DE102013101269A1 - Arrangement, useful for measuring coating properties during magnetron sputtering in strip and foil coating system, includes gas passage segments, and gauge with measuring heads, where number of heads corresponds to number of segments - Google Patents

Arrangement, useful for measuring coating properties during magnetron sputtering in strip and foil coating system, includes gas passage segments, and gauge with measuring heads, where number of heads corresponds to number of segments Download PDF

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DE102013101269A1
DE102013101269A1 DE201310101269 DE102013101269A DE102013101269A1 DE 102013101269 A1 DE102013101269 A1 DE 102013101269A1 DE 201310101269 DE201310101269 DE 201310101269 DE 102013101269 A DE102013101269 A DE 102013101269A DE 102013101269 A1 DE102013101269 A1 DE 102013101269A1
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substrate
measuring
gas channel
gas passage
segments
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DE102013101269B4 (en
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Holger Pröhl
Ronny Borchel
Jochen Krause
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Von Ardenne Asset GmbH and Co KG
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Von Ardenne Anlagentechnik GmbH
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process

Abstract

The arrangement comprises a vacuum chamber, a device configured to convey or guide a substrate (5) on a substrate guide line in a conveying direction (2), gas passage segments (12), and a gauge with measuring heads (4), which fixedly arranged on the vacuum chamber with respect to the gas passage segments. A number of the measuring heads corresponds to a number of the gas passage segments. The gas passage segments transversely extend to the substrate guide line transverse to the conveying direction, and are located transverse to an axial longitudinal extent of the vacuum coating system. The arrangement comprises a vacuum chamber, a device configured to convey or guide a substrate (5) on a substrate guide line in a conveying direction (2), gas passage segments (12), and a gauge with measuring heads (4), which fixedly arranged on the vacuum chamber with respect to the gas passage segments. A number of the measuring heads corresponds to a number of the gas passage segments. The gas passage segments transversely extend to the substrate guide line transverse to the conveying direction, and are located transverse to an axial longitudinal extent of the vacuum coating system. The gauge is arranged transverse to the substrate guiding line. The gas passage segments are arranged in the conveying direction. The measuring heads are configured to measure transmission, reflection and/or sheet resistance of coatings. A deviation from a center of the gas passage segment is +- 30%. A spectrometer is provided for measurement of the transmission properties of coatings on the substrate are arranged spectrometer, and non-contact sensors are provided for measurement of sheet resistance. An independent claim is included for a process for measurement of coating properties during magnetron sputtering in a vacuum coating apparatus.

Description

Die Erfindung betrifft eine Anordnung zur Messung von Schichteigenschaften beim Magnetronsputtern in einer Vakuumbeschichtungsanlage mit einem Vakuumraum, einer Substrattransporteinrichtung, mit der ein Substrat auf einer Substratführungslinie in einer Transportrichtung transportiert und geführt wird, Gaskanalsegmenten mit je einem Gaseinlass in die Vakuumkammer, sowie einem Messbalken mit Messköpfen welche ortsfest zur Vakuumkammer angeordnet sind, wobei die Gaskanalsegmente sich quer zur Substratführungslinie, quer zur Transportrichtung und quer zur axialen Längserstreckung der Vakuumbeschichtungsanlage befinden und der Messbalken mit Messköpfen quer zur Substratführungslinie und in Transportrichtung hinter den Gaskanalsegmenten angeordnet ist. The invention relates to an arrangement for measuring layer properties in magnetron sputtering in a vacuum coating system with a vacuum space, a substrate transport device, with which a substrate is transported and guided on a substrate guide line in a transport direction, gas channel segments, each with a gas inlet into the vacuum chamber, and a measuring beam with measuring heads which are arranged stationary to the vacuum chamber, wherein the gas channel segments are transverse to the substrate guide line, transverse to the transport direction and transverse to the axial longitudinal extent of the vacuum coating system and the measuring beam is arranged with measuring heads transversely to the Substratführungslinie and in the transport direction behind the gas channel segments.

Die Erfindung betrifft weiterhin ein Verfahren, welches die erfindungsgemäße Anordnung nutzt. The invention further relates to a method which uses the arrangement according to the invention.

