DE1496807A1 - Electroplating device - Google Patents

Description

Unetr Ztiohinr G / mo * - '

DIPL-ING. GRALFS D R. M ANIT-Z

DR. DEUFEt

PATENTA MV / ALTE 33 BRAUNSCHWEIQ

AT BOBQERPARK 8

MOIOHS COBPOSAIIOK Detroit / Michigan / USA

Electroplating device.

The invention "relates to a device for , Electroplating in a channel with closed electrolyte circulation around a fixed partition, a rotating impeller being provided in the channel.

In a known device of this type is an am End of a screw that is positioned obliquely or horizontally in the channel and is used to move the electrolyte used, which, however, can only capture a small part of the liquid and thus a very unequal * moderate speed in the electrolyte and thus a non-uniform flow is generated.

It is also known to have a Badialpunpenrad in a partitioned chamber of the channel for the electrolyte circulation

_o _. _{Λ Λ Λ} ORIGINAL BATHROOM

μ 909829/1239

New documents (Art. 7, Paragraph 1, Paragraph 2, No. 1, Clause 3 de ₉ Amendment ·. V. 4.9.19 y

to provide with a vertical shaft «that drives the Liquid "worried. The inflow - to the pump and the The pump drains through simple openings in the wall of the chamber that does not close the pump. Here, too, an uneven flow is generated.

The aim of the invention is a device of the type explained above, in which a very uniform flow generated in order to be able to increase the working speed considerably * /

According to the invention, this object is achieved in that a known per se bladed impeller Eadial pump is provided, which runs with a vertical axis of rotation in a housing that is called logarithmic Spiral housing is formed and has an outlet, the width of which corresponds essentially to the channel width.

In the case of the pump impeller, the ratio of height to diameter is preferably approximately 0.4. After a Another feature is the inlet to the pump housing in the housing bottom or on the side and has

a cross-section that corresponds to the cross-section of the impeller inlet is equivalent to. 909 929/12 39

Documents (Art. 7, Paragraph 1, Paragraph 2, No. I, Clause 3 of the Amendment Act of 4.9. IS

BATH ORIGINAL

Near the outlet of the impeller housing is after Another feature is preferably a wire mesh screen arranged to smooth the flow

Used to divert the electrolyte to the one from the radial pump distant edge of the SE baffle are after a Another feature of the invention adjustable guide vanes intended. '

Finally, according to another feature, with a ratio of depth to width of the channel exceeding the value 1.5, an additional bladed radial pump can be provided for each integer amount, the pumps being at a distance from one another in the vertical direction «

909829/1239

BAD OBIGEM ". ^ _2Uß y publishers lArt. 7 ι 1 Para. ^ No. ι Salt 3 de« Anderunjsges. V. 4.9. IS

U96807

One embodiment of the invention is as follows described and illustrated in detail with reference to the drawing.

FIG. 1 is a perspective view of a conventional iDank for electroplating, modified according to FIG of the invention,

Fig. 2 is a horizontal section, in perspective Representation, through Fig. 1, /

3 is a view taken along line 5-3 in FIG. 2; and

Figure 4 is a perspective view through a another embodiment of the invention.

In Fig. 1 an open, rectangular tank 12 is divided in the middle by a partition wall 10, which is just in front of the End walls ceases, whereby in the (thanks to a ring-shaped Flow channel 14 created for the electroplating solution will. A vertically mounted air pressure centrifugal wing. wheel 16 with large volume delivery, which in one

909829/1239

INSPECTED

H96807

logarithmic volute casing 18 is enclosed » ensures an even, rapid flow of the ■ electroplating solution in the open channel 14 · A Wire mesh 20 near the outlet 22 of the pump housing 18 helps stabilize the flow of the solution, so that he himself in the hook of the outlet 22 evenly is. Baffles 24 on the opposite one The end of the bulkhead stabilize the flow around the end .the partition. You baffles 24 can be fixed or through Rods 26 and 28 may be adjustable to precisely control the flow of the electroplating solution. The inlet (not shown) for the backflow of the electroplating solution into the impeller pump 16 is located on its Bottom, another inlet 30 in the side of the " Housing 18, below the level of the impeller 16, or in the lower part of the wall 52. Per inlet 30 is preferred short and wide and has a cross-section roughly equal to the impeller inlet. Busbars, Anodes »plating hangers, power supply etc. are not shown, because they are in the usual way Type used »

Through the present invention is primarily intends to make the known open plating tanks more common

909829/12 39

BATH ORIGINAL

U96807

Electroplating machines can be modified so that high speed plating in them without major
Changes to the machines are enabled. if
Also, the invention is primarily intended for use in rectangular tanks, it may nevertheless also with any tank shape, einschliessuch square, L-shaped, ovoid, circular and the like
Finding forms ·. .

The partition wall 10 in the Mi tte extends directly from the floor to above the level of Elektroplattierlosung. ¹

The vane pump 16 must be able to provide a steady flow through substantially all of the channel 14 at a speed of about 0.15 Us 1.2 m / aec »and preferably between 0.3 and 1 m / sec. To achieve maximum utilization of the channel length, the vane pump must deliver at least 90 % of the volume circulating in the tank at a pressure below £ 00 at the water column and preferably below about 150 to 500 vm water column.

