DE102020202613A1 - METHOD OF MANUFACTURING A SEMICONDUCTOR COMPONENT, SEMICONDUCTOR COMPONENT AND OPTOELECTRONIC DEVICE - Google Patents

METHOD OF MANUFACTURING A SEMICONDUCTOR COMPONENT, SEMICONDUCTOR COMPONENT AND OPTOELECTRONIC DEVICE Download PDF

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Publication number
DE102020202613A1
DE102020202613A1 DE102020202613.0A DE102020202613A DE102020202613A1 DE 102020202613 A1 DE102020202613 A1 DE 102020202613A1 DE 102020202613 A DE102020202613 A DE 102020202613A DE 102020202613 A1 DE102020202613 A1 DE 102020202613A1
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Prior art keywords
substrate
semiconductor
chip
adhesive layer
semiconductor chip
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DE102020202613.0A
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German (de)
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Simeon Katz
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Ams Osram International GmbH
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Osram Opto Semiconductors GmbH
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Priority to DE102020202613.0A priority Critical patent/DE102020202613A1/en
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    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/48Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor body packages
    • H01L33/62Arrangements for conducting electric current to or from the semiconductor body, e.g. lead-frames, wire-bonds or solder balls

Abstract

Ein Verfahren zur Herstellung eines Halbleiterbauelements (10) umfasst das strukturierte Aufbringen (S110) einer organischen Klebstoffschicht (150) auf einem Halbleiterchip (105) und das In-Kontaktbringen (S120) des Halbleiterchips (105) mit einem Substrat (170), wobei die organische Klebstoffschicht (150) zwischen Halbleiterchip (105) und Substrat (170) angeordnet wird.A method for producing a semiconductor component (10) comprises the structured application (S110) of an organic adhesive layer (150) on a semiconductor chip (105) and the bringing (S120) of the semiconductor chip (105) into contact with a substrate (170), the organic adhesive layer (150) is arranged between semiconductor chip (105) and substrate (170).

Description

Bei der Herstellung komplexer Halbleiterbauelemente können funktionale Elemente, beispielsweise lichtemittierende Dioden (LEDs) auf ein Substrat übertragen werden. Beispielsweise kann das Substrat ein Halbleitersubstrat sein, in dem mikroelektronische Schaltkreise angeordnet sind. Beim Übertragen der Halbleiterchips auf das Substrat findet üblicherweise ein Lötprozess statt, um die elektrischen Kontakte des Halbleiterchips mit zugehörigen elektrischen Kontakten innerhalb des Substrats zu verbinden.In the manufacture of complex semiconductor components, functional elements, for example light-emitting diodes (LEDs), can be transferred to a substrate. For example, the substrate can be a semiconductor substrate in which microelectronic circuits are arranged. When the semiconductor chips are transferred to the substrate, a soldering process usually takes place in order to connect the electrical contacts of the semiconductor chip to associated electrical contacts within the substrate.

Der vorliegenden Erfindung liegt die Aufgabe zugrunde, ein verbessertes Verfahren zur Herstellung eines Halbleiterbauelements zur Verfügung zu stellen. Weiterhin liegt der vorliegenden Erfindung die Aufgabe zugrunde, ein verbessertes Halbleiterbauelement sowie eine verbesserte optoelektronische Vorrichtung zur Verfügung zu stellen.The present invention is based on the object of providing an improved method for producing a semiconductor component. The present invention is also based on the object of providing an improved semiconductor component and an improved optoelectronic device.

Gemäß der vorliegenden Erfindung wird die Aufgabe durch den Gegenstand oder das Verfahren der unabhängigen Patentansprüche gelöst. Vorteilhafte Weiterentwicklungen sind Gegenstand der abhängigen Ansprüche.According to the present invention, the object is achieved by the subject matter or the method of the independent patent claims. Advantageous further developments are the subject of the dependent claims.

Ein Verfahren zur Herstellung eines Halbleiterbauelements umfasst das strukturierte Aufbringen einer organischen Klebstoffschicht auf einem Halbleiterchip und das In-Kontaktbringen des Halbleiterchips mit einem Substrat, wobei die organische Klebstoffschicht zwischen Halbleiterchip und Substrat angeordnet wird.A method for producing a semiconductor component comprises the structured application of an organic adhesive layer on a semiconductor chip and the bringing the semiconductor chip into contact with a substrate, the organic adhesive layer being arranged between the semiconductor chip and the substrate.

Gemäß Ausführungsformen umfasst das Verfahren weiterhin das Ausbilden von elektrischen Chip-Kontakten auf dem Halbleiterchip vor Aufbringen der organischen Klebstoffschicht und das Ausbilden von elektrischen Substratkontakten an dem Substrat. Nach dem In-Kontaktbringen des Halbleiterchips mit dem Substrat ist mindestens ein Chip-Kontakt mit mindestens einem Substratkontakt elektrisch verbunden. Die elektrischen Substratkontakte können zu einem beliebigen Zeitpunkt vor In-Kontaktbringen des Halbleiterchips mit dem Substrat ausgebildet werden.According to embodiments, the method further comprises the formation of electrical chip contacts on the semiconductor chip before application of the organic adhesive layer and the formation of electrical substrate contacts on the substrate. After the semiconductor chip has been brought into contact with the substrate, at least one chip contact is electrically connected to at least one substrate contact. The electrical substrate contacts can be formed at any point in time before the semiconductor chip is brought into contact with the substrate.

Beispielsweise kann die organische Klebstoffschicht derart strukturiert aufgebracht werden, dass sie zwischen elektrischen Chip-Kontakten angeordnet ist. Die organische Klebstoffschicht kann dabei derart strukturiert aufgebracht werden, dass sie zwischen elektrischen Chip-Kontakten unterschiedlicher Polarität angeordnet ist.For example, the organic adhesive layer can be applied in a structured manner such that it is arranged between electrical chip contacts. The organic adhesive layer can be applied in a structured manner in such a way that it is arranged between electrical chip contacts of different polarity.

Die organische Klebstoffschicht kann gemäß Ausführungsformen auch derart strukturiert aufgebracht werden, dass sie am Rand des Halbleiterchips angeordnet ist und einen aktiven Bereich des Halbleiterchips rahmenartig umgibt.According to embodiments, the organic adhesive layer can also be applied in a structured manner such that it is arranged at the edge of the semiconductor chip and surrounds an active area of the semiconductor chip in a frame-like manner.

Gemäß Ausführungsformen ist eine Vielzahl von Halbleiterchips auf einem Trägersubstrat angeordnet. Die Vielzahl von Halbleiterchips wird mit dem Substrat verbunden, wobei das Trägersubstrat nach dem Verbinden abgelöst wird.According to embodiments, a multiplicity of semiconductor chips are arranged on a carrier substrate. The plurality of semiconductor chips is connected to the substrate, the carrier substrate being detached after the connection.

Gemäß Ausführungsformen umfasst ein Halbleiterbauelement ein Substrat, einen über dem Substrat angeordneten Halbleiterchip, sowie eine strukturierte organische Klebstoffschicht, die zwischen Halbleiterchip und Substrat angeordnet ist.According to embodiments, a semiconductor component comprises a substrate, a semiconductor chip arranged above the substrate, and a structured organic adhesive layer arranged between the semiconductor chip and the substrate.

Der Halbleiterchip kann Chip-Kontakte aufweisen, das Substrat kann Substratkontakte aufweisen und mindestens einer der Chip-Kontakte kann mit einem Substratkontakt elektrisch verbunden sein.The semiconductor chip can have chip contacts, the substrate can have substrate contacts and at least one of the chip contacts can be electrically connected to a substrate contact.

Beispielsweise kann das Substrat ein Halbleitersubstrat mit darin angeordneten Schaltungskomponenten sein, und die Substratkontakte sind elektrisch mit Schaltungskomponenten verbunden.For example, the substrate can be a semiconductor substrate with circuit components arranged therein, and the substrate contacts are electrically connected to circuit components.

