DE102006031561B8 - Fotomaskenanordnung, optisches Abbildungssystem, Verfahren zum Bestimmen der Gitterparameter und Absorptionseigenschaften für ein diffraktives optisches Element und Verfahren zum Herstellen eines diffraktiven optischen Elements - Google Patents
Fotomaskenanordnung, optisches Abbildungssystem, Verfahren zum Bestimmen der Gitterparameter und Absorptionseigenschaften für ein diffraktives optisches Element und Verfahren zum Herstellen eines diffraktiven optischen Elements Download PDFInfo
- Publication number
- DE102006031561B8 DE102006031561B8 DE102006031561A DE102006031561A DE102006031561B8 DE 102006031561 B8 DE102006031561 B8 DE 102006031561B8 DE 102006031561 A DE102006031561 A DE 102006031561A DE 102006031561 A DE102006031561 A DE 102006031561A DE 102006031561 B8 DE102006031561 B8 DE 102006031561B8
- Authority
- DE
- Germany
- Prior art keywords
- optical element
- diffractive optical
- producing
- determining
- imaging system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 230000003287 optical effect Effects 0.000 title 2
- 238000010521 absorption reaction Methods 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
- 238000012634 optical imaging Methods 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/7015—Details of optical elements
- G03F7/70158—Diffractive optical elements
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/451,618 US20070287075A1 (en) | 2006-06-13 | 2006-06-13 | Mask arrangement, optical projection system and method for obtaining grating parameters and absorption properties of a diffractive optical element |
US11/451,618 | 2006-06-13 |
Publications (3)
Publication Number | Publication Date |
---|---|
DE102006031561A1 DE102006031561A1 (de) | 2007-12-27 |
DE102006031561B4 DE102006031561B4 (de) | 2011-07-21 |
DE102006031561B8 true DE102006031561B8 (de) | 2012-04-19 |
Family
ID=38721274
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE102006031561A Expired - Fee Related DE102006031561B8 (de) | 2006-06-13 | 2006-07-07 | Fotomaskenanordnung, optisches Abbildungssystem, Verfahren zum Bestimmen der Gitterparameter und Absorptionseigenschaften für ein diffraktives optisches Element und Verfahren zum Herstellen eines diffraktiven optischen Elements |
Country Status (2)
Country | Link |
---|---|
US (1) | US20070287075A1 (de) |
DE (1) | DE102006031561B8 (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL2004297A (en) | 2009-03-20 | 2010-09-21 | Asml Holding Nv | Improving alignment target contrast in a lithographic double patterning process. |
NL2004365A (en) * | 2009-04-10 | 2010-10-12 | Asml Holding Nv | Method and system for increasing alignment target contrast. |
WO2011014194A1 (en) * | 2009-07-31 | 2011-02-03 | Hewlett-Packard Development Company, L.P. | Beam direction sensor |
US8845908B2 (en) * | 2010-08-24 | 2014-09-30 | Micron Technology, Inc. | Reticles, and methods of mitigating asymmetric lens heating in photolithography |
KR20200052487A (ko) * | 2018-11-06 | 2020-05-15 | 삼성전자주식회사 | 반도체 소자의 제조 방법 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5715039A (en) * | 1995-05-19 | 1998-02-03 | Hitachi, Ltd. | Projection exposure apparatus and method which uses multiple diffraction gratings in order to produce a solid state device with fine patterns |
US6249335B1 (en) * | 1992-01-17 | 2001-06-19 | Nikon Corporation | Photo-mask and method of exposing and projection-exposing apparatus |
DE10252051A1 (de) * | 2002-02-06 | 2003-09-25 | Samsung Electronics Co Ltd | Fotomaske für eine Außerachsen-Beleuchtung und Verfahren zur Herstellung derselben |
US20050041231A1 (en) * | 1996-11-25 | 2005-02-24 | Asml Holding N.V. | Illumination system with spatially controllable partial coherence compensating for line width variances |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1994019723A1 (en) * | 1993-02-23 | 1994-09-01 | Interuniversitair Micro-Elektronica | Resolution-enhancing optical phase structure for a projection illumination system |
-
2006
- 2006-06-13 US US11/451,618 patent/US20070287075A1/en not_active Abandoned
- 2006-07-07 DE DE102006031561A patent/DE102006031561B8/de not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6249335B1 (en) * | 1992-01-17 | 2001-06-19 | Nikon Corporation | Photo-mask and method of exposing and projection-exposing apparatus |
US5715039A (en) * | 1995-05-19 | 1998-02-03 | Hitachi, Ltd. | Projection exposure apparatus and method which uses multiple diffraction gratings in order to produce a solid state device with fine patterns |
US20050041231A1 (en) * | 1996-11-25 | 2005-02-24 | Asml Holding N.V. | Illumination system with spatially controllable partial coherence compensating for line width variances |
DE10252051A1 (de) * | 2002-02-06 | 2003-09-25 | Samsung Electronics Co Ltd | Fotomaske für eine Außerachsen-Beleuchtung und Verfahren zur Herstellung derselben |
Also Published As
Publication number | Publication date |
---|---|
DE102006031561B4 (de) | 2011-07-21 |
US20070287075A1 (en) | 2007-12-13 |
DE102006031561A1 (de) | 2007-12-27 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
OP8 | Request for examination as to paragraph 44 patent law | ||
R018 | Grant decision by examination section/examining division | ||
R082 | Change of representative | ||
R020 | Patent grant now final |
Effective date: 20111022 |
|
R081 | Change of applicant/patentee |
Owner name: INFINEON TECHNOLOGIES AG, DE Free format text: FORMER OWNER: QIMONDA AG, 81739 MUENCHEN, DE Owner name: POLARIS INNOVATIONS LTD., IE Free format text: FORMER OWNER: QIMONDA AG, 81739 MUENCHEN, DE |
|
R081 | Change of applicant/patentee |
Owner name: POLARIS INNOVATIONS LTD., IE Free format text: FORMER OWNER: INFINEON TECHNOLOGIES AG, 85579 NEUBIBERG, DE |
|
R119 | Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee |