DE10356450A1 - Exposure device used in photolithographic processes comprises a pressure-reducing chamber containing a mask-supporting arrangement and a pressure plate, a pressure film, and displacement arrangements - Google Patents

Abstract

Exposure device comprises a pressure plate (4) for holding an exposure object, and a mask-supporting arrangement (30) for supporting a mask (3) describing the exposure content that is to be exposed on the exposure object. The device also comprises a pressure-reducing chamber (2) containing at least one mask-supporting arrangement and a pressure plate, and suitable for producing a pressure lower than the ambient pressure, a pressure film (1) formed as a surface of the walls of the pressure-reducing chamber which bulges inward into the pressure-reducing chamber on reduction of the pressure, and arrangements (40, 41) for relative displacement of the pressure plate and the pressure film so that the mask and the exposure object are pushed against the bulging pressure film to create full contact between the mask and the exposure object. An Independent claim is also included for an alternative exposure device.

Description

Background of the Invention

Field of the Invention

The invention relates to a Exposure device.

Related area

The photolithography process was widely used in different areas, with a predetermined one Pattern photographically through an exposure device on the surface printed on a substrate coated with photosensitive material, like photoresist, and then through the pattern on the substrate an etching process is formed. Printed circuit boards were also used an exposure device manufactured in recent years.

With this exposure device there are two exposure techniques - one without a plate in contact to come into contact with a photomask that is in contact with a original Sample picture is described, and the other, in which the plate in complete Is in contact with the photomask. Also a plastic film mask or a glass mask (including a glass plate that put together with the film mask is on which the original Sample image is described) used as the photomask.

In the case of the film mask, in which the technique of complete Mainly applied it is important to adhere the film mask to the plate to increase.

As a method of increasing Attachment in the case of the film mask are the back printing process, in which the film mask is pressed to make contact, and the printing film method (Japanese Patent No. 2509134, patent publication: Heisei 8-22571), in which the mask is used from behind of the print film is known.

In the printing film process, a Pressure chamber built up behind the pressure film, and pressurized, to expand the print film, and then the film mask to push against the plate.

Summary the invention

In the conventional printing film process however, the need to place the pressure chamber behind the Print film the device considerably big and heavy. Also dampens the glass, which is on the side of the light source of the pressure chamber is used to pass through the exposure beams to enable the same the exposure rays, reducing the effectiveness respectively Efficiency is reduced. Furthermore, there is the pressure chamber tends to accumulate dust inside, cleaning necessary. There is also a risk of damage to the glass.

The object of the invention is to solve such problems of the conventional technology described above.

To solve the above problem is one Exposure device of the invention with a pressure plate for Holding an exposure object and a mask support to support a mask that is to be exposed on the exposure object Exposure content is described, characterized in that the device a decompression or pressure reduction chamber, at least the mask support device and contains the pressure plate, and is capable of lowering its interior to a pressure that is lower than their ambient pressure is; a print film covering a surface of the walls of the Pressure reduction chamber forms, and into the pressure reduction chamber by reducing the pressure or decompression, which swells pressure reduction chamber, and means for relatively moving the pressure plate and the Print film includes, which makes the mask in full contact with the exposure object is brought up by the mask, which is through the mask support supported and the exposure object held by the pressure plate is pushed against the swollen printing film.

With the structure described above becomes a complete Contact of the mask with the exposure object with high adhesion made by the printing film. Also, since the print film by ambient pressure, such as the atmospheric pressure outside the pressure reduction chamber is swollen, a high pressure is maintained. Furthermore makes the elimination or the omission of a pressure chamber the construction simple and lightweight, and therefore reduces the Costs. The weakening the exposure light is also reduced.

It can either be the mask side or the exposure object side, or both of these moves become. In a preferred embodiment, the pressure plate by a moving device in the direction of the mask that by supported the mask device and is moved in the direction of the printing film, the Movement of the pressure plate the exposure object on the pressure plate pushes against the mask, and also pushes against the print film, which makes the mask complete Is brought into contact with the exposure object.

