DE102017103624A1 - exposure system - Google Patents

Abstract

An exposure system for producing exposed structures in at least one photosensitive layer disposed on an object, comprising an object-receiving slide and an exposure device, wherein the slide and the exposure device are movable in a feed direction relative to each other and wherein the exposure device exposure controlled on the at least In order to improve a photosensitive layer, it is proposed that the at least one exposure unit produce at least two sets of exposure beams with exposure beams, the exposure beams of one exposure beam set differ in wavelength with respect to the exposure beams of a further exposure beam set, the exposure beams of the one exposure beam set relative to the exposure beams of the further exposure radiation set spatially offset, and that the Exposure St In the case of each of the exposure ray sets, the exposure spot of the last exposure spot position of the one deflection path and the exposure spot of the first exposure spot position of the next following deflection route are arranged with respect to a reference straight parallel to the feed direction such that the reference straight lines produce the images generated in these exposure spot positions Exposure marks intersect.

Description

The invention relates to an exposure system for producing exposed structures in at least one photosensitive layer disposed on an object, comprising an object receiving slide and an exposure device, wherein the slide and the exposure device are movable in a feed direction relative to each other and wherein the exposure device transversely to the feed direction Exposure spots position-controlled on the at least one photosensitive layer can be generated in that the exposure device comprises at least one exposure, successively exiting in a row direction exposure beams, each of which an exposure spot on the at least one photosensitive layer is generated and each of which by a deflection is deflectable in a transverse to the row device and obliquely to the feed direction extending deflection, so that with each of the exposure beams through Movement of each exposure spot generated by an exposure beam in the respective deflection over a deflection distance in a plurality of successive exposure spot positions overlapping exposure spots are generated.

Such exposure systems are known from the prior art, for example the German patent application DE 10 2006 059 818 A or the German patent application DE 10 2009 046 809 A known.

In these exposure apparatuses, it is usual to work with a wavelength during the exposure of the photosensitive layer, the exposure results in the photosensitive layer not being optimal.

The invention is therefore based on the object to improve an exposure system of the generic type such that optimum exposure results in the photosensitive layer are available.

This object is achieved in an exposure system of the type described above according to the invention in that the at least one exposure unit generates at least two exposure ray sets with exposure beams, that the exposure beams of an exposure beam set differ from the exposure beams of the further exposure beam set in terms of their wavelength that the exposure beams of an exposure beam set relative to the exposure beams of the other exposure beam set are spatially offset and that the exposure beams of each exposure beam set are so relative to each other that at each of the exposure beam sets the exposure spot of the last exposure position of the one deflection and the exposure spot of the first exposure spot position of the next deflection so in a direction parallel to the feed direction extending reference straight line sin d that the reference line intersects the exposure spots generated in these exposure spot positions.

The advantage of the solution according to the invention can be seen in the fact that the exposure results can be improved by the possibility of exposing the same area of the photosensitive layer with at least two different wavelengths.

By exposing at different wavelengths, it is possible to achieve particularly favorable structural exposure results in the photosensitive layer. In particular, optimal transitions between exposed and unexposed areas of the photosensitive layer can be designed, since in particular the possibility of using at least two different wavelengths of the radiation results in different penetration depths of the radiation in the photosensitive layer and / or induces different photo-induced chemical reactions in the photosensitive layer to let.

Thus, the exposure results in the photosensitive layer can be optimized in a particularly simple manner.

Moreover, the advantage of the solution according to the invention is that the exposures with two different wavelengths can be carried out in a simple manner by the exposure beams which are offset relative to one another in space, wherein the beam guidance of the respective exposure beams can be optimized without problems for the respective wavelength.

With regard to the spatial offset of the exposure ray sets, no further details were given in connection with the previous explanation of the solution according to the invention.

For example, it would be conceivable that the exposure ray sets are offset transversely to the row direction relative to each other.

However, a particularly favorable solution provides that the exposure beams of one of the exposure beam sets relative to the exposure beams of the further exposure beam sets in the direction of the row direction are offset from one another.

This solution makes it possible to optimize the structure of the individual exposure units in a particularly simple manner.

It is not absolutely necessary that only an offset in the row direction is present. It would also be conceivable to additionally provide an offset transversely to the row direction.

However, the exposure system can be constructed in a particularly simple manner if the exposure ray sets are arranged offset from one another only in the direction of the row direction.

In principle, it would be conceivable to arrange the exposure ray sets successively in the row direction.

An offset of the exposure ray sets allows a particularly space-saving structure of the exposure units when the deflection lines generated by the exposure beams of one of the exposure beam sets are spaced apart in the row direction when the deflection paths of the exposure beams of another of the exposure beam sets are spaced from each other in the row direction and when at least half of the deflection paths of the exposure beams are further the exposure beam sets between respectively adjacent deflection paths of the exposure beams of the one of the exposure beam sets.

The advantage of this solution is that with this solution, the expansion of the exposure unit in the row direction can be reduced.

It is even better if at least two-thirds of the deflection paths of the exposure beams are further the exposure beam sets between respectively adjacent deflection paths of the exposure beams of the one of the exposure beam sets.

It is even more advantageous when at least three quarters of the deflection paths of the exposure beams are further the exposure beam sets between respectively adjacent deflection paths of the exposure beams of the one of the exposure beam sets.

In principle, the distances between the deflection paths of the different exposure ray sets could be of different sizes, so that optionally several exposure beams of the further exposure ray sets may lie between the deflection paths of the exposure beams of the one of the exposure ray sets.

