DE1232268B - Device for contacting the alloy electrodes of semiconductor components - Google Patents
Device for contacting the alloy electrodes of semiconductor componentsInfo
- Publication number
- DE1232268B DE1232268B DE1962T0022110 DET0022110A DE1232268B DE 1232268 B DE1232268 B DE 1232268B DE 1962T0022110 DE1962T0022110 DE 1962T0022110 DE T0022110 A DET0022110 A DE T0022110A DE 1232268 B DE1232268 B DE 1232268B
- Authority
- DE
- Germany
- Prior art keywords
- lead wire
- contacting
- centering
- weighting piece
- alloy material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01004—Beryllium [Be]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01005—Boron [B]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01019—Potassium [K]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01032—Germanium [Ge]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/01—Chemical elements
- H01L2924/01068—Erbium [Er]
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Die Bonding (AREA)
Description
Vorrichtung zum Kontaktieren der Legierungselektroden von Halbleiterbauelementen Die Erfindung betrifft eine Vorrung zum Kontaktieren der Legierungselektrodevn"Halbleiterbauelementen, z. B. von Transisto oder Dioden, durch Erwärmen der Kontaktieruttelle und Eindrücken des Zuleitungsdrahtes ims Legierungsmaterial unter Verwendung eind3eschwerungsstückes. Die Erfindung besteht 1 einer solchen Vorrichtung darin, daß das Besch-ungsstück aus einem in einer Bohrung einer füzn Zuleitungsdraht und das Beschwerungsst bestimmten Zentrierungsform geführten Teil d aus einem außerhalb der Bohrung befindlicheiell besteht und daß das Beschwerungsstück deratusgebildet ist, daß der außerhalb der Bohrungdindliche Teil beim Erreichen der vorgesehenen idringtiefe auf eine auf der Zentrierungsform vesehene Auflagefläche zu liegen kommt und dadh ein weiteres Eindringen des Zuleitungsdrahtes iias Legierungsmaterial verhindert wird.Apparatus for contacting the alloy electrodes of semiconductor devices The present invention relates to a Vorrung for contacting the Legierungselektrodevn "semiconductor devices, for. Example of Transisto or diodes, by heating the Kontaktieruttelle and pushing the lead wire ims alloy material using eind3eschwerungsstückes. The invention is 1 such a device is that the loading piece consists of a part d guided in a hole of a füzn supply wire and the centering shape determined by a centering shape located outside the hole and that the weighting piece is formed so that the part located outside the hole comes on when the intended penetration depth is reached the centering form comes to rest and that further penetration of the lead wire in the form of an alloy material is prevented.
Es ist bereits ein Verfahren beka, bei dem die Verbindung des Zuleitungsdrahtemit der Legierungselektrode durch Erwärmen's Legierungsmaterials und Eindrücken des Zulangsdrahtes in das Legierungsmaterial unter Veendung eines Beschwerungsstückes erfolgt. Die Eidung hat eine Vorrichtung zum Gegenstand, die z,Durchführung des bekannten Verfahrens besond geeignet ist und die verhindert, daß bei der K(aktierung von Legierungselektroden durch Zuleitgsdrähte eine Beschädigung des Halbleitersysterns (tritt.There is already a method of connecting the lead wire to the the alloy electrode by heating the alloy material and pressing the Feed wire into the alloy material using a weighting piece he follows. The divorce has a device for the subject z, implementation of the known method is particularly suitable and which prevents the K (Aktierung from alloy electrodes through lead wires damage the semiconductor system (occurs.