It may also be possible to construct such that the movement device is arranged outside the pressure reduction chamber, a part of the pressure plate extends outside the pressure reduction chamber and ge with the movement device is coupled, and sealing devices seals the gap between the extended part of the pressure plate and the pressure reduction chamber.

Short description of the drawings

1 is a schematic view of an embodiment of the invention.

2 Fig. 10 is an explanatory diagram showing the operation of the embodiment of the invention.

Precise description of the preferred embodiments

The invention is described below Reference to the related Described drawings.

1 shows an exposure device for the production of printed circuit boards, wherein a plate 50 , on which photoresist was applied, on a pressure plate 4 is placed, which in the Z-axis by a Z-axis moving device 40 as well as in the XY axis directions and in the θ direction (ie: in the angular direction) by an XYθ moving means 41 movable.

A film mask 3 , which is described with a circuit pattern, is installed so that it the plate 50 is opposite or points to this, the film mask 3 by lifting the pressure plate 4 with the plate 50 is brought into contact, whereupon an exposure light source (not shown) located above emits exposure beams around the switching pattern on the plate 50 be printed.

Above the film mask 3 is a print film 1 attached, which with the film mask 3 by lifting the pressure plate 4 is brought into contact by further lifting the plate 4 the print film 1 the film mask 3 against the plate 50 pushes.

The film mask 3 which is movable up and down is made by a mask support device 30 supported, and will contact the plate upward 50 by climbing the pressure plate 4 in the direction of the print film 1 lifted up.

The mask support device 30 who have favourited Pressure Plate 4 and the XYθ mover 41 are in a pressure reduction chamber 2 attached, and the film mask 3 and the plate 50 , each through the mask support device 30 supported, and the pressure plate 4 are also in the pressure reduction chamber 2 contain. The top surface of the pressure reduction chamber 2 is the print film 1 , and the other surface of the pressure reduction chamber 2 is composed of a sealing material.

The Z-axis movement device 40 penetrates from the outside into the pressure reduction chamber 2 through a seal 21 , and is suitable for the plate 4 to move in the Z-axis direction while separating or sealing the outside air.

To the pressure reduction chamber 2 is a pressure lowering pump 20 connected, which is suitable for the pressure within the pressure reduction chamber 2 to make negative. When the pressure on the pressure sink side Y becomes negative, the printing film becomes 1 pushed by the atmospheric pressure from the atmospheric side X and swells to the film mask 3 towards what the film mask 3 against the plate 50 as described above.

The print film 1 is a film made of plastic, etc. and has the property of transmitting or transmitting an exposure wavelength. The print film 1 is along its circumference with the wall of the pressure reduction chamber 2 connected, and thus forms the upper surface of the pressure reduction chamber 2 , By producing a negative pressure on this pressure sink chamber side Y, the printing film swells 1 to the film mask 3 in the form of a hill from its center to its periphery.

Although the print film 1 who have favourited Film Mask 3 and the plate 50 in the upper / lower direction in 1 are arranged, the structure is not limited to this. It is also possible to arrange them vertically.

The printing film can also 1 instead of the plate 50 can be moved, or both of them can also be moved.

In the construction described above, the plate is 50 on the plate 4 hung up, and the pressure plate 4 is raised in the Z-axis direction to be set at the alignment height. Furthermore, the pressure plate 4 by the XYθ mover 41 moved in the XY directions as well as the θ direction using the film mask 3 to be aligned.

At the same time starts by starting the pressure lowering pump 20 the lowering of the pressure within the pressure reduction chamber side Y to a pressure below the atmospheric pressure. The pressure film swells as a result of this reduction in pressure 1 gradually in the direction of the film mask 3 on.

As the film mask continues to swell, the plate becomes 50 with the film mask 3 by lifting the pressure plate 4 brought into contact.

