DE102017212352A1 - Cleaning module and method for in situ cleaning of a source chamber of an EUV radiation source, radiation source module and illumination system for a projection exposure apparatus and projection exposure apparatus - Google Patents

Abstract

A cleaning module (236) for in situ cleaning of a source chamber (216, 217) of an EUV radiation source (215) of a lighting system (101) for a projection exposure apparatus comprises a feed device (238) for introducing at least one cleaning agent (240) into the source chamber (216 , 217), a movement device (241) for moving the cleaning agent (240) relative to the source chamber (216, 217) and a removal device (241) for removing the cleaning agent (240) and / or from the action of the cleaning agent (240). detached impurities from the source chamber (216, 217). The delivery device (238) and the removal device (241) can be coupled in situ to the source chamber (216, 217). This ensures a mechanical cleaning of the source chamber without having to remove it from the lighting system (101) and / or disassemble it into its components.

Description

The invention relates to a cleaning module and a method for in situ cleaning of a source chamber of an EUV radiation source of a lighting system for a projection exposure apparatus. The cleaning module and the method allow, in particular, a mechanical, abrasive cleaning of the source chamber. Furthermore, the invention relates to a radiation source module and a lighting system for a projection exposure apparatus and a projection exposure apparatus.

In an EUV radiation source, useful radiation in the EUV range can be generated by igniting a source plasma in a source chamber of the EUV radiation source. The US 2011/0089834 A1 describes an embodiment of an EUV radiation source with an electrode plasma generating device.

EUV radiation sources are used in illumination systems for projection exposure systems. The projection exposure equipment is used in EUV lithography. For this purpose, useful radiation is generated in the illumination system comprising the EUV radiation source and an illumination optical system in order to image a mask for producing a semiconductor component, in particular a microchip. An exemplary projection exposure apparatus is from the WO 2009/100856 A1 known.

It is an object of the present invention to improve the practical usability and throughput of a projection exposure apparatus.

This object is achieved by a cleaning module for in situ cleaning a source chamber of an EUV radiation source of a lighting system for a projection exposure apparatus with the features mentioned in claim 1.

According to the invention, it has been recognized that the service life and precision of an EUV radiation source is limited due to contamination of a source chamber of the EUV radiation source. The contamination occurs due to debris formation due in particular to sputtering effects in the source chamber. The contamination is present in particular in the form of a contamination layer on a chamber wall delimiting the source chamber. The contamination layer grows in proportion to the number of operating hours of the EUV radiation source. The contaminants represent a significant functional risk and failure risk for the EUV radiation source, the illumination system and the entire projection exposure apparatus.

The gist of the invention is to provide a cleaning module with a feeding device for introducing at least one cleaning agent into the source chamber and a removal device for removing the cleaning agent and / or contaminants detached from the source chamber by the action of the cleaning agent, wherein the feeding device and the removal device in FIG situ can be coupled to the source chamber.

Generally, the cleaning module provides the ability to clean the source chamber in situ, thereby reducing the downtime of the EUV radiation source. In addition, the risk of contamination of the illumination optics is reduced. This increases the reliability of the EUV radiation source, the illumination system and the projection exposure apparatus.

In situ cleaning means that the EUV radiation source does not have to be removed from the illumination system for the projection exposure system and / or disassembled into individual parts for cleaning. This simplifies the cleaning considerably. The cleaning of the source chamber can be done in particular in an evacuated lighting system. This has the advantage that contamination of the lighting system is prevented when removing the EUV radiation source. In addition, a re-evacuation of the illumination system after cleaning the source chamber is not necessary. The time required for cleaning is reduced, which in particular increases the throughput of semiconductor components produced by the projection exposure apparatus, in particular of microchips. As a result, the manufacturing process for the semiconductor components carried out by the projection exposure apparatus can be carried out efficiently and inexpensively. The quality of the semiconductor devices produced is also improved with regular cleaning.

The delivery device and / or the removal device can be reversibly coupled to the source chamber. They can also be fixed to the source chamber. Particularly preferably, the supply device and / or the removal device can be coupled to the source chamber in a vacuum-tight manner.

For in situ cleaning of the source chamber, at least one cleaning agent can be introduced by means of the feed device into the source chamber of the EUV radiation source. In addition, the cleaning module comprises a movement device for moving the cleaning agent relative to the source chamber. The relative movement of the cleaning agent to the source chamber causes a removal of impurities in the source chamber, in particular a Detaching the contamination layer from the chamber wall. The cleaning is done mechanically, especially abrasive. This has the advantage that even chemically inert impurities can be removed.

The at least one cleaning agent may be solid, liquid or gaseous. Mixtures of solid, liquid and gaseous cleaning agents may also be provided. Solid cleaning agents may be, for example, abrasive particles, for example in the form of abrasive granules, by means of which relative movement to the source chamber can be abraded. The abrasive bodies can also be supplied with a carrier liquid or a carrier gas. Alternatively, solid cleaning agents in the form of a removal device, in particular a one-piece removal device may be present. Such ablation devices may be, for example, brushes and / or scrapers, with which impurities can be removed from the chamber wall of the source chamber.

The cleaning agent may comprise a blasting material. The blasting material may, for example, comprise abrasive particles. The blasting material can be moved relative to the source chamber in such a way that it impinges with high impulse on the chamber wall of the swelling chamber and ablates, in particular dissipates, the contamination layer located thereon. In particular, liquid or gaseous detergents may comprise chemical compounds which chemically act on the contaminant in addition to mechanical, abrasive cleaning.

The cleaning agent may further comprise ions and / or electrons, for example from a cleaning plasma, to sputter off the contaminants. The sputtering by means of a cleaning plasma is also referred to as micro sandblasting. In particular, when using a noble gas, from which the cleaning plasma is generated, here is the abrasive cleaning by sputtering in the foreground. Alternatively, corrosive gases such as a mixture of tetrafluoromethane (CF ₄ ) and oxygen (O ₂ ) may also be used, which additionally cause chemical etching of the contaminant.

It is preferably provided that the cleaning module comprises a container which serves as a reservoir for the cleaning agent. The supply device may comprise, for example, a supply line, which is firmly connected to the container and can be coupled to the source chamber, in particular vacuum-tight manner. This has the advantage that the cleaning agent is introduced from the container only in the source chamber and does not penetrate into other areas of the lighting system. For better introduction and distribution and / or movement of the cleaning agent in the source chamber can also be provided that the feeder or parts of the feeder can be introduced into the source chamber.

Detergents may also be supplied via the feeder from outside the projection exposure equipment. The supply can take place, for example, via a maintenance area which allows access to the source chamber in the lighting system. Refilling an integrated detergent reservoir is not necessary in this case. In the event that the cleaning agent is designed as a removal device, the supply device may in particular comprise a mechanical transmission, for example in the form of a shaft and / or a telescopic rod.

The chamber wall of the source chamber can be made of copper, in particular of a copper compound, in particular of CDA-110. The contamination layer may be chemically inert. The contamination layer may in particular comprise silicon carbide (SiC). Preferably, a cleaning is carried out such that the chemically inert contamination layer is detached without damaging the chamber wall. For this purpose it can be provided to adapt the cleaning agent to the type and degree of contamination, in particular the thickness of the contamination layer.

The moving device may include a motor. The movement device can be connected to the motor by means of a gear or can be driven magnetically. Alternatively, the movement device may also include a nozzle for generating a fluid flow, in particular a high-pressure fluid flow. The fluid stream may comprise, for example, a carrier gas. Nitrogen can be used in particular as the carrier gas. The movement device can in particular be adapted to the cleaning agent. For example, an abrasive body comprising abrasive can be moved relative to the source chamber.

It is particularly possible that the movement device can also be used for introducing the cleaning agent into the source chamber. In this case, the moving device and the feeding device may comprise the same components. This simplifies the construction of the cleaning module. Thus, the cleaning agent can be irradiated, for example by means of a nozzle in the source chamber and thus moved relative to the source chamber.

The movement device can be integrated into the source chamber or, at least in part, can be introduced into the source chamber. This is a targeted movement of the detergent relative to the source chamber improved.

The removal device serves for removing the cleaning agent and / or contaminants released from the source chamber by the action of the cleaning agent. This can be done for example by aspiration or rinsing the source chamber. In order to avoid distributing cleaning agents and / or contaminants removed from the source chamber in the illumination system, the removal device preferably comprises a container for receiving the cleaning agent and / or the detached contaminants. This container may for example be integrated into a suction device. Preferably, the container can be coupled to the at least one opening of the source chamber, in particular vacuum-tight coupled. As a result, contamination of the remaining lighting system is avoided. Alternatively, the removal device can also have a discharge line from the illumination system, in particular from the projection exposure system. This can be done for example via a maintenance area.

In order to enable the in-situ cleaning of the source chamber by the cleaning module can be provided, for example, that at an opening of the source chamber first a feeder, then a moving device and then the removal device can be coupled. Alternatively, it is also possible to have the cleaning done over several openings of the source chamber. For this purpose, for example, the feed device, the movement device and the removal device can be coupled to different openings of the source chamber, in particular coupled vacuum-tight. For effective cleaning of the source chamber, it is thus advantageous if the cleaning module is adapted to the EUV radiation source, in particular at openings of the source chamber.

It can be provided that the cleaning module and the EUV radiation source are present as a system that can be integrated into the lighting system. A suitable source chamber may have at least one opening in the chamber wall. The at least one opening of the source chamber may preferably be realized as a bore. The hole precisely defines the size and contour of the opening. As a result, an adaptation of the cleaning module, in particular the coupling of the feed device and the removal device to the opening is simplified. The at least one opening of the source chamber can be arranged in particular in a bottom plate of the source chamber. Preferably, the bottom plate comprises a plurality of openings. Preferably, all openings are designed as bores. In particular, four openings may be provided. An opening may be centered as a central opening in the bottom plate. The remaining three openings may be arranged eccentrically around the central opening. The openings may in particular be closed in order to ensure safe cleaning.

Particularly preferably, a maintenance area is arranged adjacent to the source chamber, via which the source chamber, in particular the openings in the chamber wall of the source chamber are accessible. For this purpose, the maintenance area may have a maintenance opening, in particular a maintenance flap. The maintenance opening provides a simple and uncomplicated way to access components of a projection exposure system, in particular a lighting system, in particular a source chamber, without having to remove and / or open these.

Such maintenance areas and maintenance openings may be used to install and remove components, such as inserts in holes in a plate of the source chamber. The erfmdungsgemäße cleaning module is particularly suitable for cleaning the source chamber on such a maintenance area. The cleaning module can therefore be designed to supplement already installed projection exposure systems with a maintenance area assigned to the source chamber.

According to one aspect of the invention, the cleaning agent comprises a brush head. As a result, a cleaning of the source chamber is made possible by brushing the chamber wall, in particular the bottom plate. For this purpose, the brush head by means of the movement device in motion, in particular rotated. In addition, the brush head can be guided by means of the movement device over the inner surface of the chamber wall, in particular the bottom plate and these depart, preferably fully depart. The intensity of the cleaning can be controlled by the rotational speed of the brush head on the choice of the material from which the brush head is made, and the duration of the brushing. This ensures easy and reliable cleaning.

It is also possible to provide different brush heads for different cleaning steps and / or different inner surface areas of the chamber wall to be cleaned. For example, a roller brush can allow effective cleaning of the chamber wall in the region of the opening in the chamber wall. Alternatively or additionally, a strip brush may be used to clean a portion of the chamber wall opposite to the at least one opening.