Die organische Klebstoffschicht kann derart strukturiert sein, dass Teile der organischen Klebstoffschicht zwischen Chip-Kontakten angeordnet ist.The organic adhesive layer can be structured in such a way that parts of the organic adhesive layer are arranged between chip contacts.

Beispielsweise kann die organische Klebstoffschicht derart strukturiert sein, dass Teile der organischen Klebstoffschicht zwischen Chip-Kontakten unterschiedlicher Polarität angeordnet ist.For example, the organic adhesive layer can be structured in such a way that parts of the organic adhesive layer are arranged between chip contacts of different polarity.

Gemäß Ausführungsformen kann die organische Klebstoffschicht derart strukturiert sein, dass Teile der organischen Klebstoffschicht am Rand des Halbleiterchips angeordnet sind und einen aktiven Bereich des Halbleiterchips rahmenartig umgeben.According to embodiments, the organic adhesive layer can be structured in such a way that parts of the organic adhesive layer are arranged at the edge of the semiconductor chip and surround an active area of the semiconductor chip in a frame-like manner.

Eine optoelektronische Vorrichtung gemäß Ausführungsformen umfasst das vorstehend beschriebene Halbleiterbauelement, bei dem der Halbleiterchip ein optoelektronischer Halbleiterchip ist und die in dem Halbleitersubstrat angeordneten Schaltungskomponenten geeignet sind, den optoelektronischen Halbleiterchip anzusteuern oder von dem optoelektronischen Halbleiterchip erzeugte Signale zu verarbeiten.An optoelectronic device according to embodiments comprises the semiconductor component described above, in which the semiconductor chip is an optoelectronic semiconductor chip and the circuit components arranged in the semiconductor substrate are suitable for controlling the optoelectronic semiconductor chip or for processing signals generated by the optoelectronic semiconductor chip.

Beispielsweise kann eine Vielzahl von Halbleiterchips auf dem Halbleitersubstrat angeordnet sein. In dem Halbleitersubstrat können Schaltungskomponenten angeordnet sein, die jeweils den Halbleiterchips zugeordnet sind.For example, a multiplicity of semiconductor chips can be arranged on the semiconductor substrate. Circuit components which are each assigned to the semiconductor chips can be arranged in the semiconductor substrate.

Die optoelektronische Vorrichtung kann aus einer Beleuchtungseinrichtung, einer Anzeigevorrichtung oder einer Sensorvorrichtung ausgewählt sein.The optoelectronic device can be selected from a lighting device, a display device or a sensor device.

Die begleitenden Zeichnungen dienen dem Verständnis von Ausführungsbeispielen der Erfindung. Die Zeichnungen veranschaulichen Ausführungsbeispiele und dienen zusammen mit der Beschreibung deren Erläuterung. Weitere Ausführungsbeispiele und zahlreiche der beabsichtigten Vorteile ergeben sich unmittelbar aus der nachfolgenden Detailbeschreibung. Die in den Zeichnungen gezeigten Elemente und Strukturen sind nicht notwendigerweise maßstabsgetreu zueinander dargestellt. Gleiche Bezugszeichen verweisen auf gleiche oder einander entsprechende Elemente und Strukturen.

  • 1A bis 1C zeigen Querschnittsansichten eines Halbleiterchips bei Durchführung des Verfahrens.
  • 1D und 1E zeigen Querschnittsansichten eines Werkstücks bei Durchführung des Verfahrens gemäß Ausführungsformen.
  • 2 zeigt eine Querschnittsansicht eines Halbleiterchips bei Durchführung des Verfahrens gemäß Ausführungsformen.
  • 3A bis 3D zeigen Beispiele von Ansichten einer Unterseite eines Halbleiterchips gemäß Ausführungsformen.
  • 4 fasst ein Verfahren gemäß Ausführungsformen zusammen.
  • 5 zeigt ein Beispiel einer Halbleitervorrichtung gemäß Ausführungsformen.
The accompanying drawings serve to understand exemplary embodiments of the invention. The drawings illustrate exemplary embodiments and, together with the description, serve to explain them. Further exemplary embodiments and numerous of the intended advantages result directly from the following detailed description. The elements and structures shown in the drawings are not necessarily shown true to scale with respect to one another. The same reference symbols refer to the same or corresponding elements and structures.
  • 1A until 1C show cross-sectional views of a semiconductor chip when carrying out the method.
  • 1D and 1E show cross-sectional views of a workpiece when carrying out the method according to embodiments.
  • 2 FIG. 11 shows a cross-sectional view of a semiconductor chip when carrying out the method according to embodiments.
  • 3A until 3D show examples of views of an underside of a semiconductor chip according to embodiments.
  • 4th summarizes a method according to embodiments.
  • 5 FIG. 10 shows an example of a semiconductor device according to embodiments.

In der folgenden Detailbeschreibung wird auf die begleitenden Zeichnungen Bezug genommen, die einen Teil der Offenbarung bilden und in denen zu Veranschaulichungszwecken spezifische Ausführungsbeispiele gezeigt sind. In diesem Zusammenhang wird eine Richtungsterminologie wie „Oberseite“, „Boden“, „Vorderseite“, „Rückseite“, „über“, „auf“, „vor“, „hinter“, „vorne“, „hinten“ usw. auf die Ausrichtung der gerade beschriebenen Figuren bezogen. Da die Komponenten der Ausführungsbeispiele in unterschiedlichen Orientierungen positioniert werden können, dient die Richtungsterminologie nur der Erläuterung und ist in keiner Weise einschränkend.In the following detailed description, reference is made to the accompanying drawings, which form a part of the disclosure, and in which specific exemplary embodiments are shown for purposes of illustration. In this context, directional terminology such as "top", "bottom", "front", "back", "over", "on", "in front of", "behind", "in front", "behind" etc. is applied to the Orientation related to the figures just described. Since the components of the exemplary embodiments can be positioned in different orientations, the directional terminology is only used for explanation and is in no way restrictive.

Die Beschreibung der Ausführungsbeispiele ist nicht einschränkend, da auch andere Ausführungsbeispiele existieren und strukturelle oder logische Änderungen gemacht werden können, ohne dass dabei vom durch die Patentansprüche definierten Bereich abgewichen wird. Insbesondere können Elemente von im Folgenden beschriebenen Ausführungsbeispielen mit Elementen von anderen der beschriebenen Ausführungsbeispiele kombiniert werden, sofern sich aus dem Kontext nichts anderes ergibt.The description of the exemplary embodiments is not restrictive, since other exemplary embodiments also exist and structural or logical changes can be made without deviating from the scope defined by the patent claims. In particular, elements from exemplary embodiments described below can be combined with elements from other exemplary embodiments described, unless the context indicates otherwise.

Der Begriff „vertikal“, wie er in dieser Beschreibung verwendet wird, soll eine Orientierung beschreiben, die im Wesentlichen senkrecht zu der ersten Oberfläche eines Substrats oder Halbleiterkörpers verläuft. Die vertikale Richtung kann beispielsweise einer Wachstumsrichtung beim Aufwachsen von Schichten entsprechen.The term “vertical”, as it is used in this description, is intended to describe an orientation which runs essentially perpendicular to the first surface of a substrate or semiconductor body. The vertical direction can correspond, for example, to a direction of growth when layers are grown on.

Die Begriffe „lateral“ und „horizontal“, wie in dieser Beschreibung verwendet, sollen eine Orientierung oder Ausrichtung beschreiben, die im Wesentlichen parallel zu einer ersten Oberfläche eines Substrats oder Halbleiterkörpers verläuft. Dies kann beispielsweise die Oberfläche eines Wafers oder eines Chips (Die) sein.The terms “lateral” and “horizontal”, as used in this description, are intended to describe an orientation or alignment that runs essentially parallel to a first surface of a substrate or semiconductor body. This can be the surface of a wafer or a chip (die), for example.

Die horizontale Richtung kann beispielsweise in einer Ebene senkrecht zu einer Wachstumsrichtung beim Aufwachsen von Schichten liegen.The horizontal direction can, for example, lie in a plane perpendicular to a direction of growth when layers are grown on.

