 (en)
GB (1) GB1225674A (en)
NL (1) NL6804401A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2550681B1 (en) * 1983-08-12 1985-12-06 Centre Nat Rech Scient ION SOURCE HAS AT LEAST TWO IONIZATION CHAMBERS, PARTICULARLY FOR THE FORMATION OF CHEMICALLY REACTIVE ION BEAMS
US4675145A (en) * 1984-08-16 1987-06-23 The United State Of America As Represented By The United States Department Of Energy Magnetically insulated diode for generating pulsed neutron and gamma ray emissions
US6441569B1 (en) 1998-12-09 2002-08-27 Edward F. Janzow Particle accelerator for inducing contained particle collisions

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2570124A (en) * 1949-10-20 1951-10-02 Rca Corp Positive ion beam gun
US2956192A (en) * 1959-01-02 1960-10-11 Eitel Mccullough Inc Gettering electron gun

Also Published As

Publication number Publication date
GB1225674A (en) 1971-03-17
US3532915A (en) 1970-10-06
NL6804401A (en) 1968-10-08

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