The brush head is preferably made of a technical ceramic, in particular of an aluminum oxide ceramic. A brush head made of a technical ceramic is characterized by a high abrasion and wear resistance, so that a long service life of the brush head is guaranteed.

The movement device for the brush head may comprise a brush drive, which in particular can be connected to the brush head via a shaft. The brush drive may be a motor, in particular an electric motor. Alternatively, the brush head may be rotated by generating fluid flow through tangential exit nozzles to the brush head. The fluid flow may in this case advantageously itself comprise a cleaning agent in order to effect additional purification by means of the fluid flow.

During operation of the EUV radiation source, the brush head is preferably mounted in a storage container within the cleaning module. For cleaning, the brush head is introduced into the source chamber, in particular through an opening, into the source chamber. For this purpose, the brush head preferably has an optimized brush geometry, so that the brush head can be easily inserted through the opening into the source chamber. A suitable brush geometry can be achieved by a cylindrical brush head. In this case, the brush head can be pushed along its longitudinal axis through the opening, so that the opening must be passable only for the cylinder base. Particularly preferably, the feed device comprises the same components as the movement device, in particular the brush drive and the shaft connecting the brush drive with the brush head.

According to a further aspect of the invention, the delivery device comprises a shaft which can be bent around a joint. This has proven to be particularly practical in the supply of a brush head. To feed the brush head, the joint can not be angled and thus the shaft can be stretched. After introduction of the brush head in the source chamber, the shaft can be bent and thus bring the brush head to the chamber wall, in particular the bottom plate of the source chamber.

The brush head can have an action radius defined in particular by the deflectable shaft and / or its longitudinal axis. In particular, if the deflectable shaft is also part of the movement device, thereby an effective guiding of the brush head over the chamber wall can be achieved. Preferably, the radius of action of the brush head allows a shutdown of the entire inner surface of the chamber wall of the source chamber with the brush head. Alternatively, different areas of the chamber wall of the source chamber may be cleaned by different brush heads. This allows a complete and thorough cleaning of the source chamber. Since this makes high demands on the displaceability of the individual brush heads, it may alternatively be provided that the cleaning takes place through different openings of the source chamber. This has the advantage that even with a limited range of action of the at least one brush head, a comprehensive and thorough cleaning of the source chamber is made possible. The cleaning through different openings of the source chamber can be carried out sequentially with a brush head or simultaneously with a plurality of brush heads.

According to a further aspect of the invention, the cleaning agent comprises a blasting material. The blasting material may comprise a fluid and / or abrasive body. The blasting material can be irradiated under high pressure onto the inner surface of the chamber wall, in particular by means of a carrier fluid, in particular a carrier gas, in particular nitrogen. A cleaning agent comprising a blasting material makes it possible, in particular, to clean the source chamber by means of a blast cleaning method. This has the advantage that the cleaning can be effectively adapted to the contaminants by selecting the blasting material or a blasting mixture of a fluid and abrasive bodies.

The blasting material preferably comprises particles having an average particle size of between 1 μm and 500 μm, in particular between 50 μm and 200 μm, in particular of approximately 100 μm.

The blasting material can also be an ion or electron beam. This allows cleaning by means of micro sand blasting.

Advantageously, the movement device comprises at least one nozzle for controlling a fluid flow. The fluid stream may in this case comprise the cleaning agent itself or put the cleaning agent in motion. This has the advantage of a high reliability of the movement device, since no moving mechanisms for the movement of the cleaning agent must be provided.

The nozzle may, as already explained above, be arranged on a brush head for rotation of the brush head. Preferably, however, the nozzle is designed for the blast cleaning process. For example, the nozzle can introduce a blasting material by means of a high-pressure carrier fluid in the source chamber and radiate there under high pressure on the chamber wall. The nozzle can therefore be used as a movement device and as a delivery device for serve the blasting material. The nozzle can in particular be introduced into the source chamber. For this purpose, the nozzle can be coupled to the one opening of the source chamber, in particular vacuum-tight manner. Particularly preferably, the nozzle enables the irradiation of the blasting material in different directions. For this purpose, the nozzle may have different outlet openings. Alternatively or additionally, the nozzle may vary the direction of irradiation to allow for radiating the entire inner surface of the chamber wall of the source chamber. This ensures effective and thorough cleaning of the source chamber.

According to a further aspect of the invention, the movement device comprises an evacuation device for generating a fluid flow. The evacuation device can in this case generate a negative pressure in the source chamber, as a result of which a fluid flow can be generated. The generated fluid stream may comprise the cleaning agent, for example in the form of a blasting material. Such a cleaning module is suitable for carrying out a cleaning by means of vacuum suction blasting. This has, compared to other blast cleaning process the advantage of increased process reliability. In particular, contamination of the source chamber or other components of the projection exposure apparatus, such as, for example, an illumination optics, is avoided by means of high-purity cleaning agents. The evacuation device immediately removes the blasting material and possibly detached particles. Thus, the vacuum suction is particularly cleanroom suitable.

The evacuation device can be used not only for moving the cleaning agent, in particular the blasting material relative to the source chamber, but also for the supply of the cleaning agent and for the removal of the cleaning agent. The evacuation device can therefore also be part of the removal device and the feed device.

Preferably, a vacuum of <500 mbar, in particular <250 mbar, in particular <200 mbar, can be generated via the evacuation device. For this purpose, the evacuation device is preferably coupled vacuum-tight to the source chamber. Particularly preferably, the source chamber itself serves as a vacuum chamber.

In addition to the evacuation device, a nozzle for guiding the blasting material can be provided. Vorzugseise, the nozzle has a purpose optimized lance geometry, so that the chamber wall in particular can be completely radiated. Particularly preferably, a plurality of nozzles with different lance geometries can be provided. This allows even more thorough cleaning. The nozzles may have a deflecting element, in particular in the form of a baffle surface. The baffle serves to deflect the introduced into the source chamber beam, so that it is selectively irradiated to the chamber wall. A surface normal of an exemplary baffle can be perpendicular to an inflow direction of the blasting material. The baffle may also have an increasing angle to the inflow direction. Preferably, the baffle is rotationally symmetric about the inflow direction.

The cleaning agent may comprise abrasive articles. It is preferably provided that the grinding bodies can be fed dry, that is to say without the addition of liquids, into the source chamber. In particular, dry abrasive granules of polyurethane or fine corundum can be used as the abrasive body. The choice of abrasive particles can be adapted to the degree and type of contamination. The use of abrasives as cleaning agents has the advantage of effective abrasion. This can be removed in particular chemically inert contamination layers.

Preferably, the feed device for introducing the abrasive body in the source chamber to an opening of the source chamber can be coupled, in particular vacuum-tight coupled. It is also possible that the feeding device for the grinding wheels also serves as a removal device. This has the advantage of a simple construction of the cleaning module.

Preferably, the movement device comprises a stirring device. With the stirring device, in particular introduced into the chamber grinding wheels can be set in rotation. This allows the performance of a vibratory finishing process. Surface grinding processes are characterized by low complexity and a short process time. Furthermore, the vibratory finishing process has the advantage that the cleaning can be adapted to the degree of contamination by the choice of suitable grinding wheels and / or the rotational speed of the grinding wheels.

In order to carry out the vibratory finishing process, the amount of grinding bodies introduced can be dimensioned in particular such that the source chamber is filled at least 80%, in particular at least 90%, in particular substantially completely with grinding bodies. This has the advantage that all areas of the inner surface of the source chamber are uniformly in contact with abrasive bodies. This allows for effective and uniform cleaning by means of the grinding wheels.

In principle, it is conceivable that the stirring device is integrated in the source chamber. Preferably, however, the stirring device can be introduced into the source chamber. This has the advantage that the stirring device itself is not exposed to contamination by the debris formation. Furthermore, the insertable stirring device can be more easily replaced and / or replaced in the event of a defect. In addition, various stirring devices may be provided for different types of abrasive bodies and / or different rotational speeds. For introducing the stirring device in the source chamber, this is preferably coupled to an opening of the source chamber, in particular vacuum-tight coupled.

The stirring device can be driven by means of a motor, in particular by means of an electric motor. In a preferred embodiment, the stirring device is designed as a magnetic stirrer. A magnetic stirrer has the advantage that the stirring device does not have to be connected to a motor by means of a mechanical transmission. This increases the durability of the stirring device. Alternatively, the stirring device can also have axial outlet nozzles, so that the stirring device can be set in rotation by a fluid flow. Alternatively, the abrasive bodies can also be set in rotation by the exiting fluid itself.

According to a further aspect of the invention, the removal device comprises a suction device for sucking the source chamber. This has the advantage of a simple and effective removal of the cleaning agent and / or the detached impurities from the source chamber. Preferably, the suction device can be coupled by means of a suction line to an opening of the source chamber, in particular vacuum-tight coupled. In this way, a suction of the source chamber is ensured without parts of the cleaning agent and / or the detached contaminants can penetrate into the lighting system. The extracted detergent and / or impurities can be stored in a container of the suction device. Alternatively, the cleaning agent and / or impurities removed from the source chamber are removed by means of the suction device from the illumination system, in particular from the projection exposure apparatus. This can be done in particular via a maintenance area, in particular via a maintenance opening.

A suction device can be used in particular for evacuating the source chamber, so that this no additional components of the cleaning module must be provided.

In addition, the cleaning module may also include a rinsing device for rinsing the source chamber. By means of the rinsing device, the source chamber can in particular be rinsed with a rinsing fluid, in particular a rinsing fluid or a rinsing gas. Exemplary flushing fluids may include water, clean dry air (CDA), extreme dry air (XCDA), or nitrogen.

In accordance with a further aspect of the invention, the cleaning module comprises a compressed air generator which can be coupled to the source chamber and in particular can be vacuum-tightly connected. By the compressed air generator can be carried out a pre-and / or post-cleaning of the source chamber. In particular, it can be provided to radiate the chamber wall with compressed air. This allows even more thorough cleaning with the cleaning module.

Pre-cleaning and / or post-cleaning preferably takes place with XCDA (extreme clean dry air). The compressed air generator may comprise at least one compressed air nozzle for guiding the compressed air jet. Various nozzle geometries may also be provided to effectively radiate different regions of the chamber wall. Exemplary compressed-air nozzles may be designed to emit a region of the chamber wall surrounding the opening in the source chamber. A compressed air nozzle can also produce a focused compressed air jet, which can be directed by pivoting the compressed air nozzle to different areas of the chamber wall. Another nozzle may include a nebulizer, so that the compressed air can be simultaneously directed to the largest possible area of the chamber wall.

It is preferably provided to select the compressed-air nozzles as a function of the thickness and position of the contamination layer. It can also be done different pre and / or Nachreinigungsschritte with different compressed air nozzles.

According to a further aspect of the invention, the cleaning module comprises a control device for controlling the state of the source chamber. The control device can be used to verify the success of the cleaning. In particular, it can be checked whether all impurities have been removed. Furthermore, a control device allows the inspection of the chamber wall after cleaning. Thus, possibly resulting damage to the source chambers, in particular the chamber wall, can be detected. This further reduces the risk of contamination and failure of the EUV radiation source.

By means of the control device, the state of the source chamber can also be determined before cleaning. For example, a degree of Pollution can be determined to select on this basis, a suitable cleaning agent and / or the duration of a cleaning process. This increases the efficiency of cleaning.

The control device may comprise, for example, a radar or ultrasound system insertable into the source chamber with which the chamber walls are scanned. Particularly preferably, however, the control device is designed for optical control of the source chamber. For this purpose, the control device may comprise an endoscope, which is insertable through an opening of the source chamber into the source chamber. Additionally or alternatively, the control device may be designed to perform an eddy current test. For this purpose, the control device comprises in particular a coil pair of a transmitter and a receiver coil and a signal processor.