Die Begriffe „Wafer“ oder „Halbleitersubstrat“, die in der folgenden Beschreibung verwendet sind, können jegliche auf Halbleiter beruhende Struktur umfassen, die eine Halbleiteroberfläche hat. Wafer und Struktur sind so zu verstehen, dass sie dotierte und undotierte Halbleiter, epitaktische Halbleiterschichten, gegebenenfalls getragen durch eine Basisunterlage, und weitere Halbleiterstrukturen einschließen. Beispielsweise kann eine Schicht aus einem ersten Halbleitermaterial auf einem Wachstumssubstrat aus einem zweiten Halbleitermaterial, beispielsweise einem GaAs-Substrat, einem GaN-Substrat oder einem Si-Substrat oder aus einem isolierenden Material, beispielsweise auf einem Saphirsubstrat, gewachsen sein.The terms “wafer” or “semiconductor substrate” used in the following description can include any semiconductor-based structure that has a semiconductor surface. Wafer and structure are to be understood to include doped and undoped semiconductors, epitaxial semiconductor layers, optionally supported by a base substrate, and further semiconductor structures. For example, a layer made of a first semiconductor material can be grown on a growth substrate made of a second semiconductor material, for example a GaAs substrate, a GaN substrate or a Si substrate or made of an insulating material, for example on a sapphire substrate.

Je nach Verwendungszweck kann der Halbleiter auf einem direkten oder einem indirekten Halbleitermaterial basieren. Beispiele für zur Erzeugung elektromagnetischer Strahlung besonders geeignete Halbleitermaterialien umfassen insbesondere Nitrid-Halbleiterverbindungen, durch die beispielsweise ultraviolettes, blaues oder langwelligeres Licht erzeugt werden kann, wie beispielsweise GaN, InGaN, AlN, AlGaN, AlGaInN, Al-GaInBN, Phosphid-Halbleiterverbindungen, durch die beispielsweise grünes oder langwelligeres Licht erzeugt werden kann, wie beispielsweise GaAsP, AlGaInP, GaP, AlGaP, sowie weitere Halbleitermaterialien wie GaAs, AlGaAs, InGaAs, AlInGaAs, SiC, ZnSe, ZnO, Ga2O3, Diamant, hexagonales BN und Kombinationen der genannten Materialien. Das stöchiometrische Verhältnis der Verbindungshalbleitermaterialien kann variieren. Weitere Beispiele für Halbleitermaterialien können Silizium, Silizium-Germanium und Germanium umfassen. Im Kontext der vorliegenden Beschreibung schließt der Begriff „Halbleiter“ auch organische Halbleitermaterialien ein.Depending on the intended use, the semiconductor can be based on a direct or an indirect semiconductor material. Examples of semiconductor materials particularly suitable for generating electromagnetic radiation include, in particular, nitride semiconductor compounds through which, for example, ultraviolet, blue or longer-wave light can be generated, such as, for example, GaN, InGaN, AlN, AlGaN, AlGaInN, Al-GaInBN, phosphide semiconductor compounds through which For example, green or longer-wave light can be generated, such as GaAsP, AlGaInP, GaP, AlGaP, and other semiconductor materials such as GaAs, AlGaAs, InGaAs, AlInGaAs, SiC, ZnSe, ZnO, Ga 2 O 3 , diamond, hexagonal BN and combinations of the above Materials. The stoichiometric ratio of the compound semiconductor materials can vary. Other examples of semiconductor materials can include silicon, silicon germanium, and germanium. In the context of the present description, the term “semiconductor” also includes organic semiconductor materials.

Der Begriff „Substrat“ umfasst generell isolierende, leitende oder Halbleitersubstrate.The term “substrate” generally includes insulating, conductive or semiconductor substrates.

Soweit hier die Begriffe „haben“, „enthalten“, „umfassen“, „aufweisen“ und dergleichen verwendet werden, handelt es sich um offene Begriffe, die auf das Vorhandensein der besagten Elemente oder Merkmale hinweisen, das Vorhandensein von weiteren Elementen oder Merkmalen aber nicht ausschließen. Die unbestimmten Artikel und die bestimmten Artikel umfassen sowohl den Plural als auch den Singular, sofern sich aus dem Zusammenhang nicht eindeutig etwas anderes ergibt.As far as the terms “have”, “contain”, “comprise”, “have” and the like are used, these are open-ended terms that indicate the presence of said elements or features, but the presence of further elements or features do not exclude. The indefinite articles and the definite articles include both the plural and the singular, unless the context clearly indicates otherwise.

Im Kontext dieser Beschreibung bedeutet der Begriff „elektrisch verbunden“ eine niederohmige elektrische Verbindung zwischen den verbundenen Elementen. Die elektrisch verbundenen Elemente müssen nicht notwendigerweise direkt miteinander verbunden sein. Weitere Elemente können zwischen elektrisch verbundenen Elementen angeordnet sein.In the context of this description, the term “electrically connected” means a low-resistance electrical connection between the connected elements. The electrically connected elements do not necessarily have to be directly connected to one another. Further elements can be arranged between electrically connected elements.

Der Begriff „elektrisch verbunden“ umfasst auch Tunnelkontakte zwischen den verbundenen Elementen.The term “electrically connected” also includes tunnel contacts between the connected elements.

Nachfolgend wird ein Halbleiterbauelement beschrieben werden, das ein zusammengesetztes Halbleiterbauelement oder auch Komposithalbleiterbauelement ist. Dieses umfasst einen auf einem Substrat angeordneten Halbleiterchip. Beispielsweise kann das Substrat ein Halbleitersubstrat sein. Dabei kann das Halbleitermaterial von Halbleitersubstrat und Halbleiterchip jeweils unterschiedlich oder auch gleich sein. Beispielsweise kann das Halbleitersubstrat ein Silizium-Substrat sein, in dem Schaltungskomponenten zum Ansteuern des Halbleiterchips oder zum Verarbeiten von Signalen, die von dem Halbleiterchip zugeführt werden, angeordnet sind. Das Substrat kann beispielsweise auch aus einem isolierenden Material aufgebaut sein. Das Komposithalbleiterbauelement kann einen oder mehrere Halbleiterchips enthalten. Gemäß weiteren Ausführungsformen kann das Halbleiterbauelement eine große Anzahl, beispielsweise mehr als 20 x 20 Halbleiterchips enthalten.A semiconductor component will be described below which is a composite semiconductor component or also a composite semiconductor component. This comprises a semiconductor chip arranged on a substrate. For example, the substrate can be a semiconductor substrate. In this case, the semiconductor material of the semiconductor substrate and the semiconductor chip can each be different or the same. For example, the semiconductor substrate can be a silicon substrate in which circuit components for controlling the semiconductor chip or for processing signals that are supplied from the semiconductor chip are arranged. The substrate can, for example, also be constructed from an insulating material. The composite semiconductor component can contain one or more semiconductor chips. According to further embodiments, the semiconductor component can contain a large number, for example more than 20 × 20 semiconductor chips.

Auch wenn die nachfolgenden Zeichnungen als Beispiel Komponenten eines Halbleiterchips darstellen, ist selbstverständlich, dass auf dem dargestellten Trägersubstrat eine Vielzahl von Halbleiterchips angeordnet sein können. Diese können beispielsweise identisch oder voneinander verschieden sein.Even if the following drawings show components of a semiconductor chip as an example, it goes without saying that a multiplicity of semiconductor chips can be arranged on the carrier substrate shown. These can, for example, be identical or different from one another.

1A zeigt ein Trägersubstrat 100 mit einer Vielzahl von darauf angeordneten Halbleiterkomponenten. Beispielsweise kann das Trägersubstrat ein Saphirsubstrat, beispielsweise ein Saphir-Wafer sein. Eine Halbleiterschicht 110 kann über einer ersten Hauptoberfläche 101 des Trägersubstrats 100 angeordnet sein. Das Trägersubstrat 100 kann beispielsweise ein Wachstumssubstrat für das Aufwachsen der Halbleiterschicht 110 sein. Über der Halbleiterschicht 110 kann beispielsweise eine LED-Struktur 120 aufgebracht sein. Einzelheiten eines Beispiels einer LED-Struktur 120 werden nachfolgend in 2 näher erläutert werden. 1A shows a carrier substrate 100 with a plurality of semiconductor components arranged thereon. For example, the carrier substrate can be a sapphire substrate, for example a sapphire wafer. A semiconductor layer 110 can over a first major surface 101 of the carrier substrate 100 be arranged. The carrier substrate 100 can, for example, be a growth substrate for the growth of the semiconductor layer 110 be. Over the semiconductor layer 110 can for example be an LED structure 120 be upset. Details of an example of an LED structure 120 are below in 2 are explained in more detail.

