DE10361014A1 - Semiconductor component with high frequency (HF) circuit with active circuit components integrated in first semiconductor chip, while at least part of passive circuit components are formed in second semiconductor chip by silicon processing - Google Patents
Semiconductor component with high frequency (HF) circuit with active circuit components integrated in first semiconductor chip, while at least part of passive circuit components are formed in second semiconductor chip by silicon processing Download PDFInfo
- Publication number
- DE10361014A1 DE10361014A1 DE10361014A DE10361014A DE10361014A1 DE 10361014 A1 DE10361014 A1 DE 10361014A1 DE 10361014 A DE10361014 A DE 10361014A DE 10361014 A DE10361014 A DE 10361014A DE 10361014 A1 DE10361014 A1 DE 10361014A1
- Authority
- DE
- Germany
- Prior art keywords
- circuit
- semiconductor chip
- components
- semiconductor
- passive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 63
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims description 7
- 229910052710 silicon Inorganic materials 0.000 title claims description 7
- 239000010703 silicon Substances 0.000 title claims description 7
- 238000005516 engineering process Methods 0.000 claims abstract description 8
- 239000003990 capacitor Substances 0.000 claims description 15
- 230000003071 parasitic effect Effects 0.000 description 15
- 239000010410 layer Substances 0.000 description 6
- 239000004020 conductor Substances 0.000 description 5
- 230000010354 integration Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000000969 carrier Substances 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 101100305156 Brugia malayi rpp-2 gene Proteins 0.000 description 1
- 101100273664 Neurospora crassa (strain ATCC 24698 / 74-OR23-1A / CBS 708.71 / DSM 1257 / FGSC 987) ccp-1 gene Proteins 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 238000004382 potting Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L25/00—Assemblies consisting of a plurality of semiconductor or other solid state devices
- H01L25/16—Assemblies consisting of a plurality of semiconductor or other solid state devices the devices being of types provided for in two or more different subclasses of H10B, H10D, H10F, H10H, H10K or H10N, e.g. forming hybrid circuits
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/58—Structural electrical arrangements for semiconductor devices not otherwise provided for, e.g. in combination with batteries
- H01L23/64—Impedance arrangements
- H01L23/66—High-frequency adaptations
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03B—GENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING, BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN A NON-SWITCHING MANNER; GENERATION OF NOISE BY SUCH CIRCUITS
- H03B5/00—Generation of oscillations using amplifier with regenerative feedback from output to input
- H03B5/08—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance
- H03B5/12—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device
- H03B5/1206—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device using multiple transistors for amplification
- H03B5/1212—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device using multiple transistors for amplification the amplifier comprising a pair of transistors, wherein an output terminal of each being connected to an input terminal of the other, e.g. a cross coupled pair
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03B—GENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING, BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN A NON-SWITCHING MANNER; GENERATION OF NOISE BY SUCH CIRCUITS
- H03B5/00—Generation of oscillations using amplifier with regenerative feedback from output to input
- H03B5/08—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance
- H03B5/12—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device
- H03B5/1228—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device the amplifier comprising one or more field effect transistors
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03B—GENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING, BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN A NON-SWITCHING MANNER; GENERATION OF NOISE BY SUCH CIRCUITS
- H03B5/00—Generation of oscillations using amplifier with regenerative feedback from output to input
- H03B5/08—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance
- H03B5/12—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device
- H03B5/1237—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device comprising means for varying the frequency of the generator
- H03B5/124—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device comprising means for varying the frequency of the generator the means comprising a voltage dependent capacitance
- H03B5/1243—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device comprising means for varying the frequency of the generator the means comprising a voltage dependent capacitance the means comprising voltage variable capacitance diodes
