DE102016208929A1 - Arrangement and lithography system - Google Patents

Abstract

Disclosed is an arrangement (200) for an optical device, in particular a lithography system (100), which has a flexible element (202), wherein the flexible element (202) comprises an amorphous metal (204).

Description

The present invention relates to an arrangement for an optical device and a lithography system.

Lithography is used to fabricate micro- and nanostructured devices such as integrated circuits. The lithography process is performed with a lithography system having an illumination system and a projection system. The image of a mask (reticle) illuminated by means of the illumination system is projected by the projection system onto a substrate (eg a silicon wafer) coated with a photosensitive layer (photoresist) and arranged in the image plane of the projection system in order to apply the mask structure to the photosensitive layer Transfer coating of the substrate.

Driven by the quest for ever smaller structures in the manufacture of integrated circuits, EUV lithography systems are currently being developed which use light having a wavelength in the range of 0.1 nm to 30 nm, in particular 13.5 nm. In such EUV lithography equipment, because of the high absorption of most materials of light of this wavelength, reflective optics, that is, mirrors, must be used instead of - as before - refractive optics, that is, lenses.

The mirrors can z. B. on a support frame (English: force frame) and at least partially designed to be manipulated to allow movement of a respective mirror in up to six degrees of freedom and thus a highly accurate positioning of the mirror to each other. As the mirrors become larger and heavier as the resolving power of the lithography equipment increases, the requirements for the arrangements used in the storage and positioning of the mirrors increase.

Against this background, an object of the present invention is to provide an improved arrangement for an optical device and an improved lithography system.

Accordingly, an arrangement for an optical device, in particular a lithography system, is provided, which has a flexible element, wherein the flexible element comprises an amorphous metal.

By including or consisting of an amorphous metal, the flexible element can achieve greater elastic strain and stress than when the flexible element comprises a conventional metal or alloy. This can be achieved that due to the higher elasticity less forces are exerted on, for example, an optical element. It can also be achieved that an actuator must use less force to deform the flexible element. In addition, amorphous metal is much more stable than metals or alloys due to the large possible mechanical stress up to the breaking stress.

Amorphous metals are metal or metal-and-non-metal alloys, which at the atomic level have no crystalline, but an amorphous structure and still show metallic conductivity. There is no long-range order between the atoms, but at most a close-up order. Due to the amorphous arrangement of atoms unique physical properties arise. Amorphous metals are harder, more corrosion resistant, and stronger than ordinary metals or alloys.

Alternatively, amorphous metal is also referred to as amorphous alloy, liquid metal or metallic glass (BMG).

The flexible element comprises or consists entirely of amorphous metal. Since amorphous metal is up to about 2% elongation, i. Increasing a length of the amorphous metal by 2%, is elastically deformable, the flexible element is flexible, i. elastically deformable.

According to one embodiment of the arrangement, a thickness of the amorphous metal is in the range of 0.1 mm to 25 mm, 0.1 mm to 15 mm or 1 mm to 10 mm. The length of the amorphous metal may be in the range of 5 mm to 50 mm. Further, in the case of a cylindrical shape of the amorphous metal, the thickness corresponds to the diameter of the cylinder. In the case of a cuboid geometry, the thickness of the amorphous metal corresponds to the width or height of the cuboid. In particular, the width may be in the range of 0.1 mm to 2 mm and the height in the range of 0.5 mm to 25 mm. Amorphous metals are cooled down fast enough during production to prevent crystallization. To produce amorphous metals greater than 0.1 mm thick, those materials may be used in which the cooling rate necessary to prevent crystallization is in the range of 1 to 20 K / s (Kelvin per second), 1 to 10 K / s or 1 to 5 K / s. At these cooling rates, thicknesses greater than 0.1 mm can be achieved.

According to a further embodiment of the arrangement, the amorphous metal has at least two different metals, in particular two to ten, two to six or two to four different metals, up. From metals that consist of only one element of the periodic table, it is not possible to produce an amorphous metal, because the mobility of the atoms down to low temperatures is so high that the crystallization always begins. In contrast, amorphous metals can be made from two or more metals.