Der in 1A dargestellte Halbleiterchip umfasst weiterhin Kontaktstrukturen 130 zum Kontaktieren funktionaler Schichten beispielsweise der LED-Struktur 120. Weiterhin ist Lotmaterial 139 strukturiert in Kontakt mit den Kontaktstrukturen 130 angeordnet. Das Lotmaterial 139 kann beispielsweise über einer sich ergebenden Oberfläche der LED-Struktur und der Kontaktstruktur 130 angeordnet sein. Das Lotmaterial 139 kann gegenüber einer ersten Hauptoberfläche 121 der LED-Struktur 120 hervorstehen. Obwohl der hier gezeigte Halbleiterchip 105 als Beispiel als LED-Struktur beschrieben wird, ist selbstverständlich, dass er jede andere Art von optischem Bauelement realisieren kann, beispielsweise einen Sensor und anderes. Gemäß weiteren Ausführungsformen kann der Halbleiterchip 105 auch ein von einem optoelektronischen Halbleiterchip verschiedener Halbleiterchip sein. Beispielsweise können beliebige funktionale Einheiten wie beispielsweise Transistoren, Dioden oder andere in dem Halbleiterchip 105 angeordnet sein. Das strukturierte Lotmaterial 139 stellt die Chip-Kontakte 140 dar. Beispielsweise kann das Lotmaterial der Chipkontakte 140 eine AuSn-Legierung umfassen.The in 1A The semiconductor chip shown further comprises contact structures 130 for contacting functional layers, for example the LED structure 120 . Furthermore is solder material 139 structured in contact with the contact structures 130 arranged. The solder material 139 can, for example, over a resulting surface of the LED structure and the contact structure 130 be arranged. The solder material 139 can opposite a first main surface 121 the LED structure 120 protrude. Although the semiconductor chip shown here 105 is described as an example as an LED structure, it goes without saying that it can implement any other type of optical component, for example a sensor and others. According to further embodiments, the semiconductor chip 105 also be a semiconductor chip different from an optoelectronic semiconductor chip. For example, any functional units such as transistors, diodes or others can be in the semiconductor chip 105 be arranged. The structured solder material 139 represents the chip contacts 140 represents. For example, the solder material of the chip contacts 140 comprise an AuSn alloy.

Nachfolgend wird eine organische Klebstoffschicht 150 strukturiert über dem Halbleiterchip 105 aufgebracht. Die organische Klebstoffschicht kann beispielsweise BCB (Benzocyclobuten) umfassen. Es kann aber auch ein anderes Material, beispielsweise ein Harz, beispielsweise Epoxydharz oder ein Fotolack verwendet werden. Wichtig ist, dass es aufgrund seiner Elastizität plastisch verformbar ist. Beispielsweise kann es einen Young Modulus von ≤ 2 GPa haben. Das organische Klebstoffmaterial kann selbst fotoaktive Substanzen enthalten, so dass er direkt fotolithographisch strukturierbar ist. Gemäß weiteren Ausführungsformen kann der organische Klebstoff auch unter Verwendung eines zusätzlichen Fotoresist-Materials strukturiert werden. Beispielsweise kann der organische Klebstoff ganzflächig aufgebracht und von vorbestimmten Stellen entfernt werden, so dass das Klebstoffmaterial nur an anderen vorbestimmten Stellen vorliegt. Der Begriff „strukturiertes Aufbringen“ bedeutet, dass als Ergebnis das organische Klebstoffmaterial an bestimmten Stellen vorliegt und von anderen Stellen entfernt ist.Below is an organic adhesive layer 150 structured over the semiconductor chip 105 upset. The organic adhesive layer can comprise, for example, BCB (benzocyclobutene). However, another material, for example a resin, for example epoxy resin or a photoresist, can also be used. It is important that it is plastically deformable due to its elasticity. For example, it can have a Young's modulus of ≤ 2 GPa. The organic adhesive material can itself contain photoactive substances, so that it can be structured directly photolithographically. According to further embodiments, the organic adhesive can also be structured using an additional photoresist material. For example, the organic adhesive can be applied over the entire surface and removed from predetermined locations, so that the adhesive material is only present at other predetermined locations. The term “structured application” means that, as a result, the organic adhesive material is present in certain places and is removed from other places.

Wie in 1B dargestellt ist, kann die organische Klebstoffschicht 150 derart strukturiert werden, dass sie zwischen benachbarten Chip-Kontakten 140 angeordnet ist. Durch Anordnung des organischen Klebstoffschicht zwischen benachbarten Chip-Kontakten 140 kann, wie später noch veranschaulicht werden wird, bei einem nachfolgenden Lötverfahren Kurzschlüsse der Chip-Kontakte 140 vermieden werden. Die organische Klebstoffschicht kann beispielsweise eine Schichtdicke von ein paar 100 nm bis zu mehreren µm haben. Die Schichtdicke der organischen Klebstoffschicht 150 kann größer als die Schichtdicke der Chip-Kontakte 140 oder des strukturierten Lotmaterials 139 sein. Beispielsweise kann ein Abstand der freiliegenden Oberfläche der organischen Klebstoffschicht zur ersten Hauptoberfläche 121 des Halbleiterchips 105 größer als ein Abstand der freiliegenden Oberfläche der Chip-Kontakte 140 zur ersten Hauptoberfläche 121 des Halbleiterchips 105 sein.As in 1B is shown, the organic adhesive layer 150 be structured in such a way that they are between adjacent chip contacts 140 is arranged. By arranging the organic adhesive layer between adjacent chip contacts 140 can, as later will be illustrated, short circuits of the chip contacts in a subsequent soldering process 140 be avoided. The organic adhesive layer can, for example, have a layer thickness of a few 100 nm up to several μm. The thickness of the organic adhesive layer 150 can be greater than the layer thickness of the chip contacts 140 or the structured solder material 139 be. For example, a distance between the exposed surface of the organic adhesive layer and the first main surface can be 121 of the semiconductor chip 105 greater than a distance between the exposed surface of the chip contacts 140 to the first main interface 121 of the semiconductor chip 105 be.

1B zeigt einen Halbleiterchip 105 mit einer strukturierten anorganischen Klebstoffschicht 150. Gemäß Ausführungsformen kann beispielsweise das Trägersubstrat 100 anschließend gedünnt werden. Weiterhin können nachfolgend einzelne, auf dem Trägersubstrat 100 angeordnete und beispielsweise gemeinsam prozessierte Halbleiterchips voneinander getrennt werden. Beispielsweise kann dies erfolgen, indem die LED-Struktur und die Halbleiterschicht 110 lokal durchtrennt werden. Gemäß weiteren Ausführungsformen ist es auch möglich, das Trägersubstrat 100 mit den darauf aufgebrachten Schichten in einzelne Chips 105 zu zersägen. 1B shows a semiconductor chip 105 with a structured inorganic adhesive layer 150 . According to embodiments, for example, the carrier substrate 100 then be thinned. Furthermore, individual, on the carrier substrate 100 arranged and, for example, jointly processed semiconductor chips are separated from one another. For example, this can be done by adding the LED structure and the semiconductor layer 110 be severed locally. According to further embodiments, it is also possible for the carrier substrate 100 with the layers applied to them into individual chips 105 to saw up.

Gemäß weiteren Ausführungsformen können die nachfolgend beschriebenen Schritte und Verfahren auch auf Waferebene durchgeführt werden. Beispielsweise kann eine Vielzahl einzelner Chips auf Waferebene gemeinsam auf ein Substrat aufgebracht werden.According to further embodiments, the steps and methods described below can also be carried out at the wafer level. For example, a large number of individual chips can be applied together on a substrate at the wafer level.

