DE102011007619A1 - System, useful for processing a substrate in a continuous process, comprises lock areas arranged at two opposite ends of the system, a process region arranged between the lock areas, and a transport unit - Google Patents

Abstract

The substrate processing system comprises lock areas (14) arranged at two opposite ends of the system, a process region (15) arranged between the lock areas, and a transport unit (9) extending by the system for transporting substrates to be treated along a transport path. A double valve unit having a cavity and two valve openings (7) underlying in the transport path of the substrate is disposed at a point of the transport path. A cold trap is arranged in the cavity. The cavity is opened or closed by a valve having an opening. The double valve unit is formed as a physical conditioning chamber. The substrate processing system comprises lock areas (14) arranged at two opposite ends of the system, a process region (15) arranged between the lock areas, and a transport unit (9) extending by the system for transporting substrates to be treated along a transport path. A double valve unit having a cavity and two valve openings (7) underlying in the transport path of the substrate is disposed at a point of the transport path. A cold trap is arranged in the cavity. The cavity is opened or closed by a valve having an opening. The double valve unit: is formed as a physical conditioning chamber, where the walls of the conditioning chamber enclose the cavity; is formed within the physical conditioning chamber, where the cavity is enclosed by the walls of the conditioning chamber and by a wall arranged, within the system chamber, transversely to the transport path; comprises an aperture, which is vacuum-tightly lockable to the atmosphere; and is connected with a vacuum pump. The physical conditioning chamber is arranged between two other physical conditioning chambers. The aperture is closable by a chamber cover of the associated the two-way valve unit. The transport unit is a roller conveyor with carrier rolls arranged in a transport plane, where the carrier roll is arranged in the cavity of the double valve unit. Each lock area comprises a lock chamber and a buffer chamber, and the process region comprises two transfer chambers and a process chamber (4).

Description

The invention relates to a substrate treatment plant, in particular a plant for coating or / and cleaning substrates in a continuous process in which substrates are moved sequentially along a transport path through a vacuum chamber.

Such substrate treatment plants generally have lock and process areas. The terms lock area and process area are here to be understood as purely functional delimitation of different sections of the substrate treatment plant, i. H. they may each occupy one or more physical enclosures.

Here, the lock areas, which are arranged at the beginning and at the end of the substrate treatment plant, the infeed and outfeed of the substrates to be coated. The lock area comprises a lock chamber which can be opened to the atmosphere and which can be housed in its own physical enclosure. Frequently, each of the two lock areas further comprises a buffer chamber, the necessity of which often results from the short cycle times aimed at achieving a high plant productivity. In the first lock area, the buffer chamber is usually arranged in the transport direction of the substrates behind the entry lock chamber and in the second lock area in front of the exit lock chamber. The buffer chambers can also be accommodated in each case in a separate physical plant chamber. However, it is also possible that a lock chamber and a buffer chamber are housed together in the same physical installation chamber.

The section of the transport device located in the lock area, that is to say in the lock chamber and optionally in the buffer chamber, which serves to move the substrates through the installation, operates discontinuously, while sections of the transport device lying in the process area usually operate continuously, as will be explained in more detail later. This means that although the transport device extends through the entire substrate treatment system, it is usually subdivided into a plurality of sections which can be operated independently of one another.

The process area is normally formed by at least one process chamber in which or in which the actual substrate treatment, for example an application or removal of a layer takes place, as well as transfer chambers arranged in front of and thereafter, which are characterized in that they (in the transfer chamber adjoining the entrance lock area) the transition from the discontinuous movement of the substrates in the sluice area is converted into a continuous movement or (in the transfer chamber arranged in front of the exit sluice area) the transition from the continuous movement of the substrates in the process chamber (s) is again converted into a discontinuous movement. Both transfer chambers and process chambers can each be housed in a separate physical equipment chamber. Often, two or more of the named chambers of the process area are housed together in the same physical plant chamber. The length of a physical plant chamber is determined in practice primarily by the size of the available means of transport, e.g. As the length of the loading area, and limited by machining techniques of mechanical engineering (eg drilling tools).