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03B—GENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING, BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN A NON-SWITCHING MANNER; GENERATION OF NOISE BY SUCH CIRCUITS
- H03B5/00—Generation of oscillations using amplifier with regenerative feedback from output to input
- H03B5/08—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance
- H03B5/12—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device
- H03B5/1296—Generation of oscillations using amplifier with regenerative feedback from output to input with frequency-determining element comprising lumped inductance and capacitance active element in amplifier being semiconductor device the feedback circuit comprising a transformer
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03F—AMPLIFIERS
- H03F3/00—Amplifiers with only discharge tubes or only semiconductor devices as amplifying elements
- H03F3/189—High-frequency amplifiers, e.g. radio frequency amplifiers
- H03F3/19—High-frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only
- H03F3/193—High-frequency amplifiers, e.g. radio frequency amplifiers with semiconductor devices only with field-effect devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/1901—Structure
- H01L2924/19011—Structure including integrated passive components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/191—Disposition
- H01L2924/19101—Disposition of discrete passive components
- H01L2924/19102—Disposition of discrete passive components in a stacked assembly with the semiconductor or solid state device
- H01L2924/19104—Disposition of discrete passive components in a stacked assembly with the semiconductor or solid state device on the semiconductor or solid-state device, i.e. passive-on-chip
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03B—GENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING, BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN A NON-SWITCHING MANNER; GENERATION OF NOISE BY SUCH CIRCUITS
- H03B2200/00—Indexing scheme relating to details of oscillators covered by H03B
- H03B2200/003—Circuit elements of oscillators
- H03B2200/0038—Circuit elements of oscillators including a current mirror
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03B—GENERATION OF OSCILLATIONS, DIRECTLY OR BY FREQUENCY-CHANGING, BY CIRCUITS EMPLOYING ACTIVE ELEMENTS WHICH OPERATE IN A NON-SWITCHING MANNER; GENERATION OF NOISE BY SUCH CIRCUITS
- H03B2201/00—Aspects of oscillators relating to varying the frequency of the oscillations
- H03B2201/02—Varying the frequency of the oscillations by electronic means
- H03B2201/0208—Varying the frequency of the oscillations by electronic means the means being an element with a variable capacitance, e.g. capacitance diode
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Semiconductor Integrated Circuits (AREA)
- Inductance-Capacitance Distribution Constants And Capacitance-Resistance Oscillators (AREA)
Abstract
Description
Bei Hochfrequenzschaltungen, die eine frequenzselektive Eigenschaft aufweisen sollen, wie z. B. bei Verstärkern und Oszillatoren, wird die Frequenzselektion üblicherweise mit Schwingkreisen realisiert, die mindestens eine Spule und einen Kondensator aufweisen. Diese Bauelemente können als passive Komponenten auf einem IC-Chip realisiert sein oder auch auf einem separaten Träger angeordnet und mit der integrierten Schaltung verbunden sein, die ihrerseits auch aktive Schaltungskomponenten aufweist.at High-frequency circuits that have a frequency-selective property should have, such. As with amplifiers and oscillators, is the frequency selection usually realized with resonant circuits, the at least one coil and a Have condenser. These components can be considered passive components be implemented on an IC chip or on a separate carrier be arranged and connected to the integrated circuit, the in turn also has active circuit components.
Für viele Anwendungen ist es erforderlich, dass die Resonanzkurve des Schwingkreises möglichst schmal ist, so dass die Güte des Schwingkreises, die einen dimensionslosen Wert zur Beurteilung des Verhältnisses von Höhe und Breite der Resonanzkurve angibt, möglichst hoch ist. Wenn Spulen in elektronischen Schaltungen auf einem Halbleiterchip integriert werden, ist der Gütefaktor durch die vorhandene Metallisierung und durch Substratverluste auf Werte von etwa 10 bis 15 begrenzt.For many Applications require that the resonance curve of the resonant circuit preferably is slim, so that goodness of the resonant circuit, which has a dimensionless value for the evaluation of the ratio of height and width of the resonance curve indicates is as high as possible. When coils integrated in electronic circuits on a semiconductor chip is, is the quality factor due to the existing metallization and substrate losses to values limited from about 10 to 15.