The height-to-bend ratio of the vane pump must be approximately 0.4 and the flight pump dureometer approximately 10 % smaller than the channel width * If the ratio

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"BAD ORIGINAL

U96807

Channel depth to channel width exceeds 1.5 is more required as a vane pump to achieve an even distribution. For any whole number, By which this ratio increases, a corresponding number of vane pumps must also be used. Every the vane pumps know in a "special logarithmic Volute casings can be housed or all of them can be housed in a single housing be". You must of course have vane pumps in a vertical position Spaced from each other in the direction of the electroplating solution in each vane pump inlet can occur.

As can be seen from FIGS. 2 and 3, the housing is preferably arranged in the tank 12 so that the aim in general, the backflow of the electrolyte into the channel 14 is prevented when it is not through the housing passes through. This is the best way to achieve an even flow of the solution.However, satisfied * Positive results can be achieved if only the largest rope of the solution in the channel flows back through the vane pump. If the vane pump housing is not fitted very tightly or is inserted in a sealed manner, it can be more easily assembled, adjusted or replaced. In addition, such a construction provides the additional

9Q9829 / 1239

8 "" 'U96807

ual advantage 'that they can use commercial. common vane pump housings allowed ''

If more than one vane pump is used »should the housing inlet 30 for the upper vane pump 16 between the two vane pumps 16 and 16 * on the housing wall be arranged »30 * denotes the housing inlet for the lower vane pump 16 *. , '

^1st 'ι

Of the. Outlet 22 for housing 18 should have a width that is within 10 % _{y of} approximately the same width as the channel width in order to achieve maximum utilization of the channel for plating. However, in some rare cases, an outlet size that is up to 25% smaller than the duct size can be used. The height of the housing outlet is basically determined by the vane pump height, inlet height plus a corresponding margin for the remaining components in question, since the upper and lower housing walls of the vane pump housing are generally parallel is directed parallel to the canal wall in order to stabilize the flow of the solution on the shortest possible path in the canal.

90 9829M239

Sf U96807

Especially if only one vane pump is used, it may be desirable to stabilize the flow ■ accelerate «If this is the case, an or several sieve discs, guide plates, blinds or the like be used. These sieve disks should have a free opening of at least 70 #. the Stabilizing agents extend the plating space in the channel in the most effective way because they are satisfactory Allow plating closer to housing outlet.

Some of the common plating machines have a

Piece transport mechanism that allows the use of the invention in a normal, rectangular! Thanks impossible makes, because the vane pump drive and its bracket (not shown) an obstacle for the workpiece transport mechanism offers·

In such a case, the vane pump, as illustrated in Figure 4, from the main part of the tank The resulting tank 12 'is generally still rectangular, and the invention can be applied to him in exactly the same way as described above the vane pump and its spiral housing are at least partially outside the main part of the tank

909829/1239

\ G \ NA \ - Un tcrlarpP. (Art. 7 y I para. 2 Hr. 1 Salt 3 of the Amendment Act V. 4; 9. to- >

10 U96807

an extension line 34 is used. The outlet 22 / extension line 34 is in the same Arranged like the outlet 22 of the in the Pig. 1 and 2 shown vane pump housing.

The extension line 34 is actually one Extension of the vane pump housing outlet shown in FIG. 1 22 and their cross-sectional dimensions ™ should therefore be preferred by the method used in conjunction with FIG wise proposed dimensions for the housing outlet 22 to be determined. end baffles (not shown) can also be used in extension 34 if desired, especially if the offset

. ., of the vane pump housing is so large that an im

significant L-shaped drop is created. In everyone else Relationships is that. The apparatus shown in Fig. 4 is the same as that described in connection with Figs. 1-3 fc is · With a detached vane pump housing, cladding hangers can be used taken out of the tank and out of the. The area above the extension 34 can be moved out, . without encountering an obstacle. ,.

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Claims (1)

U96807 Claims . 1 × device, which is provided as wings "rad a known bladed centrifugal pump for electroplating in a channel ■ closed electrolyte circulating around a fixed partition wall around which a rotating wing wheel is provided in the passage, characterized in that with a vertical axis of rotation in a housing (18) which is designed as a logarithmic spiral housing and has an outlet (22), the width of which corresponds essentially to the width of the channel. 2. Device according to claim 1, characterized in that that the ratio of height to diameter of the pump impeller (16) is about 0.4. 5. Apparatus according to claim 1 or 2, characterized in that the inlet (32) to the pump housing (18) in the New documents (Art. 7, Paragraph 1, Paragraph 2, No. 1, Clause 3 of the Amendment Act of 4.9. Ui 909829/1239 U96807 Housing bottom or on the side is provided and has a cross section that corresponds to the cross section of the impeller inlet is equivalent to. .- "." · 4 ·. Device according to one of the preceding claims, characterized in that in the vicinity of the outlet (22) of the impeller housing (18) a wire mesh (20) is provided· 5. Device according to one of the preceding claims, characterized in that for diverting the electrolyte around the edge remote from the Badial pump (16) of the iron plate (1p) adjustable guide vanes (24-, 26) are provided · ... ".. 6 «gate direction according to one of claims 1 to 5» thereby characterized j that at a ratio of depth to width of the channel (14) exceeding the value 1.5 for an additional bladed radial pump (16 *) is provided for every integer amount, the pumps in perpendicular sighting at a distance from each other. Aleue documents ^ y γ ^ ν,, sentence 3 of the amendment ^ _8aet , _v . 4/9. , s Blank page