DE102008022881A1 - Two-dimensional, individually controllable vertical cavity surface emitting laser-emitter arrangement for use in e.g. direct imaging printing machine, is rotated around one axis, where positions of emitters lie on hexagonal grid - Google Patents
Two-dimensional, individually controllable vertical cavity surface emitting laser-emitter arrangement for use in e.g. direct imaging printing machine, is rotated around one axis, where positions of emitters lie on hexagonal grid Download PDFInfo
- Publication number
- DE102008022881A1 DE102008022881A1 DE102008022881A DE102008022881A DE102008022881A1 DE 102008022881 A1 DE102008022881 A1 DE 102008022881A1 DE 102008022881 A DE102008022881 A DE 102008022881A DE 102008022881 A DE102008022881 A DE 102008022881A DE 102008022881 A1 DE102008022881 A1 DE 102008022881A1
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- Germany
- Prior art keywords
- arrangement
- emitters
- emitter
- distance
- positions
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1075—Mechanical aspects of on-press plate preparation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
- B41J2/447—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources
- B41J2/455—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using arrays of radiation sources using laser arrays, the laser array being smaller than the medium to be recorded
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2057—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using an addressed light valve, e.g. a liquid crystal device
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Mechanical Engineering (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Printers Or Recording Devices Using Electromagnetic And Radiation Means (AREA)
Abstract
Description
Die vorliegende Erfindung betrifft eine zweidimensionale Anordnung von einzeln ansteuerbaren VCSEL-Emittern mit den Merkmalen des Oberbegriffs von Anspruch 1 Weiterhin betrifft die vorliegende Erfindung eine Bebilderungseinrichtung mit den Merkmalen des Oberbegriffs von Anspruch 5.The The present invention relates to a two-dimensional array of individually controllable VCSEL emitters with the characteristics of the generic term of claim 1 Furthermore, the present invention relates to a An imaging device having the features of the preamble of claim 5th
In der grafischen Industrie ist der Einsatz von Laser beispielsweise bei der Bebilderung und daher in Bebilderungseinrichtungen wie z. B. so genannten DI-Druckmaschinen (Direct Imaging) oder Plattenbelichtem bekannt.In For example, in the graphics industry, the use of lasers in the imaging and therefore in imaging devices such. B. so-called DI printing machines (direct imaging) or Plattenbelichtem known.
Die
Aus
der
Die
Bei der Herstellung und Verwendung von Hochleistungs-VCSEL-Anordnungen ist es auf der einen Seite notwendig, den Abstand eines VCSEL-Emitters zu seinem Nachbarn so groß wie möglich zu gestalten, um den Einfluss so genannter „Crosstalk-Effekte” gering zu halten. Auf der anderen Seite ist es jedoch auch notwendig, die vorhandene Fläche optimal auszunutzen, um aus einem so genannten „Wafer” möglichst viele VCSEL-Anordnungen herstellen zu können. Es ist daher eine Aufgabe der vorliegenden Erfindung, eine Emitter-Anordnung zu schaffen, welche beiden Anforderungen genügt.at the manufacture and use of high power VCSEL devices On the one hand, it is necessary to know the distance of a VCSEL emitter to make his neighbor as big as possible the influence of so-called "crosstalk effects" low to keep. On the other hand, however, it is also necessary that To make optimum use of existing space to get out of one as many as possible VCSEL arrangements to be able to produce. It is therefore an object of the present invention Invention to provide an emitter assembly which meets both requirements enough.
Diese Aufgabe wird erfindungsgemäß durch eine Anordnung mit den Merkmalen von Anspruch 1 gelöst. Vorteilhafte Weiterbildungen der Erfindung ergeben sich aus den zugehörigen Unteransprüchen sowie aus der Beschreibung und den zugehörigen Zeichnungen.These Object is achieved by an arrangement solved with the features of claim 1. Advantageous developments The invention will become apparent from the accompanying dependent claims as well as from the description and the accompanying drawings.
