DE102009041642A8 - Quantendrahtarray-Feldeffekt-(Leistungs-)-Transistor QFET (insbesondere magnetisch - MQFET, aber auch elektrisch oder optisch angesteuert) bei Raumtemperatur, basierend auf Polyacetylen-artige Moleküle - Google Patents
Quantendrahtarray-Feldeffekt-(Leistungs-)-Transistor QFET (insbesondere magnetisch - MQFET, aber auch elektrisch oder optisch angesteuert) bei Raumtemperatur, basierend auf Polyacetylen-artige Moleküle Download PDFInfo
- Publication number
- DE102009041642A8 DE102009041642A8 DE102009041642A DE102009041642A DE102009041642A8 DE 102009041642 A8 DE102009041642 A8 DE 102009041642A8 DE 102009041642 A DE102009041642 A DE 102009041642A DE 102009041642 A DE102009041642 A DE 102009041642A DE 102009041642 A8 DE102009041642 A8 DE 102009041642A8
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- Germany
- Prior art keywords
- mqfet
- qfet
- polyacetylene
- molecules
- transistor
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 230000005669 field effect Effects 0.000 title 1
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- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/16—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed including, apart from doping materials or other impurities, only elements of Group IV of the Periodic Table
- H01L29/1604—Amorphous materials
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- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/12—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by the materials of which they are formed
- H01L29/122—Single quantum well structures
- H01L29/125—Quantum wire structures
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- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
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- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0657—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body
- H01L29/0665—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body the shape of the body defining a nanostructure
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/0657—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body
- H01L29/0665—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions characterised by the shape of the body the shape of the body defining a nanostructure
- H01L29/0669—Nanowires or nanotubes
- H01L29/0676—Nanowires or nanotubes oriented perpendicular or at an angle to a substrate
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/66977—Quantum effect devices, e.g. using quantum reflection, diffraction or interference effects, i.e. Bragg- or Aharonov-Bohm effects
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/775—Field effect transistors with one dimensional charge carrier gas channel, e.g. quantum wire FET
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- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/82—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by variation of the magnetic field applied to the device
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- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/0352—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions
- H01L31/035209—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions comprising a quantum structures
- H01L31/035227—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their shape or by the shapes, relative sizes or disposition of the semiconductor regions comprising a quantum structures the quantum structure being quantum wires, or nanorods
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- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by potential barriers
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- H10B—ELECTRONIC MEMORY DEVICES
- H10B61/00—Magnetic memory devices, e.g. magnetoresistive RAM [MRAM] devices
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- H10N59/00—Integrated devices, or assemblies of multiple devices, comprising at least one galvanomagnetic or Hall-effect element covered by groups H10N50/00 - H10N52/00
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- H10N99/00—Subject matter not provided for in other groups of this subclass
- H10N99/05—Devices based on quantum mechanical effects, e.g. quantum interference devices or metal single-electron transistors
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/20—Carbon compounds, e.g. carbon nanotubes or fullerenes
- H10K85/221—Carbon nanotubes
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
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- Engineering & Computer Science (AREA)
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- Physics & Mathematics (AREA)