Es empfiehlt sich, die Elektrodenleitung bereits vor dem Eindrücken auf die erfoerliche Länge zuzuschneiden. Im allgemeinen wl ein gerader Draht in das auf erhöhter Tempeiär befindliche Legierungsmaterial eingedrückt. Soller Zuleitungsdraht jedoch eine andere Form erhgn, so kann er nach dem Eindrücken und Abkühlems Legierungsmaterials entsprechend geformt werd( Die Erfindung, soll an einem Aushrungsbeispiel näher erläutert werden. Die in der Fur dargestellte Kontaktierung der Kollektorelektroi erfolgt nach dem Legieren der Emitter- und Illektorpillen 1 und 2 in einem Arbeitsgang zusamen mit dem Auflöten des Halbleiterkörpers 3 9 die Trägerplatte 4. Der Halbleiterkörper 3 md zu diesem Zweck zusammen mit der Trägerplat 4 in die Vertiefung eines Aufnahmeteiles 5 eingelacht. Auf dem Aufnahmeteil 5 befindet sich eine Zentrierungsform 6, welche zum Zentrieren des if der Kollektorpille 2 aufliegenden Kollektorzuleungsdrahtes 7 dient. Das Eindrücken des Zuleitursdrahtes 7 erfolgt mit Hilfe des Beschwerungssicks 8, dessen unteres Teilstück 9 auf dem Zuleitungsdraht aufliegt. Um das Eindringen des Zuleitungsdrahtes zu erleichtern, wird das Legierungsmaterial erwärmt, und zwar im allgemeinen bis zum Erweichungspunkt. Soll beim Kontaktieren gleichzeitig eine Trägerplatte mit dem Halbleiterkörper verlötet werden, so erfolgt die Erwärmung des Systems bis zu der dazu erforderlichen Löttemperatur. Die Eindringtiefe des Zuleitungsdrahtes richtet sich nach der Länge des unteren Teilstückes 9, da der Zuleitungsdraht nicht mehr in die Legierungspille eindringen kann, wenn das Beschwerungsstück 8 auf der Zentrierform 6 aufliegt.It is advisable to cut the electrode lead to the required length before pressing it in. Generally, a straight wire will be pressed into the elevated alloy material. However Soller lead wire erhgn a different shape, he can after pressing and Abkühlems alloy material becoming correspondingly shaped (The invention will be explained in more detail at a Aushrungsbeispiel The contacting of the Kollektorelektroi shown in Fur takes place after the alloying of the emitter and Illektorpillen. 1 and 2 in one operation together with the soldering of the semiconductor body 3 9 the carrier plate 4. The semiconductor body 3 for this purpose together with the carrier plate 4 is embedded in the recess of a receiving part 5. On the receiving part 5 there is a centering form 6 which is used for centering the if the collector pill 2 resting Kollektorzuleungsdrahtes 7 is used. the depression of the Zuleitursdrahtes 7 is performed using the Beschwerungssicks 8 whose lower portion 9 rests on the lead wire. in order to facilitate the penetration of the lead wire, the alloy material is heated, and although in general to softening points. If a carrier plate is to be soldered to the semiconductor body at the same time when making contact, the system is heated up to the soldering temperature required for this. The penetration depth of the lead wire depends on the length of the lower section 9, since the lead wire can no longer penetrate the alloy pill when the weighting piece 8 rests on the centering mold 6.
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE1962T0022110 DE1232268B (en) | 1962-05-12 | 1962-05-12 | Device for contacting the alloy electrodes of semiconductor components |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE1962T0022110 DE1232268B (en) | 1962-05-12 | 1962-05-12 | Device for contacting the alloy electrodes of semiconductor components |
Publications (1)
Publication Number | Publication Date |
---|---|
DE1232268B true DE1232268B (en) | 1967-01-12 |
Family
ID=7550404
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE1962T0022110 Pending DE1232268B (en) | 1962-05-12 | 1962-05-12 | Device for contacting the alloy electrodes of semiconductor components |
Country Status (1)
Country | Link |
---|---|
DE (1) | DE1232268B (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1059112B (en) * | 1958-04-11 | 1959-06-11 | Intermetall | Process for contacting silicon transistors alloyed with aluminum |
DE1060055B (en) * | 1957-11-15 | 1959-06-25 | Siemens Ag | Process for the production of the electrical connections of semiconductor arrangements |
-
1962
- 1962-05-12 DE DE1962T0022110 patent/DE1232268B/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1060055B (en) * | 1957-11-15 | 1959-06-25 | Siemens Ag | Process for the production of the electrical connections of semiconductor arrangements |
DE1059112B (en) * | 1958-04-11 | 1959-06-11 | Intermetall | Process for contacting silicon transistors alloyed with aluminum |
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