The transfer chambers thus functionally serve the transition between discontinuous and continuous movement of the substrates (or vice versa), which is expressed in the design of the transport device in these transfer chambers. For this purpose, in the transfer chambers usually so-called Passingbänder, d. H. arranged separately controlled portions of the transport device, which cause precisely this movement transformation between continuously and discontinuously operating sections of the transport device.

The lengths of the lock chambers and buffer chambers are generally matched to the length of the substrate for which the substrate processing equipment is primarily intended. In order nevertheless to be able to treat overlong substrates, ie substrates which exceed this intended substrate length, in the substrate treatment plant, it is customary to associate the buffer chamber with vacuum technology with the sluice area. Thus, the lock chamber and the buffer chamber are simultaneously evacuated and simultaneously ventilated to accommodate the overlong substrate therein. Sluice and buffer chamber form a vacuum unit for this case, ie there is no hermetic separation between them, but at most one slit valve, ie a slit-shaped opening in the inner wall separating the sluice chamber and the buffer chamber, which just barely moved through the passage on the conveyor Substrate allowed. A substrate treatment plant according to this concept is in 1 shown.

In contrast, allows a substrate treatment plant according to 2 a treatment of such excessive substrates not. However, in this system, the required space compared to the substrate treatment plant according to 2 clear reduced, because the lock area comprises only one lock chamber, but not a buffer chamber.

An economically feasible solution for the treatment of substrates whose substrate length, ie the dimension in the transport direction through the substrate treatment system exceed the substrate length provided for the substrate treatment plant, is to save the buffer chamber, the first and last process chamber by an additional valve of the Separate transfer chamber and vacuum when using overlong substrates, the lock and transfer chamber. An example of such a substrate treatment plant is in 3 shown.

As a result of this modification, the transfer chamber is no longer part of the process area but of the lock area, and the process area only includes one or more process chambers arranged one behind the other in the transport direction of the substrates. However, this has the disadvantage that the lock area at the beginning and at the end of the substrate treatment plant is directly adjacent to the first or the last process chamber. Such systems are for example in WO 2009/004048 A1 and WO 2009/000813 A1 described.

The transfer chambers, in normal operation, as related to 1 and 2 described belong to the process area and here also take over the function of a gas separation between lock chamber and process chamber or process chambers, but because they now belong to the lock area, must be vented with the lock chambers, which leads to significantly longer pump down times, since the opening of the valve between the vacuum unit lock and transfer chamber (lock area) on the one hand and process chamber or process chambers (process area) on the other hand, can only take place when a sufficiently low residual pressure (generally below 10 ^-5 mbar) is reached.

In order to achieve this in an acceptable time, the use of turbomolecular pumps and cold traps is essential, since the remaining residual pressure is largely determined by water vapor (water partial pressure, residual water pressure). However, both types of pumps must be switched off before venting (resulting in significant waiting times) or sealed off by suitable valves.

There is therefore a need for an improved substrate treatment system that allows the independent venting of contiguous functional areas or chambers, such as the lock area and process area, or process chambers against each other.

This object is achieved by a substrate treatment system having the features of independent claim 1. Advantageous embodiments and further developments are described in the dependent claims.

A substrate treatment plant for the treatment of substrates in a continuous process is proposed which comprises at least two sluice areas arranged at opposite ends of the substrate treatment plant and a vacuum-insulated process area between the two sluice areas and a transport facility for transporting the substrates to be treated through the substrate treatment plant along a transport path, wherein at least one point of the transport path, a double valve unit is arranged with a cavity and two lying in the transport path of the substrates valve openings, in the cavity a cold trap is arranged and the cavity by a respective valve which selectively opens or closes a valve opening , can be closed vacuum-tight on both sides.