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- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Electromagnetism (AREA)
- Materials Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Junction Field-Effect Transistors (AREA)
- Semiconductor Memories (AREA)
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102009041642A DE102009041642A1 (de) | 2009-09-17 | 2009-09-17 | Quantendrahtarray-Feldeffekt-(Leistungs-)-Transistor QFET (insbesondere magnetisch - MQFET, aber auch elektrisch oder optisch angesteuert) bei Raumtemperatur, basierend auf Polyacetylen-artige Moleküle |
GBGB1008164.4A GB201008164D0 (en) | 2009-09-17 | 2010-05-17 | Room temperature quantum field effect transistor comprising a quantum wire array based on polyacetylene-like molecules for instance in the cumulene form |
GB1012497.2A GB2473696B (en) | 2009-09-17 | 2010-07-26 | Quantum field effect devices |
PCT/IB2010/054110 WO2011033438A2 (en) | 2009-09-17 | 2010-09-13 | Room temperature quantum field effect transistor comprising a 2-dimensional quantum wire array based on ideally conducting molecules |
US13/395,078 US20120198591A1 (en) | 2009-09-17 | 2010-09-13 | Room temperature quantum field effect transistor comprising a 2-dimensional quantum wire array based on ideally conducting molecules |
EP10768068A EP2477939A2 (de) | 2009-09-17 | 2010-09-13 | Zimmertemperatur-quantenfeldeffekttransistor mit einer zweidimensionalen quantendrahtarray auf grundlage ideal leitender moleküle |
CA2774502A CA2774502A1 (en) | 2009-09-17 | 2010-09-13 | Room temperature quantum field effect transistor comprising a 2-dimensional quantum wire array based on ideally conducting molecules |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102009041642A DE102009041642A1 (de) | 2009-09-17 | 2009-09-17 | Quantendrahtarray-Feldeffekt-(Leistungs-)-Transistor QFET (insbesondere magnetisch - MQFET, aber auch elektrisch oder optisch angesteuert) bei Raumtemperatur, basierend auf Polyacetylen-artige Moleküle |
Publications (2)
Publication Number | Publication Date |
---|---|
DE102009041642A1 DE102009041642A1 (de) | 2011-03-31 |
DE102009041642A8 true DE102009041642A8 (de) | 2012-12-20 |
Family
ID=42334850
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE102009041642A Withdrawn DE102009041642A1 (de) | 2009-09-17 | 2009-09-17 | Quantendrahtarray-Feldeffekt-(Leistungs-)-Transistor QFET (insbesondere magnetisch - MQFET, aber auch elektrisch oder optisch angesteuert) bei Raumtemperatur, basierend auf Polyacetylen-artige Moleküle |
Country Status (6)
Country | Link |
---|---|
US (1) | US20120198591A1 (de) |
EP (1) | EP2477939A2 (de) |
CA (1) | CA2774502A1 (de) |
DE (1) | DE102009041642A1 (de) |
GB (2) | GB201008164D0 (de) |
WO (1) | WO2011033438A2 (de) |
Families Citing this family (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20150202662A1 (en) * | 2011-10-11 | 2015-07-23 | ANEEVE LLC dba ANEEVE NANOTECHNOLOGIES, LLC | Process for cleaning carbon nanotubes and other nanostructured films |
CN102777166A (zh) * | 2012-07-31 | 2012-11-14 | 中国海洋石油总公司 | 一种用于多分量感应测井仪的刻度装置 |
US9337334B2 (en) | 2014-04-21 | 2016-05-10 | Globalfoundries Inc. | Semiconductor memory device employing a ferromagnetic gate |
EP3751621B1 (de) * | 2015-01-12 | 2023-06-07 | Weidlich, Helmut | Vorrichtung zur führung von ladungsträgern und deren verwendung |
DE102015001713B4 (de) * | 2015-02-13 | 2021-08-19 | Forschungszentrum Jülich GmbH | Verfahren zur Messung lokaler elektrischer Potentialfelder |
CN104835905A (zh) * | 2015-05-27 | 2015-08-12 | 南京大学 | 偏振非敏感且高效率的超导纳米线单光子探测器 |
EP3101695B1 (de) * | 2015-06-04 | 2021-12-01 | Nokia Technologies Oy | Anordnung zur direkten detektion von röntgenstrahlung |
EP3206235B1 (de) | 2016-02-12 | 2021-04-28 | Nokia Technologies Oy | Verfahren zur herstellung einer vorrichtung mit einem zweidimensionalen material |
CN108362959A (zh) * | 2018-01-05 | 2018-08-03 | 中山大学 | 一种利用导电原子力显微镜装置检测薄膜忆阻特性的检测系统及方法 |
TWI815865B (zh) * | 2018-03-02 | 2023-09-21 | 國立研究開發法人科學技術振興機構 | 單分子電晶體 |
US10600802B2 (en) | 2018-03-07 | 2020-03-24 | Sandisk Technologies Llc | Multi-tier memory device with rounded top part of joint structure and methods of making the same |
US10830792B2 (en) * | 2018-03-13 | 2020-11-10 | Arizona Board Of Regents On Behalf Of The University Of Arizona | Scanning tunneling thermometer |
CN108717471B (zh) * | 2018-03-22 | 2022-01-04 | 杭州电子科技大学 | 一种电压域振荡量子器件伏安特性的建模方法 |
US11133409B2 (en) | 2018-10-17 | 2021-09-28 | The Research Foundation For The State University Of New York | Ballistic field-effect transistors based on Bloch resonance and methods of operating a transistor |
