DE102020202613A1 - METHOD OF MANUFACTURING A SEMICONDUCTOR COMPONENT, SEMICONDUCTOR COMPONENT AND OPTOELECTRONIC DEVICE - Google Patents
METHOD OF MANUFACTURING A SEMICONDUCTOR COMPONENT, SEMICONDUCTOR COMPONENT AND OPTOELECTRONIC DEVICE Download PDFInfo
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- DE102020202613A1 DE102020202613A1 DE102020202613.0A DE102020202613A DE102020202613A1 DE 102020202613 A1 DE102020202613 A1 DE 102020202613A1 DE 102020202613 A DE102020202613 A DE 102020202613A DE 102020202613 A1 DE102020202613 A1 DE 102020202613A1
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/48—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
- H01L33/62—Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls
Abstract
Ein Verfahren zur Herstellung eines Halbleiterbauelements (10) umfasst das strukturierte Aufbringen (S110) einer organischen Klebstoffschicht (150) auf einem Halbleiterchip (105) und das In-Kontaktbringen (S120) des Halbleiterchips (105) mit einem Substrat (170), wobei die organische Klebstoffschicht (150) zwischen Halbleiterchip (105) und Substrat (170) angeordnet wird.A method for producing a semiconductor component (10) comprises the structured application (S110) of an organic adhesive layer (150) on a semiconductor chip (105) and the bringing (S120) of the semiconductor chip (105) into contact with a substrate (170), the organic adhesive layer (150) is arranged between semiconductor chip (105) and substrate (170).
Description
Bei der Herstellung komplexer Halbleiterbauelemente können funktionale Elemente, beispielsweise lichtemittierende Dioden (LEDs) auf ein Substrat übertragen werden. Beispielsweise kann das Substrat ein Halbleitersubstrat sein, in dem mikroelektronische Schaltkreise angeordnet sind. Beim Übertragen der Halbleiterchips auf das Substrat findet üblicherweise ein Lötprozess statt, um die elektrischen Kontakte des Halbleiterchips mit zugehörigen elektrischen Kontakten innerhalb des Substrats zu verbinden.In the manufacture of complex semiconductor components, functional elements, for example light-emitting diodes (LEDs), can be transferred to a substrate. For example, the substrate can be a semiconductor substrate in which microelectronic circuits are arranged. When the semiconductor chips are transferred to the substrate, a soldering process usually takes place in order to connect the electrical contacts of the semiconductor chip to associated electrical contacts within the substrate.
Der vorliegenden Erfindung liegt die Aufgabe zugrunde, ein verbessertes Verfahren zur Herstellung eines Halbleiterbauelements zur Verfügung zu stellen. Weiterhin liegt der vorliegenden Erfindung die Aufgabe zugrunde, ein verbessertes Halbleiterbauelement sowie eine verbesserte optoelektronische Vorrichtung zur Verfügung zu stellen.The present invention is based on the object of providing an improved method for producing a semiconductor component. The present invention is also based on the object of providing an improved semiconductor component and an improved optoelectronic device.
Gemäß der vorliegenden Erfindung wird die Aufgabe durch den Gegenstand oder das Verfahren der unabhängigen Patentansprüche gelöst. Vorteilhafte Weiterentwicklungen sind Gegenstand der abhängigen Ansprüche.According to the present invention, the object is achieved by the subject matter or the method of the independent patent claims. Advantageous further developments are the subject of the dependent claims.
Ein Verfahren zur Herstellung eines Halbleiterbauelements umfasst das strukturierte Aufbringen einer organischen Klebstoffschicht auf einem Halbleiterchip und das In-Kontaktbringen des Halbleiterchips mit einem Substrat, wobei die organische Klebstoffschicht zwischen Halbleiterchip und Substrat angeordnet wird.A method for producing a semiconductor component comprises the structured application of an organic adhesive layer on a semiconductor chip and the bringing the semiconductor chip into contact with a substrate, the organic adhesive layer being arranged between the semiconductor chip and the substrate.