In other words, between two adjacent functional areas or functional chambers a Kuhlfalle be arranged so that the cold trap is in a vacuum technically autonomous room, so that the two adjacent areas or chambers can be independently ventilated or evacuated independently of the cold trap , That is, when both valves are closed, the dual valve unit both hermetically seals its own cavity and hermetically separates the two contiguous functional areas or chambers between which the dual valve unit is located. For this purpose, the double valve unit, in which the Kuhlfalle is arranged and acts as a gas-selective pump by the rest of the gas pressure causing water molecules are bound in the transport path of the substrates on two valves that can be opened or closed to each one of the adjacent vacuum areas.

In one embodiment, the double valve unit can be closed in a vacuum-tight manner by flap valves which are robust and cost-effective and which can be arranged such that the valve openings release a passage for transporting the substrates in an open position of the flap valves and are sealed vacuum-tight in a closed position of the flap valves, so that the pressure conditions in the double valve unit and in the both adjacent areas or chambers are independently adjustable.

If butterfly valves are used, care must be taken to ensure that they are installed so that the butterfly valves are not pressed open due to the pressure gradient. In this respect, the representations of the embodiments are to be understood only schematically; the flap valves could be installed depending on the application with opposite opening direction. Of course, other valve types, such as slide valves, are useful in which this problem can not occur.

In a first embodiment, the double valve unit is designed as a physical plant chamber whose walls enclose the cavity and which is arranged between two other physical plant chambers. With such a double valve unit it is possible, for example, to retrofit existing substrate treatment plants by inserting the double valve unit between two physical plant chambers.

In a second embodiment, however, the double valve unit is formed within a physical plant chamber, wherein the cavity is enclosed by the walls of the plant chamber and at least one transverse wall arranged transversely to the transport path within the plant chamber. This embodiment offers the greatest possible flexibility, because the double valve unit can be inserted between any two chambers, even if they are not arranged at the end of each physical plant chamber, but in the same physical plant chamber behind each other and at least one of the two chambers inside the physical plant chamber lies.

In order to be able to easily wait for the cold trap, it can be advantageous for the double valve unit to have an opening which can be closed in a vacuum-tight manner to the atmosphere. Such an opening can be provided, for example, at the top of the double valve unit. If the double valve unit is part of a physical plant chamber which has other functional chambers, then this opening can be closed, for example, by a chamber lid, which also extends over one or more of these functional chambers, so that the plant engineering effort is kept low. However, this solution means that always at least one functional chamber must be ventilated to open the double valve unit.

Therefore, according to a further embodiment, it is provided that the opening can be closed by its own chamber lid assigned only to the double valve unit. This allows the cold trap to be maintained externally with the valves closed, without having to ventilate other chambers or areas.

For better evacuability, at least one vacuum pump can furthermore be arranged on the double valve unit, ie. H. for example, be attached to the chamber lid of the double valve unit or be connected in some other way, for example by pipes and a suction opening with the double valve unit, that the double valve unit can be evacuated by the vacuum pump. In particular, in the latter case, no separate vacuum pump for the double valve unit is needed, but it can be used a vacuum pump, which also serves to evacuate another functional chamber.

In continuous systems of the type described, the transport devices are often designed as Walzenforderer with a plurality of arranged in a transport plane transport rollers. In a further development of the described substrate treatment system, it is provided that at least one transport roller of the transport device is arranged in the cavity of the double valve unit. Since the double valve unit has two valves, which include the cold trap as seen in the transport direction, it may be useful to support the substrates transported by the double valve unit also inside the cavity. This is made possible for example by one or more transport rollers, which are arranged in the cavity of the double valve unit. If the number of these transport rollers is not too large, which is generally desirable in order to keep the system length as short as possible, they also need not be drivable. The substrates are pushed in this case over the arranged in the double valve unit transport rollers

The solution described can be advantageously used for a wide variety of system configurations. For example, it may be provided in the substrate treatment system that each lock area comprises a lock chamber and the process area comprises at least two transfer chambers and at least one process chamber, so that the transfer chambers are assigned to the process area by vacuum technology. It can further be provided that each lock area further comprises at least one buffer chamber, so that the lock area in each case comprises a lock chamber and a transfer chamber.

