DE112005001583T5 - Kupfermetallisierungs-Analysesystem und -verfahren unter Verwendung von Röntgenfluoreszenz - Google Patents

Kupfermetallisierungs-Analysesystem und -verfahren unter Verwendung von Röntgenfluoreszenz Download PDF

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Publication number
DE112005001583T5
DE112005001583T5 DE112005001583T DE112005001583T DE112005001583T5 DE 112005001583 T5 DE112005001583 T5 DE 112005001583T5 DE 112005001583 T DE112005001583 T DE 112005001583T DE 112005001583 T DE112005001583 T DE 112005001583T DE 112005001583 T5 DE112005001583 T5 DE 112005001583T5
Authority
DE
Germany
Prior art keywords
analysis system
ray fluorescence
copper metallization
metallization
copper
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE112005001583T
Other languages
English (en)
Inventor
Wenbing Yun
Yuxin Wang
Michael Feser
Kenneth W Nill
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss X Ray Microscopy Inc
Original Assignee
Xradia Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xradia Inc filed Critical Xradia Inc
Publication of DE112005001583T5 publication Critical patent/DE112005001583T5/de
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
    • G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
    • G01N23/2252—Measuring emitted X-rays, e.g. electron probe microanalysis [EPMA]
DE112005001583T 2004-07-09 2005-07-08 Kupfermetallisierungs-Analysesystem und -verfahren unter Verwendung von Röntgenfluoreszenz Withdrawn DE112005001583T5 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US58683504P 2004-07-09 2004-07-09
PCT/US2005/024463 WO2006010091A2 (en) 2004-07-09 2005-07-08 Copper metallization analysis system and method using x-ray fluorescence

Publications (1)

Publication Number Publication Date
DE112005001583T5 true DE112005001583T5 (de) 2007-05-16

Family

ID=35464148

Family Applications (1)

Application Number Title Priority Date Filing Date
DE112005001583T Withdrawn DE112005001583T5 (de) 2004-07-09 2005-07-08 Kupfermetallisierungs-Analysesystem und -verfahren unter Verwendung von Röntgenfluoreszenz

Country Status (2)

Country Link
DE (1) DE112005001583T5 (de)
WO (1) WO2006010091A2 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006009247B4 (de) 2006-02-28 2007-12-27 Advanced Micro Devices, Inc., Sunnyvale Verfahren zum Abschätzen der kristallinen Textur gestapelter Metallleitungen in Mikrostrukturbauelementen
DE102006062015B4 (de) * 2006-12-29 2012-04-26 Advanced Micro Devices, Inc. Verfahren zum Testen einer Materialschicht in einer Halbleiterstruktur auf Unversehrtheit
US9335283B2 (en) * 2011-09-12 2016-05-10 Xwinsys Ltd. Method and a system for recognizing voids in a bump

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4839913A (en) * 1987-04-20 1989-06-13 American Science And Engineering, Inc. Shadowgraph imaging using scatter and fluorescence
US6108398A (en) * 1998-07-13 2000-08-22 Jordan Valley Applied Radiation Ltd. X-ray microfluorescence analyzer
US6351516B1 (en) * 1999-12-14 2002-02-26 Jordan Valley Applied Radiation Ltd. Detection of voids in semiconductor wafer processing
US7245696B2 (en) * 2002-05-29 2007-07-17 Xradia, Inc. Element-specific X-ray fluorescence microscope and method of operation

Also Published As

Publication number Publication date
WO2006010091A3 (en) 2006-07-20
WO2006010091A2 (en) 2006-01-26

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