The embodiments of the cleaning module discussed above allow various cleaning methods to be performed. In particular, the invention includes cleaning modules for performing a brush cleaning method, a blast cleaning method, and a vibratory finishing method. However, the invention also includes cleaning methods which may be suitable for carrying out a plurality of the cleaning methods shown here. For example, a cleaning module may be provided, which allows cleaning by a brush head and by a blasting material. For example, it can be provided that the brush head comprises outlet nozzles for the blasting material. This allows simultaneous brushing and blasting of the chamber wall of the source chamber. Alternatively, it can also be provided that the cleaning module enables the sequential implementation of various cleaning methods. In principle, all the aforementioned properties of the cleaning modules can be combined.

Another object of the invention is to provide a method for in situ cleaning a source chamber of an EUV radiation source.

The object is achieved by a method having the steps specified in claim 9.

First, a lighting system for a projection exposure machine with an EUV radiation source is provided. The EUV radiation source in this case has a source chamber with at least one opening. In a further step, a cleaning agent is introduced into the source chamber through the opening. In a further step, the cleaning agent is moved relative to the source chamber, whereby impurities of the source chamber detached, in particular rubbed off. The cleaning agent and / or impurities removed by the action of the cleaning agent are then removed from the source chamber through the at least one opening. Such a method is suitable for mechanical, in particular abrasive, cleaning of the source chamber. In particular, the inventive method may include a brush cleaning method, a jet cleaning method and / or a vibratory finishing process. In particular, it may be provided to combine and / or to carry out various of the abovementioned cleaning methods.

It is also conceivable to combine the various cleaning methods mentioned above with further, in particular chemical, electromagnetic or non-contact cleaning methods, such as, for example, a laser cleaning method.

The method can be carried out in particular by opening a bottom plate of the source chamber. It is also possible initially to carry out the method by means of an eccentric opening of the base plate and to repeat this once again through a further opening, for example a central opening.

In principle, the method can be carried out independently of the cleaning modules described above. However, it is advantageous to carry out the method using one of the cleaning modules described above. For this, the suitable cleaning module with the EUV radiation source or a system consisting of the EUV radiation source and the cleaning module can be provided. The advantages of such a method correspond to the advantages of the cleaning module.

Particularly preferably, the cleaning methods can be carried out by bringing the cleaning module over a maintenance area to the source chamber and flanged. The cleaning module can also be stored or permanently installed in the maintenance area.

According to a further aspect of the invention, the cleaning method comprises a pre-cleaning and / or a subsequent cleaning with compressed air. This allows a particularly thorough cleaning of the source chamber.

According to another aspect of the invention, the cleaning method comprises a control step in which a state of the source chamber is checked. The control step can be carried out before and / or after the cleaning. The other advantages of the control step correspond to the advantages of the control device outlined above.

Another object of the invention is to provide an improved radiation source module for a lighting system of a projection exposure apparatus.

The object is achieved by a radiation source module having the features specified in claim 12.

The radiation source module according to the invention comprises an EUV radiation source with a source chamber having at least one opening and a cleaning module, as outlined above. The EUV radiation source and the cleaning module may be present as individual components or as a system. The advantages correspond in particular to those of the above-outlined cleaning module.

A further object of the invention is to provide an illumination system for a projection exposure apparatus, with which an improved usability of the projection exposure apparatus is made possible.

This object is achieved by a lighting system with the features specified in claim 13.

The illumination system according to the invention comprises a radiation source module, as outlined above. Furthermore, the illumination system comprises a lighting optical system. The illumination optics serve to expose an object field in an object plane. For this purpose, the lighting system may additionally comprise a collector, with which the useful radiation generated by the EUV source is bundled. Between the collector and the illumination optics, the useful radiation can pass through a Zwischenfokusebene. The illumination optics may include, for example, a field facet mirror and a follower optics. The follow-on optics has, in particular, a pupil facet mirror and a transmission optics comprising a plurality of mirrors.

The EUV radiation source can be mounted inclined in the illumination system by an angle α relative to the horizontal. The angle α may for example be between 10 ° and 20 °, in particular about 15 °. The inclined installation of the EUV radiation source in the lighting system has the advantage that cleaning module can be coupled from below via a bottom plate of the source chamber.

Particularly preferably, the lighting system has a vacuum pump, via which the entire lighting system can be evacuated. The cleaning module can thus be used to clean the source chamber in the illumination system, in particular in the evacuated illumination system, without the source chamber of the EUV radiation source having to be removed from the illumination system. The advantages of the illumination system according to the invention correspond to the advantages of the above-outlined cleaning module.

According to another aspect of the invention, the lighting system comprises a maintenance area. In particular, access to the source chamber, in particular to the at least one opening of the source chamber, is made possible via the maintenance area. In this way, maintenance of the source chamber, for example by inspection and / or change of an insert in a bore of the source chamber, be made possible. Particularly preferably, the cleaning module can be coupled in situ to the source chamber via the maintenance area, in particular coupled in a vacuum-tight manner.

The maintenance area can have a maintenance opening, in particular maintenance cover, which allows access to the maintenance area from outside the illumination system. By way of example, components of the cleaning module can be supplied. Dirt and the like can be removed through the maintenance opening. Particularly preferably, access to the source chamber is made possible via the maintenance opening and the maintenance area, while the illumination optics is evacuated. As a result, contamination of the illumination optics is reduced or avoided.

The cleaning module can also be stored in the maintenance area. This allows cleaning without access from the outside.

It is another object of the invention to provide a projection exposure machine with increased usability.

This object is achieved by a projection exposure apparatus according to claim 15. The projection exposure apparatus according to the invention comprises a lighting system, as outlined above. Thus, a cleaning of the source chamber in the illumination system of the projection exposure system, in particular in the projection exposure system is possible. The cleaning of the source chamber can be done without removing the source chamber from the illumination system of the projection exposure system. The advantages of the projection exposure apparatus according to the invention correspond to the advantages of the above-outlined cleaning module.

Furthermore, the projection exposure machine can have an object plane with an object field include, which is illuminated by the illumination optics. The object field may comprise a reticle carrying a structure to be produced with the projection exposure apparatus. The projection exposure apparatus can be particularly suitable for the production of microstructured or nanostructured semiconductor components. For imaging the object field into an image field in an image plane, the projection exposure apparatus may further comprise projection optics.

• 1 einen schematischen Schnitt durch eine Quellkammer einer EUV-Strahlungsquelle,
• 2 eine schematische Aufsicht auf eine Bodenplatte mit vier Öffnungen entlang der Linie II - II der Quellammer in 1,
• 3 eine schematische Schnittzeichnung durch einer Quellkammer gemäß 1 mit einem eine Rührvorrichtung und eine Zuführvorrichtung umfassenden Reinigungsmodul,
• 4 einen schematischen Verfahrensablauf eines ersten Verfahrens zur Reinigung einer Quellkammer,
• 5 eine schematische Darstellung einer Quellkammer mit einem Reinigungsmodul, das eine Zuführleitung für ein Reinigungsgas und eine in die Quellkammer integrierte Plasma-Erzeugungseinrichtung umfasst,
• 6 einen schematischen Verfahrensablauf eines weiteren Verfahrens zur Reinigung einer Quellkammer,
• 7 eine schematische Darstellung einer Quell-Kammer mit einem Reinigungsmodul, welches eine Zuführleitung und eine Mikrowellen-Plasma-Erzeugungseinrichtung umfasst,
• 8 einen schematischen Verfahrensablauf eines weiteren Verfahrens zur Reinigung einer Quellkammer,
• 9 eine schematische Darstellung einer Quellkammer mit einem Reinigungsmodul, welches eine Laserlicht-Quelle und einen Strahlmanipulator umfasst,
• 10 einen schematischen Verfahrensablauf eines weiteren Verfahrens zur Reinigung einer Quellkammer,
• 11 eine schematische Darstellung einer Quellkammer mit einem Reinigungsmodul, welches eine Bürste an einer abknickbaren Welle umfasst,
• 12 eine schematische Aufsicht auf die Quellkammer gemäß 11 entlang der Linie XII - XII, bei welchem die Reinigung mittels der Bürste durch verschiedene Öffnungen einer Bodenplatte dargestellt ist,
• 13 einen schematischen Verfahrensablauf eines weiteren Verfahrens zur Reinigung einer Quellkammer,
• 14 eine schematische Darstellung einer Quellkammer mit einem Reinigungsmodul, welches eine Düse zum Abstrahlen einer Kammerwand umfasst,
• 15 einen schematischen Verfahrensablauf eines weiteren Verfahrens zur Reinigung einer Quellkammer,
• 16 schematisch in einem Meridionalschnitt eine Projektionsbelichtungsanlage für die Mikrolithografie mit einer Beleuchtungsoptik und einer Projektionsoptik,
• 17 eine schematische Darstellung eines Druckluftreinigungsmoduls mit einer Druckluftdüse,
• 18 eine schematische Darstellung des Druckluftreinigungsmoduls gemäß 17 mit einer alternativ ausgeführten Druckluftdüse,
• 19 eine schematische Darstellung des Druckluftreinigungsmoduls gemäß 17 mit einer weiteren alternativen Ausführung der Druckluftdüse,
• 20 eine schematische Darstellung des Druckluft des Druckluftreinigungsmoduls gemäß 17 mit einer weiteren alternativen Ausführung der Druckluftdüse,
• 21 eine perspektivische Darstellung eines Bürstenkopfs für ein Reinigungsmodul gemäß 11,
• 22 eine alternative Ausführung eines Bürstenkopfs für ein Reinigungsmodul gemäß 11,
• 23 eine schematische Schnittzeichnung einer EUV-Strahlungsquelle in einem Beleuchtungssystem,
• 24 eine schematische Darstellung einer EUV-Strahlungsquelle gemäß 23 mit einem Reinigungsmodul für eine Plasmareinigung,
• 25 eine schematische Darstellung einer Quellkammer gemäß 24 mit einem Reinigungsmodul zur Laserreinigung,
• 26 eine schematische Darstellung einer EUV-Strahlungsquelle mit einem Reinigungsmodul zur Strahlreinigung,
• 27 eine Detailzeichnung einer Düse des Strahlreinigungsmoduls gemäß 26,
• 28 eine Detailzeichnung einer alternativen Ausführung einer Düse für das Reinigungsmodul gemäß 26, und
• 29 eine Detailzeichnung einer alternativen Ausführung einer Düse für das Reinigungsmodul gemäß 26.

