DE102018117128A1 - Evaporator and method - Google Patents

Abstract

According to various embodiments, an evaporation device (100 to 1500) may include: a first evaporation crucible (102a) for providing a first vapor source and a second evaporation crucible (102b) for providing a second vapor source; and a bearing arrangement (106) by means of which the first evaporation crucible (102a) and the second evaporation crucible (102b) are mounted such that they can be displaced independently of one another and / or relative to one another.

Description

The invention relates to an evaporation device and a method.

In general, various coating methods based on chemical vapor deposition (CVD) or physical vapor deposition (PVD) can be used to coat workpieces. For example, material from a so-called target can be heated and evaporated using an electron beam (also referred to as EB-PVD) or a heat source. Using the electron beam or the heat source, a so-called steam source (clearly a locally highly heated area) can be generated on a surface of the target. Evaporated material spreads from the steam source, i.e. the vaporized material is clearly emitted from the steam source. The evaporated material can condense on a workpiece, for example, so that a layer is formed on the workpiece.

Electron beam evaporation (EB-PVD) can be done in various modifications. Usually, the material of the target (referred to as target material or material to be evaporated) is melted by means of the electron beam and is therefore provided in a crucible. The workpiece to be coated can, for example, via the crucible, e.g. hanging freely or lying in a workpiece carrier, and clearly coated from below.

Conventionally, the material to be evaporated (the material to be evaporated) is provided in the form of prefabricated bars (also referred to as ingot), e.g. in the form of bars or tablets. Furthermore, in a device for electron beam evaporation (also referred to as an electron beam evaporator), a plurality of ring-shaped water-cooled crucibles are provided, which have ingot refilling from below and storage of larger amounts of the evaporation material in rotatable magazines (also referred to as ingot magazines) placed under the crucible.

Some workpiece coatings require multiple layers to be applied to the workpiece. So that the several layers grow as similarly as possible, the material to be evaporated should be spatially distributed for each of the layers in a similar manner as possible. There is also the possibility of bringing the workpiece and the corresponding crucible, from which each is to be evaporated, into the same spatial position with respect to one another. Thus, of the multiple steam sources, each steam source is always provided in the same position relative to the workpiece.

However, if the workpiece to be coated is stationary, the crucibles are conventionally arranged on a carousel and rotated away under the stationary workpiece by means of the carousel, so that each crucible, once brought into its working position, can be evaporated from the same position.

Clearly, according to various embodiments, it was recognized that the carousel requires a large amount of space and furthermore limits the variability. Clearly, the carousel requires complex mechanics so that the material to be evaporated, which is stored in appropriate magazines, can be fed to the respective crucible at its corresponding position. For example, the corresponding magazines are therefore rotated with the carousel, so that the required radius, which the entire mechanics requires, is very large. Furthermore, the carousel always moves all crucibles at the same time, which limits flexibility.

If, on the other hand, the space requirement of such a carousel is to be as small as possible, it must be accepted that the crucibles are always arranged close to one another so that they also coat one another, which contaminates the layers to be separated and reduces the quality of the end product.

According to various embodiments, an evaporation device and / or a vacuum system for the PVD coating of workpieces are provided, in particular turbine blades by means of electron beam evaporation. According to various embodiments, it is provided that the workpieces can be coated from at least two movable evaporation crucibles.

The crucibles are clearly stored in such a way that they can be moved independently of one another. The space requirement can be reduced and the mechanics simplified. Alternatively or additionally, the distance between the crucibles from one another can be increased so that their contamination can be kept low and higher quality layers can be achieved.

According to various embodiments, an evaporation device may include: a first evaporation crucible for providing a first vapor source and a second evaporation crucible for providing a second vapor source; and a bearing arrangement, by means of which the first evaporation crucible and the second evaporation crucible are mounted such that they can be displaced independently of one another.

• 1A und 1B eine Verdampfungsvorrichtung gemäß verschiedenen Ausführungsformen in verschiedenen schematischen Ansichten;
• 2 und 15 jeweils eine Verdampfungsvorrichtung gemäß verschiedenen Ausführungsformen in einer schematischen Seitenansicht oder Querschnittsansicht;
• 3 bis 10, 13 und 14 jeweils eine Verdampfungsvorrichtung gemäß verschiedenen Ausführungsformen in einer schematischen Draufsicht;
• 11A und 11B eine Verdampfungsvorrichtung gemäß verschiedenen Ausführungsformen in verschiedenen schematischen Ansichten; und
• 12 ein Verfahren gemäß verschiedenen Ausführungsformen in einem schematischen Ablaufdiagramm.

Show it

• 1A and 1B an evaporation device according to various embodiments in different schematic views;
• 2 and 15 each an evaporation device according to various embodiments in a schematic side view or cross-sectional view;
• 3 to 10 . 13 and 14 each an evaporation device according to various embodiments in a schematic plan view;
• 11A and 11B an evaporation device according to various embodiments in different schematic views; and
• 12 a method according to various embodiments in a schematic flow diagram.

In the following detailed description, reference is made to the accompanying drawings, which form a part hereof and in which specific embodiments are shown by way of illustration in which the invention may be practiced. In this regard, directional terminology such as "top", "bottom", "front", "back", "front", "back", etc. is used with reference to the orientation of the figure (s) described. Because components of embodiments can be positioned in a number of different orientations, the directional terminology is illustrative and is in no way limiting. It is understood that other embodiments may be used and structural or logical changes may be made without departing from the scope of the present invention. It is understood that the features of the various exemplary embodiments described herein can be combined with one another unless specifically stated otherwise. The following detailed description, therefore, is not to be taken in a limiting sense, and the scope of the present invention is defined by the appended claims.

In the context of this description, the terms “connected”, “connected” and “coupled” are used to describe both a direct and an indirect connection (eg ohmic and / or electrically conductive, eg an electrically conductive connection), a direct or indirect connection as well as a direct or indirect coupling. Identical or similar elements are provided with identical reference symbols in the figures, insofar as this is expedient.

According to various embodiments, the term “coupled” or “coupling” in the sense of a (e.g. mechanical, hydrostatic, thermal and / or electrical), e.g. direct or indirect, connection and / or interaction can be understood. For example, several elements can be coupled together along an interaction chain along which the interaction (e.g. a signal) can be transmitted. For example, two elements coupled together can exchange interaction, e.g. a mechanical, hydrostatic, thermal and / or electrical interaction. According to various embodiments, "coupled" can be understood in the sense of a mechanical (e.g. physical or physical) coupling, e.g. through direct physical contact. A clutch can be set up to transmit a mechanical interaction (e.g. force, torque, etc.).

Controlling can be understood as an intended influencing of a system. The state of the system can be changed according to a specification. Regulating can be understood as controlling, whereby a change in state of the system is additionally counteracted by malfunctions. Clearly, the control can have a control section directed towards the front and can thus clearly implement a sequence control which converts an input variable into an output variable. The control path can also be part of a control loop, so that a control system is implemented. In contrast to the pure forward control, the control has a continuous influence of the output variable on the input variable, which is caused by the control loop (feedback). In other words, a regulation can be used as an alternative or in addition to the control, or a regulation can take place as an alternative or in addition to the control. In the case of closed-loop control, an actual value of the controlled variable (for example, based on a measured value) is compared with a reference value (a setpoint or a specification or a specified value) and the controlled variable can accordingly be controlled using a manipulated variable (using an actuator) be influenced that there is as little as possible a deviation of the respective actual value of the controlled variable from the reference value.

According to various embodiments, the material to be evaporated can be provided in the form of one or more bars (also referred to as ingot). The term ingot can also refer to an evaporation material which has no silicon or no semiconductor material. For example, the material to be evaporated can have or be formed from at least one material of the following materials: a metal; on Transition metal, an oxide (e.g. a metal oxide or a transition metal oxide); a dielectric; a polymer (e.g. a carbon-based polymer or a silicon-based polymer); an oxynitride; a nitride; a carbide; a ceramic; a semi-metal (eg carbon); a perovskite; a glass or vitreous material (e.g. a sulfidic glass); a semiconductor; a semiconductor oxide; a semi-organic material, and / or an organic material.

For example, the evaporation material can have zirconium oxide and / or aluminum oxide or be formed therefrom, the zirconium oxide and / or aluminum oxide optionally being stabilized by yttrium oxide (also known as yttrium oxide-stabilized zirconium oxide or aluminum oxide).