Gemäß Ausführungsformen umfasst das Verfahren weiterhin das Ausbilden von elektrischen Chip-Kontakten auf dem Halbleiterchip vor Aufbringen der organischen Klebstoffschicht und das Ausbilden von elektrischen Substratkontakten an dem Substrat. Nach dem In-Kontaktbringen des Halbleiterchips mit dem Substrat ist mindestens ein Chip-Kontakt mit mindestens einem Substratkontakt elektrisch verbunden. Die elektrischen Substratkontakte können zu einem beliebigen Zeitpunkt vor In-Kontaktbringen des Halbleiterchips mit dem Substrat ausgebildet werden.According to embodiments, the method further comprises the formation of electrical chip contacts on the semiconductor chip before application of the organic adhesive layer and the formation of electrical substrate contacts on the substrate. After the semiconductor chip has been brought into contact with the substrate, at least one chip contact is electrically connected to at least one substrate contact. The electrical substrate contacts can be formed at any point in time before the semiconductor chip is brought into contact with the substrate.
Beispielsweise kann die organische Klebstoffschicht derart strukturiert aufgebracht werden, dass sie zwischen elektrischen Chip-Kontakten angeordnet ist. Die organische Klebstoffschicht kann dabei derart strukturiert aufgebracht werden, dass sie zwischen elektrischen Chip-Kontakten unterschiedlicher Polarität angeordnet ist.For example, the organic adhesive layer can be applied in a structured manner such that it is arranged between electrical chip contacts. The organic adhesive layer can be applied in a structured manner in such a way that it is arranged between electrical chip contacts of different polarity.
Die organische Klebstoffschicht kann gemäß Ausführungsformen auch derart strukturiert aufgebracht werden, dass sie am Rand des Halbleiterchips angeordnet ist und einen aktiven Bereich des Halbleiterchips rahmenartig umgibt.According to embodiments, the organic adhesive layer can also be applied in a structured manner such that it is arranged at the edge of the semiconductor chip and surrounds an active area of the semiconductor chip in a frame-like manner.
Gemäß Ausführungsformen ist eine Vielzahl von Halbleiterchips auf einem Trägersubstrat angeordnet. Die Vielzahl von Halbleiterchips wird mit dem Substrat verbunden, wobei das Trägersubstrat nach dem Verbinden abgelöst wird.According to embodiments, a multiplicity of semiconductor chips are arranged on a carrier substrate. The plurality of semiconductor chips is connected to the substrate, the carrier substrate being detached after the connection.
Gemäß Ausführungsformen umfasst ein Halbleiterbauelement ein Substrat, einen über dem Substrat angeordneten Halbleiterchip, sowie eine strukturierte organische Klebstoffschicht, die zwischen Halbleiterchip und Substrat angeordnet ist.According to embodiments, a semiconductor component comprises a substrate, a semiconductor chip arranged above the substrate, and a structured organic adhesive layer arranged between the semiconductor chip and the substrate.
Der Halbleiterchip kann Chip-Kontakte aufweisen, das Substrat kann Substratkontakte aufweisen und mindestens einer der Chip-Kontakte kann mit einem Substratkontakt elektrisch verbunden sein.The semiconductor chip can have chip contacts, the substrate can have substrate contacts and at least one of the chip contacts can be electrically connected to a substrate contact.
Beispielsweise kann das Substrat ein Halbleitersubstrat mit darin angeordneten Schaltungskomponenten sein, und die Substratkontakte sind elektrisch mit Schaltungskomponenten verbunden.For example, the substrate can be a semiconductor substrate with circuit components arranged therein, and the substrate contacts are electrically connected to circuit components.
Die organische Klebstoffschicht kann derart strukturiert sein, dass Teile der organischen Klebstoffschicht zwischen Chip-Kontakten angeordnet ist.The organic adhesive layer can be structured in such a way that parts of the organic adhesive layer are arranged between chip contacts.