It is particularly favorable if, between successive deflection paths of the one of the exposure ray sets, there is respectively a deflection path of the exposure rays of the further exposure ray sets.

It is optimal if, between successive deflection distances of the one of the exposure ray sets, all the deflection distances are up to one of the exposure rays of the further exposure ray sets.

With regard to the formation or the extent of the deflection distances of the exposure beams of an exposure unit, it is preferably provided that for all exposure beam sets of the at least one exposure unit, the distance between successive deflection distances of the exposure beams of the respective exposure beam set is equal, so that each of the exposure beam sets has the same spacing grid at its Has exposure beams.

Furthermore, it is preferably provided that, in the case of the at least one exposure unit, the deflection paths of the exposure beams of the two exposure radiation sets run parallel to one another, so that the deflection paths of the individual exposure beams, which extend transversely to the row direction, can be arranged as compactly as possible side by side in the row direction.

Furthermore, it is preferably provided that, in the case of the at least one exposure unit, the exposure beams of both exposure beam sets are deflected simultaneously and to the same extent by the deflection unit, so that the exposure beams of both exposure beam sets are also aligned substantially parallel to one another on the at least one photosensitive layer, in particular in the case of the at least one exposure unit incident.

Furthermore, it is preferably provided that in each of the exposure ray sets, a reference straight line running parallel to the advancing direction intersects the exposure spot of a first exposure spot position of a next deflection distance through the last exposure spot position of a deflection line.

It is particularly advantageous if the first exposure spot position of the next following deflection line has a distance from the reference straight line which corresponds at most to half the diameter of the corresponding exposure spot.

A particularly advantageous solution provides that the deflection unit associated with each exposure unit for each exposure beam of each Exposure jet set has at least one mirror surface area.

It is particularly advantageous if the mirror surface areas of the at least one exposure unit are movable together.

In the simplest case, it is provided that the mirror surface areas are subregions of a common mirror surface.

In particular, the mirror surface areas of all the exposure beams of all the exposure beam sets of an exposure unit at the time of the deflection are in a mirror surface, for example in a row running parallel to the back direction.

Preferably, the mirror surface areas are arranged so that they lie in a common plane and in particular the mirror surface areas on which the collimated exposure beams of the at least one exposure unit impinge lie in the same plane.

It is preferably provided that the deflection unit has a plurality of mirror surface areas for each exposure beam, and in particular that the deflection unit has a plurality of successively inserted mirror surface areas for each exposure beam.

In order to deflect the exposure beams such that they migrate on the photosensitive layer, it is preferably provided that the mirror surface areas can be tilted relative to the direction of impact of the collimated exposure beams so that tilting causes the exposure beams focused on the photosensitive layer to migrate with their exposure spots.

In particular, the plurality of mirror surface regions are formed by peripheral sides of a mirror body rotatably arranged about an axis.

Preferably, the mirror body is arranged to rotate about the axis.

In particular, the mirror body can preferably be used advantageously when it is driven to rotate about its axis at a constant speed.

Furthermore, the mirror surface areas are preferably arranged at the same distance around the axis, so that the mirror body has a cross-sectional shape of a regular polygon.

With regard to the number of exposure units, no details were given in connection with the previous solution. It was merely stated that at least one exposure unit is provided.

However, it is particularly favorable if a plurality of exposure units are provided, wherein the exposure units are arranged in the deflection direction at a distance from each other.

It is particularly advantageous if the deflection directions of the multiple exposure units are substantially parallel, in particular parallel, to each other.

A particularly favorable solution provides that the row directions of the multiple exposure units are substantially parallel, in particular parallel to each other.

In order to ensure that even in the case of the multiple exposure units, the photosensitive layer can be exposed surface-wide within a designated structure area, it is preferably provided that the plurality of exposure units are arranged with respect to a reference straight parallel to the feed direction such that the reference line is the exposure spot of the last exposure spot position of the last Exposure spot position of the last deflection path of one of the exposure ray sets of an exposure unit and the exposure spot of the first exposure spot position of the first deflection path of the exposure ray set corresponding to the one exposure ray set of the next adjacent exposure unit.

That is, each of the exposure units has the same number of exposure ray sets, and by using the same exposure ray sets of all the exposure units, blanket exposure of the photosensitive layer within the pattern region is possible.

It is particularly favorable if the reference straight line passing through the last exposure spot position of the last deflection path of an exposure unit intersects the exposure spot of the first exposure spot position of the first deflection path of the corresponding exposure ray set of a next adjacent exposure unit.

It is even more advantageous if the first exposure spot position has a distance from the reference straight line which corresponds at most to half the diameter of the exposure spot to the first exposure spot position of the respective corresponding exposure beam set.

Further, no details have been given as to the formation of the radiation waves for the generation of the exposure beams.

Thus, an advantageous solution provides that a separate radiation source is provided for each exposure beam.

Preferably, the radiation source is a laser, in particular a semiconductor laser.

To guide the radiation from the respective radiation wave, it is preferably provided that each of the radiation sources is provided with its own beam-shaping optical system for the emerging radiation.

In particular, a separate beam-shaping optical unit is provided for each exposure beam.

Furthermore, with regard to the beam shaping optics, it is also provided that the beam shaping optics for the exposure beams of each exposure beam set are identical.

Preferably, in an advantageous embodiment of the exposure system beam-forming optics are formed anamorphic.

This opens up the possibility of forming the beam shaping optics anamorphic in such a way that the exposure spots are substantially round, in particular rotationally symmetrical.

In a further advantageous embodiment of the exposure apparatus, the radiation sources for each of the exposure ray sets are each arranged in a row and the rows of radiation sources are arranged at a distance from each other.