Die Erfindung liegt auf dem Gebiet des allgemeinen Magnetronsputterns. Beim Magnetronsputtern wird im Prozessgas zwischen dem zu beschichtenden Substrat und einer Magnetronkathode ein Plasma gezündet, dessen positive Ladungsträger durch den sogenannten Sputtereffekt die Atome oder Moleküle aus der Oberfläche eines Targets herauslösen und in die Gasphase überführen. Diese Teilchen können je nach verwendetem Reaktivgas mit demselben reagieren (reaktives oder keramisches Sputtern). Treffen die Dampfteilchen auf das Substrat, beginnen sie durch Kondensation auf der Oberfläche eine Schicht zu bilden. In Abhängigkeit von der Plasmadichte im Prozessraum und der Prozessgaszufuhr lassen sich die Schichteigenschaften auf einem zu beschichtenden Substrat beeinflussen. The invention is in the field of general magnetron sputtering. In magnetron sputtering, a plasma is ignited in the process gas between the substrate to be coated and a magnetron cathode whose positive charge carriers dissolve the atoms or molecules out of the surface of a target by means of the so-called sputtering effect and transfer it into the gas phase. These particles can react with the same depending on the reactive gas used (reactive or ceramic sputtering). When the vapor particles hit the substrate, they start to form a layer by condensation on the surface. Depending on the plasma density in the process chamber and the process gas supply, the layer properties on a substrate to be coated can be influenced.

Um die Abscheidung einer Schicht mit gleichbleibenden Parametern zu gewährleisten, ist es erforderlich, den Arbeitspunkt des Beschichtungsvorgangs konstant zu halten. Insbesondere für Schichteigenschaften, wie die Homogenität, die Zusammensetzung und der Schichtwiderstand ist die Stabilität der Beschichtungsparameter entscheidend. Da der Sputterprozess ein dynamischer Prozess ist, der sich zeitlich verändert, muss der Prozess kontinuierlich überwacht und eingestellt werden. In order to ensure the deposition of a layer with constant parameters, it is necessary to keep the operating point of the coating process constant. In particular for layer properties, such as homogeneity, composition and sheet resistance, the stability of the coating parameters is crucial. Since the sputtering process is a dynamic process that changes over time, the process must be continuously monitored and adjusted.

Vor allem bei der Beschichtung von Glas, Metallband oder Folien spielt die kontinuierliche Überwachung der Eigenschaften der abgeschiedenen Schicht, wie Transmission und Schichtwiderstand, eine wichtig Rolle, um, für den entsprechenden Verwendungszweck der Substrate, optimale Eigenschaften herzustellen. Especially in the coating of glass, metal strip or foils, the continuous monitoring of the properties of the deposited layer, such as transmission and sheet resistance, plays an important role in producing optimum properties for the corresponding intended use of the substrates.

Im bisherigen Stand der Technik ist es möglich, auf den durch die Vakuumbeschichtungsanlage durchlaufenden Substraten auf bis zu drei festen Messspuren die Schichteigenschaften in Bezug auf Transmission und/oder Schichtwiderstand und/oder Reflexion zu messen. Dabei befindet sich eine Messspur für die Transmissionsmessung quer zur Substratführungslinie und quer zur Transportrichtung mittig auf dem Substrat. Je eine weitere Messspur ist an den Substrataußenbereichen möglich. Bei Anwendung in Glasbeschichtungsanlagen weisen sie einen Abstand von 550 mm vom linken und rechten Rand des Substrates in Transportrichtung des Substrates gesehen, auf. In the prior art, it is possible to measure on the passing through the vacuum coating system substrates on up to three solid measuring tracks, the layer properties in terms of transmission and / or sheet resistance and / or reflection. In this case, there is a measuring track for the transmission measurement transversely to the substrate guide line and transversely to the transport direction centered on the substrate. A further measuring track is possible at the outer substrate areas. When used in glass coating equipment, they have a distance of 550 mm from the left and right edges of the substrate seen in the transport direction of the substrate on.

Bei der optischen Messung zur Bestimmung der Transmissionseigenschaften der abgeschiedenen Schicht wird ein Spektrometer verwendet. Dabei sind der Sender und der Empfänger unterhalb der Substratebene und der Reflektor oberhalb der Substratebene angeordnet. Für die Widerstandsmessung ist mittig auf dem Substrat parallel neben der Messspur für die Transmissionsmessung eine Messspur angeordnet, wobei die Messung mit einem Messsystem auf der Basis des Wirbelstromprinzips durchgeführt wird. In the optical measurement for determining the transmission properties of the deposited layer, a spectrometer is used. In this case, the transmitter and the receiver are arranged below the substrate plane and the reflector above the substrate plane. For the resistance measurement, a measuring track is arranged in the middle of the substrate parallel to the measurement track for the transmission measurement, wherein the measurement is carried out with a measuring system based on the eddy current principle.