Wenn die Induktivitäten und Kapazitäten außerhalb des IC-Chips angeordnet werden, lassen sich für den Schwingkreis höhere Gütewerte erzielen als bei einer vollständigen Integration. Wenn Spulen in einer Schichtlage einer Platine oder auf einem separaten Chip ausgebildet werden, erhält man jedoch bei hohen Frequenzen einen merklichen parasitären kapazitiven Anteil, der die Funktion der Spule einschränkt. Der Abstimmbereich wird durch die parasitären Anteile eingeschränkt, und bei ungünstiger Auslegung der Komponenten können sogar parasitäre Nebenresonanzen stehen.If the inductors and capacities outside of the IC chip arranged be, leave for the resonant circuit higher quality values achieve than complete Integration. If coils in a layer of a circuit board or formed on a separate chip, but obtained at high frequencies a noticeable parasitic capacitive Share that limits the function of the coil. The voting area will be through the parasitic Shares restricted, and unfavorable design of the components even parasitic Nebenresonanzen stand.
Wenn man versucht, die Spulen- und Kondensator-Komponenten teils mit der elektronischen Schaltung zu integrieren und teils auf externen Bauelementen anzuordnen, z. B. die Kondensatoren des Schwingkreises auf einem Halbleiterchip und die Induktivitäten auf separaten Trägern außerhalb des Chips, muss der gesamte Strom des Resonanzkreises über die externe Leitung fließen, so dass hier wesentliche Nachteile im Rauschverhalten und Verstärkungsverhalten sowie gegebenenfalls parasitäre Nebenresonanzen auftreten.If one tries, partly with the coil and capacitor components to integrate the electronic circuit and partly on external To arrange components, for. B. the capacitors of the resonant circuit on a semiconductor chip and the inductors on separate carriers outside of the chip, the entire current of the resonant circuit must over the external line flow, so that here are significant disadvantages in the noise behavior and gain behavior and optionally parasitic Secondary resonances occur.
Mit der vorliegenden Erfindung soll erreicht werden, bei Halbleiterbauelementen mit einer HF-Schaltung möglichst gute Resonanzeigenschaften bei geringem Rauschen zu erzielen. Zu diesem Zweck werden die passiven Komponenten, insbesondere Spulen, Kondensatoren und Widerstände, auf einem separaten Halbleiterchip oder einem flexiblen Träger angebracht, der nach Art einer Face-to-face-Montage mit dem ersten Halbleiterchip verbunden wird, der die elektronische Schaltung einschließlich der aktiven Komponenten enthält. Die Oberseiten des ersten Halbleiterchips und des zweiten Halbleiterchips bzw. flexiblen Trägers, die bei dieser Anordnung einander zugewandt sind, sind mit Anschlusskontaktflächen der Schaltungsteile versehen. Die einander zugehörigen Anschlusskontaktflächen sind einander gegenüberliegend angeordnet und dauerhaft elektrisch leitend miteinander verbunden. Die HF-Schaltung kann insbesondere einen oder mehrere Schaltungen oder Schaltungsteile aus der Gruppe von Modulator, Verstärker, Oszillator, Varactor und Balun umfassen.With The present invention is to be achieved in semiconductor devices if possible with an HF circuit to achieve good resonance characteristics with low noise. To For this purpose, the passive components, in particular coils, Capacitors and resistors, on a separate semiconductor chip or a flexible carrier attached, connected in the manner of a face-to-face mounting with the first semiconductor chip which is the electronic circuit including the active components contains. The tops of the first semiconductor chip and the second semiconductor chip or flexible carrier, which face each other in this arrangement, are with terminal contact surfaces of Provided circuit parts. The associated terminal contact surfaces are opposite each other arranged and permanently connected electrically conductive. The RF circuit In particular, one or more circuits or circuit parts from the group of modulator, amplifier, oscillator, varactor and balun.