According to a further embodiment of the arrangement, the amorphous metal has a first element of the periodic system having a first atomic size, a second element of the periodic system having a second atomic size and a third element of the periodic system having a third atomic size, wherein the first atomic size, the second atomic size and the third atomic size differ. In addition, the first element of the periodic table can be, in particular, iron, chromium or manganese, the second element of the periodic table, in particular a refractory metal, in particular molybdenum, and the third element of the periodic table, in particular carbon or boron.

By using three or more different elements of the periodic table, crystallization results in a complex crystal structure.

Cooling rates of only a few Kelvin per second are enough to suppress crystallization.

Refractory metals are the high-melting, base metals of the 4th subgroup (titanium, zirconium and hafnium), the 5th subgroup (vanadium, niobium and tantalum) and the 6th subgroup (chromium, molybdenum and tungsten). Refractory metals have a larger atomic size than iron, chromium and manganese. Iron, chromium and manganese in turn have a larger atomic size than carbon and boron.

According to a further embodiment of the arrangement, the amorphous metal has between 1% and 5% or 1% and 2% of rare earth metals, in particular yttrium or erbium. Furthermore, the amorphous metal may have a glass former, in particular boron or phosphorus. Advantageously, the complexity of the crystal structure can be further increased by the rare earth metals or the glass former. Thereby, a reduction of the required cooling rates to prevent crystallization can be achieved. In the present application, all indices, such as Fe ₈₀ , and percentages, such as 2%, refer to at.% (English: atomic percent), unless stated otherwise, such as for example below in terms of volume.

According to a further embodiment of the arrangement, the amorphous metal is between 10% and 80%, between 10% and 50% or between 10% and 30% of the volume of crystallites. Advantageously, so the breaking behavior of the amorphous metal can be improved, i. the amorphous metal does not break so fast.

According to a further embodiment of the arrangement, the amorphous metal of the flexible element is produced in a casting process. In contrast to conventional metals, amorphous metals do not abruptly solidify on solidification, since no phase transition of the first order takes place when solidifying amorphous metals. When the melt of an amorphous metal fills a mold, it retains this shape as it solidifies. Advantageously, the amorphous metal can thus be produced in a casting process of any shape.

According to a further embodiment of the arrangement, this further comprises an actuator and an optical element, and the flexible element is a coupling element for coupling the actuator to the optical element. Advantageously, the coupling element comprises or consists of the amorphous metal. Accordingly, the coupling element is suitable for a large mechanical stress, for example due to a high weight of the optical element. Further, because of the amorphous metal, the coupling element is up to 2% of the expansion elastic, so that manufacturing tolerances or temperature tolerances of the arrangement as well as shock loads to which the coupling element may be exposed can be well compensated. In addition, the coupling element has a low stiffness because of the high elasticity. Thus, an action of the coupling element due to disturbing forces on the optical element can be minimized.

According to a further embodiment of the arrangement, the flexible element has a first leaf spring, a second leaf spring and a connecting portion, which is arranged between the first leaf spring and the second leaf spring, wherein the two leaf springs are arranged in particular perpendicular to each other. With this structure of the flexible member, the flexible member can be suitably used as a coupling member. Characterized in that the two leaf springs are aligned perpendicular to each other, the flexible element can be tilted in two mutually orthogonal directions.

According to a further embodiment of the arrangement, the arrangement further comprises a rod, a first flexible element and a second flexible element. In this case, the first flexible element with the optical element and the rod and the second flexible element with the rod and with the Actuator connected. The first flexible element or the second flexible element or the first and the second flexible element may have all the features and characteristics of the above-described flexible element.

According to a further embodiment of the arrangement, the latter furthermore has a first component and a second component, wherein the flexible element has a spring which connects the first component to the second component. The spring may comprise or consist entirely of amorphous metal. By means of the spring, the transmission of reaction forces or vibrations between the components can be minimized. The spring has a low stiffness due to the amorphous metal. Thus, a low-frequency decoupling less than 150 Hz, for example in the range of 5 Hz to 20 Hz, 20 Hz to 40 Hz or 40 Hz to 100 Hz, can be achieved. Further, the spring has a large elastic deformability due to the amorphous metal. This elastic deformability is particularly advantageous for impact loads.

According to a further embodiment of the arrangement, the spring is a leaf spring or a spiral spring. Advantageously, different configurations of the spring can be used. In particular, the spring can also be formed as a system of several individual springs.