According to various embodiments, the workpiece may comprise or be formed from at least one of the following: a ceramic, a glass, a semiconductor (e.g. amorphous, polycrystalline or single-crystal semiconductor such as silicon), a metal, and / or a polymer (e.g. plastic). For example, the workpiece can be a plastic foil, a wafer (a semiconductor workpiece), a metal foil, a metal sheet or a glass plate, and can optionally be or be coated.

For example, the workpiece can have or be formed from one or more than one component of gas turbines, in particular one or more than one turbine blade (for example, rotor blade and / or guide blade).

According to various embodiments, turbine blades for novel layer systems are provided with at least two different materials to be coated sequentially in the PVD EB coating method, without the turbine blades having to be repeatedly introduced or removed into the process chamber.

According to various embodiments, an evaporation device is provided which consists of at least two individual evaporators which are arranged to be movable independently of one another.

According to various embodiments, a different evaporation material and or optionally the same evaporation material can be evaporated from each individual evaporator (also referred to as evaporation unit).

According to various embodiments, the movable arrangement of the individual evaporators in their evaporation position (also referred to as the working position) relative to the workpiece to be coated can be selected such that the individual layers to be formed on the workpiece in a desired layer thickness per time (also referred to as coating rate) on the Workpiece are deposited and / or are deposited on the workpiece in a desired layer thickness uniformity.

According to various embodiments, each individual evaporator can be provided in a suitable manner with a supply for evaporation material in such a way that one or more than one uninterrupted (in the sense of ventilation of the vacuum chamber) coating campaign can take place.

According to various embodiments, each individual evaporator can have: a crucible unit (also referred to as an evaporation crucible); a material storage unit which can selectively hold exactly one lot of evaporation material (the evaporation material accommodated in a shaft) or several lots of evaporation material; if the material storage unit holds several batches of evaporation material, the individual evaporator can additionally have a drive device for the material storage unit (e.g. a rotary drive for the revolver magazine).

The drive unit for supplying evaporation material (also referred to as evaporation material) to the crucible unit can be assigned to several individual evaporators. For example, exactly one central drive device can be provided for supplying evaporation material, which in each case supplies the evaporation material to the individual evaporator (s) located in the evaporation position.

The individual evaporators are arranged in such a way that: the movement of each individual evaporator can take place along an axis which has an angle between 0 ° and 90 ° with one another and / or between itself and / or the movement feed axis of the workpieces to be coated; each individual evaporator for vaporization is in the vaporization position with its crucible unit; each individual evaporator, which is not used for evaporation, is with its crucible unit in a waiting position (also referred to as a parking position), which enables the other individual evaporator to be arranged with its crucible unit in its vaporization position.

1A illustrates an evaporator 100 according to various embodiments in a schematic side view or cross-sectional view. 1B illustrates the evaporator 100 according to various embodiments in a schematic plan view 100b ,

The evaporator 100 has two evaporation crucibles 102 . 102b (a first evaporation crucible 102 and a second evaporation crucible 102b) on. The two evaporation pots 102 . 102b are by means of a bearing arrangement 106 stored in such a way that they can be shifted independently of one another (eg shifted and / or rotated), eg according to a respective degree of freedom 104a . 104b and / or along a respective direction of displacement 104a . 104b (eg direction of displacement).

Each degree of freedom can correspond to exactly one axis (also referred to as the degree of freedom axis). A rotational degree of freedom (also called a degree of freedom of rotation) can be understood as a possibility to rotate around the corresponding axis of freedom. A translational degree of freedom (also called translational degree of freedom), on the other hand, can be understood as a possibility for displacement along the corresponding axis of freedom. The number of degrees of freedom can be understood as the number of mutually independent movement possibilities, for example as the number of axes of freedom axes running transversely to one another, along / around which / which an entire system can be moved, or along / around which / which each evaporation crucible 102 . 102b can be relocated.

The number of degrees of freedom in the mechanical sense denotes the number of mutually independent (and in this sense “freely selectable”) movement options. In other words, the or each degree of freedom can be understood as a possibility of movement (e.g. possibility of rotation and / or possibility of displacement) which is provided to a body.

The expression “independently of one another” can be understood in this context as that the displacement (eg moving) of one (eg the first) evaporation label does not necessarily mean the displacement of another (eg the second) evaporation label 102b effected and vice versa. In other words, the "overall system" can be an evaporation device 100 Have at least two degrees of freedom, each of which is exactly one evaporation crucible 102 . 102b is assigned and the evaporation crucible 102 . 102b differentiate in their assigned degree of freedom, according to which they can be relocated. For example, the bearing arrangement 106 be set up such that the two evaporation crucibles 102 . 102b can be shifted relative to each other and / or individually.

By means of the bearing arrangement 106 each of the two evaporation crucibles 102 . 102b one movement option (ie one degree of freedom) is provided, which is independent of the movement possibility (ie one degree of freedom) of the other of the two evaporation crucibles 102 . 102b is. In other words, the degrees of freedom of the two crucibles are 102 . 102b independently of one another and / or independently of one another.

The axes of freedom of two independent degrees of translation are, for example, oblique to each other. The degrees of freedom axes of two mutually independent degrees of freedom are, for example, oblique to one another. A degree of rotational freedom is generally independent of a degree of translation freedom.

For example, the displacement of the first evaporation pot 102 and / or the second evaporation lever 102b the relative position of the two evaporation crucibles 102 . 102b change to each other. For example, the shifting of the first evaporation cup can 102 and relocating the second evaporation lever 102b differ from each other, for example in speed, distance, direction and / or time.

For example, the bearing arrangement 106 the first evaporation crucible 102 and / or the second evaporation crucible 102b provide at least one (ie exactly one or more than one) degree of translation freedom. Optionally, the bearing arrangement 106 the first evaporation crucible 102 and / or the second evaporation crucible 102b provide at least one degree of freedom of rotation.

The bearing arrangement 106 can, for example, a first camp 106a have, by means of which the first evaporation crucible 102 is stored. The bearing arrangement 106 can, for example, a second camp 106b have, by means of which the second evaporation crucible 102b is stored. The first and / or second bearing can, for example, each have a translation bearing, a linear bearing and / or a linear slide, or be formed therefrom.

An evaporation crucible 102 . 102b For example, an opening (also referred to as a crucible) 102t (For example, a depression), which are optionally by the evaporation crucible 102 . 102b extends through. Alternatively or additionally, the evaporation crucible 204t have a cooling device, for example a (for example fluid-conducting) heat exchanger and / or a fluid cooling device (for example water cooling).

The bearing arrangement 106 can optionally be set up to move the first evaporation crucible 102 and / or the second evaporation lever 102b to guide and / or by means of a guide, for example along a path 104a . 104b , For example, the first and / or second bearing 106a . 106b each have a slide guide, a rail guide, a cage rail guide, a profile guide or a linear guide (also referred to as a straight guide). The guide can be set up, the possibility of movement of the respective crucible 102 . 102b to be limited to exactly one degree of freedom (e.g. degree of translation freedom).

The two paths 104a . 104b can, for example, run at an angle to one another.

If the exactly one degree of freedom is a degree of translation freedom, then the corresponding path can 104a . 104b run straight (also called linear). This simplifies the mechanics. However, the first evaporation crucible 102 and / or the second evaporation crucible 102b alternatively or in addition to the exactly one degree of translational freedom, at least one degree of rotational freedom and / or at least one additional degree of translational freedom can be provided. This means that a curved path can also be used 104a . 104b to be provided. This extends flexibility.

For example, if the first evaporation crucible 102 in the first working position 111 is or will be arranged, the second evaporation crucible 102b in the second parking position 113b be arranged or be the other way around. Alternatively or additionally, the first evaporation crucible 102 in the first parking position 113a be or will be arranged when the second evaporation crucible 102b in the second working position 111b is arranged or will be the other way around.

The evaporator 100 can optionally be a transport device for transporting one or more than one workpiece along a transport direction 115 exhibit.

2 illustrates an evaporator 200 (e.g. the evaporation device 100 ) According to various embodiments in a schematic side view or cross-sectional view, which one or more than one evaporation unit 202 having.

The evaporation unit 202 can be a rack 202 which have the evaporation crucible 102 . 102b wearing.

The evaporation unit 202 can be a recording room 202a have, in which one or more than one shaft 104 (e.g. several shafts 104 ) is arranged. The or each shaft 104 can provide a cavity for receiving an evaporating material and / or by means of the frame 202 are held (e.g. flush with the crucible opening 102t) , In the or each shaft 104 can be a solid vaporization material 110 can be included, for example in the form of bars (also called ingot). For example, the multiple shafts 104 have at least 2 (eg 3, 4, 5, 6, 7, 8, 9, 10 or more) shafts.