Der bisher verwendete Messbalken weist Halterungen zur Befestigung der Messköpfe auf, die fest konfektioniert sind. Damit sind die Anzahl und die Position der Messköpfe fest vorgegeben. The measuring beam previously used has holders for fixing the measuring heads, which are firmly assembled. Thus, the number and the position of the measuring heads are fixed.

Die Nachteile aus dem bisherigen Stand der Technik sind die geringe Auswahlmöglichkeit der Messpositionen, an denen die Schichteigenschaften bestimmt werden können, sowie die geringe Flexibilität genau an den Stellen die Schichteigenschaften messen zu können, die durch unterschiedliche Prozessbedingungen besonders zu überwachen sind. The disadvantages of the prior art are the low choice of measuring positions at which the layer properties can be determined, as well as the low flexibility to be able to measure precisely at the points the layer properties, which are to be monitored by different process conditions.

Daher ist es die Aufgabe der Erfindung eine Anordnung von Messpositionen innerhalb der Vakuumbeschichtungsanlage zur Verfügung zu stellen, um die vorbenannten Nachteile zu vermeiden und eine homogene Einstellung der Schichteigenschaften zu ermöglichen. Therefore, it is the object of the invention to provide an arrangement of measuring positions within the vacuum coating system in order to avoid the aforementioned disadvantages and to enable a homogeneous adjustment of the layer properties.

Die Aufgabe wird anordnungsseitig dadurch gelöst, dass die Anzahl der Messköpfe zumindest der Anzahl der Gaskanalsegmente entspricht und jeder Messkopf auf dem Messbalken ortsfest zur Vakuumkammer mittig zu jedem zugehörigen Gaskanalsegment angeordnet ist. Dies hat den Vorteil, dass durch die Messung auf dem Substrat direkt gegenüber dem Bereich der Gaskanalsegmente zur Zuführung des Prozessgases die Schichteigenschaften bestimmt werden können und damit eine genaue und gezielte Beeinflussung der Schichteigenschaften durch die Steuerung der Prozessgasflüsse möglich ist. The object is achieved on the arrangement side, in that the number of measuring heads corresponds at least to the number of gas channel segments and each measuring head is arranged on the measuring bar stationary relative to the vacuum chamber in the middle of each associated gas channel segment. This has the advantage that the layer properties can be determined by the measurement on the substrate directly opposite the region of the gas channel segments for supplying the process gas and thus an accurate and targeted influencing of the layer properties by the control of the process gas flows is possible.

Die angeordneten Messköpfe sind zur Transmissions-, Reflexions- und/oder Schichtwiderstandsmessung (T, R, Rs) ausgebildet und es können somit die wesentlichen Schichteigenschaften gemessen werden. The arranged measuring heads are designed for transmission, reflection and / or sheet resistance measurement (T, R, Rs) and thus the essential layer properties can be measured.

Um diese Schichteigenschaften auf einem zu beschichtenden Substrat messen zu können, sind auf dem Substrat Transmissions-, Reflexions- und/oder Schichtwiderstandsmessspuren quer zur Substratführungslinie in Transportrichtung des Substrates mittig zu den jeweiligen Gaskanalsegmenten angeordnet. Die Abweichung von der Mitte eines gegenüberliegenden Gaskanalsegmentes beträgt +/– 30%. In order to be able to measure these layer properties on a substrate to be coated, transmission, reflection and / or sheet resistance measuring tracks are arranged on the substrate transversely to the substrate guide line in the transport direction of the substrate centrally to the respective gas channel segments. The deviation from the center of an opposite gas channel segment is +/- 30%.

Für die Messung der Transmissionseigenschaften und für die Schichtwiderstandsmessung von Schichten auf dem Substrat sind Spektrometer angeordnet. For the measurement of the transmission properties and for the sheet resistance measurement of layers on the substrate spectrometers are arranged.

Dabei ist für jedes Gaskanalsegment und dem jeweiligen gegenüberliegenden Substratbereich eine Transmissions-, Reflexions- und/oder berührungslose Schichtwiderstandsmessung durchführbar. In this case, a transmission, reflection and / or non-contact sheet resistance measurement can be carried out for each gas channel segment and the respective opposite substrate region.

Die Anordnung kann sowohl in Glasbeschichtungsanlagen, als auch Band- und Folienbeschichtungsanlagen eingesetzt werden. The arrangement can be used both in glass coating systems, as well as tape and foil coating equipment.