Eine erfindungsgemäße zweidimensionale Anordnung von einzeln ansteuerbaren VCSEL-Emittern, welche der Bebilderung von Druckformen dienen, wobei die Anordnung um eine – senkrecht zur Ebene der Anordnung stehende – Achse um einen Drehwinkel relativ zu einer – parallel zur lateralen Richtung der Druckformen verlaufenden – Projektionslinie gedreht ist, zeichnet sich dadurch aus, dass die Positionen der einzelnen VCSEL-Emitter auf einem im Wesentlichen hexagonalen Raster liegen. Die erfindungsgemäße Anordnung genügt in vorteilhafter Weise beiden gestellten Anforderungen: sowohl der Vergrößerung des Emitter-Abstands, als auch der optimalen Ausnutzung der Fläche.A Inventive two-dimensional arrangement of individually controllable VCSEL emitters, which the illustration of Serve printing forms, the arrangement around a - vertical to the plane of the arrangement standing - axis by a rotation angle relative to a - parallel to the lateral direction of Printing forms running - projection line is turned, is characterized by the fact that the positions of each VCSEL emitter lie on a substantially hexagonal grid. The inventive Arrangement satisfies both put in an advantageous manner Requirements: both the increase of the emitter distance, as well as the optimal utilization of the area.
Eine aufgrund der erreichbaren Auflösung von etwa 600 dpi vorteilhafte und daher bevorzugte Weiterbildung der erfindungsgemäßen Anordnung kann sich dadurch auszeichnen, dass der Abstand benachbarter Emitter und der Drehwinkel derart gewählt sind, dass der Abstand auf die Projektionslinie projizierter, benachbarter Belichtungspunkte, d. h. der Abstand deren Zentren, etwa 40 μm beträgt.A advantageous due to the achievable resolution of about 600 dpi and therefore preferred embodiment of the invention Arrangement may be characterized in that the distance between adjacent emitters and the angle of rotation are chosen such that the distance on the projection line of projected adjacent exposure points, d. H. the distance whose centers is about 40 microns.
Eine weitere aufgrund der erreichbaren Auflösung von etwa 600 dpi vorteilhafte und daher bevorzugte Weiterbildung der erfindungsgemäßen Anordnung kann sich dadurch auszeichnen, dass der Abstand benachbarter Emitter etwa 378 μm beträgt.A another due to the achievable resolution of about 600 dpi advantageous and therefore preferred development of the invention Arrangement may be characterized in that the distance of adjacent Emitter is about 378 microns.
Eine weitere aufgrund der erreichbaren Auflösung von etwa 600 dpi vorteilhafte und daher bevorzugte Weiterbildung der erfindungsgemäßen Anordnung kann sich dadurch auszeichnen, dass der Drehwinkel etwa 12,2° beträgt.A another due to the achievable resolution of about 600 dpi advantageous and therefore preferred development of the invention Arrangement may be characterized in that the rotation angle is about 12.2 °.
Eine erfindungsgemäße Bebilderungseinrichtung zur Bebilderungen von Druckformen zeichnet sich durch wenigstens eine – wie in dieser Anmeldung mit Bezug zur Erfindung beschriebene oder gezeigte – Anordnung aus.A Inventive imaging device for illustrations of printing forms is characterized by at least one - how in this application with respect to the invention described or shown - arrangement out.
Die Erfindung als solche sowie konstruktiv und/oder funktionell vorteilhafte Weiterbildungen der Erfindung werden nachfolgend unter Bezug auf die zugehörigen Zeichnungen anhand wenigstens eines bevorzugten Ausführungsbeispiels näher beschrieben. In den Zeichnungen sind einander entsprechende Elemente mit jeweils denselben Bezugszeichen versehen.The invention as such as well as structurally and / or functionally advantageous developments of the invention will be described below with reference to the accompanying drawings with reference to at least one preferred embodiment. In the drawings, corresponding elements with each provided the same reference numerals.