Beispielsweise kann anschließend, wie in 1C dargestellt, nun das Trägersubstrat 100 an seiner zweiten Hauptoberfläche 102 in Kontakt mit einem Bondkopf 160 gebracht werden.For example, as in 1C shown, now the carrier substrate 100 on its second major surface 102 be brought into contact with a bondhead 160.

Über den Bondkopf 160 kann daraufhin der Halbleiterchip 105, wie in 1D veranschaulicht ist, mit einem Substrat 170 in Kontakt gebracht werden. Beispielsweise können auf oder in dem Substrat 170 Schaltungskomponenten 177, beispielsweise Transistoren und andere Bauelemente angeordnet sein. Die Komponenten innerhalb des Substrats 170 können beispielsweise über Substratkontakte 175 nach außen oder mit entsprechenden Kontakten des Halbleiterchips 105 verbunden werden. Entsprechend kann beispielsweise über den Substratkontakten 175 ein Substrat-Lotmaterial 179 aufgebracht und strukturiert sein. Zusätzlich können über dem Substrat 170 funktionale Schichten 173 sowie dielektrische Schichten 174 aufgebracht sein. Das Substrat 170 kann beispielsweise ein Siliziumsubstrat oder auch ein anderes Halbleitermaterial umfassen. Das Halbleitermaterial des Substrats 170 kann beispielsweise von dem Material der Halbleiterschicht 110 oder des Trägersubstrats 100 verschieden sein.The semiconductor chip can then be via the bondhead 160 105 , as in 1D is illustrated with a substrate 170 be brought into contact. For example, on or in the substrate 170 Circuit components 177 , for example transistors and other components. The components within the substrate 170 can for example via substrate contacts 175 to the outside or with corresponding contacts of the semiconductor chip 105 get connected. Correspondingly, for example, via the substrate contacts 175 a substrate braze material 179 be applied and structured. In addition, above the substrate 170 functional layers 173 as well as dielectric layers 174 be upset. The substrate 170 can for example comprise a silicon substrate or also another semiconductor material. The semiconductor material of the substrate 170 can, for example, from the material of the semiconductor layer 110 or the carrier substrate 100 to be different.

Gemäß Ausführungsformen kann der Halbleiterchip 105 bei erhöhter Temperatur mit dem Substrat 170 in Kontakt gebracht werden. Beispielsweise kann die Temperatur höher als 100°C sein. Auf diese Weise wird der Halbleiterchip 105 unabhängig von einem Lötvorgang mit dem Substrat 170 mechanisch verbunden. Beispielsweise erfolgt die Positionierung des Halbleiterchips dergestalt, dass die Chip-Kontakte 140 mit dem strukturierten Substrat-Lotmaterial 179 oder den Substrat-Anschlusselementen 180 räumlich überlappen, so dass sie miteinander verbunden werden können. Gemäß Ausführungsformen kann ein einzelner Halbleiterchip 105 mit dem Substrat 170 in Kontakt gebracht werden. Gemäß weiteren Ausführungsformen kann auch eine Vielzahl von Halbleiterchips 105 mit dem Substrat 170 in Kontakt gebracht werden. Beispielsweise kann eine Vielzahl von Halbleiterchips 105 auf einem Halbleiterwafer mit dem Substrat 170 in Kontakt gebracht werden.According to embodiments, the semiconductor chip 105 at elevated temperature with the substrate 170 be brought into contact. For example, the temperature can be higher than 100 ° C. In this way the semiconductor chip becomes 105 independent of a soldering process with the substrate 170 mechanically connected. For example, the semiconductor chip is positioned such that the chip contacts 140 with the structured substrate solder material 179 or the substrate connection elements 180 spatially overlap so that they can be connected to one another. According to embodiments, a single semiconductor chip 105 with the substrate 170 be brought into contact. According to further embodiments, a multiplicity of semiconductor chips can also be used 105 with the substrate 170 be brought into contact. For example, a variety of semiconductor chips 105 on a semiconductor wafer with the substrate 170 be brought into contact.

In einem nächsten Schritt wird, wie in 1E dargestellt ist, ein Lötvorgang bei erhöhter Temperatur, beispielsweise etwa mehr als 300°C, beispielsweise 320°C durchgeführt. Auf diese Weise können die Chip-Kontakte 140 mit den Substrat-Anschlusselementen 180 elektrisch verbunden werden. Danach kann beispielsweise der Bondkopf 160 von der zweiten Hauptoberfläche 102 des Trägersubstrats 100 entfernt werden. Als Ergebnis kann beispielsweise das in 1E gezeigte Halbleiterbauelement 10 erhalten werden. Das Halbleiterbauelement 10 umfasst ein Substrat 170 und einen über dem Substrat 170 angeordneten Halbleiterchip, sowie eine strukturierte organische Klebstoffschicht 150, die zwischen Halbleiterchip 105 und Substrat 170 angeordnet ist. Der Halbleiterchip 105 weist beispielsweise Chip-Kontakte 140 auf, und das Substrat 170 weist Substratkontakte 175 auf. Mindestens einer der Chip-Kontakte 140 ist mit einem der Substratkontakte 175 elektrisch verbunden. Wie in 1E dargestellt ist, kann gemäß Ausführungsformen das Substrat 170 ein Halbleitersubstrat mit darin angeordneten Schaltungskomponenten 177 sein, und die Substratkontakte 175 sind mit Schaltungskomponenten 177 elektrisch verbunden.In a next step, as in 1E is shown, a soldering process is carried out at an elevated temperature, for example approximately more than 300 ° C, for example 320 ° C. This way the chip contacts 140 with the substrate connection elements 180 be electrically connected. Thereafter, for example, the bondhead 160 can be removed from the second main surface 102 of the carrier substrate 100 removed. As a result, for example, the in 1E Semiconductor component shown 10 can be obtained. The semiconductor component 10 comprises a substrate 170 and one above the substrate 170 arranged semiconductor chip, as well as a structured organic adhesive layer 150 that between semiconductor chip 105 and substrate 170 is arranged. The semiconductor chip 105 has chip contacts, for example 140 on, and the substrate 170 has substrate contacts 175 on. At least one of the chip contacts 140 is with one of the substrate contacts 175 electrically connected. As in 1E is shown, according to embodiments, the substrate 170 a semiconductor substrate with circuit components arranged therein 177 be, and the substrate contacts 175 are with circuit components 177 electrically connected.

Wie in den 1D und 1E veranschaulicht ist, wird beim In-Kontaktbringen des Halbleiterchips mit dem Substrat zunächst der Halbleiterchip 105 über die organische Klebstoffschicht 150 mit dem Substrat verbunden. Sodann findet ein Verbinden bzw. ein Bondprozess der Chip-Kontakte 140 mit den Substratkontakten 175 statt, so dass eine elektrische Verbindung realisiert wird.As in the 1D and 1E is illustrated, when the semiconductor chip is brought into contact with the substrate, the semiconductor chip is initially used 105 via the organic adhesive layer 150 connected to the substrate. Then there is a connection or a bonding process of the chip contacts 140 with the substrate contacts 175 instead, so that an electrical connection is realized.

Gemäß Ausführungsformen kann die organische Klebstoffschicht in dem Halbleiterbauelement verbleiben. Gemäß weiteren Ausführungsformen kann sie nach Verbinden und Durchführen des Lötvorgangs von dem Halbleiterbauelement entfernt werden, beispielsweise durch Ätzen mit KOH.According to embodiments, the organic adhesive layer in the Semiconductor component remain. According to further embodiments, it can be removed from the semiconductor component after connecting and performing the soldering process, for example by etching with KOH.