This arrangement is particularly space-saving, if the rows of radiation sources are parallel to each other.

It is even better if the rows run parallel to the row direction.

For the advantageous deflection of the exposure beams it is provided that the exposure beam sets are deflected by at least one deflection unit into a common propagation plane.

In order to arrange the at least one deflection unit favorably, the at least one deflection unit is formed by a deflection comb for the exposure beams of one of the exposure ray sets.

Furthermore, a separate focusing optics is provided for each exposure beam.

On the one hand, this allows the respective focusing optics to be optimally adjusted and, on the other hand, to be optimally tuned to the respective wavelength of the exposure radiation set.

In particular, it is provided that the focusing optics for the exposure beams of the respective exposure beam set are identical, so that an optimization of the focusing optics is possible, in particular also with regard to the wavelength of the respective exposure beam set.

Further features and advantages of the invention are the subject of the following description and the drawings of an embodiment.

• 1 eine schematische perspektivische Darstellung eines ersten Ausführungsbeispiels einer erfindungsgemäßen Belichtungsanlage;
• 2 eine ausschnittsweise vergrößerte Darstellung eines auf einem Objektträger angeordneten Objekts mit einer fotosensitiven Schicht und gegebenenfalls in dieser zu erzeugenden Strukturen;
• 3 eine ausschnittsweise schematische Darstellung zweier Ablenkeinheiten mit diesen zugeordneten Belichtungseinheiten;
• 4 einen Schnitt längs Linie 4-4 in 3;
• 5 eine schematische vergrößerte Darstellung einer Funktion einer der Ablenkungseinheit in 3 mit dem Wandern der Belichtungsstrahlen in Ablenkrichtung;
• 6 eine schematische ausschnittsweise Darstellung eines Teilbereichs eines Belichtungsbereichs, in welchem Belichtungsflecken erzeugbar sind;
• 7 eine Schnittdarstellung ähnlich 5 mit Darstellung von zwei Strahlungsquellensätzen längs Linie 7-7 in 4;
• 8 eine Schnittdarstellung ähnlich Fig. 7 längs Linie 8-8 in 4;
• 9 eine vergrößerte ausschnittsweise Darstellung von durch die Belichtungsstrahlenstütze einer Belichtungseinheit erzeugbaren Belichtungsfleckpositionen und Belichtungsflecken;
• 10 eine Darstellung der von einem Belichtungsstrahlensatz erzeugbaren Belichtungsfleckpositionen ähnlich 6 bei mehreren Belichtungseinheiten und
• 11 eine schematische vergrößerte Darstellung von nebeneinanderliegend angeordneten Belichtungseinheiten der Belichtungseinrichtung mit den zugeordneten Ablenkungseinheiten.

In the drawing show:

• 1 a schematic perspective view of a first embodiment of an exposure system according to the invention;
• 2 a fragmentary enlarged view of an object disposed on a slide object with a photosensitive layer and optionally in these structures to be produced;
• 3 a fragmentary schematic representation of two deflection units with these associated exposure units;
• 4 a section along line 4-4 in 3 ;
• 5 a schematic enlarged view of a function of the deflection unit in 3 with the traveling of the exposure beams in deflection direction;
• 6 a schematic partial view of a portion of an exposure area in which exposure spots can be generated;
• 7 a sectional view similar 5 with representation of two radiation source sets along line 7-7 in 4 ;
• 8th a sectional view similar to FIG. 7 along line 8-8 in 4 ;
• 9 an enlarged fragmentary view of exposure spot positions and exposure spots that can be generated by the exposure beam support of an exposure unit;
• 10 a representation of the exposure spot positions that can be generated by an exposure beam set is similar 6 at several exposure units and
• 11 a schematic enlarged view of juxtaposed exposure units of the exposure device with the associated deflection units.

A first embodiment of an in 1 Illustrated exposure device comprises a generally designated 10 machine base, which is a guide 12 along which a slide 14 in the direction of a feed direction 16 on the one hand is movably guided and on the other hand by means of drives, such as linear actuators, preferably positionally accurate movable.

The leadership 12 is for example on one of a stand area 18 opposite side of the machine base 10 arranged and guides the slide 14 such that on the machine base 10 facing away from the top 20 , as in 2 represented an object 22 can be placed and fixed on its slide 14 turn away side with a photosensitive layer 24 is provided, in which by a suitable exposure structures 26 by optical conversion of the material of the photosensitive layer 24 can be generated.

For example, such structures are used 26 to, individual areas of a layer 28 , For example, a copper layer 28 of the object 22 selectively cover, then in the context of, for example, an etching process, the layer 28 in the places where they are not through the structures 26 covered, remove, leaving the layer 28 only in the areas where they pass through the structures 26 is covered, persists.

Making the in 2 represented structures 26 by optical conversion of the photosensitive layer 24 is effected by an exposure device designated as a whole by 30, which in a direction of movement extending transversely to the feed direction 16 31 movable and positionable on a bridge 32 is arranged, which is located on both sides of the guide 12 on the machine base 10 supports and, moreover, about the leadership 12 hinwegerstreckt.

In the illustrated embodiment, it is with the exposure device according to the invention 30 possible, with a single movement of the slide 14 with the object 22 and the photosensitive layer disposed thereon 24 the photosensitive layer in the course of this one-time movement of the photosensitive layer 24 in the feed direction 16 within a structural area 34 all in this structural area 34 provided structures 26 by exposure, wherein the exposure means 30 is capable of, in the course of the one-time movement of the photosensitive layer 24 in the feed direction 16 the structure area 34 both in its longitudinal direction 36 as well as in its transverse direction 38 to expose in one go to all within the structural area 34 provided and required structures 26 produce without further movements of the slide 14 in the feed direction 16 requirement.