Several shafts 104 can optionally by means of a vaporization magazine 202m be or will be provided. Then the recording room 202a of the frame 202 as a magazine recording room 202a to hold an evaporative magazine 202m (also called a magazine). The evaporative magazine 202m can for example in the frame 202 be or will be rotatably mounted and optionally be or will be driven (for example its rotational movement).

The evaporative magazine 202m can have a frame, for example, which the multiple shafts 104 provides.

The crucible opening 102t of the evaporation crucible 102 . 102b can for example be a through opening 102t have or be formed, which in the receiving space 202a opens, for example in the cavity of a shaft 104 , The evaporation crucible can optionally be used 204t have a cooling device, for example a (for example fluid-conducting) heat exchanger and / or a fluid cooling device (for example water cooling).

The or each shaft 104 can be set up one or more than one ingot 110 include, for example, at least 2 (eg 3, 4, 5, 6, 7, 8, 9, 10 or more) ingots 110 , As an ingot 110 can be understood to mean an ingot, for example a rod-shaped or tablet-shaped ingot, which has the evaporation material or is formed therefrom. The ingot can also have a different shape.

The evaporator 200 can be set up in such a way that by means of the bearing arrangement 106 the entire evaporation unit 202 is shiftable and together with her the crucible 102 . 102b and / or the optional magazine 202m ,

However, not every evaporation unit needs to 202a . 202b the evaporation device 200 (e.g. the two evaporation units 202a . 202b) a magazine 202m exhibit. For example, at least the second evaporation unit 202b exactly one shaft 104 have the static in the posed 202g is held.

Optionally, the evaporation device 200 a tracking device 302 exhibit. The tracking device 302 can, for example, a lifting mechanism 302h exhibit. The tracking device 302 can also be a finger 302f have, which in the recording room 202a (e.g. in a shaft 104 ) intervenes.

For example, the lifting mechanism 302h have a spindle, a reciprocating piston or the like on which the finger sits, so that by means of driving (for example a rotation of the spindle) the lifting mechanism 302h the finger 302f is shifted and thus the evaporation material into the passage opening 102t of the crucible 102 . 102b pushes in. Furthermore, the tracking device 302 a drive device for driving the lifting mechanism 302h exhibit. The tracking device 306 can also be implemented differently.

The tracking device 302 can, for example, together with the respective crucible 102 . 102b be relocatable and / or on the frame 202g the evaporation unit 200 attached or at least partially in the frame 202g be integrated.

The evaporator 200a can have several such evaporation units 202 have, for example a first such evaporation unit 202 (hereinafter the first evaporation unit 202a) which is the first evaporation crucible 102 has, and / or a second such evaporation unit 202 (hereinafter the second evaporation unit 202b) which is the second evaporation crucible 102b having.

3 illustrates an evaporator 300 according to various embodiments in a schematic plan view. The evaporator 300 can be set up like the evaporation device 100 or 200 ,

The evaporator 300 can be set up, for example, to apply a multilayer and / or heterogeneous coating by means of EB-PVD, the layers (also referred to as layers) of the coating differing in their chemical composition. For example, the layers can have different materials or be formed therefrom.

The evaporator 300 can be used, for example, to evaporate material to be evaporated from at least two evaporation units 202a . 202b (also referred to as an evaporator), each of which has an evaporation unit 202a . 202b a crucible 102 . 102b has, for example, a water-cooled ring crucible 102 . 102b ,

The material to be evaporated can, for example, be a rod-shaped material to be evaporated, i.e. this can be in the form of a bar.

The material to be evaporated can be in at least one magazine, for example 202m stored below the crucible level and / or by means of a tracking device 302 (also referred to as conveyor) from the magazine 202m from below into the first crucible 102 and / or the second crucible 102b be introduced.

The first crucible 102 and / or the second crucible 102b can along a (e.g. linear) path 104a . 104b be relocatable.

According to various embodiments (eg according to the first degree of freedom 104a) the first evaporation crucible 102 in a first position 111 (also as the first working position 111 designated) and an additional first position 113a (also as the first parking position 113a referred to) be relocatable. Alternatively or additionally, (for example, according to the second degree of freedom 104b) the second evaporation crucible 102b in a second position 111b (also as a second working position 111b designated) and an additional second position 113b (also as a second parking position 113b referred to) be relocatable.

The shifting (e.g. moving) of the first evaporation crucible 102 between the first working position 111 and the first parking position 113a can along the first path 104a respectively. The shifting (eg moving) of the second evaporation crucible 102b between the second working position 111b and the second parking position 113b can along the second path 104b respectively.

For example, the first path 104a and the second path 104b lie in a horizontal plane. Alternatively or additionally, the first path 104a and / or the second path 104b be essentially linear.

The shifting (e.g. moving) of the first evaporation crucible 102 and the second evaporation level 102b can take place independently of one another and / or relative to one another, for example one after the other (ie at different times) and / or in different directions.

In general, the working positions 111 . 111b of the two evaporation crucibles 102 . 102b in an evaporation area 333 and the parking positions 113a . 113b of the two evaporation crucibles 102 . 102b outside the evaporation range 333 be arranged. Optionally, the working positions 111 . 111b of the two evaporation crucibles 102 . 102b be different from one another, ie have a distance from one another.

The first degree of freedom of the first evaporation crucible 102 and the second degree of freedom of the second evaporation level 102b can, for example, be provided in such a way that they can be moved past one another.

The shifting (e.g. moving) of the first evaporation crucible 102 can be done, for example, by a first distance (roughly corresponds to the distance from the first working position 111 from the first parking position 113a) , The shifting (eg moving) of the second evaporation crucible 102b can be done, for example, by a second distance (roughly corresponds to the distance between the second working position 111b from the second parking position 113b) ,

The second distance can be greater than a first extent, for example 101 the first evaporation unit 202a which is projected onto the second route. Alternatively or additionally, the first distance can be greater than a second extent 101b the second evaporation unit 202b which is projected on the first route.

Optionally, the tracking device 302 the first evaporation unit 202a and / or the second evaporation unit 202a together with the respective crucible 102 . 102b be relocatable and / or on the frame 202g the respective evaporation unit 202a . 202b attached or at least partially integrated into this.

4 illustrates an evaporator 400 according to various embodiments in a schematic plan view. The evaporator 400 can be set up as one of the evaporation devices 100 to 300 , with the difference that the working positions 111 . 111b of the two evaporation crucibles 102 . 102b are substantially the same, ie have a distance (also referred to as a working distance) from one another of less than approximately 200 mm (eg less than approximately 100 mm). Alternatively or additionally, the working distance can be smaller than an extension (eg diameter) of the crucible opening 102t of the first and / or the second crucible 102 . 102b , The expansion can be measured, for example, parallel to the working distance.

For example, the working positions 111 . 111b to a common working position 111 coincide or be arranged at a small spatial distance (for example, less than 200 mm from each other).

5 illustrates an evaporator 500 according to various embodiments in a schematic plan view. The evaporator 500 can be set up as one of the evaporation devices 100 to 400 , further comprising each of the two evaporation units 202a . 202b a magazine 202m having.

Optionally, the magazine 202m the first evaporation unit 202a (also as the first vaporization magazine 202m referred to) and the magazine 202m the second evaporation unit 202b (also as a second vaporization magazine 202m differentiate) from each other, for example in their evaporation capacity. For example, the smaller of the two magazines can have a vaporization capacity in a range from approximately 5% to approximately 10% or less, in a range from approximately 10% to approximately 30% or less, in a range from approximately 30% to approximately 50% or less, or in a range from about 50% to about 80% or less of the evaporative capacity of the larger of the two magazines. This makes the arrangement even smaller.

The capacity of an evaporative magazine 202m can be defined by the number of its shafts 104 , the height of the shafts 104 , and / or the diameter d of the vaporization magazine 202m ,

6 illustrates an evaporator 600 according to various embodiments in a schematic plan view. The evaporator 600 can be set up as one of the evaporation devices 100 to 500 , with the difference that at least one tracking device 302 (Also referred to as a bifunctional tracking device) has a lifting mechanism and / or a drive device which is fixed in place relative to the bearing arrangement 106 and / or relative to a vacuum chamber 802 (see 15 ) in which the evaporation device 600 is arranged. In other words, the first and / or second evaporation crucibles 102 . 102b relative to at least part of the bifunctional tracking device 302 (For example, their drive devices and / or the lifting mechanism).