Die Zeichnungen zeigen:The Drawings show:
In
In
In
Mit
der erfindungsgemäßen Emitter-Anordnung
Man
kann die erfindungsgemäße Anordnung
Bei
der erfindungsgemäßen Anordnung muss der letzte
Emitter
Mit R als Abstand zwischen den Emitter einer Spalte und α als Drehwinkel der Emitter-Anordnung um den Emitter (1,1) gilt: 8*R*sin(α) [2·R·sin(60°)]·sin(90° + α). Mit sin(90° + α)cos(α) und Umstellung der Gleichung nach α erhält man sin(α)/cos(α) = (2·R·sin(60°))/(8·R) also tan(α) = (1/4)·sin(600) bzw. α = 12,2163°, somit etwa 12,2°. Mit R·sin(α) = 80 μm erhält man R = 378,067 μm, somit etwa 378 μm. Im Vergleich: Bei einer kartesischen Anordnung und gegebenen 40 μm-Raster würde sich ein geringerer Emitter-Abstand von nur etwa 320 μm und damit zu erwartende stärkere so genannte „Crosstalk-Effekte” ergeben.With R as distance between the emitter of a column and α as The angle of rotation of the emitter arrangement around the emitter (1,1) is: 8 * R * sin (α) [2 * R * sin (60 °)] * sin (90 ° + α). With sin (90 ° + α) cos (α) and conversion the equation for α yields sin (α) / cos (α) = (2 · R · sin (60 °)) / (8 · R) also tan (α) = (1/4) · sin (600) or α = 12.2163 °, thus about 12.2 °. With R · sin (α) = 80 μm one obtains R = 378.067 microns, thus about 378 microns. In comparison: In a Cartesian arrangement and given 40 micron grid would be a lower emitter distance of only about 320 microns and thus expected stronger so-called "crosstalk effects" result.
Die
Positionen (X, Y) der einzelnen Emitter
Die
auf diese Weise berechneten X-Positionen der Emitter
Die
Y-Positionen der Emitter
Die
Daten zur Ansteuerung der Emitter
Zum
Beschreiben einer geschlossenen Fläche mit 32 × 8
erfindungsgemäß und bevorzugt im Wesentlichen
hexagonal angeordneten VCSEL-Emittern
Die
Darüber
hinaus können fehlende Emitter
Die
Anordnung gemäß
Die
Anzahl der Emitter 2 im Ausführungsbeispiel von 32 × 8
= 256 (= 28) ist eine für die Elektronik
und Software günstige Größe. Die Fläche,
die die erfindungsgemäße Anordnung
Durch
die gegenüber einer entsprechenden kartesischen Anordnung
vergrößerten Abstände zwischen den erfindungsgemäß und
bevorzugt im Wesentlichen hexagonal angeordneten Emittern
In
dem in
Die
Emitter-Anordnung
- 11
- Emitter-AnordnungEmitter arrangement
- 22
- Emitteremitter
- AA
- Abstanddistance
- A'A '
- Abstanddistance
- αα
- Drehwinkelangle of rotation
- LL
- Projektions-LinieProjection line
- RR
- Abstand der Emitterdistance the emitter
- XX
- Richtungdirection
- YY
- Richtungdirection
ZITATE ENTHALTEN IN DER BESCHREIBUNGQUOTES INCLUDE IN THE DESCRIPTION
Diese Liste der vom Anmelder aufgeführten Dokumente wurde automatisiert erzeugt und ist ausschließlich zur besseren Information des Lesers aufgenommen. Die Liste ist nicht Bestandteil der deutschen Patent- bzw. Gebrauchsmusteranmeldung. Das DPMA übernimmt keinerlei Haftung für etwaige Fehler oder Auslassungen.This list The documents listed by the applicant have been automated generated and is solely for better information recorded by the reader. The list is not part of the German Patent or utility model application. The DPMA takes over no liability for any errors or omissions.