To within this structural area 34 all necessary structures 26 to be able to generate are within one of the exposure device 30 associated exposure range 40 represented in 1 and partly in 4 to 10 , single exposure spots 42 which can be generated within the exposure range 40 are arranged that the sum of all in the exposure area 40 existing exposure spots 42 all those exposure spots 42 includes, which are required to move in the transverse direction 38 one over the entire extent of the structure area 34 in the transverse direction 38 to generate extending linear structure in the transverse direction 38 is continuous without interruption, including the exposure spots 42 to be arranged so that they are in the transverse direction 38 successive exposure spots 42 overlap.

In other words, that's within the exposure range 40 producible exposure spots 42 have such a size and are arranged such that with these in consideration of the movement of the object 22 in the feed direction 16 nationwide in the entire structural area 34 the photosensitive layer 24 in the context of the areal extent of the exposure spots 42 in the longitudinal direction 36 and the transverse direction 38 conditional resolution all possible structures 26 can be generated.

But it is also conceivable in a modification of the first embodiment, the slide 14 once in one direction of the feed direction 16 to move and at other times contrary to this, so starting from an in 1 shown starting position a back and forth movement of the slide 14 for the desired comprehensive exposure in the structural area 34 leads, so that it would be conceivable, for example, in the course of a movement in the direction of the feed direction 16 in the transverse direction 38 seen in a first position of the exposure device 30 in the direction of adjustment 31 half of the structure area 34 through a small selected exposure range 40 to expose and after a shift of the exposure device 30 together with the associated exposure range 40 in the direction of adjustment 31 in a second position in return to the other half.

To within the exposure range 40 to the circuit of the structures 26 required exposure spots 42 with the required number and Being able to generate position are, as in 3 shown in the exposure device 30 several exposure units 50a . 50b , etc., each of which, as shown schematically in 4 shown a series of in a row direction 53 successive and spaced apart radiation exit areas 54 has, from each of which divergent exposure beams 56 emerge through the beam shaping optics 58 in collimated exposure beams 60 be transformed, in which case the collimated exposure beams 60 , as in 4 and 5 represented by a deflection unit 62 be deflected transversely to its direction of propagation, the exposure beams 60 on an in 3 and 5 shown deflection unit 70 with a deflector 72 that meets, as in 5 shown, the collimated exposure beams 60 in a deflection direction 74 transverse to the row direction 53 wandering exposure rays 66 deflects.

The deflection unit 70 includes as a deflecting element 72 for example, a mirror body 80 , which is rotationally symmetric to an axis 82 arranged and parallel to the axis 82 extending mirror surfaces 84 has, preferably the shell side of the mirror body 80 are arranged ( 5 ).

Preferably, the mirror surfaces border 84 in the circumferential direction 85 essentially abut each other and extend in their parallel to the axis 82 extending longitudinal direction 86 as well as in their transverse direction 88 over the same length or width, so that all mirror surfaces 84 have the same extent ( 5 ).

In addition, all mirror surfaces 84 flat surfaces, so that the mirror body 80 in the simplest case has a cross-sectional area corresponding to that of a regular polygon, wherein the number of mirror surfaces 84 for example, greater than 4 and less than 100.

A preferred embodiment provides that the number of mirror surfaces 84 greater than 30 and less than 50.

Each of the mirror surfaces 84 each reflects one of the deflection unit, each with a mirror surface area 89 62 deflected collimated exposure beam 60 according to the respective rotational position of the mirror body 80 such that, as in 5 and 6 shown in a first position of the mirror surface 84 for example, the first traveling exposure beam 66 an exposure spot 42 _X1 in a first exposure spot position 90 _X1 , which is then in the direction of the deflection 74 via a deflection distance AS continues to migrate up to a last Nth exposure spot position 90 _XN , the position of the respective mirror surface 84 corresponds to, in which the collimated exposure beam 60 _X still on an actively used area of the mirror surface 84 is incident and thus still from this for generating the last exposure _{spot position} 90 _XN associated exposure _spot 42 _{XN is} reflected.

Further rotation of the mirror body 80 in the direction of rotation 92 then causes the exposure beam _60X to the actively used area of the next mirror surface 84 which in turn then reflects the exposure beam 60 _X into the traveling exposure beam 66 _X , which in turn generates the exposure spot 42 _X1 in the first exposure spot position 90 _X1 .

Thus, the constant rotation of the mirror body leads 80 around the axis 82 to a constant migration of the exposure spots 42 _X1 generated by an exposure beam 66 _x from the first exposure _{spot position} 90 _{x 1} to the last N th exposure _{spot position} 90 _x N via the deflection path AS on the photosensitive layer 24 ,

This makes it possible in the region of the deflection distance AS along the deflection direction 74 an exposure of the photosensitive layer through the exposure spots 42 _x in defined selectable exposure spot positions 90 _xy 24 when the respective exposure spot 42 _{xy is} in the respective exposure _spot position 90 _xy , only in this position on the photosensitive layer 24 By activating the respective exposure beam 66 _x , that is, for example, switching on the radiation source 54 _x associated radiation source, an exposure with sufficient intensity takes place, by which a photochemical conversion in the photosensitive layer 24 42 _xy can be reached in the area of this exposure _spot .