For example, the bifunctional tracking device 302 have a drive device which is set up to drive the lifting mechanism and is set up in a fixed position relative to the bearing arrangement 106 and / or the vacuum chamber. For example, the entire bifunctional tracking device 302 be fixed relative to the bearing arrangement 106 and / or the vacuum chamber.

For example, for the two evaporators 202a and 202b a common tracking device 302 be provided, which at Moving the evaporator remains essentially stationary (for example at least its lifting mechanism).

A bifunctional tracking device 302 can further reduce the space requirement.

The bifunctional tracking device 302 (eg their lifting mechanism) can be set up in the receiving area 202a (e.g. the optional magazine 202m therein) of the first evaporation unit 202a arranged evaporation material in the direction of the first evaporation crucible 102 (e.g. in its crucible opening 102d in) when the first evaporation unit 202a is arranged in purple in the first working position.

The bifunctional tracking device 302 (eg their lifting mechanism) can be set up in the receiving area 202a (e.g. the optional magazine 202m therein) of the second evaporation unit 202b arranged evaporation material in the direction of the second evaporation crucible 102b (e.g. in its crucible opening 102d in) when the second evaporation unit 202a is arranged in purple in the first working position.

7A and 7B each illustrate an evaporation device 700 according to different embodiments in a schematic top view in different configurations 700a and 700b , The evaporator 700 can be set up as one of the evaporation devices 100 to 600 , the evaporator 700 has a multiplicity (for example 3 or more, for example 4 or more) evaporation crucibles and / or a multiplicity of evaporation units (for example 3 or more, for example 4 or more).

A large number of types of vaporized material that are different from one another can thus be vaporized, which for example form different layers from one another or can be mixed with one another. Alternatively or additionally, more steam sources can be provided, so that, for example, larger workpieces can be coated.

For example, the first evaporation crucible 102 and the additional first evaporation crucible 112a (also as a third evaporation crucible 112a referred to) by means of two different evaporation units 202a . 202c be or will be provided. For example, a third evaporation unit 202c at least one additional first evaporation crucible 112a exhibit. Alternatively or additionally, the second evaporation unit 202b at least one additional second evaporation crucible 112b exhibit.

The first and third evaporation units 202a . 202c can, for example, different frames 202g have and / or be arranged displaceable towards or away from each other.

By means of the bearing arrangement 106 can, for example, the second evaporation crucible 102b and the additional second evaporation crucible 112b be relocatable such that they can only be relocated together (ie together and / or along the same route). Alternatively or additionally, the second evaporation crucible 102b and the additional second evaporation crucible 112b by means of the same frame 202g to be or to be worn.

By means of the bearing arrangement 106 can for example be the first evaporation crucible 102 and the additional first evaporation crucible 112a be displaceably mounted such that they can be displaced independently of one another and / or relative to one another. In other words, the first evaporation crucible 102 and the additional first evaporation crucible 112a degrees of freedom different from one another (for example degrees of translation degrees of freedom) are or will be provided.

In the first configurations 700a can be the first evaporation crucible 102 in the first working position 111 and the additional first evaporation crucible 112a in an additional first working position 121 be arranged. In the first configurations 700a can also use the second evaporation crucible 102b in the second parking position 113b and the additional second evaporation crucible 112b in an additional second parking position 123b be arranged.

In the second configurations 700b can be the first evaporation crucible 102 in the first parking position 113a and the additional first evaporation crucible 112a in an additional first parking position 123a be arranged. In the second configurations 700b can also use the second evaporation crucible 102b in the second working position 111b and the additional second evaporation crucible 112b in an additional second working position 121b be arranged.

For example, at least four evaporation crucibles can be provided, of which the two first evaporation crucibles 102 . 112a between their first working positions 111 . 121 and the respective parking positions 113a and 123a and two second evaporation crucibles 102b . 112b between her second working positions 111b . 121b and respective parking positions 113b . 123b are displaceable (eg displaceable).

8A and 8B each illustrate an evaporation device 800 according to different embodiments in a schematic top view in different configurations 800a and 800b , The evaporator 800 can be set up like the evaporation device 700 , with the difference that the second evaporation crucible 102b and the additional second evaporation crucible 112b are displaceably mounted such that they can be displaced independently of one another and / or relative to one another. In other words, the second evaporation crucible 102b and the additional second evaporation crucible 112b (also as the fourth evaporation crucible 112b denotes) two degrees of freedom (eg degrees of translation freedom) that are different from one another or will be provided.

This enables even greater flexibility to be achieved. For example, if only one material to be evaporated is to be evaporated, all other evaporation crucibles can be arranged at a greater distance from the steam formed.

For example, the second evaporation crucible 102b and the additional second evaporation crucible 112b by means of two different evaporation units 202b . 202d be or will be provided. The two evaporation units 202b . 202d can, for example, different frames 202g have and / or be arranged displaceable towards or away from each other.

Optionally, the second evaporation crucible 102b and the additional second evaporation crucible 112b Be part of a common evaporation unit. An evaporation unit with several evaporation crucibles makes it possible to save at least one drive device.

9A and 9B each illustrate an evaporation device 900 according to different embodiments in a schematic top view in different configurations 900a and 900b , The evaporator 900 can be set up like the evaporation devices 800 , with the difference that the bearing arrangement 106 provides a diamond configuration.

In the diamond configuration, the two paths 104a . 114a along which the first evaporation crucible 102 and the additional first evaporation crucible 112a are displaceable, at an angle (for example perpendicular and / or rectilinear) to one another. Alternatively or additionally, the two paths can be configured in the diamond configuration 104b . 114b along which the second evaporation crucible 102b and the additional second evaporation crucible 112b are displaceable, at an angle (for example perpendicular and / or rectilinear) to one another.

For example, the four paths are vivid 104a . 114a . 104b . 114b along which the evaporation crucibles of the evaporation device 900 are shiftable, diamond-shaped. In other words, the four paths 104a . 114a . 104b . 114b run parallel to the sides of a diamond, for example the evaporation area 333 surrounds.

10 illustrates an evaporator 1000 according to various embodiments in a schematic plan view. The evaporator 1000 can be set up as one of the evaporation devices 100 to 900 , and further one or more than one beam catcher 1002 (e.g. electron reflector 1002 ) exhibit.

The beam trap can clearly be seen in the process room 1002 (eg a beam diffuser) can be provided. The beam catcher 1002 can, for example, be or be provided in the form of a high-temperature-resistant assembly (also referred to as a beam trap assembly, for example a diffuser assembly). The beam catcher 1002 can be set up during the transport of the workpieces to be coated into a coating position above the working position (for example into the vacuum chamber) in which the workpieces are coated, acted upon by the electron beam from the electron beam source blocked by the incoming workpieces (ie is irradiated with the electron beam) to become.

The one in the ray catcher 1002 radiated energy (or power) can for example be diffusely reflected back, for example at least partially immediately (due to backscattered electrons) and / or at least partially with a slight time delay, for example due to an increase in the temperature of the beam catcher 1002 and subsequent radiation in the form of heat radiation. The application of the ray catcher 1002 (eg diffuser) instead of the evaporation pot eliminates the need to switch off the electron beam during the transport of the workpieces. The diffusely retroreflected energy can lead to and / or at least contribute to a temporal homogenization of the power balance of the coating process space and thus to a temporal stabilization of the process temperature.

One or more than one beam trap 1002 can, for example, have an electron reflector or be formed therefrom. An electron reflector can be set up, more electrons and / or power of the electron beam 23 to deliver (eg to reflect and / or re-emit) as to absorb. In other words, the electron reflector can be set up to emit a larger proportion of the electrons striking it and / or the power of the electron beam than to absorb it. The absorption can take place by converting the energy of the electrons into thermal energy.

One or more than one beam trap 1002 can alternatively or additionally have an electron diffuser or be formed therefrom. The electron diffuser can be set up to diffusely emit the emitted electrons (eg without a preferred direction), the electron beam 23 fan out and / or otherwise the beam characteristic of the electrons 23 repealed.

Alternatively or additionally, the one or more than one beam catcher can be used 1002 have a heat radiation source or be formed therefrom. The heat radiation source can be set up, fewer electrons and / or power of the electron beam 23 emit (eg to reflect and / or re-emit) than to absorb. The absorbed electrons or power can, for example, be converted into heat energy and / or heat radiation, which is the beam catcher 1002 can emit again.