Further details, advantages and features will become apparent from the description of some embodiments with reference to FIGS. Show it:

• 1 a schematic section through a source chamber of an EUV radiation source,
• 2 a schematic plan view of a bottom plate with four openings along the line II - II of the Quellammer in 1 .
• 3 a schematic sectional view through a source chamber according to 1 with a cleaning module comprising a stirring device and a feeding device,
• 4 a schematic process flow of a first method for cleaning a source chamber,
• 5 a schematic representation of a source chamber with a cleaning module comprising a supply line for a cleaning gas and a plasma generating device integrated in the source chamber,
• 6 a schematic process sequence of a further method for cleaning a source chamber,
• 7 a schematic representation of a source chamber with a cleaning module, which comprises a supply line and a microwave plasma generating device,
• 8th a schematic process sequence of a further method for cleaning a source chamber,
• 9 a schematic representation of a source chamber with a cleaning module, which comprises a laser light source and a beam manipulator,
• 10 a schematic process sequence of a further method for cleaning a source chamber,
• 11 a schematic representation of a source chamber with a cleaning module, which includes a brush on a deflectable shaft,
• 12 a schematic plan view of the source chamber according to 11 along the line XII - XII, in which the cleaning by means of the brush through different openings of a bottom plate is shown,
• 13 a schematic process sequence of a further method for cleaning a source chamber,
• 14 a schematic representation of a source chamber with a cleaning module, which comprises a nozzle for emitting a chamber wall,
• 15 a schematic process sequence of a further method for cleaning a source chamber,
• 16 schematically in a meridional section a projection exposure apparatus for microlithography with illumination optics and projection optics,
• 17 a schematic representation of a compressed air cleaning module with a compressed air nozzle,
• 18 a schematic representation of the compressed air cleaning module according to 17 with an alternatively executed compressed air nozzle,
• 19 a schematic representation of the compressed air cleaning module according to 17 with a further alternative embodiment of the compressed-air nozzle,
• 20 a schematic representation of the compressed air of the compressed air cleaning module according to 17 with a further alternative embodiment of the compressed-air nozzle,
• 21 a perspective view of a brush head for a cleaning module according to 11 .
• 22 an alternative embodiment of a brush head for a cleaning module according to 11 .
• 23 a schematic sectional drawing of an EUV radiation source in a lighting system,
• 24 a schematic representation of an EUV radiation source according to 23 with a cleaning module for a plasma cleaning,
• 25 a schematic representation of a source chamber according to 24 with a cleaning module for laser cleaning,
• 26 a schematic representation of an EUV radiation source with a cleaning module for blasting,
• 27 a detailed drawing of a nozzle of the jet cleaning module according to 26 .
• 28 a detailed drawing of an alternative embodiment of a nozzle for the cleaning module according to 26 , and
• 29 a detailed drawing of an alternative embodiment of a nozzle for the cleaning module according to 26 ,

16 schematically shows in a meridional section an exemplary projection exposure system 100 for microlithography. A lighting system 101 the projection exposure apparatus 100 has an EUV radiation source 1 an illumination optics 102 for the exposure of an object field 103 in an object plane 104 , One is exposed in the object field 103 arranged and in the 1 not shown reticle, the one with the projection exposure system 100 contributes to the production of microstructured or nanostructured semiconductor devices to be projected structure. A projection optics 105 serves to represent the object field 103 in a picture field 106 in an image plane 107. The structure on the reticle is imaged onto a photosensitive layer in the area of the image field 106 in the picture plane 107 arranged wafer, which is not shown in the drawing.

The EUV radiation source 1 is a plasma source which is in operation of the projection exposure apparatus 100 Useful radiation in the form of EUV radiation 108 emitted. The EUV radiation 108 is from a collector 109 bundled. A corresponding collector is for example from the EP 1 225 481 A known. After the collector 109 propagates the EUV radiation 108 through an intermediate focus level 110 before moving to a field facet mirror 111 meets. The field facet mirror 111 is in a plane of illumination optics 102 arranged to the object level 104 is optically conjugated. After the field facet mirror 111 becomes the EUV radiation 108 from a pupil facet mirror 112 reflected. The pupil facet mirror 112 is in a plane of illumination optics 102 arranged to a pupil plane of the projection optics 105 is optically conjugated. Using the pupil facet mirror 112 and an imaging optical assembly in the form of a transmission optics 113 with in the order of the beam path for the EUV radiation 108 designated mirrors 114 . 115 and 116 become field facets of the field facet mirror 111 overlapping each other in the object field 103 displayed. The transmission optics 113 becomes along with the pupil facet mirror 112 also as a follow-up optics for the transfer of EUV radiation 108 from the field facet mirror 111 towards the object field 103 designated.

The lighting system 101 is via a vacuum pump 117 evacuated.

The embodiment of the projection exposure apparatus described here 100 is purely illustrative and not limiting. Alternatively, other configurations of a projection exposure apparatus, a lighting system and / or an illumination optics can be used. For the invention described herein, it is only important that the EUV radiation source 1 is integrated into a lighting system of a projection exposure apparatus and a source chamber 2 the EUV radiation source 1 can be cleaned in the installed state.

The following is with reference to the 1 the EUV radiation source 1 described in more detail.

The EUV radiation source 1 includes the source chamber 2 , The source chamber 2 is through a chamber wall 3 limited. The chamber wall 3 includes a lid 4 and a bottom plate 5 , The chamber wall 3 is made of copper, in particular of a copper compound, in particular of CDA 110 , manufactured.

The source chamber 2 is substantially cylindrical, with a cylinder axis perpendicular to the bottom plate 5 (see. 2 ) runs. The bottom plate 5 is circular and may, for example, have a diameter of 200 mm. An extension of the source chamber 2 perpendicular to the bottom plate 5 may for example be 100 mm.

The EUV radiation source 1 is part of the projection exposure system 100 , in particular the lighting system 101 , In the embodiment shown here, the EUV radiation source is in the projection exposure apparatus 100 integrated. When installed, the bottom plate 5 the EUV radiation source 1 inclined at an angle α with respect to the horizontal. The angle α is about 15 °.

Access to the EUV radiation source 1 is limited. However, the inclined installation at the angle α allows access, albeit limited, to the EUV radiation source 1 over the bottom plate 5 , The bottom plate 5 has several openings for this purpose. The openings may be used for maintenance and, as will be explained later, for cleaning purposes.

In 2 is a plan view of an exemplary floor slab 5 the source chamber 2 according to 1 shown. The bottom plate 5 has three openings 6 a central opening 7 on. The openings 6 . 7 are as holes in the bottom plate 5 executed. The openings 6 are eccentric about the central opening 7 arranged. The openings 6 . 7 can in operation the EUV radiation source 1 serve as flow openings for source plasma. At least during operation of the EUV radiation source 1 can the central opening 7 In addition, a middle part, for example in the form of a conductor tube include. The central opening 7 is therefore usually occupied. The cleaning of the source chamber 2 can over the eccentric openings 6 respectively. In principle, however, it is also possible to clean it via the central opening 7 perform. For example, the cleaning can be done after removal of the contents through the central opening. In particular, it may be provided to carry out the cleaning in a first cleaning step via the eccentric openings 6 and then the central part of the central opening 7 refer to. In a second cleaning step, cleaning may be through the central opening 7 be repeated. The cleaning over the central opening 7 has the advantage that a cleaning agent, such as a source plasma, better in the source chamber 2 can be distributed. Even when cleaning with a laser beam, cleaning is ensured through the central opening 7 better coverage of the chamber wall 3 the source chamber 2 ,

In the 1 and 2 shown source chamber 2 may be used in particular in an induction plasma generator. Alternative versions of the EUV radiation source 1 For example, with an electrode plasma generating device are possible. For the cleaning methods described below, it is only important that the source chamber 2 has at least one opening. The opening can be used as opening 6,7 in the bottom plate 5 or in other areas of the chamber wall 3 be executed.

In operation of the EUV radiation source 1 will be in the source chamber 2 generates the source plasma. For this purpose, a process gas by a in the 1 Not shown plasma generating device ionized to the source plasma and excited for the emission of useful radiation in the EUV range. The supply of the process gas via a mass flow controller and a supply line to the source chamber 2 ,

When operating the EUV radiation source 1 There may be deposits of debris in the source chamber 2 come. The debris can be found in particular on an inner surface 8th the chamber wall 3 in the form of a contamination layer 9 deposit. The contamination layer 9 increases proportionally with the number of operating hours of the EUV radiation source 1 , The contamination layer 9 poses a functional risk for the EUV radiation source 1 To ensure safe and accurate operation of the EUV radiation source 1 to ensure the source chamber 2 from the contamination layer 9 getting cleaned.

The contamination layer 9 For example, it may comprise silicon carbide (SiC). This is particularly the case when a plasma generating device with silicon carbide (SiC) electrodes is used. Silicon carbide forms a chemically inert and highly amorphous contamination layer 9 , In induction plasma generators, central parts are often used in the central opening 7 made of SiC. The cleaning of the source chamber 2 from the contamination layer 9 should preferably be such that the silicon carbide is removed without damaging the underlying chamber wall 3.

It is known, the source chamber 2 to clean by the EUV radiation source 1 from the projection exposure system 100 removed and disassembled into individual parts. However, this is possible only with a large amount of time. The productivity of the projection exposure machine 100 and thus the throughput of the semiconductor components to be produced are thereby considerably reduced. It is therefore advantageous when cleaning the source chamber 2 in situ, ie without the EUV radiation source 1 has to be removed from the projection exposure system and / or dismantled.

The following is a system from the EUV radiation source 1 and a cleaning module for in situ cleaning of the source chamber 2 described. By various of the cleaning modules described below is in particular a cleaning of the inner surface 8th the chamber wall 3 through the openings 6,7 possible. The embodiments of the cleaning module described below are suitable for carrying out various cleaning methods for cleaning the source chamber 2 , The different cleaning methods allow the cleaning of the source chamber 2 without the inner surface 8th the chamber wall 3 to damage. The cleaning procedures allow in situ cleaning of the source chamber 2 through an opening of the source chamber 2 ,

In principle, the purification processes could also be carried out ex situ. For example, the source chamber 2 also be dismantled and / or opened to carry out the cleaning process.

In the following, the required process steps and then a cleaning module suitable for carrying out are described first.

All cleaning procedures described below can be precleaned 10 and / or a post-cleaning 11 include. The pre-cleaning 10 and / or the post-cleaning 11 are carried out in particular with XCDA. For this purpose, in each case a radiation step 12 provided in which the inner surface 8th the chamber wall 3 is emitted with compressed air. Before and / or after the radiation step 12 may be followed by a suction 13, in which the source chamber 2 is sucked off. In the im The cleaning process shown below includes the pre-cleaning 10 a suction step 13 before and after the radiation step 12 , If a post-cleaning 11 is provided, the suction step 13 only after the radiation step 12 carried out. Of course it is also possible that the post-cleaning 11 the suction step 13 contains before and after the radiation step 12. The suction step 13 is particularly suitable for removing by means of the compressed air in the emitting step 12 emitted particles from the source chamber 2 ,

To carry out the pre-cleaning 10 and / or the post-cleaning 11 For example, the cleaning modules described below include a compressed air generator and compressed air nozzles. The compressed air generator is at one of the openings 6 . 7 coupled, in particular vacuum-tight coupled, so that the respective opening 6 . 7 can be acted upon with compressed air.

In the 17 to 20 are exemplary embodiments of a compressed air cleaning module 201 for the pre-cleaning 10 and / or after-cleaning 11 shown. Identical components bear the same reference numerals as in the above with reference to the 1 and 2 already described embodiments of the source chamber, to which reference is hereby made.

The in the 17 to 20 illustrated compressed air cleaning modules 201 differ only by the specific design of the respective compressed air nozzles. All compressed air cleaning modules have a compressed air generator 202 for generating compressed air, in particular from XCDA. The compressed air generated in this case is in the direction of an arrow 203 through the compressed air line 204 guided. In the compressed air line 204 are a compressed air valve 205 and a compressed air tap 206 arranged. The compressed air tap 206 serves to control the outlet of the compressed air. In the in 17 to 20 The exemplary embodiments shown are the compressed air tap 206 manually operated. Alternatively, an automatically controlled compressed air valve can also be provided.