Verfahrensseitig wird die Aufgabe dadurch gelöst, dass mittels Messköpfen zur Transmissions-, Reflexions- und/oder Schichtwiderstandsmessung die Eigenschaften der abgeschiedenen Schicht gemessen werden, wobei über Stelleinrichtungen die Plasmastöchiometrie oberhalb der Substratebene über die Gaskanalsegmente getrennt voneinander einstellbar ist, so dass direkt Einfluss auf die Schichteigenschaften genommen wird. In terms of the method, the object is achieved by measuring the properties of the deposited layer by means of measuring heads for transmission, reflection and / or sheet resistance measurement, wherein the plasma stoichiometry above the substrate plane can be set separately via adjusting devices, so that directly influence the Layer properties is taken.

Des Weiteren wird jeder Gasfluss eines jeden Gaskanalsegmentes mittels zugehöriger Stelleinrichtung geregelt. Furthermore, each gas flow of each gas channel segment is controlled by means of associated adjusting device.

Die Erfindung soll nachfolgend anhand eines Ausführungsbeispiels näher erläutert werden. The invention will be explained in more detail with reference to an embodiment.

1 Vakuumbeschichtungsanlage mit mehreren Beschichtungsstationen und drei Messspuren sowie drei Messpositionen zum Messen von Schichteigenschaften, insbesondere Transmission und Schichtwiderstand entlang der axialen Längserstreckung der Magnetrons. 1 Vacuum coating system with several coating stations and three measuring tracks and three measuring positions for measuring layer properties, in particular transmission and sheet resistance along the axial length of the magnetron.

2 Erfindungsgemäße Anordnung der Messköpfe auf dem Messbalken mittig zu jedem zugehörigen Gaskanalsegment. 2 Inventive arrangement of the measuring heads on the measuring bar centrally to each associated gas channel segment.

In einer bevorzugten Ausgestaltung der Erfindung ist zur Messung von Schichteigenschaften eines Substrates 5 beim Magnetronsputtern in einer Vakuumbeschichtungsanlage 1 mit einem Vakuumraum der Messbalken 4 entlang der axialen Längserstreckung eines Magnetrons M in Transportrichtung 2 des Substrates 5 hinter dem Magnetron M so angeordnet, dass die darauf integrierten Messköpfe T, Rs mittig zu dem jeweiligen zugehörigen Gaskanalsegmenten 12 angeordnet sind. Die Transmissions-, Reflexions- und/oder Schichtwiderstandsmessungen werden auf den jeweiligen zugehörigen Messspuren auf dem, über die Substrattransporteinrichtung auf einer Substratführungslinie transportierten Substrate 5 durchgeführt. Dabei kann der Nutzer an jedem Ort, an dem Einfluss auf die Schichteigenschaften durch Änderung der Prozessgasmenge und -zusammensetzung genommen werden kann, eine Analyse der Schicht durchführen. Sind bei einer Vakuumbeschichtungsanlage 1 eine Anzahl x Gaskanalsegmente, die sich quer zur Transportrichtung 2 des Substrates 5 und quer zur axialen Längserstreckung der Vakuumbeschichtungsanlage 1 befinden, angeordnet, so ist es nunmehr möglich, die Schichteigenschaften auf den dazugehörigen x-anzahligen Substratbereichen zu messen. In a preferred embodiment of the invention is for measuring layer properties of a substrate 5 Magnetron sputtering in a vacuum coating system 1 with a vacuum space of the measuring bars 4 along the axial longitudinal extent of a magnetron M in the transport direction 2 of the substrate 5 behind the magnetron M arranged so that the integrated thereon measuring heads T, Rs centered to the respective associated gas channel segments 12 are arranged. The transmission, reflection and / or sheet resistance measurements are made on the respective associated measurement tracks on the substrates transported via the substrate transport device on a substrate guide line 5 carried out. In this case, the user can carry out an analysis of the layer at any location where influence on the layer properties can be taken by changing the process gas quantity and composition. Are in a vacuum coating system 1 a number x gas channel segments, which are transverse to the transport direction 2 of the substrate 5 and transverse to the axial longitudinal extent of the vacuum coating system 1 are arranged, it is now possible to measure the layer properties on the associated x-number substrate regions.