Alternatively, the substrate treatment system may be configured such that each lock area comprises a lock chamber and at least one transfer chamber and the process area comprises at least one process chamber, so that the transfer chamber waiving buffer chambers is assigned vacuum technology to the lock area and the process area comprises only process chambers.

Accordingly, the double valve unit described can be arranged at any point between two adjoining functional chambers, so that there is a very high degree of flexibility in the configuration of the substrate treatment plant with regard to the vacuum separation capability of individual sections compared to other sections of the substrate treatment system.

The described substrate treatment plant will be explained in more detail with reference to exemplary embodiments and associated drawings. Show

1 to 3 various known plant configurations,

4 to 6 the exemplary use of the double valve unit described in the plants of 1 to 3 , and

7 and 8th two exemplary structural embodiments of the integration of the double valve unit in a substrate treatment plant.

Substrate treatment plants of the 1 to 6 show very schematically only the arrangement of different functional chambers and their respective affiliation with a vacuum technical field. For the sake of clarity, these figures have been omitted to present details that contribute to understanding these configurations, such as the specific design of the chamber lid, the drive device of the transport device, the physical limits of the joined plant chambers, etc ..

1 to 3 each show a substrate treatment plant, in which two lock areas 14 a process area 15 lock in. Each of these systems comprises a juxtaposition of different functional chambers and a transport device configured as a horizontal roller conveyor, on which substrates with or without substrate holders on transport rollers 9 in a transport direction through the entire system of the first lock chamber 1 to the second lock chamber 1 be transported. The heart of each of these systems is a process chamber 4 , of which several could be present. In the process chamber 4 is a substrate treatment device 12 arranged, through which the actual substrate treatment is performed. In the schematic illustrations of the figures, a double tubular magnetron is shown by way of example, which serves to coat the upwardly facing side of the substrates. Of course, alternatively or additionally, other types of substrate handling equipment could be used 12 be provided.

In the configuration gemaß 1 includes each lock area 14 one lock chamber each 1 and a buffer chamber 2 and the intervening process area 15 includes a process chamber 4 that of two transfer chambers 3 is included. The lock chamber 1 and the buffer chamber 2 each lock area are operated together as a vacuum unit, ie between them is only one through an opening 7 formed slit valve arranged; a true vacuum separation does not occur. The same is true for the transfer chambers 3 and the process chamber 4 to, so that these three chambers vacuum technology, a unit, namely the process area 15 form.

In contrast, the adjacent vacuum technical units are lock area 14 and process area 15 hermetically separated from each other, and each by a flap valve 8th which are arranged in the transport path of the substrates and the valve openings 7 the transverse walls 6 either release or close.

In the system configuration gemaß 2 were in the lock areas 14 the buffer chambers saved, so that the lock chambers 1 directly to the process area 15 borders and are hermetically separable from them. Although only a process chamber 4 shown, of course, in a plant of the type shown, several process chambers 4 be provided, for example, to apply several different layers on the substrates, to clean the substrates before coating, etc.

In 3 however, a plant configuration is shown in which buffer chambers are not provided and instead the transfer chambers 3 Vacuum technology the lock area 14 are assigned, reducing the process area 15 only through the process chamber 4 is formed. Again, of course, several process chambers could 4 In addition, various types of substrate treatment devices may be provided 12 can be arranged. In addition, other functional chamber types, for example pump chambers, heating or cooling chambers, etc., or within a chamber compartments, ie subregions of the chambers with a specific function, such as pump compartments or the like, may additionally be provided in all systems, but not for reasons of clarity are shown.

The system configurations according to 4 to 6 show the exemplary use of the proposed double valve unit 5 with the cold trap 10 to plants of the above with reference to 1 explained plant configurations.

Here are in 4 on a plant of the type in 1 shown is two double valve units 5 provided, each between the lock area 14 and the process area 15 are arranged. The same is in 5 for a plant of the type 2 and in 6 on a plant of the type 3 shown.