To the compressed air tap 206 joins a compressed air nozzle. In the 17 to 20 Different versions of the compressed air nozzles are shown. All compressed air nozzles are over the central opening 7 or an eccentric opening 6 through the bottom plate 5 into the source chamber 2 insertable. Thus, via the compressed air nozzles, the inner surfaces of the chamber wall 3 be radiated with compressed air. The compressed air nozzles are detachable with the compressed air tap 206 connected and can be exchanged for each other. Thus, for the emitting step 12 the pre-cleaning 10 and / or the post-cleaning 11 different compressed air nozzles with the compressed air cleaning module 201 be used. The compressed air nozzles can be adapted to the degree of contamination, such as the thickness and position of the contamination layer.

In the 17 shown compressed air nozzle 207 consists of an angled feed pipe. As a result, a focused compressed air jet can be generated, which is targeted to individual points of the chamber wall 3 can be directed. The alignment of the compressed air jet via the compressed air nozzle 207 takes place manually.

In the 18 shown compressed air nozzle 208 is suitable for blasting the bottom plate 5. Here is the area of the bottom plate 5 which the opening 7 surrounds over which the compressed air nozzle 208 into the source chamber 2 is introduced, radiated. In 18 is the compressed air nozzle 208 through the central opening 207 into the source chamber 2 introduced. Alternatively or additionally, the compressed air nozzle 208 also over one or more of the eccentric openings 6 into the source chamber 2 be introduced. The compressed air nozzle 208 is mushroom-shaped. The outlet openings for the compressed air are annular at the bottom of a mushroom-shaped tip of the compressed air nozzle 208 arranged. As a result, the compressed air from the compressed air nozzle 208 cone-shaped on the base plate 5 irradiated.

In the 19 illustrated compressed air nozzle 209 is suitable for simultaneous blasting of a large area of the chamber wall 3 , in particular the bottom plate 5 as well as one in the 19 not shown lids 4 the source chamber 2 , The compressed air nozzle 209 acts as a nebulizer for the introduced compressed air. The compressed air nozzle 209 is spherical and has a plurality of compressed air openings. The compressed air comes from the compressed air nozzle 209 radiated star-shaped into a large area of the solid angle.

In the 20 shown compressed air nozzle 210 has a rotatable compressed air outlet opening. The compressed air outlet creates a focused compressed air jet 211 , The compressed air jet 211 can by turning the Druckluftauslassöffnung by means of the compressed air nozzle 210 targeted to individual areas of the chamber wall 3 , in particular the bottom plate 5 or the bottom plate 5 opposite, in the 20 lid, not shown 4 the source chamber 2 be irradiated.

Furthermore, the cleaning modules include one with one of the openings 6 . 7 connectable removal device. The removal device comprises a suction device 52 , The suction device 52 has a suction line 79 for vacuum-tight coupling to one of the openings 6 . 7 on. The suction device 52 comprises a container for receiving the extracted detergent and / or impurities.

All purification procedures described below include a control step 14. The control step 14 ensures in particular that a removal of the contamination layer 9 is completely done. Furthermore, in the control step 14 possible damage to the source chamber 2 , in particular on the inner surface 8th the chamber wall 3 be detected. The control step 14 It is also done before cleaning to reduce the level of contamination, such as the thickness and location of the contamination layer 9 to determine.

To carry out the control step 14 the cleaning module comprises a control device. The control device comprises an endoscope, not shown, with which an optical inspection of the source chamber 2 can be done. Furthermore, the control device has a layer thickness measuring probe. The layer thickness measuring probe is designed to carry out an eddy current test. The layer thickness measuring probe comprises a coil pair of a transmitter and a receiver coil and a signal processor.

The following is with reference to 4 a first cleaning process in the form of a vibratory finishing process 15 described. First, in a deployment step 48 a lighting system 101 for a projection exposure machine 100 with an EUV radiation source 1 provided. The EUV radiation source has a source chamber 2 with at least one opening 6 . 7 (see. 3 ) on.

After a pre-cleaning 10 is in a control step 14 the degree of contamination of the source chamber 2 determined. This is followed in a detergent application step 16 a cleaning agent in the form of abrasive articles 17 (see. 3 ) through one of the openings 6 into the source chamber 2 brought in. The grinding wheels 17 become dry, ie without liquids, in the source chamber 2 brought in. At the grinding bodies 17 these are in particular dry abrasive granules. There are so many abrasives 17 into the source chamber 2 introduced that the source chamber 2 at least 80%, in particular at least 90%, especially wholly, with abrasive articles 17 is filled. Under a complete filling of the source chamber 2 through the grinding wheels 17 Let it be understood that the grinding wheels 17 in the source chamber 2 in a tight package. The volume of the source chamber 2 is up to in the dense packing existing gaps between the grinding wheels 17 completely through the grinding wheels 17 refilled.

After incorporation of the grinding wheels 17 These are relative to the source chamber 2 emotional. In the embodiment shown here, the grinding wheels 17 for this purpose in a stirring step 18 by means of a stirring device 19 put into rotation. The rotating grinding wheels 17 grind dirt in the source chamber 2 , in particular the contamination layer 9 , from. The source chamber 2 is thereby mechanically cleaned. Abrasion generates abrasive particles. An effectiveness of grinding can be achieved by the choice of grinding wheels 17 , by the rotational speed of the stirring device 19 and by the duration of the stirring step 18 be varied. The effectiveness of the abrading can be at one in the control step 14 certain thickness of the contamination layer 9 be adjusted.

Following the stirring step 18 be in a removal step 20 the grinding wheels 17 and the abrasive particles from the source chamber 2 away. This is the source chamber 2 in the removal step 20 through one of the openings 6 aspirated. The removal step 20 can the suction step 13 the pre-cleaning 10 and / or the post-cleaning 11 correspond.

At the removal step 20 close the post-cleaning 11 and a new control step 14 to verify the success of the cleaning.

After a single execution of the vibratory finishing process 15 This can be repeated. In particular, provision may be made for the detergent-introducing step 16 , the stirring step 18 and the removal step 20 perform several times.

A cleaning module 24 for carrying out a vibratory finishing process 15 includes, as for the embodiment in 3 schematically shown, designed as a stirring device 19 moving device, the suction device 52 and a feeder 23 for that as a grinding wheel 17 executed cleaning agents.

The feeder 23 is for the detergent-introducing step 16 with one of the at least one opening 6,7 vacuum-tight connectable. In the embodiment shown here, the supply device comprises 23 a container 80 , which serves as Schleifkörperreservoir. In the detergent-introducing step 16 become the grinding wheels 17 via the feeder 23 from the container 80 through one of the openings 6 into the source chamber 2 brought in. In this case, it may in particular be provided that possibly further openings 6 . 7 are closed.

The stirring device 19 can in principle be in the source chamber 2 be integrated. However, it is advantageous if the stirring device 19 through one of the opening 6,7 in the source chamber 2 is introduced. For this purpose, the stirring device 19 tightly coupled to the opening 6,7. In the one shown here Embodiment, the stirring device 19 to the central opening 7 , So to another opening than the feeder 23 coupled. Alternatively, after the detergent-introducing step 16 the feeder 23 from the opening 6 be removed and by the stirring device 19 be replaced.

In 3 is the system of EUV radiation source 1 and cleaning module 24 during the stirring step 18 shown. The grinding wheels 17 are via the feeder 23 through an eccentric opening 6 into the source chamber 2 been introduced. To the central opening 7 is the stirring device 19 flanged. The stirring device 19 includes a drive 21 , which is below the bottom plate 5 is arranged and a stirrer 22 passing through the opening 7 into the source chamber 2 protrudes. By the drive 21 becomes the stirrer 22 set in rotation and in turn causes a rotation of the grinding wheels 17 , The stirring device 19 is mechanically rotated by a motor in rotation. In an alternative, not shown, the stirring device 19 designed as a magnetic stirrer. In a further alternative, not shown, the stirring device can also be designed as a nozzle which sets the grinding bodies in rotation by means of a tangential air outlet.

To carry out the removal step 20 includes the cleaning module 24 as a suction device 52 executed removal device. The suction device 52 for the removal step 20 corresponds in the embodiment shown here, the suction device 52 the suction step 13 the pre-cleaning 10 and / or the post-cleaning 11 , In the in 3 illustrated embodiment is the suction device 52 not yet by means of the suction line 79 with one of the openings 6,7 of the source chamber 2 connected. The suction device 52 can after the stirring step 18 be coupled to one of the openings 6,7, in particular vacuum-tight coupled. The suction device 52 especially after removal of the stirrer 19 to the former by the stirrer 19 occupied opening 7 be flanged. Alternatively, the suction device 52 even during the stirring step 18 be connected to a further opening 6,7. Instead of the separate suction device 52 the suction can in principle also via the feeder 23 respectively.

With the cleaning module shown here 24 the cleaning process takes place 15 through one of the eccentric openings 6 and the central opening 7 , Alternatively, the vibratory finishing process 15 even through one of the eccentric openings 6 or only through the central opening 7 respectively. For example, it may be provided after a first implementation of at least the detergent introduction step 16 , the stirring step 18 and the removal step 20 through one of the eccentric openings 6 the middle part of the central opening 7 to remove and the detergent introduction step 16 , the stirring step 18 and the removal step 20 through the central opening 7 to repeat.

Hereinafter, with reference to 6 another cleaning process in the form of a first plasma cleaning process 25 described. In 5 is a cleaning module that can be used for this purpose 26 shown schematically. Identical method steps and components bear the same reference numerals as in the above with reference to FIGS 3 and 4 already described alternatives to which reference is hereby made.

In the first plasma cleaning process 25 will be in a deployment step 49 a lighting system 101 for a projection exposure machine 100 with an EUV radiation source 1 provided. The EUV radiation source has a source chamber 2 with at least one opening 6 . 7 and one as in the source chamber 2 integrated plasma generating device 29 executed energy input device (see. 5 ). The plasma generator 29 may be used to generate the source plasma during operation of the EUV radiation source 1 serve. As a plasma generating device 29 An induction plasma generator will be used. Alternatively, another plasma generating device, for example with electrodes, may also be used.

After the pre-cleaning 10 and the control step 14 is first in an evacuation step 118 evacuated the source chamber. This is followed in a gas introduction step 27 a cleaning gas into the source chamber 2 brought in. The cleaning gas may in particular be mixtures of CF ₄ and O ₂ or Ar and H ₂ . Further cleaning gases may be CDA or XCDA for generating an atmospheric plasma or forming gas.

After the gas introduction step 27 is in a plasma generation step 28 by the plasma generator 29 electromagnetic energy in the source chamber 2 introduced so that a cleaning plasma is generated from the cleaning gas. For example, the gas mixture of CF ₄ and O ₂ as a purge gas and an induction plasma generator operated at an operating voltage of 500 V may be used, thereby providing a duration of the plasma generation step 28 less than two hours, especially less than 90 minutes, especially about 60 minutes, for the purification of the source chamber 2 is sufficient. In the event that the gas mixture of Ar and H ₂ is used, the induction plasma generator can be operated with an operating voltage 250 volts, whereby a duration of the plasma generating step 28 less than one hour, especially about 30 minutes, for the purification of the source chamber 2 is sufficient. The operating voltage in the plasma generating step 28 is at the bottom plate 5 the source chamber 2 created.

After the plasma generation step 28 be in a removal step 30 the cleaning gas and the pollution from the source chamber due to the action of the cleaning plasma 2 through the opening 6 . 7 away. The removal of the cleaning gas and the detached particles by suction of the source chamber 2. The removal step 30 corresponds to the suction step 13 the pre-cleaning 10 and / or the post-cleaning 11 ,

After the removal step 30 Follow the post-cleaning 11 and the control step 14 ,

An embodiment of one for the plasma cleaning process 25 usable cleaning module 26 is in 5 shown. It comprises an energy introduction device, which, as discussed above, in the source chamber 2 integrated plasma generating device 29 is realized. Furthermore, one with one of the openings 6 , 7 connectable supply line 31 intended for the cleaning gas. The cleaning gas is using a pump system 32 through the supply line 31 into the source chamber 2 be introduced. The pump system 32 may include a forepump. It comprises in particular a turbomolecular pump.