Beispielsweise kann die organische Klebstoffschicht derart strukturiert sein, dass Teile der organischen Klebstoffschicht zwischen Chip-Kontakten unterschiedlicher Polarität angeordnet ist.For example, the organic adhesive layer can be structured in such a way that parts of the organic adhesive layer are arranged between chip contacts of different polarity.
Gemäß Ausführungsformen kann die organische Klebstoffschicht derart strukturiert sein, dass Teile der organischen Klebstoffschicht am Rand des Halbleiterchips angeordnet sind und einen aktiven Bereich des Halbleiterchips rahmenartig umgeben.According to embodiments, the organic adhesive layer can be structured in such a way that parts of the organic adhesive layer are arranged at the edge of the semiconductor chip and surround an active area of the semiconductor chip in a frame-like manner.
Eine optoelektronische Vorrichtung gemäß Ausführungsformen umfasst das vorstehend beschriebene Halbleiterbauelement, bei dem der Halbleiterchip ein optoelektronischer Halbleiterchip ist und die in dem Halbleitersubstrat angeordneten Schaltungskomponenten geeignet sind, den optoelektronischen Halbleiterchip anzusteuern oder von dem optoelektronischen Halbleiterchip erzeugte Signale zu verarbeiten.An optoelectronic device according to embodiments comprises the semiconductor component described above, in which the semiconductor chip is an optoelectronic semiconductor chip and the circuit components arranged in the semiconductor substrate are suitable for controlling the optoelectronic semiconductor chip or for processing signals generated by the optoelectronic semiconductor chip.
Beispielsweise kann eine Vielzahl von Halbleiterchips auf dem Halbleitersubstrat angeordnet sein. In dem Halbleitersubstrat können Schaltungskomponenten angeordnet sein, die jeweils den Halbleiterchips zugeordnet sind.For example, a multiplicity of semiconductor chips can be arranged on the semiconductor substrate. Circuit components which are each assigned to the semiconductor chips can be arranged in the semiconductor substrate.
Die optoelektronische Vorrichtung kann aus einer Beleuchtungseinrichtung, einer Anzeigevorrichtung oder einer Sensorvorrichtung ausgewählt sein.The optoelectronic device can be selected from a lighting device, a display device or a sensor device.
Die begleitenden Zeichnungen dienen dem Verständnis von Ausführungsbeispielen der Erfindung. Die Zeichnungen veranschaulichen Ausführungsbeispiele und dienen zusammen mit der Beschreibung deren Erläuterung. Weitere Ausführungsbeispiele und zahlreiche der beabsichtigten Vorteile ergeben sich unmittelbar aus der nachfolgenden Detailbeschreibung. Die in den Zeichnungen gezeigten Elemente und Strukturen sind nicht notwendigerweise maßstabsgetreu zueinander dargestellt. Gleiche Bezugszeichen verweisen auf gleiche oder einander entsprechende Elemente und Strukturen.
-
1A bis1C zeigen Querschnittsansichten eines Halbleiterchips bei Durchführung des Verfahrens. -
1D und1E zeigen Querschnittsansichten eines Werkstücks bei Durchführung des Verfahrens gemäß Ausführungsformen. -
2 zeigt eine Querschnittsansicht eines Halbleiterchips bei Durchführung des Verfahrens gemäß Ausführungsformen. -
3A bis3D zeigen Beispiele von Ansichten einer Unterseite eines Halbleiterchips gemäß Ausführungsformen. -
4 fasst ein Verfahren gemäß Ausführungsformen zusammen. -
5 zeigt ein Beispiel einer Halbleitervorrichtung gemäß Ausführungsformen.