For example, the evaporation device 1000 have a control device for controlling the electron beam and / or the beam catcher, the control device being set up to switch the control between a plurality of beam catcher configurations, of which: in a first beam catcher configuration the electron beam onto the beam catcher 1002 is directed; and in a second beam catcher configuration, the electron beam on the beam catcher 1002 is directed past, for example the beam catcher 202 happens and / or on or in the first evaporation crucible 102 and / or the second evaporation crucible 102b meets. In the first beam catcher configuration, the beam catcher can 1002 for example the first evaporation crucible 102 and / or the second evaporation crucible 102b cover.

Optionally, in a conditioning configuration, in which the electron beam on the beam catcher 1002 is directed past, a periphery (eg parts of the vacuum chamber or other chamber internals) of the coating arrangement 200 be or will be irradiated to heat them. For example, in the conditioning configuration, the periphery can be irradiated by means of the electron beam.

For example, the beam catcher 1002 (e.g. electron reflector 1002 ) have a material (eg graphite) which has a higher melting temperature than the first evaporation crucible 102 and / or the second evaporation crucible 102b ,

The beam catcher 1002 (e.g. electron reflector 1002 ) can optionally by means of an additional bearing arrangement 116 be stored, for example in such a way that it is between two positions (a third working position 111c and a third parking position 113c) is relocatable. Alternatively or additionally, the beam catcher can be used 1002 (e.g. electron reflector 1002 ) regardless of the first evaporation crucible 102 and / or the second evaporation crucible 102b be relocatable.

The additional bearing arrangement 116 can the beam catcher 1002 For example, provide a degree of freedom (eg a degree of translation freedom) that is different from the first degree of freedom and / or the second degree of freedom.

In the third working position 111c can the beam catcher 1002 (eg the first beam catcher configuration) the first working position 111 and / or the second working position 111b (e.g. cover the evaporation crucibles in their working position) and / or shield them, e.g. against an electron beam source 1102 (see. 11A) ,

For example, the beam catcher 1002 in the third working position 111c in the evaporation area 333 be arranged in which the first working position 111 and / or the second working position 111b are arranged. Alternatively or additionally, the beam catcher can be used 1002 in the third working position 111c between the evaporation area 333 (or the working positions arranged therein) and the electron beam source 1102 be arranged.

In the third parking position 113c can the beam catcher 1002 (eg the second beam catcher configuration) the first working position 111 and / or the second working position 111b (e.g. expose the evaporation crucibles in their working position), e.g. opposite the electron beam source 1102 , For example, the beam catcher 1002 in the third parking position 113c outside the evaporation range 333 be arranged and / or a greater distance from this (or the first working position arranged therein 111 and / or second working position 111b) have than in the third working position 111c ,

11A illustrates an evaporator 1100 according to various embodiments in a schematic side view or cross-sectional view. 11B illustrates the evaporator 1100 according to various embodiments in a schematic plan view 1100b , The Evaporation device 1100 can be set up as one of the evaporation devices 100 to 1000 , and furthermore at least one (ie exactly one or more than one) electron beam source 1102 exhibit.

The at least one electron beam source 1102 can be set up at least one electron beam 1102e to emit, for example in the evaporation area 333 into and / or to the corresponding working positions of the evaporation crucibles 102 . 102b the evaporation device 1100 out. For example, the at least one electron beam source 1102 be set up, at least a first (eg additional) evaporation crucible 102 . 112a and / or at least one (eg additional) second evaporation crucible 102b . 112b or to irradiate the material to be evaporated therein (for example with the at least one electron beam 1102e) when this is in their working position 111 are brought.

The evaporator 1100 can optionally in a vacuum area 802 or a vacuum chamber 802 be arranged. The vacuum area 802 can by means of the vacuum chamber 802 be or will be provided. The vacuum chamber 802 can be set up so that a vacuum can be formed in the vacuum area, for example a process pressure in the vacuum area.

The process pressure can be, for example, in a range from approximately 10 mbar to approximately 1 mbar (in other words, rough vacuum) or less, for example in a range from approximately 1 mbar to approximately 10 ^-3 mbar (in other words, fine vacuum) or less, for example in a range from about 10 ^-3 mbar to about 10 ^-7 mbar (in other words high vacuum) or less than high vacuum, for example less than about 10 ^-7 mbar.

12 illustrates a process 1200 according to various embodiments in a schematic flowchart. The procedure 1200 can be set up to operate one of the evaporation devices 100 to 1100 ,

The procedure 1200 can in 1201 have: first displacement of a first evaporation material, for example in the evaporation area 333 in and / or out of it.

The first evaporation material can, for example, in the first evaporation crucible 102 be arranged. Then the first move 1201 have to move the first evaporation crucible between two positions, which the first working position purple in the evaporation area 333 and the first parking position 113a outside the evaporation range 333 exhibit.

The first relocation 1201 can be done according to the first degree of freedom and / or along the first path 104a ,

The procedure 1200 can in 1203 have: second displacement of a second evaporation material, for example in the evaporation area 333 in and / or out of it.

The second evaporation material can, for example, in the second evaporation crucible 102b be arranged. Then the second move 1203 have the second evaporation crucible 102b to shift between two positions, which is the second working position 111b in the evaporation area 333 and the second parking position 113b outside the evaporation range 333 exhibit.

The second shift 1203 can be done according to the second degree of freedom and / or along the second path 104b , Optionally, the second relocation 1203 after (eg after) the first publishing 1203 respectively.

The procedure 1200 can in 1205 have: first evaporation of the first evaporation material, for example if it is in the evaporation area 333 is arranged and / or if the second material to be evaporated is outside the evaporation area 333 is arranged.

The procedure 1200 can in 1207 have: second evaporation of the second evaporation material, for example if it is in the evaporation area 333 is arranged and / or if the first material to be evaporated is outside the evaporation area 333 is arranged.

The first vaporization 1205 and / or the second evaporation 1207 may have the evaporation area 333 or to irradiate the evaporation material arranged therein with electrons. Alternatively or additionally, the first evaporation can be carried out 1205 and / or the second evaporation 1207 have to evaporate the corresponding vaporization material thermally, for example by heating it to a temperature (for example above the vaporization temperature or sublimation temperature) at which it changes into the vapor phase.

The procedure 1200 can optionally in 1209 have: third displacement of an additional first vaporization material, for example in the vaporization area 333 in and / or out of it.

The additional first evaporation material can, for example, in the additional first evaporation crucible 112a be arranged. Then the third move 1209 have the additional first evaporation crucible 112a between two To shift positions which are the additional first working position 121 in the evaporation area 333 and the additional first parking position 123a outside the evaporation range 333 exhibit.

The third shift 1201 can be done according to the third degree of freedom and / or along the third path 114a (comparison 7A) ,

The third shift 1209 can be done for example after the first publishing or simultaneously.

The procedure 1200 can optionally in 1211 have: fourth shifting of an additional second vaporization material, for example into the vaporization area 333 in and / or out of it.

The additional second evaporation material can, for example, in the additional second evaporation crucible 112b be arranged. Then the fourth move 1211 have the additional second evaporation crucible 112b to shift between two positions, which is the additional second working position 121b in the evaporation area 333 and the additional second parking position 123b outside the evaporation range 333 exhibit.

The fourth relocation 1211 can be done according to the fourth degree of freedom and / or along the fourth path 114b ,

The fourth relocation 1211 can, for example, after the second publishing 1203 or take place simultaneously.

The procedure 1200 can optionally in 1213 have to evaporate one or more than one additional (eg first and / or second) material to be evaporated. The procedure 1200 can for example in 1213 have: third evaporation of the additional first evaporation material, for example if it is in the evaporation area 333 is arranged and / or if the (eg additional) second material to be evaporated outside the evaporation area 333 is arranged. Alternatively or additionally, the method can 1200 optional in 1213 have: fourth evaporation of the additional second evaporation material, for example if it is in the evaporation area 333 is arranged and / or if the (eg additional) first material to be evaporated lies outside the evaporation area 333 is arranged.

The (eg third and / or fourth) evaporation 1213 can optionally be set up like the first evaporation and / or second evaporation.

Optionally, the first material to be evaporated and the second material to be evaporated can differ from one another. Alternatively or additionally, the first material to be evaporated and the additional first material to be evaporated can differ from one another.

The procedure 1200 can optionally in 1215 exhibit: temporarily inhibiting (for example first, second, third and / or fourth) evaporation, for example the (for example additional) first material to be evaporated and / or for (for example additional) second material for evaporation. The temporary inhibition can include reducing the rate at which the corresponding material to be evaporated is only reduced for a limited period of time (the evaporation taking place at a higher rate before and after the time period).