BezugszeichenlisteLIST OF REFERENCE NUMBERS

1 1
Vakuumbeschichtungsanlage Vacuum coating system
2 2
Substrattransportrichtung Substrate transport direction
4 4
Messbalken measuring beam
5 5
Substrat substratum
6 6
Substratebene substrate plane
M M
Magnetron magnetron
T T
Messkopf für Transmission Measuring head for transmission
Rs, RRs, R
Messkopf für Schichtwiderstandsmessung oder Reflexion  Measuring head for sheet resistance measurement or reflection
12 12
Gaskanalsegment mit Gaseinlass in die Vakuumkammer Gas duct segment with gas inlet into the vacuum chamber

Claims (8)

Anordnung zur Messung von Schichteigenschaften beim Magnetronsputtern in einer Vakuumbeschichtungsanlage (1) mit einem Vakuumraum, einer Substrattransporteinrichtung, mit der ein Substrat auf einer Substratführungslinie in einer Transportrichtung transportiert und geführt wird, Gaskanalsegmenten (12) mit je einem Gaseinlass in die Vakuumkammer, sowie einem Messbalken (4) mit Messköpfen (T, R, Rs), welche ortsfest zur Vakuumkammer angeordnet sind, wobei die Gaskanalsegmente (12) sich quer zur Substratführungslinie, quer zur Transportrichtung (2) und quer zur axialen Längserstreckung der Vakuumbeschichtungsanlage (1) befinden und der Messbalken (4) mit Messköpfen (T, R, Rs) quer zur Substratführungslinie und in Transportrichtung (2) hinter den Gaskanalsegmenten (12) angeordnet ist, dadurch gekennzeichnet, dass die Anzahl der Messköpfe (T, R, Rs) zumindest der Anzahl der Gaskanalsegmente (12) entspricht und jeder Messkopf (T, R, Rs) auf dem Messbalken (4) ortsfest zur Vakuumkammer mittig zu jedem zugehörigen Gaskanalsegment (12) angeordnet ist. Arrangement for measuring layer properties during magnetron sputtering in a vacuum coating installation ( 1 ) with a vacuum space, a substrate transport device, with which a substrate is transported on a substrate guide line in a transport direction and guided, gas channel segments ( 12 ), each with a gas inlet into the vacuum chamber, and a measuring bar ( 4 ) with measuring heads (T, R, Rs), which are arranged fixed to the vacuum chamber, wherein the gas channel segments ( 12 ) transversely to the substrate guide line, transversely to the transport direction ( 2 ) and transversely to the axial longitudinal extent of the vacuum coating system ( 1 ) and the measuring bar ( 4 ) with measuring heads (T, R, Rs) transversely to the substrate guide line and in the transport direction ( 2 ) behind the gas channel segments ( 12 ), characterized in that the number of measuring heads (T, R, Rs) at least the number of gas channel segments ( 12 ) and everyone Measuring head (T, R, Rs) on the measuring bar ( 4 ) fixed to the vacuum chamber centered to each associated gas channel segment ( 12 ) is arranged. Anordnung nach Anspruch 1, dadurch gekennzeichnet, dass die Messköpfe (T, R, Rs) zur Transmissions-, Reflexions- und/oder Schichtwiderstandsmessung ausgebildet sind. Arrangement according to claim 1, characterized in that the measuring heads (T, R, Rs) are designed for transmission, reflection and / or sheet resistance measurement. Anordnung nach den Ansprüchen 1 und 2, dadurch gekennzeichnet, dass auf dem Substrat (5) Transmissions-, Reflexions- und/oder Schichtwiderstandsmessspuren quer zur Transportrichtung (2) des Substrates (5) mittig zu den jeweiligen Gaskanalsegmenten (12) angeordnet sind. Arrangement according to claims 1 and 2, characterized in that on the substrate ( 5 ) Transmittance, reflection and / or sheet resistance measuring tracks transversely to the transport direction ( 2 ) of the substrate ( 5 ) centrally to the respective gas channel segments ( 12 ) are arranged. Anordnung nach Anspruch 3, dadurch gekennzeichnet, dass eine Abweichung von der Mitte eines Gaskanalsegmentes (12) +/– 30% beträgt. Arrangement according to claim 3, characterized in that a deviation from the center of a gas channel segment ( 12 ) +/- 30%. Anordnung nach den Ansprüchen 1 und 2, dadurch gekennzeichnet, dass für die Messung der Transmissionseigenschaften von Schichten auf dem Substrat Spektrometer angeordnet sind und für die Schichtwiderstandsmessung berührungslos messende Sensoren angeordnet sind. Arrangement according to claims 1 and 2, characterized in that spectrometers are arranged for the measurement of the transmission properties of layers on the substrate, and non-contact measuring sensors are arranged