In the embodiment shown here, the supply line 31 to the central opening 7 coupled. Other openings 6 not with the supply line 31 are required to carry out the plasma cleaning process 25 be closed.

To carry out the removal step 20 includes the cleaning module 26 as a suction device 52 executed removal device. The suction device 52 for the removal step 20 corresponds to that of the suction step 13 the pre-cleaning 10 and / or the post-cleaning 11 , In the in 5 illustrated embodiment is the suction device 52 not yet by means of the suction line 79 with one of the openings 6,7 of the source chamber 2 connected. The suction device 52 will then terminate the plasma generation step 28 coupled vacuum-tight at one of the openings 6, 7. The suction device 52 especially after removing the supply line 31 to the former through the supply line 31 occupied central opening 7 be coupled. Alternatively, the suction device 52 even during the stirring step 18 with one of the other openings 6 be connected.

The cleaning module 26 allows the plasma cleaning process 25 to be carried out for in situ cleaning of the source chamber 2 through the central opening 7 , Alternatively, the cleaning of the source chamber 2 by means of the cleaning module 26 also through one of the openings 6 respectively.

The plasma cleaning process 25 can also be repeated several times. In particular, it can be provided, the plasma cleaning process 25 , in particular the steps gas introduction step 27 , Plasma generation step 28 and removal step 30 , initially using an eccentric opening 6 perform. Following this, the middle part of the central opening 7 be removed and the plasma cleaning process 25 , in particular the steps gas introduction step 27 , Plasma generation step 28 and removal step 30 again using the central opening 7 be performed.

In the multiple execution of the plasma cleaning process 25 In particular, different cleaning gases can be used. In a preferred embodiment, in a first purification step, the gas mixture CF ₄ and O _{2 is} used and the plasma cleaning is carried out for about 60 minutes. In a second purification step, the gas mixture of Ar and H _{2 is} used and the plasma cleaning is carried out for about 15 minutes. The combination of different cleaning gases allows a particularly thorough cleaning of the source chamber 2 ,

In the following, referring to the 8th a second plasma cleaning method 33 is described. In 7 is a cleaning module that can be used for this purpose 34 shown. Identical method steps and components bear the same reference numerals as in the above with reference to FIGS 3 to 6 already described alternatives to which reference is hereby made.

The plasma cleaning process 33 differs from the plasma cleaning method 25 in that in a deployment step 50 instead of the one in the source chamber 2 integrated plasma generating device 29 a separate energy input device in the form of a plasma generating device, in particular a microwave plasma generating device 35 , provided. The microwave plasma generator 35 This is done before the Gaseibringungsschritt 27 in a loading step 36 into the source chamber 2 brought in. In the plasma generation step 28 is by means of the microwave plasma generator 35 electromagnetic energy in the source chamber 2 introduced so that the cleaning gas dissociates to a cleaning plasma. After completion of the removal step 30 becomes the microwave plasma generator 35 in a take-out step 37 again from the source chamber 2 away.

The microwave plasma generator 35 can be operated in particular with a power of 6 kilowatts with a frequency of 2450 megahertz. The microwave plasma generator 35 can be operated with the gas mixtures CF ₄ and O ₂ , Ar and H ₂ or forming gas as cleaning gas. Alternatively, an atmospheric plasma of CDA or XCDA can be generated. The process times essentially correspond to the process times of the cleaning process described above 25 ,

The cleaning module 34 to carry out the plasma cleaning process 33 is different from the cleaning module 26 only in that the energy input device instead of by the plasma generating device 29 by the microwave plasma generator 35 is realized. The microwave plasma generator 35 is over the opening 6 into the source chamber 2 recoverable. Alternatively, the microwave plasma generating device 35 also through the central opening 7 into the source chamber 2 be introduced. In a further embodiment of the cleaning module 34 is the microwave plasma generator outside the source chamber 2 stored and the cleaning plasma is via a to the source chamber 2 connectable plasma supply line into the source chamber 2 brought in. Otherwise, the cleaning module corresponds 34 the cleaning module 26 ,

The following is with reference to the 10 Another method for cleaning the source chamber 2 in the form of a laser cleaning process 38 describe. In 9 is schematically one for the laser cleaning process 38 usable cleaning module 39 shown. Identical method steps and components bear the same reference numerals as in the above with reference to FIGS 3 to 8th already described alternatives to which reference is hereby made.

First, in a deployment step 51 a lighting system 101 for a projection exposure machine 100 with an EUV radiation source 1 and an energy input device with a laser light source 41 and a beam manipulator 42 provided (cf. 9 ). The EUV radiation source 1 includes a source chamber 2 with at least one opening 6 . 7 ,

After the pre-cleaning 10 and the control step 14 is in one scanning step 40 electromagnetic energy in the form of laser radiation pulses targeted to the inner surface 8th the source chamber 2 , especially one the source chamber 2 bounding chamber wall 3 irradiated. For this purpose, the laser radiation pulses are generated by a laser light source 41 and by means of a beam manipulator 42 spatially targeted to the inner surface 8th irradiated.

By means of the beam manipulator 42 is an irradiation direction of the laser radiation pulses adjustable so that during the scanning step 40 the entire inner surface 8th the chamber wall 3 is scanned by the laser radiation pulses. This ensures a thorough cleaning.

Furthermore, a removal step 44 intended. In the removal step 44 become due to the irradiation of the laser light pulses detached particles from the source chamber 2 through the opening 6 . 7 away. The removal step 44 takes place by suction of the source chamber 2 , In the event that the impurities removed by the laser radiation pulses are sublimated, the detached particles do not interfere with subsequent laser radiation pulses. The removal step 44 can therefore after the scanning step 40 be performed. In an alternative embodiment, the removal step becomes 44 at the same time as the sampling step 40 carried out. This ensures that non-sublimated particles detached by the irradiation of the laser radiation pulses do not scatter or absorb subsequent laser radiation pulses, which adversely affects the cleaning process.

Using the sampling step 40 For example, cleaning may be carried out in less than 120 minutes, in particular under 90 minutes, in particular in about 60 minutes.

To the sampling step 40 and the removal step 44 close the post-cleaning 11 and then a new control step 14 at.

In 9 is an embodiment of a cleaning module 39 for performing the laser cleaning process 38 shown. The cleaning module 39 includes one as a laser light source 41 including beam manipulator 42 executed energy introduction device. The beam manipulator 42 is through one of the openings 6 . 7 in the bottom plate 5 into the source chamber 2 recoverable. In the embodiment shown here, the beam manipulator is through the central opening 7 into the source chamber 2 been introduced.

To aspirate in the removal step 44 to ensure the suction device with suction line 79 intended. The suction line 79 can after or during the scanning step 40 to the source chamber 2 be coupled. The beam manipulator 42 is through the central opening 7 into the source chamber 2 brought in. Further, unnecessary openings 6 can during the laser cleaning process 38 to be introverted.

The cleaning module 39 is suitable for carrying out the laser cleaning process 38 through the central opening 7 the bottom plate 5 , Alternatively, the cleaning process 38 by means of the cleaning module 39 also through one of the eccentric openings 6 respectively.

The following is with reference to the 13 Another method for cleaning the source chamber 2 in the form of a brush cleaning method 53 described. In 11 is schematically a for the brush cleaning method 53 usable cleaning module 54 shown. Identical method steps and components bear the same reference numerals as in the above with reference to FIGS 3 to 10 already described alternatives to which reference is hereby made.

First, in a deployment step 55 a lighting system 101 for a projection exposure machine 100 with an EUV radiation source 1 provided. The EUV radiation source has a source chamber 2 with at least one opening 6 . 7 on.

After the pre-cleaning 10 and the control step 14 is in a brush insertion step 59 one as a brush head 57 executed cleaning agent through one of the openings 6,7 in the source chamber 2 introduced. This is in a Abbürstschritt 60 the brush head 57 set in rotation and over an inner surface 8th the chamber wall 3 guided. This will make the inner surface 8th the chamber wall 3 mechanically cleaned. After the brushing step 60 becomes the brush head 57 in a take-out step 61 again over the opening 6 . 7 from the source chamber 2 away. The duration of the cut-off 60 is due to the thickness of the contamination layer 9 adapted and may for example be between 10 min and 60 min.

Furthermore, a removal step 62 intended. In the removal step 62 are due to the action of the brush head 57 detached particles from the source chamber 2 through the opening 6 . 7 away. The removal step 62 takes place by suction of the source chamber 2 , Preferably, in the removal step 62 also a blasting of the inner surface 8th the chamber wall 3 done with compressed air. The removal step 62 So can the pre-cleaning 10 or the post-cleaning 11 , which each have a jet step 12 and a suction step 13 include, correspond.

At the removal step 62 close the post-cleaning 11 and then the control step 14 at.

At the scrub step 60 of the brush cleaning method 53 can the brush head 57 be shifted so that the entire inner surface 8th the chamber wall 3 is traversed. This will make the entire source chamber 2 by the action of the brush head 57 cleaned. However, this places great demands on the displaceability of the brush head 57 in the source chamber 2 , In most cases, the brush head 57 only a limited range of action 63 within the source chamber 2 to have. Such a situation is in 12 shown a schematic plan view of the source chamber 2 according to 11 with a bottom plate 5 with three eccentric openings 6 and a central opening 7 represents. As in 12 can be seen has the brush head 57 only a limited range of action 63 which does not cover the entire floor 5 the source chamber 2 covers. In such a case, the complete cleaning of the inner surface 8th the chamber wall 3 and in particular the bottom plate 5 be achieved by the brush cleaning method 53 through all three eccentric openings 6 of the bottom plate 5 is carried out. The union of those through the openings 6 assigned action radii 63 Covered area covers the bottom plate 5 preferably completely off. The in the 12 shown cleaning over all three eccentric openings 6 is done sequentially by repeating the steps of the brush introduction step 59 , Brushing step 60 and takeout step 61 through each one of the other openings 6 respectively. Alternatively, the cleaning can be done simultaneously with three brush heads 57.

In 11 is an embodiment of a cleaning module 54 for performing the brush cleaning method 53 shown. The cleaning module 54 includes a brush unit 56 , The brush unit 56 has that as a brush head 57 executed cleaning agents on. Furthermore, the brush unit comprises 56 one of the brush drive 58 and a shaft 64 existing movement device and delivery device. The movement and feeding device are thus realized by the same components. In 21 is a perspective view of the brush head 57 when driving off the bottom plate 5 around the central opening 7 shown.

The brush head 57 is made of an alumina ceramic. The brush head 57 is designed as a cylindrical roller brush. As a result, its geometry is adapted so that the brush head 57 through one of the openings 6 . 7 into the source chamber 2 can be introduced. The brush head is by means of the brush drive 58 not only in rotation, but also relative to the source chamber 2 displaced. The brush head 57 this is about the wave 64 with the brush drive 58 connected. The shaft 64 includes a hinge 65 on which the shaft can be bent. To carry out the brush introduction step 59 is the joint 65 not angled, so the shaft 64 stretched. In this position, the brush unit 56 coupled to the source chamber and the brush head 57 and part of the wave 64 into the source chamber 2 through one of the openings 6 . 7 be introduced. After inserting the brush head 57 becomes the joint 65 the wave 64 bent so that the brush head 57 with the bottom plate 5 comes into contact. To carry out the brushing step 60 becomes the brush head 57 by means of the brush drive 58 rotated and opposite the source chamber 2 relocated. To do this, the brush head moves 57 one by its radius of action 63 (see. 12 ) defined area.