The inhibition can be done by means of the electron reflector 1002 done by putting this in the third working position 111c is brought and / or by placing the electron beam on the beam catcher 1002 is judged.

The inhibition can interrupt the evaporation (for example for a limited period of time), for example until the beam catcher 1002 in the third parking position 113c brought or from which the beam catcher 1002 in the third working position 111c brought. In other words, the rate of evaporation (ie vaporized material to be evaporated per time) can be changed, for example controlled and / or regulated, by means of the displacement of the electron reflector 1002 between his working position and parking position. For example, evaporation after inhibition 1215 be continued, for example by positioning the electron reflector in its parking position 113c he follows.

The reflected electrons can hit the workpiece to be coated, for example, so that it is heated (for example to 1000 ° C. or more). Alternatively or additionally, the workpiece can be heated by means of heat radiation from the beam catcher 1002 is emitted. The beam trap can do this 1002 For example, it can be set up to withstand high temperatures (for example, only change to the gaseous phase at more than 1000 ° C). Optionally, the heating of the workpiece can be controlled and / or regulated by irradiating the electron reflector 1002 with the electron beam.

The procedure 1200 can optionally further comprise: coating the workpiece (ie applying a coating to the workpiece). The coating can optionally be multi-layer, ie have several layers. The several layers can optionally differ from one another, for example in their chemical composition and / or their thickness.

The (eg first, second, third and / or fourth) evaporation and / or coating can take place at the process pressure. For this purpose, the vacuum area in which evaporation and / or coating take place can be pumped out, for example to the process pressure.

The coating can (for example, the multiple layers) have, for example, a first layer which has the first vaporization material and / or is formed therefrom. The coating can (for example, the multiple layers) have, for example, a second layer which has the second vaporization material and / or is formed therefrom. The coating (for example, the multiple layers can have) a fourth layer, for example, which has the additional first vaporization material and / or is formed therefrom. The coating can (for example, the multiple layers) have, for example, a fourth layer which has the additional second vaporization material and / or is formed therefrom.

The coating can have, for example, an oxide or a ceramic or be formed therefrom. The coating can have, for example, a thermal barrier coating or be formed therefrom.

The workpiece may, for example, have or be formed from a turbine component, e.g. a turbine blade.

The procedure 1200 can optionally further comprise: equipping the first evaporation pot 102 and / or the first evaporation device 202a (eg their magazine) with the first material to be evaporated. The procedure 1200 can alternatively or additionally have: equipping the second evaporation crucible 102b and / or the second evaporation device 202b (eg their magazine) with the second material to be evaporated. Analogously, one or more than one additional (eg first and / or second) evaporation crucible 112a . 112b or additional (eg first and / or second) evaporation device 202c . 202d (eg their magazine) can be equipped with at least one additional material to be evaporated.

Before the first evaporation 1205 can post the first and second 1201 . 1203 take place and have: positioning the first evaporation lever and / or the first evaporation device in its working position or in the evaporation area and (e.g. simultaneously) positioning the second evaporation lever and / or the second evaporation device (for example its magazine) in its park position or outside of the evaporation region.

The first vaporization 1205 can optionally further comprise: applying energy to the first evaporation lever and / or the first evaporation device (for example thermal energy and / or radiation energy), for example by means of one or more than one electron beam. This can cause the first material to be evaporated to evaporate (ie a vapor source or cloud of vapor is formed from the first material to be evaporated).

The coating can optionally further comprise: coating the workpiece with the first material to be evaporated, e.g. by means of the steam source formed.

Before the second evaporation 1207 can post the first and second 1201 . 1203 take place and have: positioning the first evaporation lever and / or the first evaporation device (e.g. its magazine) in its parking position or outside the evaporation area and (e.g. simultaneously) positioning the second evaporation lever and / or the second evaporation device (e.g. its magazine) in its Working position or within the evaporation area.

The second vaporization 1207 can optionally further comprise: applying energy to the second evaporation lever and / or the second evaporation device (for example thermal energy and / or radiation energy), for example by means of one or more than one electron beam. This can cause the second material to be evaporated to evaporate (ie a vapor source or vapor cloud is formed from the second material to be evaporated).

The coating can optionally further comprise: coating the workpiece with the second material to be evaporated, e.g. by means of the steam source formed.

For the first publishing 1203 can optionally be carried out simultaneously: applying the energy and / or irradiating the electron reflector to the electron reflector, for example by means of the electron beam.

The inhibition 1215 of (for example first, second, third and / or fourth) evaporation can comprise: positioning the electron reflector in its working position and / or irradiating the electron reflector. The continuation of the (for example first, second, third and / or fourth) evaporation can include: positioning the electron reflector in its parking position and / or irradiating the corresponding evaporation material.

For example, the inhibition 1215 of evaporation: positioning the first Evaporation crucible in its parking position and the second evaporation crucible in its working position while simultaneously applying the energy of the electron beam to the electron reflector (eg irradiation with the electron beam).

For example, the inhibition 1215 of evaporation: positioning the first evaporation crucible in its working position and the second evaporation crucible in its parking position while simultaneously applying the energy of the electron beam to the electron reflector (eg irradiation with the electron beam).

While the energy is applied to the beam catcher, it can be arranged in its working position or parking position.

13 illustrates an evaporator 1300 according to various embodiments in a schematic plan view. The evaporator 1300 can be set up as one of the evaporation devices 100 to 1100 , wherein the tracking device 302 at least two stationary drive devices 1302 and / or at least two stationary lifting mechanisms 302h has relative to the bearing arrangement 106 , This allows the evaporation material to be tracked for more than two, for example three or four, evaporation units 202a . 202b . 202c . 202d provide space-saving.

The evaporator 1300 can optionally have a transport device for transporting one or more than one workpiece along a transport direction 115 ,

At least one (eg the first, second, third and / or fourth) evaporation unit 202a . 202b . 202c . 202d can be a drive device 1304 have, which is set up for rotating the magazine.

14 illustrates the evaporator 1300 in a schematic top view in one configuration 1400 , in which at least two evaporation crucibles are brought into the working position and the respective magazines from the tracking device 302 to be served.

15 illustrates the evaporator 1500 according to various embodiments in a schematic plan view, for example one of the evaporation devices 100 to 1100 or 1300 ,

The tracking device 302 can the evaporation material 110 the (for example first, second, third and / or fourth) evaporation unit 202a . 202b . 202c . 202d in the appropriate crucible 102 . 102b . 112a . 112c track, eg if the corresponding crucible 102 . 102b . 112a . 112c is in his working position.

The tracking can be done in the direction 111b respectively. direction 111b can be perpendicular to the path, for example 104a . 104b . 114a . 114b be along which the crucible 102 . 102b . 112a . 112c is relocatable. The path 104a . 104b . 114a . 114b can from the bearing arrangement 106 be defined, for example a displacement unit 106 can have or be formed therefrom.

Optionally, the drive devices 1302 and / or the lifting mechanism 302h stationary relative to the vacuum chamber 802 be set up, for example, in relation to the displacement of the crucible 102 . 102b . 112a . 112c , In other words, the crucible 102 . 102b . 112a . 112c relative to the drive devices 1302 and / or the lifting mechanism 302h be relocatable.

Various examples are described below, which relate to those described above and shown in the figures.

Example 1 is an evaporator 100 to 1500 , comprising: (eg exactly) a first evaporation crucible 102 to provide a first vapor source and (eg exactly) a second evaporation crucible 102b to provide a second source of steam; and a bearing arrangement 106 , by means of which the first evaporation crucible 102 and the second evaporation crucible 102b are displaceable (for example displaceable) in such a way that they can be displaced independently of one another and / or relative to one another.

Example 2 is the evaporator 100 to 1500 according to Example 1, being by means of the bearing arrangement 106 , by means of which the first evaporation crucible 102 and the second evaporation crucible 102b are displaceably mounted, the first evaporation crucible 102 (eg exactly) a first (eg mechanical) degree of freedom and the second evaporation crucible 102b (for example exactly) a second (for example mechanical) degree of freedom is provided.

Example 3 is the evaporator 100 to 1500 according to Example 2, wherein the first degree of freedom and the second degree of freedom are independent of each other.

Example 4 is the evaporator 100 to 1500 according to example 2 or 3, wherein the first degree of freedom and / or the displaceability of the first evaporation crucible 102 along a first path 104a is provided, and wherein the second degree of freedom and / or the displaceability of the second evaporation lever 102b along a second path 104b is provided, the first path 104a and the second path 104b run diagonally to each other.

Example 5 is the evaporator 100 to 1500 according to Example 4, the first path 104a and the second path 104b run perpendicular to each other and / or in a straight line.