Is no exposure of the photosensitive layer in the remaining exposure spot positions 90 _xy within the deflection distance AS _x 24 provided, the radiation source associated with the respective radiation exit 54 _{x is} not switched on when passing through these remaining exposure spot positions 90 _xy or operated at an intensity which does not lead to photochemical conversion of the photosensitive layer 24 42 _xy in the area of the respective exposure _spot .

For focusing the traveling exposure beams 66 on the photosensitive layer 24 and thus for adjusting the extension of the respective traveling exposure rays 66 generated exposure spots 42 is between the deflection unit 70 and the photosensitive layer 24 another optical unit 100 provided, which for each of the exposure beams 66 a separate imaging optics 104 , For example in the form of a lens system, through which the respective wandering exposure beam 66 is focused and thus the respective exposure spot 42 _x with a defined size of the exposure spot 42 _x and a defined intensity distribution in the exposure spot 42 _x on the photosensitive layer 24 forms.

In particular, advantageous imaging properties of the imaging optics 104 are given when the average distance between the effective mirror surface area 89 the mirror surface 74 approximately the focal length f of the imaging optics 104 so that the imaging ratios for the traveling exposure beam due to the telecentric optics are substantially identical, and thus also the exposure spots 42 _{x have} substantially the same size and substantially the same intensity distribution ( 5 ).

Furthermore, it is preferably provided that the distance between the imaging optics 104 and the photosensitive layer to be exposed 24 approximately the focal length f of the imaging optics 104 corresponds to 5 ) for optimal focusing of the respective exposure beam 66 in the exposure spot 42 on the photosensitive layer 24 to obtain.

According to the invention, as in particular in the 4 and 6 and 7, each of the exposure units 50 associated with two sets of radiation sources, the exposure ray sets 63a , in 4 marked with solid lines, and 63b, in 4 characterized by dashed lines, with different wavelengths of radiation.

For example, a first set of exposure radiation includes 63a in the row direction 53 successive exposure beams 66a ₁ to 66 at a first wavelength λa, which is, for example, at values of 400 nm or greater, but at most 450 nm, and a second exposure beam set 63b in the row direction 53 successive exposure beams 60b1 to 60bn of a second wavelength λb which is, for example, at values of less than 400 nm, but at least 300 nm.

Here is the second exposure beam set 63b relative to the first exposure beam set 63a in the row direction 53 staggered ( 4 ), so that, for example, the offset V of the second exposure beam set 63b relative to the first exposure beam set 63a an odd integer multiple of half the value of the distance of successive collimated exposure beams 60a of the first exposure ray set 63a in the row direction 53 corresponds, wherein the distance of the second collimated exposure beams 60b of the second exposure ray set 63b in the row direction 53 is identical to the distance of the first exposure beams 66a of the first exposure ray set 63a in the row direction 53 ,

In the arrangement of the radiation sources for generating the first exposure beam set 63a and the second exposure beam set 63b is preferably as in 7 illustrated, provided that first radiation sources 110a a first radiation source set lilac for the generation of the first exposure radiation set 63a in a direction parallel to the row direction 53 running row 112a are arranged and second radiation sources 110b a second radiation source set 111b for the generation of the second exposure radiation set 63b in a direction parallel to the row direction 53 and across the row direction 53 relative to the series 112a offset row 112b are arranged.

Each of the radiation sources 110a . 110b In turn, for example, includes a laser diode 113a . 113b the the respective radiation exit area 54a . 54b forms, from which the corresponding exposure beams 56a . 56b leak out and each of the laser diodes 113a . 113b is the respective beam shaping optics 58a . 58b assigned.

In this case, the respective beam-shaping optical system is preferred 58a . 58b Anamorphotically formed to, starting from the non-rotationally symmetrical radiation cross section in the radiation exit regions 54a, 54b, a round, in particular an optimal rotationally symmetric beam cross-sectional shape of the respective exposure spot 42a . 42b to reach.

Around the collimated exposure beams 60a and 60b essentially in the same propagation plane and thus with essentially the same propagation direction to the common deflection unit 62 is preferably one of the radiation source sets lila, 111b, for example, the radiation source set 111b , a diverting comb 114 associated with each of the collimated exposure beams 60b a parallel displacement diverting unit 115 which is between the collimated exposure beams 60a of the first exposure ray set 63a lies, with the individual deflection units 115 held on a common carrier 116.

Alternatively to providing the deflection unit 115 But it is also conceivable the deflection unit 62 to modify them for the first collimated exposure beams 60a and for the second collimated exposure beams 60b, respectively, a different swirling behavior is exhibited around the first exposure beams 60a and the second exposure beams 60b to redirect that through the optical unit 100 so that each of the traveling exposure beams can be imaged 66a . 66b the appropriate exposure spot 42a , b generated.