The between lock area 14 and process area 15 located double valve unit 5 has two valves 8th on, which are executed in the embodiments as flap valves. In addition, it is designed such that in the cavity H, the between the lock area 14 pointing valve 8th and to the process area 15 pointing valve 8th is included, a cold trap 10 is arranged. This allows the double valve unit 5 assume a dual function: on the one hand, the vacuum areas lock area 14 and process area 15 Vacuum technology separated and on the other hand between the two valves 8th located cold trap 10 from the vacuum unit to be ventilated, ie generally the lock area 14 but also, if necessary, the process area 15 to be sealed off. The Kuhlfalle 10 can thus remain cooled and switched on reaching an allowable pressure of the respective vacuum unit. This also results in a shortening of the system length compared to a solution with additional gas separation chamber.

Another, not shown in the figures application of the double valve unit 5 consists in the arrangement of the double valve unit 5 in the process area 15 , for example, between a transfer chamber 3 and a process chamber 4 or between two consecutive process chambers 4 , Thus, it is possible, on the one hand, the process chambers 4 to ventilate independently, but on the other hand, the cold trap 10 during operation of the system, after closing the two valves 8th to regenerate. For this it is necessary that the double valve unit 5 has a vacuum pump or a connection for such a vacuum pump, in order to regenerate the cold trap 10 remove the amount of gas.

In the 7 and 8th Two constructive implementations of the presented concept are presented. In the solution according to 7 is the double valve unit 5 in a separate physical enclosure 16 accommodated by means of flanges F with two adjacent physical plant chambers 16 connected is. Specifically, the physical investment chamber points 16 the double valve unit 5 at each end a transverse wall 6 each with a valve opening 7 on. Each of these valve openings 7 is through a flap valve 8th hermetic, ie vacuum-tight, lockable. The size of the flap 8th can be designed such that the largest possible suction power of the cold trap is available at the adjacent chambers, or even an active (by the Kuhlfalle) pumped gas separation between the adjacent chambers is formed.

In the physical plant chamber 16 the double valve unit 5 is a single transport roller 9 mounted so that they are level with the transport rollers 9 the adjacent chambers. This single transport roller 9 is not drivable in the embodiment. The valve openings 7 are relative to the transport rollers 9 arranged so that they are located in the transport plane of the substrates, leaving substrates through the valve openings 7 can be moved when the valves 8th are open.

Below in the physical plant chamber 16 the double valve unit 5 arranged transport roller 9 and above the valve openings 7 are two elements of the cold trap 10 arranged so that water molecules above and below the transport plane of the substrates can be captured.

The physical plant chamber 16 the double valve unit 5 has its own chamber lid 11 on, on which a vacuum pump 13 arranged so that the physical plant chamber 16 the double valve unit 5 through the chamber lid 11 can be evacuated through. In this way, also in the regeneration of the cold trap 10 released gas and water molecules from the physical plant chamber 16 the double valve unit 5 away.

In contrast, in 8th an alternative embodiment shown in which the double valve unit 5 within a physical investment room 16 is arranged, which at the same time has at least one further functional chamber (in the figure to the left of the double valve unit 5 ). The physical plant chamber 16 has at its right end a transverse wall 6 with an opening disposed therein 7 and a flange F which is connected to a corresponding flange F of the next physical plant chamber adjacent thereto 16 connected is. The opening 7 in the transverse wall 6 at the right end of the left physical system chamber 16 is through a valve 8th closable. Inside the physical plant chamber 16 is another transverse wall 6 with an opening 7 arranged, which likewise by a valve 8th is closable.

In the between the transverse walls 6 enclosed cavity of the double valve unit 5 is level with the transport rollers 9 the adjacent chambers a single transport roller 9 arranged so that the substrates at the height of the valves 8th through the double valve unit 5 can be moved when both valves 8th are open. As in the embodiment according to 7 Above and below the transport plane of the substrates are two elements of a cold trap 10 in the cavity of the double valve unit 5 arranged.