In 22 is another embodiment of a brush head 212 shown. Identical components bear the same reference numerals as in the above with reference to the 11 . 12 and 21 already described alternatives to which reference is hereby made.

The brush head 212 is designed in the form of a strip brush. The brush head 212 is about this over the joint 213 with the wave 64 connected. About the joint 213 can the brush head 212 be folded in and out. In the folded state, the brush head 212 through an opening, such as the central opening 7 , in the spring chamber 2 be introduced. When unfolded, the brush head has 212 a length which is the diameter of the source chamber 2 equivalent. By rotation of the brush head 212 can thus the inner surface 8th the chamber wall 3 , in particular in the area of the bottom plate 5 opposite lids 4 to be brushed off. The brush head 212 includes bristles 214 , The bristles 214 are made of an alumina ceramic.

To carry out the removal step 62 includes the cleaning module 54 as a suction device 52 executed removal device. The suction device 52 for the removal step 62 corresponds to that of the suction step 13 the pre-cleaning 10 and / or the post-cleaning 11 , In the in 11 illustrated embodiment is the suction device 52 not yet by means of the suction line 79 with an opening 6 . 7 the source chamber 2 connected. The suction device 52 then becomes after completion of the brushing step 60 and the removal step 61 at an opening 6 . 7 coupled vacuum-tight. The suction device 52 especially after the removal step 62 to the former through the brush unit 56 occupied opening 6 . 7 be coupled vacuum-tight. Alternatively, the suction device 52 even during the brushing step 60 with another opening 6 . 7 be connected.

The cleaning module 54 is suitable for carrying out the brush cleaning process 53 for in situ cleaning of the source chamber 2 through the eccentric openings 6 , Alternatively, the cleaning of the source chamber 2 by means of the cleaning module 54 also through the central opening 7 respectively. In particular, a repeated cleaning can be done through different openings 6 . 7 respectively.

The following is with reference to the 15 Another method for cleaning the source chamber 2 in the form of a jet cleaning process 66 described. In 14 is schematically one for the blast cleaning process 66 usable cleaning module 67 shown. Identical method steps and components bear the same reference numerals as in the above with reference to FIGS 3 to 13 already described alternatives to which reference is hereby made.

First, in a deployment step 68 a lighting system 101 for a projection exposure machine 100 with an EUV radiation source 1 and a radiating device 69 provided. The EUV radiation source 1 has a source chamber 2 with at least one opening 6 . 7 on.

The radiator 69 includes a nozzle 70 and a supply line 71 for blasting material 82 and / or a carrier gas. The blasting material 82 is dry and contains particles with an average particle size of 100 μm. In alternative embodiments, as blasting 82 various grinding wheels, such as the grinding wheels 17 of the vibratory finishing process 15 be used. Alternatively, the blasting material 82 also present as a fluid.

After the pre-cleaning 10 and the control step 14 becomes in a Ankoppelschritt 72 the radiator 69 to the at least one opening 6 . 7 the source chamber 2 coupled and here the nozzle 70 over the opening 6 . 7 into the source chamber 2 introduced. On the coupling step 72 follows a radiation step 73 , In the emitting step 73 becomes the blasting material 82 over the supply line 71 and the nozzle 70 into the source chamber 2 placed and there on an inner surface 8th the chamber wall 3 and the bottom plate 5 irradiated. In this case, different beam directions may be preferred 74 through the nozzle 70 be generated so that different areas of the inner wall 8th the chamber wall 3 can be emitted simultaneously. For radiation in the radiation step 73 creates the nozzle 70 a high-pressure jet from the jet bodies and / or a carrier gas. As the carrier gas is preferably nitrogen, which under high pressure is used. Preferably, the nozzle 70 the beam direction 74 vary, so the entire inner surface 8th the source chamber 2 can be radiated. By blasting, the source chamber becomes 2 mechanically cleaned.

After completion of the radiation step 73 becomes the radiator 69 in a decoupling step 76 from the opening 6 . 7 decoupled. This is also the nozzle 70 from the source chamber 2 over the opening 6 . 7 taken.

By blasting removed impurities and the introduced blasting 82 be in a removal step 75 from the source chamber 2 away. The removal step 75 takes place by suction of the source chamber 2 through the opening 6 . 7 , The removal step is preferred 75 at the same time as the radiation step 73 carried out. This can be done by the removal step 75 for example, by a further opening 6, 7, to which not the emission device 69 Flanged is done. Alternatively, the removal step 75 also after the radiation step 73 and the decoupling step 78 through the opening 6 . 7 , which was occupied by the emitting device, take place.

At the removal step 75 and the decoupling step 76 close the post-cleaning 11 and then the control step 14 at.

In the 14 is an embodiment of a cleaning module 67 to carry out the blast cleaning process 66 shown. The cleaning module 67 includes one as a radiation device 69 running movement device and supply device for the detergent and a suction device 52 executed removal device. The moving device and the feeding device are thus realized by the same components.

The radiator 69 includes the nozzle 70 , which via the supply line 71 with a as Strahlgutreservoir 77 engineered tank and a carrier gas storage 78 connected is. The nozzle 70 is over one of the openings 6 . 7 into the source chamber 2 einbringbar and there can the mixture of blasting and carrier gas in several beam directions 74 on the inner surface 8th the chamber wall 3 radiate. In the embodiment shown here, the emitting device 69 to the central opening 7 docked and the nozzle 70 into the source chamber 2 introduced. In addition, the nozzle can 70 the beam direction 74 change, so that the entire inner surface 8th the chamber wall 3 and the bottom plate 5 can be radiated.

In the embodiment shown here is the removal step 75 over the suction device 52 at the same time as the radiation step 73 respectively. For this purpose, the suction device 52 via the suction line 79 vacuum-tight to another opening 6 which is not due to the radiator 69 is occupied, coupled. The suction device 52 for the removal step 75 corresponds to the suction device of the suction 13 the pre-cleaning 10 and / or the post-cleaning 11 , In an embodiment, not shown, the removal step 75 after the radiation step 73 and the decoupling step 76 respectively. For this purpose, the suction device 52 after decoupling the emission device 69 to the former through the radiator 69 occupied central opening 7 be coupled vacuum-tight.

The cleaning module 67 is suitable for carrying out the blast cleaning process 66 for in situ cleaning of the source chamber 2 through one of the openings 6 . 7 the source chamber 2 , Preference is given to cleaning by two different openings 6 , 7 performed by the radiator 69 to the central opening 7 and the suction device 52 to another opening 6 is coupled.

In 23 is a schematic sectional view of another embodiment of a radiation source 215 shown. The radiation source 215 is part of a lighting system not explicitly shown. Identical components bear the same reference numerals as in the above with reference to the 1 to 22 already described alternatives to which reference is hereby made.

The radiation source 215 has a two-part source chamber with an upper chamber part 216 and a lower chamber part 217 on. The upper chamber part 216 is also called top chamber. Between the upper chamber part 216 and the lower chamber part 217 there is a center plate 218 , The center plate 218 has eccentric openings 219 and a central opening 220 on. In the central opening 220 is a middle part 221 used. The middle part 221 consists of a conductive cylinder of silicon carbide. In operation of the EUV radiation source 215 serve the eccentric openings 219 as well as the central opening 220 for the flow of one in the chamber parts 216 . 217 ignited source plasma. The EUV radiation source 215 is an induction plasma generator. When operating the EUV radiation source 215 become parts of the middle part 221 sputtered and settle as silicon carbide contamination on a chamber wall 222 from. This is the chamber wall 222 especially in the area of the upper chamber part 216 dirty. As the illumination optics to the upper chamber part 216 It is essential for the safe operation of the EUV radiation source 215 indispensable, at least the upper chamber part 216 regularly clean from contamination.

Below the EUV radiation source 215 is a maintenance area 223 arranged. Between the maintenance area 223 and the EUV radiation source 215 , in particular the lower chamber part 217 is an interface with a dome mask 224 intended. The Domeblende 224 has closable openings through which access from the maintenance area 223 to the EUV radiation source 215 , in particular the lower chamber part 217 , is created. The Domeblende 224 is thus part of the chamber wall 222, which the lower chamber part 217 limited. About the Domeblende 224 is an access to the EUV radiation source 215 from the maintenance area 223 allows while the rest of the lighting system 101 , in particular the illumination optics 102 is evacuated. The maintenance area 223 has a maintenance opening in the form of a maintenance flap 225 on. When the maintenance cover is closed 225 is the maintenance area 223 vacuum-tight against an outdoor area 226 locked. The outdoor area 226 is outside the projection exposure machine 100 , In the outdoor area 226 it can be a clean room in which the projection exposure machine 100 is built, act. In the opened state of the maintenance flap 225 is an access from the outside area 226 to the maintenance area 223 and over to the EUV radiation source 215 possible. Access to the EUV radiation source 215 Can be used especially for maintenance and cleaning. For example, it is possible for the middle part 221 expand and / or change access.

The upper chamber part 216 is essentially the same as in 1 shown source chamber 2 , The cleaning of the upper chamber part 216 can therefore by the cleaning modules described above 24 . 26 . 34 . 39 . 54 . 67 getting cleaned. For this purpose, the cleaning modules 24 . 26 . 34 . 39 . 54 . 67 through the Domeblende 224 and the openings 219 . 220 the center plate 218 be guided. Should the cleaning modules 24 . 26 , 34, 39, 54, 67 through the central opening 220 in the upper chamber part 216 This can be done in particular after the middle part 221 from the central opening 220 was removed. Of course it is also possible, the lower chamber part 217 to clean accordingly.

In the maintenance area 223 can cleaning modules, such as the cleaning modules 24 . 26 . 34 . 39 . 54 . 67 , for cleaning the chamber parts 216 . 217 be stored. Alternatively, the cleaning modules can be cleaned via the maintenance flap 225 in the maintenance area 223 and from there over the Domeblende 224 in the chamber parts 217 . 216 be introduced.

In 24 is a schematic sectional view of another embodiment of a cleaning module 227 shown. Identical components bear the same reference numerals as in the above with reference to the 7 and 23 already described alternatives to which reference is hereby made.

The plasma cleaning module 227 is suitable for carrying out the second plasma cleaning process 33 , which with reference to the 8th has been described. The cleaning module 227 includes for this purpose the gas supply 31 and the pump system 32 for supplying a cleaning gas. The pump system 32 is outside the lighting system 101 in the outdoor area 226 stored. The feeder 31 extends through the service door 225 in the maintenance area 223 , The supplied cleaning gases may those which, with reference to the 8th have been described correspond.

In contrast to the cleaning module 34 includes the cleaning module 227 a plasma generator 228 which are outside the chamber parts 216 . 217 the source chamber in the maintenance area 223 is arranged. The plasma generator 228 is designed as a microwave plasma generating device and is particularly suitable for generating an atmospheric plasma. In contrast to the cleaning module 34 is the plasma generator 228 not within the source chamber 216, 217 of the radiation source 215 arranged. The plasma generator 228 is via a holder / feeder 229 in which also the gas supply 231 is located in the maintenance area 223 be introduced and held there.