-
1A until1C show cross-sectional views of a semiconductor chip when carrying out the method. -
1D and1E show cross-sectional views of a workpiece when carrying out the method according to embodiments. -
2 FIG. 11 shows a cross-sectional view of a semiconductor chip when carrying out the method according to embodiments. -
3A until3D show examples of views of an underside of a semiconductor chip according to embodiments. -
4th summarizes a method according to embodiments. -
5 FIG. 10 shows an example of a semiconductor device according to embodiments.
In der folgenden Detailbeschreibung wird auf die begleitenden Zeichnungen Bezug genommen, die einen Teil der Offenbarung bilden und in denen zu Veranschaulichungszwecken spezifische Ausführungsbeispiele gezeigt sind. In diesem Zusammenhang wird eine Richtungsterminologie wie „Oberseite“, „Boden“, „Vorderseite“, „Rückseite“, „über“, „auf“, „vor“, „hinter“, „vorne“, „hinten“ usw. auf die Ausrichtung der gerade beschriebenen Figuren bezogen. Da die Komponenten der Ausführungsbeispiele in unterschiedlichen Orientierungen positioniert werden können, dient die Richtungsterminologie nur der Erläuterung und ist in keiner Weise einschränkend.In the following detailed description, reference is made to the accompanying drawings, which form a part of the disclosure, and in which specific exemplary embodiments are shown for purposes of illustration. In this context, directional terminology such as "top", "bottom", "front", "back", "over", "on", "in front of", "behind", "in front", "behind" etc. is applied to the Orientation related to the figures just described. Since the components of the exemplary embodiments can be positioned in different orientations, the directional terminology is only used for explanation and is in no way restrictive.
Die Beschreibung der Ausführungsbeispiele ist nicht einschränkend, da auch andere Ausführungsbeispiele existieren und strukturelle oder logische Änderungen gemacht werden können, ohne dass dabei vom durch die Patentansprüche definierten Bereich abgewichen wird. Insbesondere können Elemente von im Folgenden beschriebenen Ausführungsbeispielen mit Elementen von anderen der beschriebenen Ausführungsbeispiele kombiniert werden, sofern sich aus dem Kontext nichts anderes ergibt.The description of the exemplary embodiments is not restrictive, since other exemplary embodiments also exist and structural or logical changes can be made without deviating from the scope defined by the patent claims. In particular, elements from exemplary embodiments described below can be combined with elements from other exemplary embodiments described, unless the context indicates otherwise.
Der Begriff „vertikal“, wie er in dieser Beschreibung verwendet wird, soll eine Orientierung beschreiben, die im Wesentlichen senkrecht zu der ersten Oberfläche eines Substrats oder Halbleiterkörpers verläuft. Die vertikale Richtung kann beispielsweise einer Wachstumsrichtung beim Aufwachsen von Schichten entsprechen.The term “vertical”, as it is used in this description, is intended to describe an orientation which runs essentially perpendicular to the first surface of a substrate or semiconductor body. The vertical direction can correspond, for example, to a direction of growth when layers are grown on.
Die Begriffe „lateral“ und „horizontal“, wie in dieser Beschreibung verwendet, sollen eine Orientierung oder Ausrichtung beschreiben, die im Wesentlichen parallel zu einer ersten Oberfläche eines Substrats oder Halbleiterkörpers verläuft. Dies kann beispielsweise die Oberfläche eines Wafers oder eines Chips (Die) sein.The terms “lateral” and “horizontal”, as used in this description, are intended to describe an orientation or alignment that runs essentially parallel to a first surface of a substrate or semiconductor body. This can be the surface of a wafer or a chip (die), for example.
Die horizontale Richtung kann beispielsweise in einer Ebene senkrecht zu einer Wachstumsrichtung beim Aufwachsen von Schichten liegen.The horizontal direction can, for example, lie in a plane perpendicular to a direction of growth when layers are grown on.
Die Begriffe „Wafer“ oder „Halbleitersubstrat“, die in der folgenden Beschreibung verwendet sind, können jegliche auf Halbleiter beruhende Struktur umfassen, die eine Halbleiteroberfläche hat. Wafer und Struktur sind so zu verstehen, dass sie dotierte und undotierte Halbleiter, epitaktische Halbleiterschichten, gegebenenfalls getragen durch eine Basisunterlage, und weitere Halbleiterstrukturen einschließen. Beispielsweise kann eine Schicht aus einem ersten Halbleitermaterial auf einem Wachstumssubstrat aus einem zweiten Halbleitermaterial, beispielsweise einem GaAs-Substrat, einem GaN-Substrat oder einem Si-Substrat oder aus einem isolierenden Material, beispielsweise auf einem Saphirsubstrat, gewachsen sein.The terms “wafer” or “semiconductor substrate” used in the following description can include any semiconductor-based structure that has a semiconductor surface. Wafer and structure are to be understood to include doped and undoped semiconductors, epitaxial semiconductor layers, optionally supported by a base substrate, and further semiconductor structures. For example, a layer made of a first semiconductor material can be grown on a growth substrate made of a second semiconductor material, for example a GaAs substrate, a GaN substrate or a Si substrate or made of an insulating material, for example on a sapphire substrate.