Example 6 is the evaporator 100 to 1500 according to one of Examples 2 to 5, wherein the first degree of freedom and / or the second degree of freedom are a degree of translation freedom.

Example 7 is the evaporator 100 to 1500 according to one of Examples 1 to 6, further comprising: a first evaporation unit 202a which have a first recording area 202a for receiving a first evaporation material and the first evaporation crucible 102 having; a second evaporation unit 202b which has a second recording area 202a for receiving a second evaporation material and the second evaporation crucible 102b having; being by means of the bearing arrangement 106 the first evaporation unit 202a and the second evaporation unit 202b are mounted such that they can be moved independently of one another and / or relative to one another; and / or wherein the first evaporation unit 202a and the second evaporation unit each have a separate frame.

Example 8 is the evaporator 100 to 1500 according to Example 7, wherein the first evaporation unit 202a a first frame 202g in which the first recording area 202a is provided and which is the first evaporation crucible 102 wearing; and / or wherein the second evaporation unit 202b a second frame 202g in which the second recording area 202a is provided and which is the second evaporation crucible 102b wearing; for example the first frame 202g and the second rack 202g have a distance from each other.

Example 9 is the evaporator 100 to 1500 according to one of Examples 1 to 8, wherein (for example according to the first degree of freedom) the first evaporation crucible 102 in a first position 111 and an additional first position 113a is displaceable, with (for example according to the second degree of freedom) the second evaporation crucible 102b in a second position 111b and an additional second position 113a is displaceable, the first position purple and the second position 111b have a smaller distance from each other than the additional first position 113a and the additional second position 113b ,

Example 10 is the evaporator 100 to 1500 according to Example 9, wherein the spacing of the positions from one another is that between the spacing of the first evaporation cup 102 from the second evaporation crucible 102b is when they are brought into the respective position.

Example 11 is the evaporator 100 to 1500 according to Example 9 or 10, wherein the distance of the first position 113a and the second position 113b from each other is smaller than 200 mm and / or as an extension of an opening 102t of the first evaporation level 102 , For example, a slight deviation of the positions of the steam sources relative to the expansion of the generated steam sources is achieved.

Example 12 is the evaporator 100 to 1500 according to one of Examples 1 to 11, further comprising: a first vaporization magazine 202m to supply the first evaporation crucible 102 with a first material to be evaporated, for example for holding the first material to be evaporated in the first receiving area 202a , for example, the first vapor source is to be provided by means of the first vaporization material (for example by converting the first vaporization material into a gaseous aggregate state).

Example 13 is the evaporator 100 to 1500 according to Example 12, wherein the first evaporative magazine 202m several shafts 104 for receiving the first evaporation material and / or by means of the first evaporation unit 202a rotatable in the recording area 202a is stored; the evaporator 100 to 1500 optionally further comprising a drive device (for example having one or more than one electric motor) for rotating the material to be evaporated 202m ,

Example 14 is the evaporator 100 to 1500 according to Example 6 or 13, further comprising: a second vaporization magazine 202m to supply the second evaporation crucible 102b with a second material to be evaporated (eg for holding the second material to be evaporated in the second receiving area 202a) , the first evaporating magazine 202m and the second vaporization magazine 202m differ in at least one of the following: their number of shafts for holding a vaporized material; their vaporizable capacity; their height; and / or their diameter; wherein, for example, the second vapor source is to be provided by means of the second vaporization material (for example by converting the second vaporization material into a gaseous state of aggregation).

Example 15 is the evaporator 100 to 1500 according to one of Examples 1 to 14, further comprising: a tracking arrangement, which has a first tracking device and / or a second tracking device; wherein the first tracking device is set up (eg in the first recording area 202a arranged) evaporation material in the direction of the first evaporation crucible 102 to track (ie to relocate); and / or wherein the second tracking device is set up, for example in the second recording area 202a) arranged evaporation material in the direction of the second evaporation crucible 102b to track.

Example 16 is the evaporator 100 to 1500 according to Example 15, further comprising: a drive device (for example having one or more than one electric motor) for driving the tracking arrangement (for example its first tracking device and / or second tracking device), the drive device being arranged in a stationary manner relative to the bearing arrangement 106 ,

Example 17 is the evaporator 100 to 1500 according to Example 15 or 16, wherein the first tracking device and / or the second tracking device have a lifting mechanism (for example having a linear gear), the lifting mechanism being fixed in place relative to the bearing arrangement 106 ,

Example 18 is the evaporator 100 to 1500 according to Example 17, wherein the lifting mechanism is set up, when driven, to effect the tracking.

Example 19 is the evaporator 100 to 1500 according to Example 18, wherein the lifting mechanism is set up to convert a rotary movement (for example provided by the drive device) into a translation of the respective evaporation material (for example in the direction of the respective crucible) for tracking.

Example 20 is the evaporator 100 to 1500 according to one of Examples 1 to 19, further comprising: one or more than one additional evaporation crucible 112a , for example the first evaporation unit 202a and / or the second evaporation unit 202b at least one evaporation crucible of one or more than one additional evaporation crucible 112a having.

Example 21 is the evaporator 100 to 1500 according to one of Examples 1 to 20, further comprising: a third evaporation crucible 112a for providing a third steam source, which by means of the bearing arrangement 106 is displaceably mounted such that it is independent of and / or relative to both the first evaporation crucible 102 as well as the second evaporation crucible 102b can be relocated; the evaporator 100 to 1500 optionally further comprising: a fourth evaporation crucible 112b for providing a fourth steam source, which by means of the bearing arrangement 106 is displaceably mounted such that it is independent of and / or relative to both the first evaporation crucible 102 , the third evaporation crucible 112a as well as the second evaporation crucible 102b can be relocated; the evaporator 100 to 1500 optionally further comprising: a third evaporation unit 202c which has a third recording area 202a to hold a third evaporation material and the third evaporation crucible 112a having; the evaporator 100 to 1500 optionally further comprising: a fourth evaporation unit 202d which has a fourth recording area 202a for holding a fourth evaporation material and the fourth evaporation crucible 112b having; whereby, for example, by means of the bearing arrangement 106 , the third evaporation unit 202c a third degree of freedom and / or the fourth evaporation unit 202d a fourth degree of freedom is provided; wherein, for example, the third degree of freedom and / or the fourth degree of freedom are independent of one another and / or both of the first degree of freedom and of the second degree of freedom.

Example 22 is the evaporator 100 to 1500 according to one of Examples 1 to 21, further comprising: a beam catcher 1002 (which is set up, for example, to reflect more electrons than to absorb them).

Example 23 is the evaporator 100 to 1500 according to one of Examples 1 to 22, further comprising: an additional bearing arrangement 116 , by means of which the beam catcher 1002 (eg electron reflector) can be shifted to a position in which the first evaporation crucible 102 and the second evaporation crucible 102b (for example, if these are brought into the working position) and / or by means of which the beam catcher 1002 relative to the bearing arrangement 106 is relocatable.

Example 23a is the evaporator 100 to 1500 according to Example 23, the beam trap 1002 has a heat exchanger and / or remains in a solid state of aggregation up to a temperature, the temperature (also referred to as resistance temperature) optionally being greater than 1000 ° C., the heat exchanger optionally having at least one fluid line and / or a fluid flowing through it.

Example 23b is the evaporator 100 to 1500 according to Example 23 or 23a, the beam catcher 1002 a ceramic, a nickel or cobalt-based metal alloy and / or carbon in a carbon modification (eg graphite) or is formed therefrom, optionally the beam catcher 202 has a coating; and wherein optionally the coating comprises the ceramic, a nickel or cobalt-based metal alloy and / or carbon in a carbon modification (eg graphite).

Example 23c is the evaporator 100 to 1500 according to one of Examples 23 to 23b, wherein the beam catcher 202 has a surface element (for example a plate) or is formed therefrom.

Example 23d is the evaporator 100 to 1500 according to one of Examples 23 to 23c, wherein the beam catcher 1002 provides a reflection coefficient and an absorption coefficient for electrons or the electron beam, the reflection coefficient being greater than the absorption coefficient, and / or wherein the beam catcher 1002 is set up to reflect and / or re-emit more electrons than to absorb them.

Example 23e is the evaporator 100 to 1500 according to one of Examples 23 to 23d, wherein the beam catcher 1002 is set up to convert at least part of the power introduced by means of the electron beam into heat radiation, and to radiate the heat radiation, for example, in the direction away from the electron beam gun and / or towards a coating material and / or towards a workpiece.