The double valve unit 5 has on its top a separate chamber lid 11 on, on which a vacuum pump 13 is appropriate. The left of it arranged functional chamber also has its own chamber lid 11 on, on which a vacuum pump 13 is appropriate. This allows the functional chamber on the left side and the double valve unit 5 independently evacuated and ventilated, even though they are in the same physical enclosure 16 are located.

As explained above, when installing the valves 8th Care should be taken when ventilating the double valve unit 5 not be pushed open if adjacent chambers are not ventilated at the same time. This can be done on the valves 8th Also be provided a lock that prevents unwanted opening. Alternatively, another type of valve, such as spool valves, may be used. The representations of the figures are therefore not binding, but merely indicate the position of the respective valve. If necessary, the valves should 8th be installed so that they are relative to the double valve unit 5 open inside.

LIST OF REFERENCE NUMBERS

1

lock chamber

2

buffer chamber

3

transfer chamber

4

process chamber

5

Double valve unit

6

partition

7

opening

8th

Valve

9

transport roller

10

cold trap

11

chamber cover

12

Substrate treatment facility

13

vacuum pump

14

lock area

15

process area

16

physical plant chamber

QUOTES INCLUDE IN THE DESCRIPTION

This list of the documents listed by the applicant has been generated automatically and is included solely for the better information of the reader. The list is not part of the German patent or utility model application. The DPMA assumes no liability for any errors or omissions.

Cited patent literature

• WO 2009/004048 A1 [0010]
• WO 2009/000813 A1 [0010]

Claims (10)

Substrate treatment plant for the treatment of substrates in a continuous process, comprising at least two lock regions arranged at opposite ends of the substrate treatment plant (US Pat. 14 ) and one between the two lock areas ( 14 ), vacuum technology of the lock areas ( 14 ) separate process area ( 15 ) as well as a transport device extending through the substrate treatment plant ( 9 ) for the transport of substrates to be treated along a transport path, wherein at least one point of the transport path a double valve unit ( 5 ) having a cavity and two valve openings located in the transport path of the substrates ( 7 ), in the cavity a cold trap ( 10 ) is arranged and the cavity by a respective valve ( 8th ), each having a valve opening ( 7 ) optional or closes, on both sides vacuum-tight sealable. Substrate treatment plant according to claim 1, characterized in that the double valve unit ( 5 ) as a physical plant chamber ( 16 ) whose walls surround the cavity and which between two other physical plant chambers ( 16 ) is arranged. Substrate treatment plant according to claim 1, characterized in that the double valve unit ( 5 ) within a physical plant chamber ( 16 ), wherein the cavity through the walls of the plant chamber ( 16 ) and at least one within the plant chamber ( 16 ) arranged transversely to the transport path transverse wall ( 6 ) is enclosed. Substrate treatment plant according to one of claims 1 to 3, characterized in that the double valve unit ( 5 ) has an opening which is closed to the atmosphere vacuum-tight Substrate treatment plant according to claim 4, characterized in that the opening by its own, only the double valve unit ( 5 ) associated chamber lid ( 11 ) is closable. Substrate treatment plant according to one of claims 1 to 5, characterized in that the double valve unit ( 5 ) with at least one vacuum pump ( 13 ) connected is. Substrate treatment plant according to one of claims 1 to 6, characterized in that the transport device is a roller conveyor with a plurality of arranged in a transport plane transport rollers ( 9 ) and in the cavity of the double valve unit ( 5 ) at least one transport roller ( 9 ) is arranged. Substrate treatment installation according to one of claims 1 to 7, characterized in that each lock area ( 14 ) a lock chamber ( 1 ) and the process area ( 15 ) at least two transfer chambers ( 3 ) and at least one process chamber ( 4 ). Substrate treatment plant according to claim 8, characterized in that each lock area ( 14 ) at least one buffer chamber ( 2 ). Substrate treatment installation according to one of claims 1 to 7, characterized in that each lock area ( 14 ) a lock chamber ( 1 ) and at least one transfer chamber ( 3 ) and the process area ( 15 ) at least one process chamber ( 4 ).

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