DE10338257A1 - Radiation-sensitive element, especially useful as lithographic printing plate precursor, comprising carrier coated with layer containing infrared absorbers or diazo compound and layer containing diazo resin - Google Patents

Radiation-sensitive element, especially useful as lithographic printing plate precursor, comprising carrier coated with layer containing infrared absorbers or diazo compound and layer containing diazo resin Download PDF

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Publication number
DE10338257A1
DE10338257A1 DE10338257A DE10338257A DE10338257A1 DE 10338257 A1 DE10338257 A1 DE 10338257A1 DE 10338257 A DE10338257 A DE 10338257A DE 10338257 A DE10338257 A DE 10338257A DE 10338257 A1 DE10338257 A1 DE 10338257A1
Authority
DE
Germany
Prior art keywords
radiation
layer containing
diazo
infrared absorbers
printing plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
DE10338257A
Other languages
German (de)
Other versions
DE10338257B4 (en
Inventor
Celin Savariar-Hauck
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kodak Graphic Communications GmbH
Original Assignee
Kodak Polychrome Graphics GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kodak Polychrome Graphics GmbH filed Critical Kodak Polychrome Graphics GmbH
Priority to DE10338257A priority Critical patent/DE10338257B4/en
Publication of DE10338257A1 publication Critical patent/DE10338257A1/en
Application granted granted Critical
Publication of DE10338257B4 publication Critical patent/DE10338257B4/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/02—Positive working, i.e. the exposed (imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/14—Multiple imaging layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/20—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by inorganic additives, e.g. pigments, salts
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/26—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions not involving carbon-to-carbon unsaturated bonds
    • B41C2210/262—Phenolic condensation polymers, e.g. novolacs, resols

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

New radiation-sensitive elements (A) comprise (a) an optionally pretreated carrier, (b) a first layer (applied to (a)) containing polymeric binder(s) soluble or swellable in aqueous media and a radiation-sensitive component selected from infrared absorbers (I) and compounds (II) containing a diazo (=N2) group (including derivatives or mixtures) and (c) a covering layer, containing at least one negatively working diazo resin (III). Independent claims are included for: (1) the preparation of (A), by (i) applying a first coating solution, comprising organic solvent(s), the polymeric binder(s) and (I) or (II), to the carrier, (ii) drying, (iii) applying a second coating solution, comprising organic solvent(s) and (III), and (iv) drying; and (2) an image forming method, involving imagewise exposure of (A) with radiation of wavelength 650-1300 nm if the radiation-sensitive component is (I) or 300-450 nm if the radiation-sensitive component is (II), followed by treating with an aqueous alkaline developer of pH at least 11.5 (preferably 12-14).
DE10338257A 2003-08-20 2003-08-20 Process for imaging two-layer radiation-sensitive elements Expired - Fee Related DE10338257B4 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
DE10338257A DE10338257B4 (en) 2003-08-20 2003-08-20 Process for imaging two-layer radiation-sensitive elements

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE10338257A DE10338257B4 (en) 2003-08-20 2003-08-20 Process for imaging two-layer radiation-sensitive elements

Publications (2)

Publication Number Publication Date
DE10338257A1 true DE10338257A1 (en) 2005-04-21
DE10338257B4 DE10338257B4 (en) 2007-10-18

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
DE10338257A Expired - Fee Related DE10338257B4 (en) 2003-08-20 2003-08-20 Process for imaging two-layer radiation-sensitive elements

Country Status (1)

Country Link
DE (1) DE10338257B4 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3401732A1 (en) * 2017-05-11 2018-11-14 Folex AG High resolution flexographic printing plate and means for constructing same

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01102456A (en) * 1987-10-15 1989-04-20 Konica Corp Photosensitive composition
JPH01102457A (en) * 1987-10-15 1989-04-20 Konica Corp Photosensitive composition
EP1072432A2 (en) * 1999-07-27 2001-01-31 Fuji Photo Film Co., Ltd. Image forming material and method for forming thereof
US6451505B1 (en) * 2000-08-04 2002-09-17 Kodak Polychrome Graphics Llc Imageable element and method of preparation thereof
WO2003087942A1 (en) * 2002-04-05 2003-10-23 Kodak Polychrome Graphics Llc Multi-layer negative working imageable element

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01102456A (en) * 1987-10-15 1989-04-20 Konica Corp Photosensitive composition
JPH01102457A (en) * 1987-10-15 1989-04-20 Konica Corp Photosensitive composition
EP1072432A2 (en) * 1999-07-27 2001-01-31 Fuji Photo Film Co., Ltd. Image forming material and method for forming thereof
US6451505B1 (en) * 2000-08-04 2002-09-17 Kodak Polychrome Graphics Llc Imageable element and method of preparation thereof
WO2003087942A1 (en) * 2002-04-05 2003-10-23 Kodak Polychrome Graphics Llc Multi-layer negative working imageable element

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
FALBE J., REGITZ, M.: Römpp Chemie Lexikon, Band 2 Cm-G,9., erw. u. neubearb. Aufl. Stuttgart (u.a.), Georg Thieme Verlag, 1990, Eintrag "Diazoharze", S. 937. ISBN 3-13-734709-2. *
FALBE, J., REGITZ, M.: Römpp Chemie Lexikon, Band 2 Cm-G., erw. u. neubearb. Aufl. Stuttgart (u.a.), Georg Thieme Verlag, 1990, Eintrag "Diazo...", S. 936. ISBN 3-13-734709-2. *
Patent Abstracts of Japan & JP 01102456 A *
Patent Abstracts of Japan & JP 01102457 A *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3401732A1 (en) * 2017-05-11 2018-11-14 Folex AG High resolution flexographic printing plate and means for constructing same
WO2018205041A1 (en) 2017-05-11 2018-11-15 Folex Ag High-resolution flexographic printing plate and means for producing same

Also Published As

Publication number Publication date
DE10338257B4 (en) 2007-10-18

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Legal Events

Date Code Title Description
OP8 Request for examination as to paragraph 44 patent law
8327 Change in the person/name/address of the patent owner

Owner name: KODAK GRAPHIC COMMUNICATIONS GMBH, 37520 OSTER, DE

8364 No opposition during term of opposition
R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee

Effective date: 20130301