According to a further embodiment of the arrangement, the arrangement comprises an optical element and the flexible element is an end stop for limiting a deflection of the optical element. Due to the amorphous metal, the flexible element is suitable for limiting the deflection. The amorphous metal is harder than crystalline metal and has a high strength, but small deformations up to 2% are purely elastic. Therefore, an amorphous metal end stop is suitable for high mechanical stress due to a heavy optical element.

According to a further embodiment of the arrangement, the arrangement has a facet of a facet mirror and the flexible element is a bending device for tilting the facet. Advantageously, the bending device comprises or consists of the amorphous metal. The amorphous metal has a large specific strength (unit: MPa · cm ³ / g). Therefore, it is particularly suitable for use in the limited space below the facet. Thus, a bending device can be realized, which can be arranged completely below the facet.

Furthermore, a lithography system, in particular EUV or DUV lithography system, with an arrangement as described above, is provided. EUV stands for "extreme ultraviolet" and denotes a working light wavelength between 0.1 and 30 nm. DUV stands for "deep ultraviolet" and denotes a working light wavelength between 30 and 250 nm.

The embodiments and features described for the proposed arrangement apply to the proposed lithographic system accordingly and vice versa.

Further possible implementations of the invention also include not explicitly mentioned combinations of features or embodiments described above or below with regard to the exemplary embodiments. The skilled person will also add individual aspects as improvements or additions to the respective basic form of the invention.

Further advantageous embodiments and aspects of the invention are the subject of the dependent claims and the embodiments of the invention described below. Furthermore, the invention will be explained in more detail by means of preferred embodiments with reference to the attached figures.

1A shows a schematic view of an EUV lithography system;

1B shows a schematic view of a DUV lithography system;

2 shows an arrangement according to an embodiment;

3 shows a perspective view of the area III 2 ;

4A shows a perspective view of the area IVA 3 ;

4B shows a perspective view of an in 4A illustrated leaf spring;

5 shows an arrangement according to another embodiment;

6 shows an arrangement according to another embodiment;

7 shows an arrangement according to another embodiment; and

8th shows an arrangement according to another embodiment.

Unless otherwise indicated, like reference numerals in the figures denote like or functionally identical elements. It should also be noted that the illustrations in the figures are not necessarily to scale.

1A shows a schematic view of an EUV lithography system 100A which is a beam shaping and illumination system 102 and a projection system 104 includes. EUV stands for "extreme ultraviolet" (Engl.: Extreme ultraviolet, EUV) and refers to a working light wavelength between 0.1 and 30 nm. The beam shaping and illumination system 102 and the projection system 104 are each provided in a vacuum housing, wherein each vacuum housing is evacuated by means of an evacuation device, not shown. The vacuum housings are surrounded by a machine room, not shown, in which the drive devices are provided for the mechanical method or adjustment of the optical elements. Furthermore, electrical controls and the like may be provided in this engine room.

The EUV lithography system 100A has an EUV light source 106A on. As an EUV light source 106A For example, a plasma source or a synchrotron can be provided, which radiation 108A in the EUV area. In the beam-forming and lighting system 102 becomes the EUV radiation 108A bundled and the desired operating wavelength from the EUV radiation 108A filtered out. The from the EUV light source 106A generated EUV radiation 108A has a relatively low transmissivity by air, which is why the beam guiding spaces in the beam-forming and lighting system 102 and in the projection system 104 are evacuated.

This in 1A illustrated beam shaping and illumination system 102 has five mirrors 110 . 112 . 114 . 116 . 118 on. After passing through the beam shaping and lighting system 102 becomes the EUV radiation 108A on the photomask (English: reticle) 120 directed. The photomask 120 is also designed as a reflective optical element and can be outside the systems 102 . 104 be arranged. Next, the EUV radiation 108A by means of a mirror 136 on the photomask 120 be steered. The photomask 120 has a structure which, by means of the projection system 104 reduced to a wafer 122 or the like is mapped.

The projection system 104 For example, there are six mirrors M1-M6 for imaging the photomask 120 on the wafer 122 on. In this case, individual mirrors M1-M6 of the projection system 104 symmetrical to the optical axis 124 of the projection system 104 be arranged. It should be noted that the number of mirrors of the EUV lithography system 100A is not limited to the number shown. It can also be provided more or less mirror. Furthermore, the mirrors are usually curved at the front for beam shaping.

1B shows a schematic view of a DUV lithography system 100B which is a beam shaping and illumination system 102 and a projection system 104 includes. DUV stands for "deep ultraviolet" (English: deep ultraviolet, DUV) and refers to a wavelength of working light between 30 and 250 nm. The beam shaping and illumination system 102 and the projection system 104 are surrounded by a machine room, not shown, in which the drive devices are provided for the mechanical method or adjustment of the optical elements. The DUV lithography system 100B also has a control device 126 for controlling various components of the DUV lithography system 100B on. In this case, the control device 126 with the beam shaping and illumination system 102 , a DUV light source 106B , a holder 128 the photomask 120 (English: reticle stage) and a holder 130 of the wafer 122 (Engl .: wafer stage) connected.

The DUV lithography system 100B has a DUV light source 106B on. As a DUV light source 106B For example, an ArF excimer laser can be provided, which radiation 108B emitted in the DUV range at 193 nm.

This in 1B illustrated beam shaping and illumination system 102 directs the DUV radiation 108B on a photomask 120 , The photomask 120 is designed as a transmissive optical element and can be outside the systems 102 . 104 be arranged. The photomask 120 has a structure which, by means of the projection system 104 reduced to a wafer 122 or the like is mapped.

The projection system 104 has several lenses 132 and / or mirrors 134 for imaging the photomask 120 on the wafer 122 on. This can be individual lenses 132 and / or mirrors 134 of the projection system 104 symmetrical to the optical axis 124 of the projection system 104 be arranged. It should be noted that the number of lenses and mirrors of the DUV lithography system 100B is not limited to the number shown. There may also be more or fewer lenses and / or mirrors. In particular, the beamforming and illumination system 102 the DUV lithography system 100B several lenses and / or mirrors. Furthermore, the mirrors are usually curved at the front for beam shaping.

The arrangements described below 200 are described by way of example for use in a lithography system. However, the arrangements described below 200 also be used in other optical devices, such as an electron beam microscope.

arrangements 200 are exemplified below for the mirror M6 of the EUV lithography system 100A described. The arrangements 200 However, they can be used with all optical elements of the EUV lithography system 100A or the DUV lithography system 100B be used. The arrangements 200 can therefore also for other components of a lithography system 100 be provided as a mirror. This applies, for example, lenses 132 , the holder of the photomask 120 or the holder of the wafer 122 ,

2 shows an arrangement 200 according to an embodiment. The order 200 has two flexible elements 202 on, being the flexible elements 202 wholly or partly made of amorphous metal 204 consist. Next, the arrangement 200 an optical element 206 For example, the mirror M6 or a facet of the mirror M6, a rod 208 and an actor 210 on.

The first flexible elements 212 is the first coupling element 214 for connecting the rod 208 with the optical element 206 educated. The second flexible element 216 is as a second coupling element 218 for connecting the rod 208 with the actor 210 educated. The rod 208 has a rod axis S.

Alternatively, it could just be a flexible element 202 ie a coupling element 214 . 218 , be provided. In this case, the staff is 208 either directly with the actuator 210 or directly with the optical element 206 connected.

Next, the first coupling element 214 via an adapter 220 with the optical element 206 be connected. Likewise, the second coupling element 218 via an adapter 222 with the actor 210 be connected.

The actor 210 has a moving part 224 and a stationary part 226 on. The moving part 224 is with the adapter 222 connected. The stationary part 226 is with a base 228 connected. For example, in the moving and in the stationary part 224 . 226 be integrated multiple permanent magnets and / or coils.

The coupling elements 214 . 218 each have a first leaf spring 230 , a second leaf spring 232 and a connection section 234 on. In this case, the connection section connects 234 the first leaf spring 230 with the second leaf spring 232 , Next, the first leaf spring 230 and the second leaf spring 232 be aligned perpendicular to each other.

3 shows a perspective view of the area III 2 , You can see the first coupling element 214 , the second coupling element 218 and the staff 208 ,

An arrangement 200 In an alternative, only the flexible element can be used 202 , so for example one of the coupling elements 214 . 218 , exhibit. There is the flexible element 202 completely or partially made of amorphous metal 204 ,

4A shows a perspective view of the area IVA 3 , Shown are the adapter 220 , the first flexible element 212 , So the first coupling element 214 , and part of the staff 208 , The first leaf spring 230 is over the connecting section 234 with the second leaf spring 232 connected.

The first leaf spring 230 is perpendicular to the second leaf spring 232 arranged. Next, the first leaf spring 230 be bent around a bending axis R and the second leaf spring 232 can be bent around a bending axis T. This allows the coupling element 214 to tilt two orthogonal axes R, T.

The coupling element 214 ie the flexible element 202 , completely made of amorphous metal 204 consist. Alternatively, only one or both of the leaf springs can be used 230 . 232 made of amorphous metal 204 consist. In a further alternative, only a certain percentage of the flexible element may be used 202 made of amorphous metal 204 consist.

The amorphous metal 204 may have a thickness D in the range of 0.1 mm to 25 mm, 0.1 mm to 15 mm or 1 mm to 10 mm. The thicker the amorphous metal 204 The more difficult it is crystallization during cooling of the amorphous metal 204 to prevent in the production.

The flexible element 202 can in a casting process of amorphous metal 204 getting produced. This can be done easily in the 4A shown complicated structure of the flexible element 202 getting produced. Advantageously, amorphous metal does not change its extent in the transition from the liquid state to the solid state. Alternatively, the flexible element 202 be made by milling or eroding the target geometry of a cast semi-finished amorphous metal.

4B shows a perspective view of in 4A illustrated leaf spring 230 , The leaf spring 230 has two opposite broad sides 400 . 402 as well as four narrow sides 404 . 406 . 408 . 410 on. The opposite long narrow sides 404 . 408 point in the direction of the rod axis S (in undeflected state of the optical element 206 ). The short narrow sides 406 . 410 pointing in the direction of the bending axis R. The opposite broad sides 400 . 402 pointing in the direction of the bending axis T. The same applies to the leaf spring 232 ,

The narrow side 404 is with the adapter 220 connected. In contrast, the narrow side 408 with the connecting section 234 connected.

The leaf springs 230 . 232 may be integral or non-integral with the connecting portion 234 be educated. Advantageously, at least the leaf springs 230 . 232 made of amorphous metal 204 ,

The amorphous metal 204 may for example consist of or include the materials mentioned below. Examples are AuIn ₂ , Fe ₈₀ B ₂₀ and PdCuNiP.

The amorphous metal 204 For example, the glass formers may include boron, silicon and / or phosphorus and the metals iron, cobalt and / or nickel and may be magnetic. In particular, the amorphous metal 204 In the case of non-dominance of cobalt, be magnetically soft, ie have a low coercive force, and at the same time have a high electrical resistance.

Next can be the amorphous metal 204 between 1% and 5%, between 1% and 3% or between 1% and 2% of rare earth metals, for example yttrium or erbium.

Further, the amorphous metal may include cobalt (Co), boron (B), iron (Fe), molybdenum (Mo), nickel (Ni), and silicon (Si). Further combinations are zirconium (Zr), titanium (Ti), neodymium (Nb), nickel (Ni), copper (Cu) and aluminum (Al) or zirconium (Zr), aluminum (Al), nickel (Ni), copper ( Cu) and palladium (Pd), approximately in the composition Zr ₄₄ Al ₁₀ Ni ₁₀ Cu ₃₀ Pd ₆ .

Amorphous metals may also be based on titanium (Ti), zirconium (Zr) and beryllium (Be), such as Zr _41.2 Ti _13.8 Cu _12.5 Ni ₁₀ Be _22.5 .

It is also possible to combine the following elements of the Periodic Table (Fe, Ni and / or Co), (Zr, Nb, Ta, Hf, Mo, Ti, V, Cr and / or W), (Al, Si, C and / or P), B. Another possible combination is (Fe, Ni and / or Co), (B, C and / or P), (Si, Al and / or Ge) with Ti, V, Cr, Mn, Cu, Zr , Nb, Mo, Ta and / or W or with In, Sn, Sb and / or Pb. Conceivable combinations are also Re, Hf, O or Re, Ir, Nb.

In particular, the amorphous metal 204 at least two different metals, in particular two to ten, two to six or two to four different metals, on.