2 zeigt weitere Komponenten des Halbleiterchips 105. Beispielsweise kann die LED-Struktur 120 eine erste Halbleiterschicht 122 von einem ersten Leitfähigkeitstyp, beispielsweise n-Typ sowie eine zweite Halbleiterschicht 124 von einem zweiten Leitfähigkeitstyp, beispielsweise p-Typ aufweisen. Eine aktive Zone 123 kann zwischen der ersten Halbleiterschicht 122 und der zweiten Halbleiterschicht 124 angeordnet sein. 2 shows further components of the semiconductor chip 105 . For example, the LED structure 120 a first semiconductor layer 122 of a first conductivity type, for example n-type, and a second semiconductor layer 124 of a second conductivity type, for example p-type. An active zone 123 may be between the first semiconductor layer 122 and the second semiconductor layer 124 be arranged.

Die aktive Zone 123 kann beispielsweise einen pn-Übergang, eine Doppelheterostruktur, eine Einfach-Quantentopf-Struktur (SQW, single quantum well) oder eine Mehrfach-Quantentopf-Struktur (MQW, multi quantum well) zur Strahlungserzeugung aufweisen. Die Bezeichnung „Quantentopf-Struktur“ entfaltet hierbei keine Bedeutung hinsichtlich der Dimensionalität der Quantisierung. Sie umfasst somit unter anderem Quantentröge, Quantendrähte und Quantenpunkte sowie jede Kombination dieser Schichten.The active zone 123 can for example have a pn junction, a double heterostructure, a single quantum well structure (SQW, single quantum well) or a multiple quantum well structure (MQW, multi quantum well) for generating radiation. The term “quantum well structure” has no meaning with regard to the dimensionality of the quantization. It thus includes, among other things, quantum wells, quantum wires and quantum dots as well as any combination of these layers.

Ein erster Chipkontakt 141 kann über ein erstes Kontaktelement 131 mit der ersten Halbleiterschicht 122 elektrisch verbunden sein. Beispielsweise kann das erste Kontaktelement 131 über ein dielektrisches Isolationsmaterial 133 von der zweiten Halbleiterschicht 124 isoliert sein. Ein zweiter Chipkontakt 142 kann über ein zweites Kontaktelement 132 mit der zweiten Halbleiterschicht 124 verbunden sein. Das zweite Kontaktelement 132 kann über ein Isolationsmaterial 133 gegenüber der ersten Halbleiterschicht 122 isoliert sein. Es ist selbstverständlich, dass die LED-Struktur 120 auch einen anderen Aufbau haben kann. Wie in 2 gezeigt ist, umfasst ein Halbleiterchip 105 einen ersten Chipkontakt 141 und einen zweiten Chipkontakt 142. Die strukturierte organische Klebstoffschicht 150 kann den Zwischenraum zwischen dem ersten Chip-Kontakt 141 und dem zweiten Chip-Kontakt 142 füllen, so dass eine zufällige Verbindung oder ein Kurzschluss des Lots zwischen dem ersten und dem zweiten Chip-Kontakt 141, 142 verhindert wird.A first chip contact 141 can have a first contact element 131 with the first semiconductor layer 122 be electrically connected. For example, the first contact element 131 via a dielectric insulation material 133 from the second semiconductor layer 124 be isolated. A second chip contact 142 can have a second contact element 132 with the second semiconductor layer 124 be connected. The second contact element 132 can have an insulation material 133 compared to the first semiconductor layer 122 be isolated. It goes without saying that the LED structure 120 can also have a different structure. As in 2 shown comprises a semiconductor chip 105 a first chip contact 141 and a second chip contact 142 . The structured organic adhesive layer 150 can reduce the gap between the first chip contact 141 and the second chip contact 142 fill, so that an accidental connection or a short circuit of the solder between the first and the second chip contact 141 , 142 is prevented.

Die 3A bis 3D zeigen Beispiele für eine mögliche Strukturierung der organischen Klebstoffschicht 150. Wie in 3A gezeigt, kann beispielsweise die strukturierte organische Klebstoffschicht 150 zwischen ersten Chip-Kontakten 141 und zweiten Chip-Kontakten 142 angeordnet sein.the 3A until 3D show examples of a possible structuring of the organic adhesive layer 150 . As in 3A shown, for example, the structured organic adhesive layer 150 between first chip contacts 141 and second chip contacts 142 be arranged.

Gemäß weiteren Ausführungsformen kann der erste Chip-Kontakt 141 auch flächig ausgebildet sein, während die zweiten Chip-Kontakte 142 jeweils lokal ausgebildet sind. Dies ist in den 3B und 3C realisiert. Wie in 3B gezeigt ist, kann die strukturierte organische Klebstoffschicht 150 zwischen den isolierten zweiten Chip-Kontakten 142 und dem flächig ausgebildeten ersten Chip-Kontakt 141 angeordnet sein.According to further embodiments, the first chip contact 141 also be formed flat, while the second chip contacts 142 are each trained locally. This is in the 3B and 3C realized. As in 3B shown, the structured organic adhesive layer 150 between the isolated second chip contacts 142 and the planar first chip contact 141 be arranged.

Gemäß Ausführungsformen, die in 3C dargestellt sind, kann die strukturierte organische Klebstoffschicht 150 am Rand des Halbleiterchips 105 angeordnet sein und aktive Bereiche des Halbleiterchips rahmenartig umgeben. Zusätzlich kann die strukturierte organische Klebstoffschicht 150 auch hier zwischen den ersten Chip-Kontakten 141 und den zweiten Chip-Kontakten 142 angeordnet sein. Aufgrund der am Rand des Halbleiterchips ausgebildeten Klebstoffschicht kann beim Zusammenfügen des Halbleiterchips mit dem Substrat eine Verkapselung des Halbleiterchips erfolgen. Gemäß Ausführungsformen, die in 3D dargestellt sind, sind die ersten und zweiten Chip-Kontakte 141, 142 als isolierte Kontakte ausgebildet. Auch hier kann die strukturierte organische Klebstoffschicht am Rand des Halbleiterchips 105 angeordnet sein und aktive Bereiche des Halbleiterchips rahmenartig umgeben.According to embodiments described in 3C are shown, the structured organic adhesive layer 150 at the edge of the semiconductor chip 105 be arranged and surround active areas of the semiconductor chip like a frame. In addition, the structured organic adhesive layer 150 also here between the first chip contacts 141 and the second chip contacts 142 be arranged. Due to the adhesive layer formed on the edge of the semiconductor chip, the semiconductor chip can be encapsulated when the semiconductor chip is joined to the substrate. According to embodiments described in 3D are the first and second chip contacts 141 , 142 designed as isolated contacts. Here, too, the structured organic adhesive layer can be on the edge of the semiconductor chip 105 be arranged and surround active areas of the semiconductor chip like a frame.

Wie in den 3A bis 3D veranschaulicht worden ist, können die Chipkontakte flexibel ausgestaltet werden. Als zusätzliche Funktion der organischen Klebstoffschicht kann eine Isolierung der Chipkontakte und Substratkontakte bewirkt werden. Gemäß weiteren Ausführungsformen kann eine Einkapselung des Halbleiterbauelements erreicht werden.As in the 3A until 3D has been illustrated, the chip contacts can be designed flexibly. As an additional function of the organic adhesive layer, the chip contacts and substrate contacts can be isolated. According to further embodiments, encapsulation of the semiconductor component can be achieved.