Es
folgt eine genauere Beschreibung von Beispielen des Halbleiterbauelements
anhand der
Die
Die
Wesentlich
für das
Halbleiterbauelement gemäß der Erfindung
ist die Aufteilung der HF-Schaltung, so dass nur der erste Halbleiterchip
Das
soll anhand der
In
der
Mit
einer solchen externen Anordnung der LC-Komponenten kann man für den Resonanzkreis höhere Güten erzielen
als mit einer vollständigen
Integration der gesamten HF-Schaltung. Jedoch führen die in der
Ein
weiteres Ausführungsbeispiel
zeigt die Schaltung der
Die
Die
Die dargestellten Ausführungsbeispiele geben nur eine sehr begrenzte Anzahl von Möglichkeiten an, wie mit dem erfindungsgemäßen Halbleiterbauelement eine Aufteilung der gesamten HF-Schaltung auf einen passiven Schaltungsteil und einen restlichen, die aktiven Komponenten enthaltenden Schaltungsteil möglich ist; dabei wird durch die Face-to-face-Montage erreicht, dass die Resonatoreigenschaften des HF-Resonanzkreises wesentlich verbessert werden, sowohl gegenüber einer herkömmlichen vollständigen Integration als auch gegenüber einer Aufteilung der Komponenten und einer Verbindung über Bonddrähte oder Gehäuseanschlüsse oder dergleichen. Durch die Face-to-face-Anordnung werden die Nachteile der vollständig integrierten oder auch nur teilweise integrierten Halbleiterschaltungen vermieden, indem die störenden parasitären Schaltungskomponenten weitestgehend unterdrückt werden.The illustrated embodiments indicate only a very limited number of possibilities, such as with the inventive semiconductor device a division of the entire RF circuit to a passive circuit part and a remaining circuit part containing the active components possible is; It is achieved by the face-to-face assembly that the Resonator properties of the RF resonant circuit significantly improved be, both opposite a conventional one complete Integration as well as opposite a division of the components and a connection via bonding wires or Housing connections or like. Due to the face-to-face arrangement, the disadvantages the complete integrated or even partially integrated semiconductor circuits avoided by the disturbing ones parasitic Circuit components are largely suppressed.
- 11
- erster Halbleiterchipfirst Semiconductor chip
- 22
- zweiter Halbleiterchipsecond Semiconductor chip
- 33
- AnschlusskontaktflächeTerminal pad
- CC
- Kondensatorcapacitor
- C1C1
- Kondensatorcapacitor
- C2C2
- Kondensatorcapacitor
- LL
- Induktivitätinductance
- L1L1
- Induktivitätinductance
- L2L2
- Induktivitätinductance
- RR
- Widerstandresistance
- T1T1
- Transistortransistor
- T2T2
- Transistortransistor
- TN T N
- NMOS-TransistorNMOS transistor
- TP T P
- PMOS-TransistorPMOS transistor
Claims (3)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10361014A DE10361014A1 (en) | 2003-12-23 | 2003-12-23 | Semiconductor component with high frequency (HF) circuit with active circuit components integrated in first semiconductor chip, while at least part of passive circuit components are formed in second semiconductor chip by silicon processing |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10361014A DE10361014A1 (en) | 2003-12-23 | 2003-12-23 | Semiconductor component with high frequency (HF) circuit with active circuit components integrated in first semiconductor chip, while at least part of passive circuit components are formed in second semiconductor chip by silicon processing |
Publications (1)
Publication Number | Publication Date |
---|---|
DE10361014A1 true DE10361014A1 (en) | 2005-03-03 |
Family
ID=34112170
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE10361014A Ceased DE10361014A1 (en) | 2003-12-23 | 2003-12-23 | Semiconductor component with high frequency (HF) circuit with active circuit components integrated in first semiconductor chip, while at least part of passive circuit components are formed in second semiconductor chip by silicon processing |