That from the plasma generator 228 generated plasma is by means of a plasma supply line 230 through an opening 254 with the dome diaphragm 224 and the central opening 220 in the upper part 216 introduced the source chamber. In the introduction step 36 of the plasma cleaning process 33 does not become the plasma generator 228 in the sub-chamber 216 introduced, but only the plasma supply 230 to the sub-chamber 216 flanged.

The other components of the cleaning module 227 correspond to those of the cleaning module 34 and are not in 24 shown.

In 25 is a schematic sectional view of another embodiment of a cleaning module 231 shown. identical Components carry the same reference numerals as in the above with reference to the 9 and 10 and 23 and 24 described alternatives, to which reference is hereby made.

The cleaning module 231 is suitable for carrying out the with reference to the 10 described laser cleaning process 38 , The cleaning module 231 includes a laser light source 232 and a beam manipulator 233 , By means of the beam manipulator 233 can laser radiation pulses 234 targeted to the inner surface 235 the chamber wall 222 be irradiated. The other components of the cleaning module 231 correspond to the components of the cleaning module 39 and are in 25 Not shown.

In 26 is a schematic sectional view of another embodiment of a cleaning module 236 shown. Identical method steps and components bear the same reference numerals as in the above with reference to FIGS 14 and 15 and 23 to 25 alternatives already described, to which reference is hereby made.

The cleaning module 236 includes a reservoir 237 for a blasting material 240 , in particular a blasting material 240 from particles with a mean particle size of 100 μm. To the reservoir 237 closes a Strahlgutzuführungsleitung 238 at. The beam supply line 238 connects the storage tank 237 with the upper chamber part 216 , The beam supply line 238 this is through the opening 254 the dome diaphragm 224 and through the central opening 220 in the middle plate 218 through into the upper chamber part 216 guided. At her the reservoir 237 opposite end has the Strahlgutzuleitung 238 a nozzle 239 on. The means of Strahlgutzuleitung 238 in the upper chamber part 216 introduced blasting material 240 gets over the nozzle 239 targeted to areas of the chamber wall 222 irradiated. For this purpose, the nozzle 239 an optimized lance geometry.

Furthermore, the cleaning module 236 an evacuation facility 241 , The evacuation facility 241 is vacuum-tight to the dome diaphragm 224 flanged. The evacuation facility 241 includes a vacuum pump 242 ,

The vacuum pump 242 and the reservoir 237 are outside the lighting system 101 outside 226 arranged. The beam supply line 238 is via the maintenance flap 225 in the maintenance area 223 and from there into the EUV radiation source 215 guided. The evacuation facility 241 includes a vacuum line 243 which the vacuum pump 242 with a vacuum connection 252 the evacuation facility 241 in the maintenance area 223 combines.

The vacuum connection 252 is pot-shaped and covers the whole dome diaphragm 224 having interface. Thus, a vacuum-tight coupling of the evacuation device 241 via the vacuum connection 252 guaranteed. The vacuum connection 252 indicates an omission 253 on, through which the Strahlgutzuleitung 238 is performed vacuum-tight.

The cleaning module 236 is suitable for carrying out the blast cleaning process 66 with reference to with reference to 15 described steps. Here is the cleaning module 236 designed for performing a vacuum Saugstrahlreinigungsverfahrens. In the coupling step 72 is next to the Strahlgutzuleitung 238 also the evacuation facility 241 to the radiation source 215 coupled. To carry out the radiation step 73 is by means of the evacuation device 241 a negative pressure in the EUV radiation source 215 , in particular in the upper chamber part 216 and the lower chamber part 217 , generated. The evacuation device generates a negative pressure of 200 mbar. By the in the EUV radiation source 215 prevailing negative pressure is the blasting material 240 from the reservoir 237 via the Strahlgutzuleitung 238 in the upper chamber part 216 pulled and over the nozzle 239 targeted to the inner surfaces 235 the chamber wall 226 irradiated. During the radiation step 73 becomes the radiation source 215 through the evacuation facility 241 sucked out continuously, so the removal step 275 at the same time by the evacuation device 241 he follows. The evacuation facility 241 is part of the movement device and the removal device. The vacuum pump 242 serves as a suction device.

The with the cleaning module 236 performed vacuum suction blasting has the advantage of increased process safety compared to other blast cleaning. In particular, a contamination of the source chamber or other components of the projection exposure system, such as the illumination optics 101 , by high-blasting blasting material 240 avoided. By the evacuation device 271 become the blasting material 240 and any detached particles removed immediately. Thus, the vacuum suction is particularly cleanroom suitable.

In 27 is the nozzle 239 of the cleaning module 236 shown in detail. The nozzle 239 is suitable for deflecting the introduced steel stock 240 to target this on individual areas of the inner surface 235 the chamber wall 222 irradiate. For this purpose, the nozzle 239 a Lanzengeometrie on which a blasting in particular of the upper chamber member 216 facing inner surface 235 the center plate 218 allowed. For deflecting the over the Strahlgutzuleitung 238 introduced blasting material 240 the nozzle 239 has a deflection element in the form of a baffle surface 244 on. The baffle 244 the nozzle 239 is rotationally symmetrical about the inflow direction 245 of the blasting material 240 from the Strahlgutzuleitung 238 executed. The baffle 244 is flat and has a surface normal, which is parallel to the inflow direction 245 lies. Thus, this bounces in the inflow direction 245 inflowing blasting material 240 at the baffle 244 off and in the direction of the center plate 218 distracted. The baffle 244 the nozzle 239 is over a carrier pin 246 with the Strahlgutzuleitung 238 connected. The carrier pin 246 is parallel to the inflow direction 245 aligned and centrally in an outlet opening 247 of the Strahlgutzuführung 238 positioned.

In 28 is an alternative embodiment of a nozzle 248 for the cleaning module 236 shown. Identical components bear the same reference numerals as in the above with reference to the 26 and 27 already described alternatives to which reference is hereby made.

The nozzle 248 has a baffle 249 on. The baffle 249 corresponds in alignment and function of the baffle 244 the nozzle 239 , The baffle 239 the nozzle 248 is not over the carrier pin 246 but via a support frame 250 with the outlet 247 the Strahlgutzuleitung 238 connected.

In 29 Another alternative is a nozzle 251 for the cleaning module 236 shown. Identical components bear the same reference numerals as in the above with reference to the 26 to 28 already described alternatives to which reference is hereby made.

The nozzle 251 has a baffle 255 on. The baffle 255 is rotationally symmetrical about the inflow direction 245 executed. The baffle 255 is designed in the form of a conical surface. Here, the cone tip is on the outlet opening 247 the Strahlgutzuleitung 238 aligned. Thus, the baffle faces 255 in the inflow direction 245 an increasing angle to the inflow direction 245 on. As a result, this is in the inflow direction 245 inflowing blasting material 240 deflected at different angles and can affect different areas of the inner surface 235 the side wall 222 be irradiated.

The cleaning methods discussed here 15 , Plasma cleaning procedure 25 . 33 , Laser cleaning process 38 , Brush cleaning method 53 and blast cleaning process 66 provide alternative purification methods for a source chamber 2 Likewise, the cleaning modules provide 24 . 26 . 34 . 39 . 54 . 67 . 227 . 231 and 236 alternative embodiments of a cleaning module according to the invention for in situ cleaning of an inner surface 8th the chamber wall 3 a source chamber 2 In principle, however, it is also possible for a cleaning module to have features of the cleaning modules discussed above 24 . 26 . 34 . 39 . 54 . 67 . 227 . 231 . 236 combined. With such a cleaning module, it is possible to carry out a plurality of the cleaning processes 15, 25, 33, 38, 53, 66 illustrated here. For example, it may be provided, the source chamber 2 first by the vibratory finishing process 15 to clean and then the laser cleaning process 38 perform.

QUOTES INCLUDE IN THE DESCRIPTION

This list of the documents listed by the applicant has been generated automatically and is included solely for the better information of the reader. The list is not part of the German patent or utility model application. The DPMA assumes no liability for any errors or omissions.

Cited patent literature

• US 2011/0089834 A1 [0002]
• WO 2009/100856 A1 [0003]
• EP 1225481A [0083]

Claims (15)

Cleaning module for in situ cleaning of a source chamber (2; 216, 217) of an EUV radiation source (1; 215) of a lighting system (101) for a projection exposure apparatus (100) 1.1. a supply device (23; 58, 64; 69; 238) for introducing at least one cleaning agent (17; 57; 212; 82; 240) into a source chamber (2; 216, 217) of an EUV radiation source (1; 215), 1.2. a movement device (19; 58,64; 69; 241) for moving the cleaning agent (17; 57; 212; 82; 240) relative to the source chamber (2; 216,217), and 1.3. a removal device (52, 79; 241) for removing the cleaning agent (17; 57; 212; 82; 240) and / or contaminants released from the source chamber (17; 57; 212; 82; 240) by the action of the cleaning agent (17; 2, 216, 217), 1.4. wherein the supply device (23; 58, 64; 69; 238) and the removal device (52, 79; 241) can be coupled in situ to the source chamber (2; 216, 217). Cleaning module after Claim 1 characterized in that the cleaning means (17; 57; 212; 82; 240) comprises at least one brush head (57; 212). Cleaning module after Claim 2 , characterized in that the feed device (23; 58, 64; 69; 238) comprises a shaft (64) which can be bent around a joint (65; 213). Cleaning module according to one of the preceding claims, characterized in that the cleaning agent (17; 57; 212; 82; 240) comprises a blasting material (82; 240). Cleaning module according to one of the preceding claims, characterized in that the movement device (19; 58, 64; 69; 241) comprises an evacuation device (241). Cleaning module according to one of the preceding claims, characterized in that the removal device (52, 79, 241) comprises a suction device (52, 242) for sucking off the source chamber (2, 216, 217). Cleaning module according to one of the preceding claims, characterized by a compressed air generator (202) which can be coupled to the source chamber (2; 216, 217). Cleaning module according to one of the preceding claims, characterized by a control device for checking a state of the source chamber (2; 216, 217). Method for in situ cleaning of a source chamber (2; 216, 217) of an EUV radiation source (1; 215) of a lighting system (101) for a projection exposure apparatus (100) with the following steps 9.1. Providing a lighting system (101) for a projection exposure apparatus (100) with an EUV radiation source (1; 215) having a source chamber (2; 216,217) having at least one opening (6,7; 219,220,254), 9.2. Introducing at least one cleaning agent (17; 57; 212; 82; 240) into the source chamber (2; 216, 217) through the at least one opening (6, 7; 219, 220, 254), 9.3. Moving the cleaning agent (17; 57; 212; 82; 240) relative to the source chamber (2; 216,217), and 9.4. Removing the cleaning agent (17; 57; 212; 82; 240) and / or contaminants released from the source chamber (2; 216,217) by the at least one by the action of the cleaning agent (17; 57; 212; 82; Opening (6, 7, 219, 220, 254). Method according to Claim 9 , characterized by a pre-cleaning (10) and / or post-cleaning (11) with compressed air. Method according to one of Claims 9 or 10 characterized by at least one control step (14) in which a state of the source chamber (2; 216, 217) is checked. Radiation source module for an illumination system (101) of a projection exposure apparatus (100), comprising 12.1. an EUV radiation source (1; 215) having a source chamber (2; 216,217) having at least one opening (6,7; 219,220,254), 12.2. a cleaning module (24; 54; 67; 236) according to any one of Claims 1 to 8th , Illumination system for a projection exposure apparatus (100), comprising 13.1. a radiation source module after Claim 12 13.2. an illumination optics (102). Lighting system after Claim 13 characterized by a maintenance area (223). Projection exposure system with a lighting system (101) according to one of Claims 13 or 14 ,

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