Example 23f is the evaporator 100 to 1500 according to one of Examples 23 to 23e, wherein an averaged spatial power density (for example angle-related) which the electron beam provides when the beam catcher is irradiated with it is smaller than when the coating material is irradiated with it.

Example 24 is the evaporator 100 to 1500 according to one of Examples 1 to 23f, further comprising: one or more than one electron beam source for irradiating the first evaporation crucible 102 and / or the second evaporation lever 102b (eg when they are brought into the working position), or the evaporation material arranged therein.

Example 25 is a method of operating an evaporator 100 to 1500 , comprising: moving a fixed first evaporation item (for example according to a first degree of freedom) into and / or out of an evaporation area; (eg subsequent) moving a fixed second vaporization material (eg according to a second degree of freedom) into and / or out of the vaporization area; (eg subsequent) vaporization of the first vaporized material (for example by means of an electron beam) if this is arranged in the vaporization area and the second vaporized material is arranged outside the vaporization area; (e.g. subsequent) vaporization of the second vaporization material (for example by means of the electron beam), if this is arranged in the vaporization area and the first vaporization material is arranged outside the vaporization area, for example the displacement of the first vaporization material and the displacement of the second vaporization material independently of one another and / or successively.

Example 26 is the method according to Example 25, wherein the displacement of the first vaporized material according to a first degree of freedom and the displacement of the second vaporized material according to a second degree of freedom, the first degree of freedom and the second degree of freedom being independent of one another.

Example 27 is the method according to Example 25 or 26, wherein the first material to be evaporated and the second material to be evaporated differ from one another.

Example 28 is the method according to one of Examples 25 to 27, coating a workpiece by means of the vaporized first vaporized material and by means of the vaporized second vaporized material.

Example 29 is the method according to one of Examples 25 to 27, wherein the evaporation of the first evaporation item and / or the evaporation of the second evaporation item comprise irradiating the first evaporation item and / or second evaporation item with electrons, e.g. by means of an electron beam; and / or wherein the vaporization of the first vaporization material provides a first vapor source and / or the vaporization of the second vaporization material provides a second vapor source.

Example 30 is the method according to Example 29, wherein the electrons are emitted in the direction of the evaporation region and the method further comprises: temporarily inhibiting (eg interrupting) the evaporation of the first evaporation material and / or the second evaporation material by removing at least some of the electrons from is reflected and / or absorbed away from the evaporation area (for example before they reach the evaporation area).

Example 31 is the method of Example 30, wherein the inhibiting includes reflecting and / or absorbing more electrons away from the evaporation area than entering the evaporation area.

Example 32 is the method of Example 30 or 31, further comprising: heating a workpiece by means of at least a portion of the electrons that are reflected away from the evaporation region and / or by means of thermal radiation which is brought about by means of electron absorption.

Example 33 is the method of any of Examples 25 to 32, further comprising: irradiating an electron reflector with electrons between evaporation 1205 the first material to be evaporated and the evaporation 1207 the second material to be evaporated; and / or irradiating the electron reflector with electrons during the displacement 1201 the first material to be evaporated and / or the displacement 1203 of the second material to be evaporated.

Example 34 is the method according to Example 33, wherein the irradiation of the electron reflector comprises reflecting electrons, e.g. more than are absorbed by the beam trap; and / or wherein the irradiation of the electron reflector comprises irradiating the beam catcher with more electrons than the first vaporization material and / or as the second vaporization material.

Example 35 is the method according to one of Examples 25 to 34, wherein the vaporization of the first vaporized material and the vaporization of the second vaporized material (e.g. the irradiation thereof) are carried out by means of one or more than one electron beam.

Example 36 is the method according to one of Examples 25 to 35, the method further comprising: moving a beam catcher 1002 (e.g. between two positions, of which the beam catcher 1002 covers the first and / or the second evaporation crucible in a first position); and irradiating (eg impinging) the beam catcher 1002 with at least part of the electron beam (eg part of the electron beam power), if and / or as long as the beam catcher 1002 covers the first and / or the second evaporation crucible, the beam catcher 1002 optionally has or is formed from an electron reflector, optionally shifting the beam catcher 1002 in a first position, in which this covers the first and / or the second evaporation crucible, optionally shifting the beam catcher 1002 has in the first position to move it towards the first and / or second evaporation crucible.

Example 37 is the method according to one of Examples 25 to 36, the method further comprising: moving one or the workpiece in the direction of the first and / or second evaporation material; and while moving, irradiating one or the beam catcher 1002 by means of the electron beam; the first and / or second vaporized material being evaporated after the displacement (for example by means of the electron beam), for example towards the workpiece.

Claims (13)

Evaporator (100 to 1500), comprising: • a first evaporation crucible (102a) for providing a first vapor source and a second evaporation crucible (102b) for providing a second vapor source; and • A bearing arrangement (106), by means of which the first evaporation crucible (102a) and the second evaporation crucible (102b) are mounted such that they can be displaced independently of one another and / or relative to one another. Evaporation device (100 to 1500) according to Claim 1 , further comprising: • a first evaporation unit (202a) which has a first receiving region (202a) for receiving a first evaporation material and the first evaporation crucible (102a); • a second evaporation unit (202b) which has a second receiving area (202a) for receiving a second evaporation material and the second evaporation crucible (102b); • wherein the first evaporation unit (202a) and the second evaporation unit (202b) are mounted such that they can be displaced by means of the bearing arrangement (106) such that they can be displaced independently of one another and / or relative to one another. Evaporation device (100 to 1500) according to Claim 2 , • wherein the first evaporation unit (202a) has a first frame in which the first receiving area (202a) is provided and which carries the first evaporation crucible (102a); and / or • the second evaporation unit (202b) has a second frame in which the second receiving region (202a) is provided and which carries the second evaporation crucible (102b). Evaporation device (100 to 1500) according to one of the Claims 1 to 3 , wherein the first evaporation crucible (102a) can be displaced into a first position (111a) and an additional first position (113a), wherein the second evaporation crucible (102b) can be displaced into a second position (111b) and an additional second position (113b) , wherein the first position (111a) and the second position (111b) have a smaller distance from one another than the additional first position (113a) and the additional second position (113b). Evaporation device (100 to 1500) according to Claim 4 , wherein the distance of the first position (111a) from the second position (111b) is smaller than an extension of an opening (102t) of the first evaporation crucible (102a). Evaporation device (100 to 1500) according to one of the Claims 1 to 5 , further comprising: a first evaporating material magazine (202m) for holding the first evaporating material in the first receiving area (202a). Evaporation device (100 to 1500) according to Claim 6 , further comprising: a second evaporating material magazine (202m) for holding the second evaporating material in the second receiving area (202a), the first evaporating material magazine and the second evaporating material magazine differing from one another in their evaporating material capacity. Evaporation device (100 to 1500) according to one of the Claims 1 to 7 , further comprising: a tracking arrangement (302) having a first tracking device and / or a second tracking device; • wherein the first tracking device is set up to track an evaporating material arranged in the first receiving region (202a) in the direction of the first evaporation crucible (102a); and / or • the second tracking device being set up to track an evaporating material arranged in the second receiving region (202a) in the direction of the second evaporation crucible (102b). Evaporation device (100 to 1500) according to Claim 8 , further comprising: a drive device for driving the tracking arrangement, the drive device being fixed in place relative to the bearing arrangement (106). Evaporation device (100 to 1500) according to one of the Claims 1 to 9 , further comprising: a beam catcher (1002). Evaporation device (100 to 1500) according to one of the Claims 1 to 10 , further comprising: an additional bearing arrangement (116), by means of which the beam catcher (1002) can be displaced into a position (111c) in which it covers the first evaporation crucible (102a) and / or the second evaporation crucible (102b). A method (1200) for operating an evaporation device (100 to 1500), comprising: • moving (1201) a solid first vaporization material into and / or out of an evaporation area; • moving (1203) a solid second vaporization material into and / or out of the vaporization area; • evaporating (1205) the first vaporized material if it is arranged in the vaporization area and the second vaporized material is arranged outside the vaporization area; • evaporating (1207) the second evaporating material if it is arranged in the evaporation area and the first evaporating material is arranged outside the evaporation area; • whereby the displacement (1201) of the first vaporization material and the displacement (1203) of the second vaporization material take place independently of one another. Method (1300) for operating an evaporation device (100 to 1500) according to Claim 12 , the method further comprising: • moving an electron reflector; • Applying at least a portion of the electron beam power to the electron reflector when it covers the first and / or the second evaporation crucible.

Images