4 fasst ein Verfahren gemäß Ausführungsformen zusammen. Ein Verfahren zur Herstellung eines Halbleiterbauelements umfasst das strukturierte Aufbringen (S110) einer organischen Klebstoffschicht auf einem Halbleiterchip und das In-Kontaktbringen (S120) des Halbleiterchips mit einem Substrat, wobei die organische Klebstoffschicht zwischen Halbleiterchip und Substrat angeordnet wird. Gemäß Ausführungsformen kann das Verfahren ferner das Ausbilden (S100) von elektrischen Chip-Kontakten auf dem Halbleiterchip vor Aufbringen der organischen Klebstoffschicht und das Ausbilden von elektrischen Substratkontakten an dem Substrat umfassen. Nach dem In-Kontaktbringen des Halbleiterchips (S120) mit dem Substrat ist mindestens ein Chip-Kontakt mit mindestens einem Substratkontakt elektrisch verbunden. Das Ausbilden der elektrischen Substratkontakte an dem Substrat kann zu einem beliebigen Zeitpunkt vor In-Kontaktbringen des Halbleiterchips mit dem Substrat erfolgen. 4th summarizes a method according to embodiments. A method for producing a semiconductor component comprises the structured application (S110) of an organic adhesive layer on a semiconductor chip and the bringing (S120) the semiconductor chip into contact with a substrate, the organic adhesive layer being arranged between the semiconductor chip and the substrate. According to embodiments, the method can further comprise the formation (S100) of electrical chip contacts on the semiconductor chip prior to application of the organic adhesive layer and the formation of electrical substrate contacts on the substrate. After the semiconductor chip (S120) has been brought into contact with the substrate, at least one chip contact is electrically connected to at least one substrate contact. The electrical substrate contacts can be formed on the substrate at any point in time before the semiconductor chip is brought into contact with the substrate.

5 zeigt eine optoelektronische Vorrichtung 1, die das zuvor beschriebene Halbleiterbauelement umfasst. Hier kann beispielsweise eine Vielzahl von optoelektronischen Halbleiterchips 105 über einem Trägersubstrat 170 angeordnet und in der zuvor beschriebenen Weise verbunden sein. Das Substrat kann ein Halbleitersubstrat sein. Die in dem Halbleitersubstrat angeordneten Schaltungskomponenten 177 können geeignet sein, den oder die optoelektronischen Halbleiterchips anzusteuern. Bei Anordnung einer Vielzahl von optoelektronischen Halbleiterchips 105 kann jedem Halbleiterchip 105 eine eigene Schaltung zugeordnet sein. Beispielsweise können Schaltungskomponenten der einzelnen Schaltungen jeweils geeignet sein, den zugehörigen optoelektronischen Halbleiterchip 105 zu steuern oder von dem zugehörigen optoelektronischen Halbleiterchip 105 empfangene Signale zu verarbeiten. Beispielsweise kann die optoelektronische Vorrichtung 1 eine Beleuchtungseinrichtung, z.B. ein Fahrzeugscheinwerfer mit einer Vielzahl von einzeln ansteuerbaren Lichtelementen, die jeweils durch die Halbleiterchips verwirklicht sind, sein. Gemäß weiteren Ausgestaltungen kann die optoelektronische Vorrichtung 1 eine Anzeigevorrichtung zur Anzeige von Videosignalen, beispielsweise eine Videoanzeigevorrichtung, eine Videoleinwand oder eine großflächige Sensorvorrichtung sein. Beispielsweise kann die optoelektronische Vorrichtung 1 eine Videoanzeigevorrichtung für Augmented/Mixed Reality-Anwendungen mit sehr kleinen monolithischen Bauelementen sein. 5 shows an optoelectronic device 1 comprising the semiconductor device described above. For example, a large number of optoelectronic semiconductor chips can be used here 105 over a carrier substrate 170 be arranged and connected in the manner previously described. The substrate can be a semiconductor substrate. The circuit components arranged in the semiconductor substrate 177 can be suitable for controlling the optoelectronic semiconductor chip (s). When arranging a large number of optoelectronic semiconductor chips 105 can any semiconductor chip 105 be assigned its own circuit. For example, circuit components of the individual circuits can each be suitable, the associated optoelectronic semiconductor chip 105 to control or from the associated optoelectronic semiconductor chip 105 process received signals. For example, the optoelectronic device 1 a lighting device, for example a vehicle headlight with a large number of individually controllable light elements which are each implemented by the semiconductor chips. According to further refinements, the optoelectronic device can 1 a display device for displaying video signals, for example a video display device, a video screen or a large-area sensor device. For example, the optoelectronic device 1 be a video display device for augmented / mixed reality applications with very small monolithic components.

Wie beschrieben worden ist, können unter Verwendung des beschriebenen organischen Klebstoffmaterials, das strukturiert unter dem Halbleiterchip 105 aufgebracht wird, die Funktionen mechanisches und elektrisches Verbinden voneinander getrennt werden. Durch die Anwesenheit der strukturierten organischen Klebstoffschicht wird das mechanische Verbinden unabhängig von dem elektrischen Verbinden, das nach dem mechanischen Verbinden erfolgt, durchgeführt werden. Aufgrund der Trennung der beiden Funktionen ist es möglich, die einzelnen Halbleiterchips 105 auch bei zunehmender Miniaturisierung und Verkleinerung der Kontakte sehr genau zu platzieren. Auch bei zunehmender Verkleinerung der Kontakte können die Halbleiterchips 105 über große Anbindungsflächen mit dem Substrat 170 verbunden werden. Als Folge wird die Wärmeableitung verbessert. Das beschriebene organische Klebstoffmaterial kann mit sehr feinen Strukturgrößen strukturiert werden und ist bis etwa 330°C temperaturstabil. Daher kann es in dem Bauelement dauerhaft verbleiben.As has been described, using the described organic adhesive material that is patterned under the semiconductor chip 105 is applied, the functions of mechanical and electrical connection are separated from each other. The presence of the structured organic adhesive layer means that the mechanical connection can be carried out independently of the electrical connection that takes place after the mechanical connection. Due to the separation of the two functions, it is possible to use the individual semiconductor chips 105 to place very precisely even with increasing miniaturization and shrinking of the contacts. Even as the size of the contacts increases, the semiconductor chips 105 over large connection areas with the substrate 170 get connected. As a result, the heat dissipation is improved. The organic adhesive material described can be structured with very fine structure sizes and is temperature-stable up to about 330 ° C. Therefore, it can permanently remain in the component.

Obwohl hierin spezifische Ausführungsformen veranschaulicht und beschrieben worden sind, werden Fachleute erkennen, dass die gezeigten und beschriebenen spezifischen Ausführungsformen durch eine Vielzahl von alternativen und/oder äquivalenten Ausgestaltungen ersetzt werden können, ohne vom Schutzbereich der Erfindung abzuweichen. Die Anmeldung soll jegliche Anpassungen oder Variationen der hierin diskutierten spezifischen Ausführungsformen abdecken. Daher wird die Erfindung nur durch die Ansprüche und deren Äquivalente beschränkt.Although specific embodiments have been illustrated and described herein, those skilled in the art will recognize that the specific embodiments shown and described can be replaced by a variety of alternative and / or equivalent configurations without departing from the scope of the invention. The application is intended to cover any adaptations or variations of the specific embodiments discussed herein. Therefore, the invention is to be limited only by the claims and their equivalents.

BezugszeichenlisteList of reference symbols

11
Optoelektronische HalbleitervorrichtungSemiconductor optoelectronic device
1010
HalbleiterbauelementSemiconductor component
100100
TrägersubstratCarrier substrate
101101
erste Hauptoberflächefirst main interface
102102
zweite Hauptoberflächesecond main surface
105105
HalbleiterchipSemiconductor chip
110110
HalbleiterschichtSemiconductor layer
120120
LED-StrukturLED structure
121121
erste Hauptoberfläche der LED-Strukturfirst main surface of the LED structure
122122
erste Halbleiterschichtfirst semiconductor layer
123123
aktive Zoneactive zone
124124
zweite Halbleiterschichtsecond semiconductor layer
130130
KontaktstrukturContact structure
131131
erstes Kontaktelementfirst contact element
132132
zweites Kontaktkontaktsecond contact contact
133133
IsolationsmaterialInsulation material
139139
LotmaterialSolder material
140140
Chip-KontaktChip contact
141141
erster Chip-Kontaktfirst chip contact
142142
zweiter Chip-Kontaktsecond chip contact
150150
strukturierte organische Klebstoffschichtstructured organic adhesive layer
170170
SubstratSubstrate
173173
funktionale Schichtfunctional layer
174174
dielektrische Schichtdielectric layer
175175
SubstratkontaktSubstrate contact
177177
SchaltungskomponenteCircuit component
179179
Substrat-LotmaterialSubstrate solder material
180180
Substrat-AnschlusselementSubstrate connection element

Claims (15)