Je nach Verwendungszweck kann der Halbleiter auf einem direkten oder einem indirekten Halbleitermaterial basieren. Beispiele für zur Erzeugung elektromagnetischer Strahlung besonders geeignete Halbleitermaterialien umfassen insbesondere Nitrid-Halbleiterverbindungen, durch die beispielsweise ultraviolettes, blaues oder langwelligeres Licht erzeugt werden kann, wie beispielsweise GaN, InGaN, AlN, AlGaN, AlGaInN, Al-GaInBN, Phosphid-Halbleiterverbindungen, durch die beispielsweise grünes oder langwelligeres Licht erzeugt werden kann, wie beispielsweise GaAsP, AlGaInP, GaP, AlGaP, sowie weitere Halbleitermaterialien wie GaAs, AlGaAs, InGaAs, AlInGaAs, SiC, ZnSe, ZnO, Ga2O3, Diamant, hexagonales BN und Kombinationen der genannten Materialien. Das stöchiometrische Verhältnis der Verbindungshalbleitermaterialien kann variieren. Weitere Beispiele für Halbleitermaterialien können Silizium, Silizium-Germanium und Germanium umfassen. Im Kontext der vorliegenden Beschreibung schließt der Begriff „Halbleiter“ auch organische Halbleitermaterialien ein.Depending on the intended use, the semiconductor can be based on a direct or an indirect semiconductor material. Examples of semiconductor materials particularly suitable for generating electromagnetic radiation include, in particular, nitride semiconductor compounds through which, for example, ultraviolet, blue or longer-wave light can be generated, such as, for example, GaN, InGaN, AlN, AlGaN, AlGaInN, Al-GaInBN, phosphide semiconductor compounds through which For example, green or longer-wave light can be generated, such as GaAsP, AlGaInP, GaP, AlGaP, and other semiconductor materials such as GaAs, AlGaAs, InGaAs, AlInGaAs, SiC, ZnSe, ZnO, Ga 2 O 3 , diamond, hexagonal BN and combinations of the above Materials. The stoichiometric ratio of the compound semiconductor materials can vary. Other examples of semiconductor materials can include silicon, silicon germanium, and germanium. In the context of the present description, the term “semiconductor” also includes organic semiconductor materials.
Der Begriff „Substrat“ umfasst generell isolierende, leitende oder Halbleitersubstrate.The term “substrate” generally includes insulating, conductive or semiconductor substrates.
Soweit hier die Begriffe „haben“, „enthalten“, „umfassen“, „aufweisen“ und dergleichen verwendet werden, handelt es sich um offene Begriffe, die auf das Vorhandensein der besagten Elemente oder Merkmale hinweisen, das Vorhandensein von weiteren Elementen oder Merkmalen aber nicht ausschließen. Die unbestimmten Artikel und die bestimmten Artikel umfassen sowohl den Plural als auch den Singular, sofern sich aus dem Zusammenhang nicht eindeutig etwas anderes ergibt.As far as the terms “have”, “contain”, “comprise”, “have” and the like are used, these are open-ended terms that indicate the presence of said elements or features, but the presence of further elements or features do not exclude. The indefinite articles and the definite articles include both the plural and the singular, unless the context clearly indicates otherwise.
Im Kontext dieser Beschreibung bedeutet der Begriff „elektrisch verbunden“ eine niederohmige elektrische Verbindung zwischen den verbundenen Elementen. Die elektrisch verbundenen Elemente müssen nicht notwendigerweise direkt miteinander verbunden sein. Weitere Elemente können zwischen elektrisch verbundenen Elementen angeordnet sein.In the context of this description, the term “electrically connected” means a low-resistance electrical connection between the connected elements. The electrically connected elements do not necessarily have to be directly connected to one another. Further elements can be arranged between electrically connected elements.
Der Begriff „elektrisch verbunden“ umfasst auch Tunnelkontakte zwischen den verbundenen Elementen.The term “electrically connected” also includes tunnel contacts between the connected elements.
Nachfolgend wird ein Halbleiterbauelement beschrieben werden, das ein zusammengesetztes Halbleiterbauelement oder auch Komposithalbleiterbauelement ist. Dieses umfasst einen auf einem Substrat angeordneten Halbleiterchip. Beispielsweise kann das Substrat ein Halbleitersubstrat sein. Dabei kann das Halbleitermaterial von Halbleitersubstrat und Halbleiterchip jeweils unterschiedlich oder auch gleich sein. Beispielsweise kann das Halbleitersubstrat ein Silizium-Substrat sein, in dem Schaltungskomponenten zum Ansteuern des Halbleiterchips oder zum Verarbeiten von Signalen, die von dem Halbleiterchip zugeführt werden, angeordnet sind. Das Substrat kann beispielsweise auch aus einem isolierenden Material aufgebaut sein. Das Komposithalbleiterbauelement kann einen oder mehrere Halbleiterchips enthalten. Gemäß weiteren Ausführungsformen kann das Halbleiterbauelement eine große Anzahl, beispielsweise mehr als 20 x 20 Halbleiterchips enthalten.A semiconductor component will be described below which is a composite semiconductor component or also a composite semiconductor component. This comprises a semiconductor chip arranged on a substrate. For example, the substrate can be a semiconductor substrate. In this case, the semiconductor material of the semiconductor substrate and the semiconductor chip can each be different or the same. For example, the semiconductor substrate can be a silicon substrate in which circuit components for controlling the semiconductor chip or for processing signals that are supplied from the semiconductor chip are arranged. The substrate can, for example, also be constructed from an insulating material. The composite semiconductor component can contain one or more semiconductor chips. According to further embodiments, the semiconductor component can contain a large number, for example more than 20 × 20 semiconductor chips.
Auch wenn die nachfolgenden Zeichnungen als Beispiel Komponenten eines Halbleiterchips darstellen, ist selbstverständlich, dass auf dem dargestellten Trägersubstrat eine Vielzahl von Halbleiterchips angeordnet sein können. Diese können beispielsweise identisch oder voneinander verschieden sein.Even if the following drawings show components of a semiconductor chip as an example, it goes without saying that a multiplicity of semiconductor chips can be arranged on the carrier substrate shown. These can, for example, be identical or different from one another.
Der in
Nachfolgend wird eine organische Klebstoffschicht
Wie in
Gemäß weiteren Ausführungsformen können die nachfolgend beschriebenen Schritte und Verfahren auch auf Waferebene durchgeführt werden. Beispielsweise kann eine Vielzahl einzelner Chips auf Waferebene gemeinsam auf ein Substrat aufgebracht werden.According to further embodiments, the steps and methods described below can also be carried out at the wafer level. For example, a large number of individual chips can be applied together on a substrate at the wafer level.
Beispielsweise kann anschließend, wie in
Über den Bondkopf 160 kann daraufhin der Halbleiterchip
Gemäß Ausführungsformen kann der Halbleiterchip
In einem nächsten Schritt wird, wie in
Wie in den
Gemäß Ausführungsformen kann die organische Klebstoffschicht in dem Halbleiterbauelement verbleiben. Gemäß weiteren Ausführungsformen kann sie nach Verbinden und Durchführen des Lötvorgangs von dem Halbleiterbauelement entfernt werden, beispielsweise durch Ätzen mit KOH.According to embodiments, the organic adhesive layer in the Semiconductor component remain. According to further embodiments, it can be removed from the semiconductor component after connecting and performing the soldering process, for example by etching with KOH.
Die aktive Zone
Ein erster Chipkontakt
Die
Gemäß weiteren Ausführungsformen kann der erste Chip-Kontakt
Gemäß Ausführungsformen, die in
Wie in den
Wie beschrieben worden ist, können unter Verwendung des beschriebenen organischen Klebstoffmaterials, das strukturiert unter dem Halbleiterchip
Obwohl hierin spezifische Ausführungsformen veranschaulicht und beschrieben worden sind, werden Fachleute erkennen, dass die gezeigten und beschriebenen spezifischen Ausführungsformen durch eine Vielzahl von alternativen und/oder äquivalenten Ausgestaltungen ersetzt werden können, ohne vom Schutzbereich der Erfindung abzuweichen. Die Anmeldung soll jegliche Anpassungen oder Variationen der hierin diskutierten spezifischen Ausführungsformen abdecken. Daher wird die Erfindung nur durch die Ansprüche und deren Äquivalente beschränkt.Although specific embodiments have been illustrated and described herein, those skilled in the art will recognize that the specific embodiments shown and described can be replaced by a variety of alternative and / or equivalent configurations without departing from the scope of the invention. The application is intended to cover any adaptations or variations of the specific embodiments discussed herein. Therefore, the invention is to be limited only by the claims and their equivalents.
BezugszeichenlisteList of reference symbols
- 11
- Optoelektronische HalbleitervorrichtungSemiconductor optoelectronic device
- 1010
- HalbleiterbauelementSemiconductor component
- 100100
- TrägersubstratCarrier substrate
- 101101
- erste Hauptoberflächefirst main interface
- 102102
- zweite Hauptoberflächesecond main surface
- 105105
- HalbleiterchipSemiconductor chip
- 110110
- HalbleiterschichtSemiconductor layer
- 120120
- LED-StrukturLED structure
- 121121
- erste Hauptoberfläche der LED-Strukturfirst main surface of the LED structure
- 122122
- erste Halbleiterschichtfirst semiconductor layer
- 123123
- aktive Zoneactive zone
- 124124
- zweite Halbleiterschichtsecond semiconductor layer
- 130130
- KontaktstrukturContact structure
- 131131
- erstes Kontaktelementfirst contact element
- 132132
- zweites Kontaktkontaktsecond contact contact
- 133133
- IsolationsmaterialInsulation material
- 139139
- LotmaterialSolder material
- 140140
- Chip-KontaktChip contact
- 141141
- erster Chip-Kontaktfirst chip contact
- 142142
- zweiter Chip-Kontaktsecond chip contact
- 150150
- strukturierte organische Klebstoffschichtstructured organic adhesive layer
- 170170
- SubstratSubstrate
- 173173
- funktionale Schichtfunctional layer
- 174174
- dielektrische Schichtdielectric layer
- 175175
- SubstratkontaktSubstrate contact
- 177177
- SchaltungskomponenteCircuit component
- 179179
- Substrat-LotmaterialSubstrate solder material
- 180180
- Substrat-AnschlusselementSubstrate connection element
Claims (15)
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EP1732116A2 (en) | 2005-06-08 | 2006-12-13 | Interuniversitair Micro-Elektronica Centrum (IMEC) | Methods for bonding and micro-electronic devices produced according to such methods |
DE102009009828A1 (en) | 2009-02-19 | 2010-09-02 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Component arrangement and method for its production |
DE102018112586A1 (en) | 2018-05-25 | 2019-11-28 | Osram Opto Semiconductors Gmbh | METHOD FOR PRODUCING A CONNECTION BETWEEN COMPONENTS AND COMPONENT |
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CN112531091A (en) * | 2020-06-12 | 2021-03-19 | 友达光电股份有限公司 | Light emitting device |
US20210391516A1 (en) * | 2020-06-12 | 2021-12-16 | Au Optronics Corporation | Light emitting device and method for manufacturing the same |
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