Zitierte PatentliteraturCited patent literature
- - EP 1241013 B [0003] EP 1241013 B [0003]
- - DE 10338015 A1 [0004] - DE 10338015 A1 [0004]
- - JP 2007-293016 A [0005] - JP 2007-293016 A [0005]
Claims (5)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102008022881A DE102008022881A1 (en) | 2008-05-08 | 2008-05-08 | Two-dimensional, individually controllable vertical cavity surface emitting laser-emitter arrangement for use in e.g. direct imaging printing machine, is rotated around one axis, where positions of emitters lie on hexagonal grid |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102008022881A DE102008022881A1 (en) | 2008-05-08 | 2008-05-08 | Two-dimensional, individually controllable vertical cavity surface emitting laser-emitter arrangement for use in e.g. direct imaging printing machine, is rotated around one axis, where positions of emitters lie on hexagonal grid |
Publications (1)
Publication Number | Publication Date |
---|---|
DE102008022881A1 true DE102008022881A1 (en) | 2009-11-12 |
Family
ID=41152671
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE102008022881A Ceased DE102008022881A1 (en) | 2008-05-08 | 2008-05-08 | Two-dimensional, individually controllable vertical cavity surface emitting laser-emitter arrangement for use in e.g. direct imaging printing machine, is rotated around one axis, where positions of emitters lie on hexagonal grid |
Country Status (1)
Country | Link |
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DE (1) | DE102008022881A1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20190148918A1 (en) * | 2017-11-14 | 2019-05-16 | Lumentum Operations Llc | Configuring an emitter pattern for an emitter array to avoid a potential dislocation line |
US20190173265A1 (en) * | 2017-11-20 | 2019-06-06 | Ii-Vi Delaware, Inc. | VCSEL Array Layout |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10111871A1 (en) * | 2001-03-13 | 2002-09-19 | Heidelberger Druckmasch Ag | Imaging device for a printing form with an array of VCSEL light sources |
DE10256296A1 (en) * | 2002-01-24 | 2003-07-31 | Heidelberger Druckmasch Ag | Printing form fabrication device e.g. for off-set printer, has switchable light sources arranged in grouped-matrix formation |
DE10338015A1 (en) | 2002-09-06 | 2004-03-18 | Heidelberger Druckmaschinen Ag | Printing image on substrate involves producing fluid printing ink on printing-ink carrier by inputting energy using image spots of controllable vertical cavity surface emitting laser light source array |
US20070013765A1 (en) * | 2005-07-18 | 2007-01-18 | Eastman Kodak Company | Flexible organic laser printer |
JP2007293016A (en) | 2006-04-25 | 2007-11-08 | Ricoh Co Ltd | Surface emitting laser array, image forming method, optical scanner, and image forming apparatus |
-
2008
- 2008-05-08 DE DE102008022881A patent/DE102008022881A1/en not_active Ceased
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10111871A1 (en) * | 2001-03-13 | 2002-09-19 | Heidelberger Druckmasch Ag | Imaging device for a printing form with an array of VCSEL light sources |
EP1241013B1 (en) | 2001-03-13 | 2006-12-13 | Heidelberger Druckmaschinen Aktiengesellschaft | Imaging device for a printing plate with an array of VCSEL-light sources |
DE10256296A1 (en) * | 2002-01-24 | 2003-07-31 | Heidelberger Druckmasch Ag | Printing form fabrication device e.g. for off-set printer, has switchable light sources arranged in grouped-matrix formation |
DE10338015A1 (en) | 2002-09-06 | 2004-03-18 | Heidelberger Druckmaschinen Ag | Printing image on substrate involves producing fluid printing ink on printing-ink carrier by inputting energy using image spots of controllable vertical cavity surface emitting laser light source array |
US20070013765A1 (en) * | 2005-07-18 | 2007-01-18 | Eastman Kodak Company | Flexible organic laser printer |
JP2007293016A (en) | 2006-04-25 | 2007-11-08 | Ricoh Co Ltd | Surface emitting laser array, image forming method, optical scanner, and image forming apparatus |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20190148918A1 (en) * | 2017-11-14 | 2019-05-16 | Lumentum Operations Llc | Configuring an emitter pattern for an emitter array to avoid a potential dislocation line |
CN109787089A (en) * | 2017-11-14 | 2019-05-21 | 朗美通经营有限责任公司 | Transmitter pattern is constructed for transmitter array to avoid potential dislocation line |
US20190173265A1 (en) * | 2017-11-20 | 2019-06-06 | Ii-Vi Delaware, Inc. | VCSEL Array Layout |
US11594860B2 (en) * | 2017-11-20 | 2023-02-28 | Ii-Vi Delaware, Inc. | VCSEL array layout |
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