Verfahren zur Herstellung eines Halbleiterbauelements (10), umfassend: strukturiertes Aufbringen (S110) einer organischen Klebstoffschicht (150) auf einem Halbleiterchip (105); und In-Kontaktbringen (S120) des Halbleiterchips (105) mit einem Substrat (170), wobei die organische Klebstoffschicht (150) zwischen Halbleiterchip (105) und Substrat (170) angeordnet wird.A method for manufacturing a semiconductor device (10) comprising: structured application (S110) of an organic adhesive layer (150) on a semiconductor chip (105); and Bringing (S120) the semiconductor chip (105) into contact with a substrate (170), the organic adhesive layer (150) being arranged between the semiconductor chip (105) and the substrate (170). Verfahren nach Anspruch 1, ferner umfassend: Ausbilden (S100) von elektrischen Chip-Kontakten (140) auf dem Halbleiterchip (105) vor Aufbringen der organischen Klebstoffschicht (150), und Ausbilden von elektrischen Substratkontakten (175) an dem Substrat (170), wobei nach dem In-Kontaktbringen des Halbleiterchips (105) mit dem Substrat (170) mindestens ein Chip-Kontakt (140) mit mindestens einem Substratkontakt (175) elektrisch verbunden ist.Procedure according to Claim 1 , further comprising: Formation (S100) of electrical chip contacts (140) on the semiconductor chip (105) before application of the organic adhesive layer (150), and formation of electrical substrate contacts (175) on the substrate (170), wherein after the semiconductor chip has been brought into contact (105) at least one chip contact (140) with at least one substrate contact (175) is electrically connected to the substrate (170). Verfahren nach Anspruch 2, bei dem die organische Klebstoffschicht (150) derart strukturiert aufgebracht wird, dass sie zwischen elektrischen Chip-Kontakten (140) angeordnet ist.Procedure according to Claim 2 , in which the organic adhesive layer (150) is applied in a structured manner such that it is arranged between electrical chip contacts (140). Verfahren nach Anspruch 3, bei dem die organische Klebstoffschicht (150) derart strukturiert aufgebracht wird, dass sie zwischen elektrischen Chip-Kontakten (140) unterschiedlicher Polarität angeordnet ist.Procedure according to Claim 3 , in which the organic adhesive layer (150) is applied in a structured manner such that it is arranged between electrical chip contacts (140) of different polarity. Verfahren nach einem der vorhergehenden Ansprüche, bei dem die organische Klebstoffschicht (150) derart strukturiert aufgebracht wird, dass sie am Rand des Halbleiterchips (105) angeordnet ist und einen aktiven Bereich des Halbleiterchips (105) rahmenartig umgibt.Method according to one of the preceding claims, in which the organic adhesive layer (150) is applied in a structured manner such that it is arranged at the edge of the semiconductor chip (105) and surrounds an active area of the semiconductor chip (105) in a frame-like manner. Verfahren nach einem der vorhergehenden Ansprüche, bei dem eine Vielzahl von Halbleiterchips (105) auf einem Trägersubstrat (100) angeordnet sind und mit dem Substrat (170) verbunden werden, wobei das Trägersubstrat (100) nach dem Verbinden abgelöst wird.Method according to one of the preceding claims, in which a plurality of semiconductor chips (105) are arranged on a carrier substrate (100) and are connected to the substrate (170), the carrier substrate (100) being detached after the connection. Halbleiterbauelement (10), mit einem Substrat (170); einem über dem Substrat (170) angeordneten Halbleiterchip (105), sowie einer strukturierten organischen Klebstoffschicht (150), die zwischen Halbleiterchip (105) und Substrat (170) angeordnet ist.Semiconductor component (10), with a Substrate (170); a semiconductor chip (105) arranged above the substrate (170), and a structured organic adhesive layer (150) which is arranged between the semiconductor chip (105) and the substrate (170). Halbleiterbauelement (10) nach Anspruch 7, bei dem der Halbleiterchip (105) Chip-Kontakte (140) aufweist und das Substrat (170) Substratkontakte (175) aufweist und mindestens einer der Chip-Kontakte (140) mit einem der Substratkontakte (175) elektrisch verbunden ist.Semiconductor component (10) according to Claim 7 wherein the semiconductor chip (105) has chip contacts (140) and the substrate (170) has substrate contacts (175) and at least one of the chip contacts (140) is electrically connected to one of the substrate contacts (175). Halbleiterbauelement (10) nach Anspruch 8, bei dem das Substrat (170) ein Halbleitersubstrat mit darin angeordneten Schaltungskomponenten (177) ist und die Substratkontakte (175) mit Schaltungskomponenten (177) elektrisch verbunden sind.Semiconductor component (10) according to Claim 8 wherein the substrate (170) is a semiconductor substrate with circuit components (177) arranged therein and the substrate contacts (175) are electrically connected to circuit components (177). Halbleiterbauelement (10) nach Anspruch 8 oder 9, bei dem die organische Klebstoffschicht (150) derart strukturiert ist, dass Teile der organischen Klebstoffschicht (150) zwischen Chip-Kontakten (140) angeordnet ist.Semiconductor component (10) according to Claim 8 or 9 , in which the organic adhesive layer (150) is structured in such a way that parts of the organic adhesive layer (150) are arranged between chip contacts (140). Halbleiterbauelement (10) nach Anspruch 10, bei dem die organische Klebstoffschicht (150) derart strukturiert ist, dass Teile der organischen Klebstoffschicht (150) zwischen Chip-Kontakten (140) unterschiedlicher Polarität angeordnet ist.Semiconductor component (10) according to Claim 10 , in which the organic adhesive layer (150) is structured in such a way that parts of the organic adhesive layer (150) are arranged between chip contacts (140) of different polarity. Halbleiterbauelement (10) nach einem der Ansprüche 7 bis 11, bei dem die organische Klebstoffschicht (150) derart strukturiert ist, dass Teile der organischen Klebstoffschicht (150) am Rand des Halbleiterchips (105) angeordnet sind und einen aktiven Bereich des Halbleiterchips (105) rahmenartig umgeben.Semiconductor component (10) according to one of the Claims 7 until 11 , in which the organic adhesive layer (150) is structured in such a way that parts of the organic adhesive layer (150) are arranged at the edge of the semiconductor chip (105) and surround an active area of the semiconductor chip (105) like a frame. Optoelektronische Vorrichtung (1) umfassend das Halbleiterbauelement (10) nach einem der Ansprüche 9 bis 12, bei dem der Halbleiterchip (105) ein optoelektronischer Halbleiterchip ist und die in dem Halbleitersubstrat (170) angeordneten Schaltungskomponenten (177) geeignet sind, den optoelektronischen Halbleiterchip (105) anzusteuern oder von dem optoelektronischen Halbleiterchip (105) erzeugte Signale zu verarbeiten.Optoelectronic device (1) comprising the semiconductor component (10) according to one of the Claims 9 until 12th , in which the semiconductor chip (105) is an optoelectronic semiconductor chip and the circuit components (177) arranged in the semiconductor substrate (170) are suitable for controlling the optoelectronic semiconductor chip (105) or for processing signals generated by the optoelectronic semiconductor chip (105). Optoelektronische Vorrichtung (1) nach Anspruch 13, bei der auf dem Halbleitersubstrat (170) eine Vielzahl von Halbleiterchips (105) angeordnet sind und in dem Halbleitersubstrat (170) Schaltungskomponenten (177) angeordnet sind, die jeweils den Halbleiterchips (105) zugeordnet sind.Optoelectronic device (1) according to Claim 13 wherein a plurality of semiconductor chips (105) are arranged on the semiconductor substrate (170) and circuit components (177) are arranged in the semiconductor substrate (170), which are respectively assigned to the semiconductor chips (105). Optoelektronische Vorrichtung (1) nach Anspruch 13 oder 14, die ausgewählt ist aus einer Beleuchtungseinrichtung, einer Anzeigevorrichtung oder einer Sensorvorrichtung.Optoelectronic device (1) according to Claim 13 or 14th which is selected from a lighting device, a display device or a sensor device.
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