for the sheet resistance measurement. Anordnung nach den vorherigen Ansprüchen, dadurch gekennzeichnet, dass für jedes Gaskanalsegment (12) und dem jeweiligen gegenüberliegenden Substratbereich eine Transmissions-, Reflexions- und/oder berührungslose Widerstandsmessung durchführbar ist. Arrangement according to the preceding claims, characterized in that for each gas channel segment ( 12 ) and the respective opposite substrate region a transmission, reflection and / or non-contact resistance measurement is feasible. Verfahren zur Messung von Schichteigenschaften beim Magnetronsputtern in einer Vakuumbeschichtungsanlage (1) mit einem Vakuumraum, einer Substrattransporteinrichtung, mit der ein Substrat auf einer Substratführungslinie in einer Transportrichtung transportiert und geführt wird, Gaskanalsegmenten (12) mit je einem Gaseinlass in die Vakuumkammer sowie einem Messbalken (4) mit Messköpfen (T, R, Rs), welche ortsfest zur Vakuumkammer angeordnet sind, wobei die Gaskanalsegmente (12) sich quer zur Substratführungslinie, quer zur Transportrichtung (2) und quer zur axialen Längserstreckung der Vakuumbeschichtungsanlage (1) befinden und der Messbalken (4) mit Messköpfen (T, R, Rs) quer zur Substratführungslinie und in Transportrichtung (2) hinter den Gaskanalsegmenten (12) angeordnet ist, wobei über die Gaskanalsegmente (12) ein Prozessgas in den Vakuumraum eingeleitet wird, dadurch gekennzeichnet, dass mittels Messköpfen (T, R, Rs) zur Transmissions-, Reflexions- und/oder Schichtwiderstandsmessung Eigenschaften der abgeschiedenen Schicht gemessen werden, wobei über Stelleinrichtungen die Plasmastöchiometrie oberhalb des Substrates (5) über die Gaskanalsegmente (12) getrennt voneinander einstellbar ist. Method for measuring layer properties during magnetron sputtering in a vacuum coating system ( 1 ) with a vacuum space, a substrate transport device, with which a substrate is transported on a substrate guide line in a transport direction and guided, gas channel segments ( 12 ) each with a gas inlet into the vacuum chamber and a measuring bar ( 4 ) with measuring heads (T, R, Rs), which are arranged fixed to the vacuum chamber, wherein the gas channel segments ( 12 ) transversely to the substrate guide line, transversely to the transport direction ( 2 ) and transversely to the axial longitudinal extent of the vacuum coating system ( 1 ) and the measuring bar ( 4 ) with measuring heads (T, R, Rs) transversely to the substrate guide line and in the transport direction ( 2 ) behind the gas channel segments ( 12 ), wherein via the gas channel segments ( 12 ) a process gas is introduced into the vacuum space, characterized in that by means of measuring heads (T, R, Rs) for the transmission, reflection and / or sheet resistance measurements properties of the deposited layer are measured, wherein via adjusting devices the plasma stoichiometry above the substrate ( 5 ) over the gas channel segments ( 12 ) is adjustable separately from each other. Verfahren nach Anspruch 7, dadurch gekennzeichnet, dass jeder Gasfluss eines jeden Gaskanalsegmentes (12) mittels zugehöriger Stelleinrichtung geregelt wird. Method according to claim 7, characterized in that each gas flow of each gas channel segment ( 12 ) is regulated by means of associated adjusting device.
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DE102014118878A1 (en) * 2014-12-17 2016-06-23 Von Ardenne Gmbh Process control method and associated arrangement for the production of a thin-film system
WO2016156496A1 (en) 2015-03-31 2016-10-06 Bühler Alzenau Gmbh Method for producing coated substrates
DE102020102546B4 (en) 2020-02-03 2024-03-07 Audi Aktiengesellschaft Process and measuring device for foil metallization

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Publication number Priority date Publication date Assignee Title
DE102014118878A1 (en) * 2014-12-17 2016-06-23 Von Ardenne Gmbh Process control method and associated arrangement for the production of a thin-film system
WO2016156496A1 (en) 2015-03-31 2016-10-06 Bühler Alzenau Gmbh Method for producing coated substrates
US11814718B2 (en) 2015-03-31 2023-11-14 Bühler Alzenau Gmbh Method for producing coated substrates
DE102020102546B4 (en) 2020-02-03 2024-03-07 Audi Aktiengesellschaft Process and measuring device for foil metallization

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