Country Status (1)
Country | Link |
---|---|
DE (1) | DE10361014A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8552829B2 (en) | 2010-11-19 | 2013-10-08 | Infineon Technologies Austria Ag | Transformer device and method for manufacturing a transformer device |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002043841A (en) * | 2000-07-26 | 2002-02-08 | Tdk Corp | Voltage-controlled oscillator |
EP1306902A1 (en) * | 2001-04-26 | 2003-05-02 | Sony Corporation | High-frequency module and its manufacturing method |
-
2003
- 2003-12-23 DE DE10361014A patent/DE10361014A1/en not_active Ceased
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002043841A (en) * | 2000-07-26 | 2002-02-08 | Tdk Corp | Voltage-controlled oscillator |
EP1306902A1 (en) * | 2001-04-26 | 2003-05-02 | Sony Corporation | High-frequency module and its manufacturing method |
Non-Patent Citations (1)
Title |
---|
JP 200243841 AA |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8552829B2 (en) | 2010-11-19 | 2013-10-08 | Infineon Technologies Austria Ag | Transformer device and method for manufacturing a transformer device |
US9245684B2 (en) | 2010-11-19 | 2016-01-26 | Infineon Technologies Austria Ag | Method for manufacturing a transformer device on a glass substrate |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE102006035204B4 (en) | Monolithically integrated circuit arrangement | |
DE102004011719B4 (en) | Semiconductor device | |
KR20060090932A (en) | Integrated semiconductor inductor and method therefor | |
EP1336245B1 (en) | Oscillator circuit | |
DE10340391A1 (en) | Low energy loss inductor | |
DE102008014930A1 (en) | Output circuit and power component | |
EP1556899B1 (en) | Electronic component with an integrated passive electronic component and method for production thereof | |
DE102016201244B4 (en) | INDUCTIVE COUPLING TRANSFORMER WITH TUNABLE IMPEDANCE MATCHING NETWORK | |
DE60025796T2 (en) | Ground plane for an IC | |
DE69620859T2 (en) | Earth-symmetrical semiconductor integrated arrangement with a parallel resonance circuit | |
DE102020127249A1 (en) | GALVANIC HIGH FREQUENCY INSULATORS | |
EP1696487B1 (en) | High frequency arrangement | |
DE19846254C2 (en) | Infrared sensor | |
DE102008027422B4 (en) | Integrated circuit with multi-stage matching circuit and method for producing an integrated circuit with multi-stage matching circuit | |
DE10047214A1 (en) | Frequency filtering or selection circuit for HF signal reception and/or generation incorporated in IC metallisation with constant ohmic resistance | |
DE19821726C1 (en) | Integrated CMOS circuit for high frequency applications, e.g. as a symmetrical mixer input stage or an impedance transformer | |
DE102014222768B4 (en) | Semiconductor device | |
DE10361014A1 (en) | Semiconductor component with high frequency (HF) circuit with active circuit components integrated in first semiconductor chip, while at least part of passive circuit components are formed in second semiconductor chip by silicon processing | |
US10700003B2 (en) | Integrated circuit structure, voltage-controlled oscillator and power amplifier | |
DE102011053680A1 (en) | Circuit arrangement for reducing oscillation tendency | |
DE10126328A1 (en) | Integrated, tunable capacity | |
US6709977B2 (en) | Integrated circuit having oversized components and method of manafacture thereof | |
DE10259050A1 (en) | Integrated circuit | |
WO2006000168A1 (en) | Multi-layer capacitor and integrated circuit module | |
EP1595432B1 (en) | Device and method for damping cavity resonance in a multi-layer carrier module |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
OAV | Publication of unexamined application with consent of applicant | ||
OP8 | Request for examination as to paragraph 44 patent law | ||
8131 | Rejection |