FR3089015B1 (fr) * | 2018-11-28 | 2020-10-30 | Commissariat Energie Atomique | Procédé de détermination d'une courbe courant-tension corrigée caractéristique d'un système électrique |
RU195646U1 (ru) * | 2018-12-20 | 2020-02-03 | федеральное государственное автономное образовательное учреждение высшего образования "Национальный исследовательский университет "Высшая школа экономики" | Ячейка квантовой памяти на основе сверхпроводниковой наноструктуры |
CN109970358B (zh) * | 2019-03-28 | 2021-09-28 | 电子科技大学 | 一种基于钛酸铋基铁电薄膜的光驱动逻辑器及其应用方法 |
KR20200129347A (ko) | 2019-05-08 | 2020-11-18 | 삼성전자주식회사 | 저항 변화 메모리 소자 및 그 제조 방법과 전자 장치 |
US11183978B2 (en) | 2019-06-06 | 2021-11-23 | International Business Machines Corporation | Low-noise amplifier with quantized conduction channel |
WO2021154351A2 (en) * | 2019-10-25 | 2021-08-05 | President And Fellows Of Harvard College | Guiding electrons in graphene with a carbon nanotube |
CN113662528B (zh) * | 2021-08-24 | 2023-07-21 | 上海赫德医疗管理咨询有限公司 | 一种量子检测治疗仪及量子共振分析方法 |
Family Cites Families (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH430578A (fr) | 1963-02-15 | 1967-02-15 | Johns Manville Societe Anonyme | Transporteur à courroie |
EP0408966A3 (en) | 1989-07-19 | 1991-04-24 | Siemens Aktiengesellschaft | Electrophotographic recording material and process for its manufacture |
US5835477A (en) | 1996-07-10 | 1998-11-10 | International Business Machines Corporation | Mass-storage applications of local probe arrays |
EP0875939A1 (de) * | 1997-04-30 | 1998-11-04 | Interuniversitair Micro-Elektronica Centrum Vzw | Räumlich modulierter Detektor für elektromagnetische Strahlung |
AU5316299A (en) | 1998-07-16 | 2000-02-07 | Mark Cohen | Reinforced variable stiffness tubing |
EP1096569A1 (de) | 1999-10-29 | 2001-05-02 | Ohnesorge, Frank, Dr. | Quantendrahtmatrix, Verwendungen derselben, und Verfahren zu deren Herstellung |
KR100360476B1 (ko) | 2000-06-27 | 2002-11-08 | 삼성전자 주식회사 | 탄소나노튜브를 이용한 나노 크기 수직 트랜지스터 및 그제조방법 |
DE10036897C1 (de) | 2000-07-28 | 2002-01-03 | Infineon Technologies Ag | Feldeffekttransistor, Schaltungsanordnung und Verfahren zum Herstellen eines Feldeffekttransistors |
US7620330B2 (en) * | 2003-06-05 | 2009-11-17 | Tom Faska | Optical receiver device and method |
DE102004003374A1 (de) | 2004-01-22 | 2005-08-25 | Infineon Technologies Ag | Halbleiter-Leistungsschalter sowie dafür geeignetes Herstellungsverfahren |
US8309843B2 (en) * | 2004-08-19 | 2012-11-13 | Banpil Photonics, Inc. | Photovoltaic cells based on nanoscale structures |
US8314327B2 (en) * | 2005-11-06 | 2012-11-20 | Banpil Photonics, Inc. | Photovoltaic cells based on nano or micro-scale structures |
US20090020150A1 (en) * | 2007-07-19 | 2009-01-22 | Atwater Harry A | Structures of ordered arrays of semiconductors |
DE102008015118A1 (de) * | 2008-03-10 | 2009-09-24 | Ohnesorge, Frank, Dr. | Raumtemperatur-Quantendraht-(array)-Feldeffekt-(Leistungs-) Transistor "QFET", insbesondere magnetisch "MQFET", aber auch elektrisch oder optisch gesteuert |
DE102009031481A1 (de) | 2008-07-03 | 2010-02-11 | Ohnesorge, Frank, Dr. | Konzept für optische (Fernfeld-/Fresnel-Regime aber auch Nahfeld-) Mikroskopie/Spektroskopie unterhalb/jenseits des Beugungslimits - Anwendungen für optisches (aber auch elektronisches) schnelles Auslesen von ultrakleinen Speicherzellen in Form von lumineszierenden Quantentrögen - sowie in der Biologie/Kristallographie |
NL2001894C2 (nl) | 2008-08-15 | 2010-02-16 | Q Mat B V | Grendelbalk voor het afsluiten van transportcontainers en systeem voor het beveiligen en traceren van transportcontainers met een dergelijke grendelbalk. |
-
2009
- 2009-09-17 DE DE102009041642A patent/DE102009041642A1/de not_active Withdrawn
-
2010
- 2010-05-17 GB GBGB1008164.4A patent/GB201008164D0/en not_active Ceased
- 2010-07-26 GB GB1012497.2A patent/GB2473696B/en not_active Expired - Fee Related
- 2010-09-13 EP EP10768068A patent/EP2477939A2/de not_active Withdrawn
- 2010-09-13 WO PCT/IB2010/054110 patent/WO2011033438A2/en active Application Filing
- 2010-09-13 CA CA2774502A patent/CA2774502A1/en not_active Abandoned
- 2010-09-13 US US13/395,078 patent/US20120198591A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US20120198591A1 (en) | 2012-08-02 |
GB2473696A (en) | 2011-03-23 |
DE102009041642A1 (de) | 2011-03-31 |
GB2473696B (en) | 2014-04-23 |
CA2774502A1 (en) | 2011-03-24 |
WO2011033438A3 (en) | 2011-11-17 |
GB201008164D0 (en) | 2010-06-30 |
WO2011033438A2 (en) | 2011-03-24 |
EP2477939A2 (de) | 2012-07-25 |
GB201012497D0 (en) | 2010-09-08 |
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