The more complex the crystal structure of the material of the amorphous metal 204 is, the easier it is to prevent crystallization. For this reason, the amorphous metal may have three or more different elements of the periodic table with different atomic sizes. For example, the amorphous metal may comprise iron, chromium and / or manganese having medium atomic sizes, refractory metals such as molybdenum having large atomic sizes, and atomically small elements such as carbon and / or boron.

In particular, the amorphous metal can also be used in the composition Zr _52.5 Ti ₅ Cu _17.9 Ni _14.6 Al ₁₀ .

Alternatively, the amorphous metal 204 partly consist of crystallites. In particular, 10% to 80%, 10% to 50% or 10% to 30% of the volume of the amorphous metal 204 consist of crystallites. This allows the breaking behavior of the amorphous metals 204 improve.

5 shows an arrangement 200 according to another embodiment. The order 200 has a flexible element 202 , a first component 500 and a second component 502 on. The flexible element 202 is as a spring 504 formed and consists entirely or partially of amorphous metal 204 , The second component 502 can as a support frame 506 a lithography system 100 be formed which with a base 508 connected is. The feather 504 connects the first component 500 with the second component 502 ,

An actor 210 applies a force to an optical element 206 , For example, the mirror M6, from. Because of "actio = reactio" the actor 210 a corresponding counterforce on one with the actuator 210 connected holding frame 506 exercise. To suppress this reaction force is a mechanical filter in the form of a system of spring 504 and component 500 on the force path between the optical element 206 and the support frame 506 used.

A feather 504 the completely or partially amorphous metal 204 is because of the low rigidity of the amorphous metal 204 well suited to low-frequency decoupling too to reach. The decoupling can be achieved in particular in a range of 5 Hz to 20 Hz, 20 Hz to 30 Hz, 30 Hz to 80 Hz or 80 Hz to 100 Hz. Further, due to the elastic deformability of the amorphous metal 204 Shock loads are well intercepted.

The feather 504 can have any shape. In particular, the spring 504 be designed as a leaf spring or as a spiral spring.

6 shows an arrangement 200 according to another embodiment. The order 200 has a flexible element 202 , a first component 500 and a second component 502 on. The flexible element 202 is as a spring 504 formed and consists entirely or partially of amorphous metal 204 , This is the first component 500 and the spring 504 a vibration absorber. The mass of the first component 500 forms together with the spring 504 a pendulum, the natural frequency of which is to be eliminated oscillation frequency of the second component 502 is tuned. This shows the amorphous metal 204 the advantages for the spring described above 504 on.

7 shows an arrangement 200 according to another embodiment. The order 200 has two flexible elements 202 and an optical element 206 on. The flexible elements 202 consist entirely or partially of amorphous metal 204 , Alternatively, any other number of flexible elements may be used 202 be used. Next are the flexible elements 202 each as an end stop 700 for limiting the deflection of the optical element 206 educated.

Every end stop 700 is with a base 702 connected. Next is a bending device 704 with the optical element 206 connected. The bending device 704 serves to tilt the optical element 206 , By means of the two end stop 700 can be the deflection of the optical element 206 be limited. Due to the elastic deformability of the amorphous metal 204 can every end stop 700 Intercept shock loads well. The optical element 206 is for example the mirror M6 or a facet of the mirror M6.

8th shows an arrangement 200 according to another embodiment. The order 200 has a facet 800 a faceted mirror and a flexible element 202 on. For example, the facet mirror of the mirror M6 of the EUV lithography system 100A be. The flexible element 202 is as a bending device 802 formed and consists entirely or partially of amorphous metal 204 ,

Due to the higher elasticity of the amorphous metal 204 Compared to metals with crystal structure is the amorphous metal 204 suitable to in the bending device 802 to be used.

Although the invention has been described with reference to various embodiments, it is by no means limited thereto, but variously modifiable.

