DE102014223454A1 - Beleuchtungsoptik zur Beleuchtung eines Beleuchtungsfeldes sowie Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik - Google Patents

Beleuchtungsoptik zur Beleuchtung eines Beleuchtungsfeldes sowie Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik Download PDF

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Publication number
DE102014223454A1
DE102014223454A1 DE102014223454.9A DE102014223454A DE102014223454A1 DE 102014223454 A1 DE102014223454 A1 DE 102014223454A1 DE 102014223454 A DE102014223454 A DE 102014223454A DE 102014223454 A1 DE102014223454 A1 DE 102014223454A1
Authority
DE
Germany
Prior art keywords
illumination
illumination light
mirrors
mirror assembly
illumination optics
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE102014223454.9A
Other languages
German (de)
English (en)
Inventor
Markus Degünther
Stig Bieling
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to DE102014223454.9A priority Critical patent/DE102014223454A1/de
Priority to PCT/EP2015/076185 priority patent/WO2016078964A1/en
Priority to TW104137851A priority patent/TWI687776B/zh
Publication of DE102014223454A1 publication Critical patent/DE102014223454A1/de
Withdrawn legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/702—Reflective illumination, i.e. reflective optical elements other than folding mirrors, e.g. extreme ultraviolet [EUV] illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE102014223454.9A 2014-11-18 2014-11-18 Beleuchtungsoptik zur Beleuchtung eines Beleuchtungsfeldes sowie Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik Withdrawn DE102014223454A1 (de)

Priority Applications (3)

Application Number Priority Date Filing Date Title
DE102014223454.9A DE102014223454A1 (de) 2014-11-18 2014-11-18 Beleuchtungsoptik zur Beleuchtung eines Beleuchtungsfeldes sowie Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik
PCT/EP2015/076185 WO2016078964A1 (en) 2014-11-18 2015-11-10 Illumination optical unit for illuminating an illumination field and projection exposure apparatus comprising such an illumination optical unit
TW104137851A TWI687776B (zh) 2014-11-18 2015-11-17 用以照明一照明場的照明光學單元以及包含此類照明光學單元的投射曝光裝置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102014223454.9A DE102014223454A1 (de) 2014-11-18 2014-11-18 Beleuchtungsoptik zur Beleuchtung eines Beleuchtungsfeldes sowie Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik

Publications (1)

Publication Number Publication Date
DE102014223454A1 true DE102014223454A1 (de) 2016-05-19

Family

ID=54542240

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102014223454.9A Withdrawn DE102014223454A1 (de) 2014-11-18 2014-11-18 Beleuchtungsoptik zur Beleuchtung eines Beleuchtungsfeldes sowie Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik

Country Status (3)

Country Link
DE (1) DE102014223454A1 (zh)
TW (1) TWI687776B (zh)
WO (1) WO2016078964A1 (zh)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08148415A (ja) * 1994-11-24 1996-06-07 Nikon Corp 照明装置及び露光装置
US20030095623A1 (en) 2001-08-10 2003-05-22 Wolfgang Singer Illumination system that suppresses debris from a ligh source
WO2004068564A1 (ja) * 2002-12-26 2004-08-12 Nikon Corporation 照明光学系、照明装置、投影露光装置、及び露光方法
US20050094764A1 (en) 2002-03-28 2005-05-05 Carl Zeiss Smt Ag Collector unit with a reflective element for illumination systems with a wavelength of smaller than 193 nm
US20050093041A1 (en) 2002-03-01 2005-05-05 Carl Zeiss Smt Ag Illumination system having a nested collector for annular illumination of an exit pupil
US20050207039A1 (en) 2002-02-01 2005-09-22 Carl Zeiss Smt Ag Optical element for forming an arc-shaped illumination field
US20050274897A1 (en) 2002-09-30 2005-12-15 Carl Zeiss Smt Ag And Asml Netherlands Illumination system for a wavelength of less than or equal to 193 nm, with sensors for determining an illumination
WO2010099807A1 (de) 2009-03-06 2010-09-10 Carl Zeiss Smt Ag Beleuchtungsoptik sowie optische systeme für die mikrolithographie

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6369906B2 (ja) * 2012-03-09 2018-08-08 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｅｕｖ投影リソグラフィのための照明光学ユニット及びそのような照明光学ユニットを含む光学系
DE102012209132A1 (de) * 2012-05-31 2013-12-05 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die Projektionslithographie

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH08148415A (ja) * 1994-11-24 1996-06-07 Nikon Corp 照明装置及び露光装置
US20030095623A1 (en) 2001-08-10 2003-05-22 Wolfgang Singer Illumination system that suppresses debris from a ligh source
US20050207039A1 (en) 2002-02-01 2005-09-22 Carl Zeiss Smt Ag Optical element for forming an arc-shaped illumination field
US20050093041A1 (en) 2002-03-01 2005-05-05 Carl Zeiss Smt Ag Illumination system having a nested collector for annular illumination of an exit pupil
US20050094764A1 (en) 2002-03-28 2005-05-05 Carl Zeiss Smt Ag Collector unit with a reflective element for illumination systems with a wavelength of smaller than 193 nm
US20050274897A1 (en) 2002-09-30 2005-12-15 Carl Zeiss Smt Ag And Asml Netherlands Illumination system for a wavelength of less than or equal to 193 nm, with sensors for determining an illumination
WO2004068564A1 (ja) * 2002-12-26 2004-08-12 Nikon Corporation 照明光学系、照明装置、投影露光装置、及び露光方法
WO2010099807A1 (de) 2009-03-06 2010-09-10 Carl Zeiss Smt Ag Beleuchtungsoptik sowie optische systeme für die mikrolithographie

Also Published As

Publication number Publication date
WO2016078964A1 (en) 2016-05-26
TW201626111A (zh) 2016-07-16
TWI687776B (zh) 2020-03-11

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R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee
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