In order not only within the deflection distance AS, the individual exposure spots 42 _x , generated by one of the exposure ray sets 63a or 63b be able to position 90 _x in the individual exposure spot positions such that they are - for the production of contiguous, at least one component in the transverse direction extending structures 26 , overlap each other to the coherent structure 26 from a variety of individual exposure spots 42a . 42b with the same wavelength λa and / or the second wavelength λb, but also the exposure spots 42 passing through in the row direction 53 successive exposure beams 66a _x , 66b _{x + 1} , 66a _{(x + 1)} , 66b _{(x + 1) of} the respective exposure beam set 63a or 63b can be generated overlapping, runs (as in 9 shown), the row direction 53 relative to the feed direction 16 at an angle α so that one to the feed direction 16 parallel reference line RG through the last exposure _{spot position} 90 _{XN of} the exposure _beam 66 _aX or 66b _{x of} the respective exposure beam set 63a, 63b, the first exposure spot 42a _{(x + 1) 1} in the first exposure _{spot position} 90 _{(x + 1) 1} in the row direction 53 next exposure beam 66a _{x + 1} and 66b _{(x + 1) 1 of the} same exposure beam set 63a, 63b touched, preferably intersects, so that in the respective exposure beam set 63a or 63b by moving the last exposure spot 42a _XN or 42b _XN in the feed direction 16 up to the advancing position of the first exposure _spot 42a _{(x + 1) 1} or 42b _{(x + 1) 1 of} the next exposure beam 66a _{(x + 1)} and 66b _{(x + 1)} the two exposure spots 42a _XN and 42a _{(x + 1) 1,} respectively or 42b _XN and 42b _{(x + 1) 1 may} be arranged partially overlapping each other, for example, overlapping by not more than half an exposure _spot diameter, and thus the exposure spots 42a _{(x + 1)} and 42b _{(x + 1) of} the in the row direction 53 Next exposure beam 66a _{(X + 1)} and 66b _{(x + 1)} are used, together with the exposure spots 42a _x and 42b _{x of} the exposure beam 66a _x and 66b _x the continuous structure 26 within the structure area 34 to create.

This relative arrangement of the respective last exposure _spot 42 _{XN of} an exposure beam 66 _x to the respective first exposure _spot 42 _{x + 1 of} the next exposure beam 66 _{x + 1} is for all exposure beams 66 _X and exposure spots 42 _{x of} the respective exposure beam set 63a or 63b provided, so that theoretically all exposure spots 42 of the respective exposure ray set 63a or 63b can be used to deal with a component in the transverse direction 38 over the entire extent of the exposure beam set 63a or 63b extending in the transverse direction 38 contiguous structure 26 to create.

In the same way as in connection with the arrangement of the exposure spots 42 , generated by the different exposure beams 66a . 66b of the respective exposure ray set 63a . 63b , are also the exposure units 50a . 50b , etc. arranged so relative to each other that, such as in 10 shown, one to the feed direction 16 parallel reference line RGB through the last exposure position 90 _{NN of} the respective exposure ray set 63a . 63b a first exposure unit 50, for example the exposure unit 50a , the exposure _spot 42 _{a11 of} the respective exposure _{ray set} 63a . 63b the first exposure position 90 _a11 in the transverse direction 38 next exposure unit, for example, the exposure unit 50b , tangents or cuts, so that too of all in the transverse direction 38 successive exposure units, for example the exposure units 50a and 50b , producible exposure spots 42 of the respective exposure ray set 63a . 63b to create a coherent structure 26 can be used, in that the exposure spots 42 an exposure unit 50 For example, the exposure unit 50a , are positioned overlapping and the last exposure spot 42 _{NN of} the last exposure beam 66 _{N of} the respective exposure beam set 63a . 63b overlapping with the first exposure _spot 42 _{11 of} the first exposure beam 66 _{1 of} the respective exposure beam set 63a . 63b in the transverse direction 38 next exposure unit, for example, the exposure unit 50b , can be arranged.

Provided that the exposure area 40 in the transverse direction 38 over the entire width of the photosensitive layer 24 or at least one for exposure and for creating structures 26 provided area of the photosensitive layer 24 , extends, are in the whole of the exposure area 40 covered area of the photosensitive layer 24 coherent or unrelated structures 26 with the exposure beams 66a of the first exposure ray set 63a and / or the exposure beams 66b of the second exposure beam set 63b produced.

Since all the exposure units 50 _a , ... 50 _{X of} the exposure device 30 Thus, there is the possibility on the photosensitive layer 24 over the entire transversely 38 and over the entire longitudinal direction 36 using the feed movement 16 in any area arbitrarily designed coherent structures 26 , 28 with the exposure beams 66a of the first exposure ray set 63a and / or the exposure beams 66b of the second exposure beam set 63b, both in the longitudinal direction 36 as well as in the transverse direction 38 or can run at any angle to these.

To the mirror body 80 To arrange space-saving, they are one-sided by a drive unit 130 around the axis 82 rotatably driven, but rotatably mounted on both sides ( 11 ).

Furthermore, as in 5 represented, each of the drive units 130 still with a sensor 132 provided which is capable of optical, that is, for example, via one of a radiation source 134 generated and reflected on a mirror surface measuring beam 136 that is on a detector 138 impinges, directly the rotational position of the mirror body 80 and thus in particular the position of the mirror surfaces 84 and to communicate to a designated as a whole by 150 control unit.

This control unit 150 controls the drive units 130 so that they rotate at a constant speed and also controls the illumination of the exposure spots 42 ,

The control unit detects this 150 both the position of the photosensitive layer 24 in the feed direction 16 by detecting the position of the slide 14 and the positions of the individual exposure spots that can be generated 42 along the deflection path AS through the rotational position of the mirror body 80 and is thus able, in addition still by suitable control of the respective radiation source 110a respectively 110b at the appropriate time at any point of the intended exposure range 40 on the photosensitive layer 24 an exposure spot 42 This is preferably achieved by suitable control of the radiation sources 110a, 110b in the course of a single movement of the slide 14 in the feed direction 16 he follows.

For sufficient accuracy in positioning the exposure spots 42 to create the structures 26 It is favorable if the speed in the feed direction 16 just so big is that of two in the circumferential direction 86 successive mirror surface areas 88 through an exposure beam 66 generated exposure spots 42 a maximum of half a diameter, even better around values in the range of one-fifth to one-tenth of the diameter of the exposure spots 42 are offset from each other, that overlap to a considerable extent.