LIST OF REFERENCE NUMBERS

100

lithography system

100A

EUV lithography system

100B

DUV lithography system

102

Beam shaping and lighting system

104

projection system

106A

EUV-light source

106B

DUV light source

108A

EUV radiation

108B

DUV radiation

110

mirror

112

mirror

114

mirror

116

mirror

118

mirror

120

photomask

122

wafer

124

optical axis of the projection system

126

control device

128

Holder of the photomask

130

Holder of the wafer

132

lens

134

mirror

136

mirror

200

arrangement

202

flexible element

204

amorphous metal

206

optical element

208

Rod

210

actuator

212

first flexible element

214

first coupling element

216

second flexible element

218

second coupling element

220

adapter

222

adapter

224

moving part of the actuator

226

stationary part of the actuator

228

Base

230

first leaf spring

232

second leaf spring

234

connecting portion

400

Broad side of the leaf spring

402

Broad side of the leaf spring

404

Narrow side of the leaf spring

406

Narrow side of the leaf spring

408

Narrow side of the leaf spring

410

Narrow side of the leaf spring

500

first component

502

second component

504

feather

506

holding frame

508

Base

700

end stop

702

Base

704

bender

800

facet

802

bender

M1-M6

 mirror

S

rod axis

R

bending axis

T

bending axis

D

thickness

Claims (15)

Arrangement ( 200 ) for an optical device, in particular a lithography system ( 100 ), comprising a flexible element ( 202 ), the flexible element ( 202 ) an amorphous metal ( 204 ). Arrangement according to claim 1, wherein a thickness (D) of the amorphous metal ( 204 ) in the range of 0.1 mm to 25 mm, 0.1 mm to 15 mm or 1 mm to 10 mm. Arrangement according to claim 1 or 2, wherein the amorphous metal ( 204 ) has at least two different metals, in particular two to ten, two to six or two to four different metals. Arrangement according to one of claims 1 to 3, wherein the amorphous metal ( 204 ) a first element of the periodic table having a first atomic size, a second element of the periodic table having a second atomic size and a third element of the periodic table having a third atomic size, wherein the first atomic size, the second atomic size and the third atomic size differ, and / or wherein the first element of the periodic table is in particular iron, chromium or manganese, the second element of the periodic table is in particular a refractory metal, in particular molybdenum, and the third element of the periodic table is in particular carbon or boron. Arrangement according to one of claims 1 to 4, wherein the amorphous metal ( 204 ) between 1% and 5% or 1% and 2% of rare earth metals, in particular yttrium or erbium, and / or wherein the amorphous metal ( 204 ) has a glass former, in particular boron or phosphorus. Arrangement according to one of claims 1 to 5, wherein the amorphous metal ( 204 ) between 10% and 80%, between 10% and 50%, or between 10% and 30% of the volume of crystallites. Arrangement according to one of claims 1 to 6, wherein the amorphous metal ( 204 ) of the flexible element ( 202 ) is produced in a casting process. Arrangement according to one of claims 1 to 7, wherein the arrangement ( 200 ) an actuator ( 210 ) and an optical element ( 206 ), and wherein the flexible element ( 202 ) a coupling element ( 214 . 218 ) for coupling the actuator ( 210 ) to the optical element ( 206 ). Arrangement according to claim 8, wherein the flexible element ( 202 ) a first leaf spring ( 230 ), a second leaf spring ( 232 ) and a connecting section ( 234 ), which between the first leaf spring ( 230 ) and the second leaf spring ( 232 ), wherein the two leaf springs ( 230 . 232 ) are arranged in particular perpendicular to each other. Arrangement according to claim 8 or 9, wherein the arrangement ( 200 ) also a rod ( 208 ), a first flexible element ( 212 ) and a second flexible element ( 216 ), and wherein the first flexible element ( 212 ) with the optical element ( 206 ) and the staff ( 208 ) and the second flexible element ( 216 ) with the rod ( 208 ) and with the actuator ( 210 ) connected is. Arrangement according to one of claims 1 to 7, further comprising a first component ( 500 ) and a second component ( 502 ), the flexible element ( 202 ) a feather ( 504 ), which the first component ( 500 ) with the second component ( 502 ) connects. Arrangement according to claim 11, wherein the spring ( 504 ) is a leaf spring or a coil spring. Arrangement according to one of claims 1 to 7, wherein the arrangement ( 200 ) an optical element ( 206 ) and the flexible element ( 202 ) an end stop ( 700 ) for limiting a deflection of the optical element ( 206 ). Arrangement according to one of claims 1 to 7, wherein the arrangement ( 200 ) a facet ( 800 ) of a facet mirror (M6) and the flexible element ( 202 ) a bending device ( 802 ) for tilting the facet ( 800 ). Lithography plant ( 100 ) with an arrangement ( 200 ) according to one of claims 1 to 14.

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