By further lifting the pressure plate 4 the printing film occurs 1 with the film mask 3 , as in 2 is shown in contact with the film mask 3 against the plate 50 is pushed. Because the print film 1 The film mask is swollen in the shape of a hill from its center to its circumference 3 against the plate 50 gradually or successively from their center to their circumference with the lifting of the pressure plate 4 pushed, causing the film mask 3 and the plate 50 come into full contact while the pressure between them is reduced (vacuumed).

Because the print film 1 is swollen by atmospheric pressure, its thrust is strong, and thus the adhesive force between the film mask increases 3 and the plate 50 ,

On making full contact with the film mask 3 with the plate 50 At this stage, rays of the radiation wavelength are emitted from the irradiation light source (not shown), which causes this to appear on the film mask 3 described pattern on the plate 50 is projected.

Because the light from the irradiation light source is only the print film 1 passes through or is transmitted through it, its weakening is small.

As described above, efficient or effective irradiation is possible in the structure described above, since the light from the irradiation light source is only the printing film 1 with little weakening. It is also possible to generate greater adhesive pressure by using the advantage of using atmospheric pressure as a pressure source.

Furthermore, a glass is no longer used to create a sealed space behind the print film 1 to form, whereby weight reduction becomes possible, and also an obstacle to exposure such as dust in the sealed space and the need for cleaning the same can be eliminated. Another advantage is that there is no risk of damage to the glass.

As described above, poses the exposure device of the invention in preference ready to perform an exposure efficiently and with high precision.

In summary is a film mask described with a circuit pattern 3 attached so that it is a plate 50 opposite and a print film 1 is above the film mask 3 appropriate. By lifting a pressure plate 4 becomes the film mask 3 with the print film 1 contacted and against the plate 50 pushed. That mask 3 and the pressure plate 4 are in a pressure reduction chamber 2 attached, the upper surface of the printing film 1 is. The print film 1 is a film made of plastic, etc., which has a property of transmitting exposure wavelengths. The print film 1 is with the wall of the pressure reduction chamber 2 connected along the periphery thereof to form a wall of the pressure-lowering chamber, whereby by producing a negative pressure on the pressure-lowering chamber side Y, the pressure film 1 in the form of a hill swelling from its center to the circumference, which the film mask 3 against the plate 50 pushes.

Claims (4)

Exposure device with a pressure plate for holding an exposure object, and a mask support device for supporting a mask, which is described with exposure content to be exposed on the exposure object, characterized in that it comprises: a pressure reduction chamber which contains at least one mask support device and a pressure plate, and is capable of producing a pressure lower than its ambient pressure; a pressure film formed as a surface of the walls of the pressure reduction chamber which swells inward into the pressure reduction chamber by lowering the pressure of the pressure reduction chamber; and means for relatively moving the pressure plate and the printing film such that the mask supported by the mask support device and the exposure object held by the pressure plate are pushed against the swollen printing film, whereby the mask and the exposure object come into full contact. An exposure device according to claim 1, wherein: the Pressure plate in the direction of the mask supported by the mask device and movable in the direction of the printing film by the moving means is; and the exposure object on the pressure plate by movement the pressure plate against the mask, and further against the printing film is pushed, causing the mask to be in full contact with the exposure object occurs. Exposure device according to claim 1 or 2, wherein: the Movement device is attached outside the pressure reduction chamber; on Part of the pressure plate extends outside the pressure reduction chamber and is coupled to the movement device, being the device further includes: a sealing device for sealing between the extended part of the pressure plate and the pressure reduction chamber. Exposure device, characterized in that it includes: a pressure plate for holding an exposure object; a support means to support a mask described with exposure content; one Printing film to make the mask in full contact with the through to bring the exposure plate held to the platen; one sealed space that is sealed with the printing film and other Materials is formed, the at least the mask support device and contains the exposure object; and a device for producing a vacuum in the sealed room, where: by creating the negative pressure in the sealed room the print film masked against the exposure object suppressed.