As in 9 In the case of the two exposure ray sets 63a, 63b, this results in that, as shown in FIG 9 represented by the first exposure beam set 63a generated first exposure spots 42a for the exposure of a transversely related structure 26 by means of radiation of the first wavelength λa and the exposure of the corresponding in the transverse direction corresponding or changed structure 26 by means of radiation of the second wavelength λb, in particular in the entire structural region 34 allow.

QUOTES INCLUDE IN THE DESCRIPTION

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Cited patent literature

• DE 102006059818 A
• DE 102009046809 A

Claims (42)

An exposure apparatus for producing exposed structures (26) in at least one photosensitive layer (24) arranged on an object (22), comprising a slide (14) receiving the object (22) and an exposure device (30), wherein the slide (14) and the exposure device (30) can be moved relative to one another in a feed direction (16) and wherein with the exposure device (30), exposure spots (42) can be generated position-controlled on the at least one photosensitive layer (24) in a position-controlled manner by the exposure device (30) comprises at least one exposure unit (50), from which in a row direction (53) successively exposure beams (66) emerge, with each of which an exposure spot (42) on the at least one photosensitive layer (24) can be generated and each of which by a deflection unit (70) in a direction transverse to the row direction (53) and obliquely to the feed direction (16) extending deflection means (74) is deflectable such that with each of the exposure beams (66) by movement of each exposure spot (42) produced by an exposure beam (66) in the respective deflection direction (74) over a deflection distance (AS) in a plurality of successive exposure spot positions (90) overlapping exposure patches (42) can be produced, characterized in that the at least one exposure unit (50) generates at least two exposure beam sets (63a, 63b) with exposure beams (66a, 66b) such that the exposure beams (66a) of an exposure beam set (63a ) differ from the exposure beams (66b) of another exposure beam set (63b) in wavelength λa, λb) in that the exposure beams (66a) of the one exposure beam set (63a) are spatially relative to the exposure beams (66b) of the further exposure beam set (63b) offset, and that the exposure beams (66a, 66b) of each exposure beam set (63a, 63b) are guided relative to each other such that in each of the exposure beam sets (63a, 63b) the exposure spot of the last exposure spot position (90) of the one deflection path (AS) and the exposure patch (42) of the first Exposure spot position (90) of the next deflection distance (AS) are arranged with respect to a parallel to the feed direction (16) extending reference line (RG) such that the reference line (RG) intersects the exposure spots (42) generated in these exposure spot positions (90). Exposure after Claim 1 , characterized in that the exposure beams (66a) of the one of the exposure beam sets (63a) are offset relative to the exposure beams (66b) of the further exposure beam set (63b) in the direction of the row direction (53). Exposure after Claim 1 or 2 characterized in that the deflection paths (ASa) produced by the exposure beams (66A) of one of the exposure beam sets (63A) are spaced apart in the row direction (53) such that the deflection paths (ASb) of the exposure beams (66b) of a further exposure beam set ( 63b) are arranged in the row direction (53) at a distance from one another, and that at least half of the deflection paths (ASb) of the exposure beams (66b) further comprise the exposure beam sets (63b) between respectively adjacent deflection paths (ASa) of the exposure beams (66a) of the one of the exposure beam sets (63a) lie. Exposure after Claim 3 , characterized in that at least two-thirds of the deflection paths (ASb) of the exposure beams (66b) of the further exposure beam sets (63b) between each adjacent deflection paths (ASa) of the exposure beams (66a) of the one of the exposure beam sets (63a). Exposure after Claim 4 characterized in that at least three quarters of the deflection distances (ASb) of the exposure beams (66b) of the further exposure beam sets (63b) lie between respectively adjacent deflection paths (ASa) of the exposure beams (66a) of the one of the exposure beam sets (63a). Exposure system according to one of the preceding claims, characterized in that between successive deflection sections (ASa) of the one of the exposure beam sets (63a) there is a respective deflection path (ASb) of the exposure beam (66b) of the further exposure beam sets (63b). Exposure system according to one of the preceding claims, characterized in that, for all the exposure ray sets (63a, 63b) of the at least one exposure unit (50), the distance between successive deflection paths (ASa, ASb) of the exposure beams (66a, 66b) of the respective exposure ray set (63a, 63b ) is the same size. Exposure plant according to one of the preceding claims, characterized in that in the at least one exposure unit (50) the deflection paths (ASa, ASb) of the exposure beams (66a, 66b) of both exposure ray sets (63a, 63b) are parallel to one another. Exposure system according to one of the preceding claims, characterized in that in the at least one exposure unit (50) the exposure beams (66a, 66b) of both exposure beam sets (63a, 63b) are deflected simultaneously and to the same extent by the deflection unit (70). Exposure system according to one of the preceding claims, characterized in that, in the at least one exposure unit (50), the exposure beams (66a, 66b) of both exposure beam sets (63a, 63b) strike the at least one photosensitive layer (24) substantially parallel to one another. Exposure system according to one of the preceding claims, characterized in that in each of the exposure beam sets (63a, 63b) a reference straight line (RG) extending parallel to the feed direction (16) through the last exposure spot position (90 _XN ) of a deflection path (AS) exposes the exposure spot (42 _{(x + 1) 1} ) intersects a first exposure _{spot position} (90 _{(x + 1) 1} ) of a next deflection line (AS). Exposure system according to one of the preceding claims, characterized in that the first exposure _{spot position} (90 _{(x + 1) 1} ) of the next following deflection line (AS) is at a distance from the reference straight line (RG) which is at most half the diameter of the corresponding exposure spot (42 ₍ 42). _{x + 1) 1} ). Exposure system according to one of the preceding claims, characterized in that the deflection unit (70) associated with each exposure unit (50) has at least one mirror surface area (89) for each exposure beam (66a, 66b) of each exposure beam set (63a, 63b). Exposure after Claim 13 , characterized in that the mirror surface areas (89) of the at least one exposure unit (50) are movable together. Exposure after Claim 13 or 14 , characterized in that the mirror surface regions (89) are subregions of a common mirror surface (84). Exposure system according to one of the Claims 13 to 15 , characterized in that the mirror surface areas (89) are flat surface areas. Exposure system according to one of the Claims 13 to 16 , characterized in that all the mirror surface areas (89) lie in a common plane, and in particular that the mirror surface areas (89) on which the collimated exposure beams (60) of the at least one exposure unit (50) impinge lie in the same plane. Exposure system according to one of the Claims 13 to 17 , characterized in that the mirror surface areas (89) are tiltable relative to the direction of impact of the collimated exposure beams (60). Exposure system according to one of the Claims 13 to 18 , characterized in that the deflection unit (70) has for each exposure beam (60) a plurality of successively inserted mirror surface regions (89). Exposure after Claim 19 , characterized in that the plurality of mirror surface regions (89) by peripheral sides of a about an axis (82) rotatably mounted mirror body (80) are formed. Exposure after Claim 20 , characterized in that the mirror body (80) is driven to rotate at a constant speed about its axis (82). Exposure after Claim 20 or 21 , characterized in that the mirror surface regions (89) are arranged at the same radial distance about the axis (82). Exposure system according to one of the preceding claims, characterized in that a plurality of exposure units (50) are provided, wherein the exposure units (50) in the deflection direction (74) are arranged at a distance from each other. Exposure after Claim 23 , characterized in that the deflection directions (74) of the plurality of exposure units (50) are substantially parallel to each other. Exposure after Claim 23 or 24 , characterized in that the row directions (53) of the plurality of exposure units (50) are substantially parallel to each other. Exposure system according to one of the Claims 23 to 25 , characterized in that the plurality of exposure units (50) are arranged with respect to a parallel to the feed direction (16) extending reference line (RGB) so that the reference line (RGB) the exposure spot (42) of the last exposure spot position of the last deflection distance (AS) one of Exposure beam sets (63a, 63b) of an exposure unit (50) and the exposure spot (42) of the first exposure spot position (90) of the first deflection path (AS) of the one exposure beam set (63a, 63b) corresponding exposure beam set (63a, 63b) of the next adjacent exposure beam unit (50) intersects. Exposure after Claim 26 , characterized in that the reference straight line (RGB) passing through the last exposure spot position (90) of one of the exposure ray sets (63a, 63b) of an exposure unit (50) exposes the exposure spot (42) of the first exposure spot position (90) of the first Deflection distance (AS) of the corresponding one of the exposure beam sets (63a, 63b) of a next adjacent exposure unit (50) intersects. Exposure after Claim 26 or 27 , characterized in that the first exposure spot position (90) has a distance from the reference line (RGB) which corresponds at most to half the diameter of the exposure spot (42) to the first exposure spot position (90) of the corresponding exposure beam set (63a, 63b). Exposure according to the generic term of Claim 1 or according to one of the preceding claims, characterized in that a separate radiation source (110) is provided for each exposure beam (66a, 66b). Exposure according to the generic term of Claim 1 or after Claim 29 , characterized in that the radiation source (110) is a laser (113), in particular a semiconductor laser. Exposure system according to one of the preceding claims, characterized in that each of the radiation sources (110) is provided with its own beam-shaping optics (58) for the exiting radiation. Exposure after Claim 31 , characterized in that a beam-shaping optical system (58) is provided for each exposure beam (60). Exposure after Claim 31 or 32 , characterized in that the beam shaping optics (58) for the exposure beams of each exposure beam set (63a, 63b) are identical. Exposure system according to one of the Claims 31 to 33 , characterized in that the beam-shaping optics (58) are anamorphic. Exposure after Claim 34 , characterized in that the beam-shaping optics (58) are formed anamorphic such that the exposure spots are substantially round, in particular rotationally symmetrical. Exposure system according to one of the preceding claims, characterized in that a separate focusing optics (104) is provided for each exposure beam (66λ, 66b). Exposure after Claim 33 , characterized in that the focusing optics (104) for the exposure beams (66λ, b) of the respective exposure beam set (63a, 63b) are identical. Exposure system according to one of the Claims 29 to 35 , characterized in that the radiation sources (110a, 110b) for each of the exposure ray sets (63a, 63b) are each arranged in a row (112a, 112b) and in that the rows (112a, 112b) of the radiation sources (110a, 110b) are spaced apart are arranged from each other. Exposure after Claim 38 , characterized in that the rows (112a, 112b) of the radiation sources (110a, 110b) are parallel to each other. Exposure after Claim 38 or 39 , characterized in that the rows (112a, 112b) are parallel to the row direction (53). Exposure system according to one of the Claims 38 to 40 , characterized in that the exposure beams (60a, 60b) of the exposure beam sets (63a, 63b) are deflected by at least one deflection unit (62) into a common propagation plane. Exposure after Claim 41 , characterized in that the at least one deflecting unit (62) is formed by a deflection comb (114) for the exposure beams (60a, 60b) of one of the exposure beam sets.

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