DE102006005026A1 - Electrically conductive transparent coating production of sintered particles involves applying liquid composition with nanoparticles of electrically conductive metal oxide and dispersion agent to substrate - Google Patents

Abstract

The process involves applying a liquid composition containing at least one electrically conductive metal oxide in the form of nanoparticles, and a dispersion agent in the form of a coating to the substrate, sintering the applied composition coating through microwave radiation with uniform or irregular radiation power for durations of from 0.1-5000 s/radiation at frequencies of 300 mHz to 30 GHz and radiation powers of 50-50000 W. Independent claims are also included for the following: (i) a coating made as above with a dry layer thickness of 10 nm to 100 mu m; (ii) an electronic component with a coating; and (iii) the use of the electronic component in a display, photovoltaic element, contact-sensitive screen, resistance heating element and others.

Description

The The present invention relates to a process for producing highly conductive and transparent layers of metal oxides by irradiation with Microwaves.

Under a mechanically stable layer is hereinafter referred to as a layer understood that a resistance to stress by scratching, sharp-edged objects or materials, characterizes e.g. by the pencil hardness according to DIN EN 13523-4: 2001.

Under sheet resistance is understood in the following, the ohmic resistance, the at a Coating with a uniform layer thickness is obtained when a square area of any size at two opposite Edges contacted and the current as a function of the (DC) Voltage is measured. The sheet resistance is measured in Ω and marked with Ω. The determination of sheet resistance may also be by other methods, e.g. the four-point measurement respectively.

Under resistivity is hereinafter the ohmic resistance understood by multiplying the sheet resistance with the layer thickness [in cm] and a measure of the ohmic properties of the conductive Represents material itself. The resistivity is given in Ω · cm.

Under Transmission is hereinafter the permeability of a transparent body for light the wavelength 550 nm understood. The transmission of a coated glass is in relation to to the transmission of the same uncoated glass in percentages specified.

transparent Layers with high ohmic conductivity have surface resistances of at most 1000 Ω and one Transmission of over 70% and are used in all modern displays, e.g. in LCD, plasma displays, OLEDs, and e.g. Also needed in organic solar cells by the photovoltaic effect excited electrical currents to be able to use with little loss.

in the The following are under transparent conductive oxides, abbreviated "TCO" for "transparent conductive oxides ", Metal oxides understood, from which a transparent, conductive layer can be produced.

It has long been looking for a method that allows TCO in a cost-effective coating or printing process on glass or plastic surfaces, so on the technically elaborate Vacuum processes, e.g. Sputtering, CVD or PVD, for manufacturing transparent conductive Be able to do without layers.

A number of patent applications describe the use of soluble metal compounds to produce conductive transparent layers by means of coating or printing techniques. In particular, WO 98/49112 describes the use of indium and tin compounds, and also antimony and tin compounds, which can be converted by pyrolysis or hydrolysis into indium-tin oxide, hereinafter abbreviated to "ITO." The pyrolysis of the precursor compounds can be carried out by heating in an oven to above 500 ° C or by laser irradiation, described in WO 95/29501. The precursor compounds used are indium and tin octanoates ( JP 54009792 ), Formates ( EP 0192009 ), Chlorides ( EP 148608 ), Acetylacetonates ( JP 61009467 ), Nitrates ( JP 02126511 ) and also organometallic compounds, such as dibutyltin dioctanoate ( JP 02192616 ) and trimethyl- or triethylindium as well as tetramethyl- or tetraethyltin ( JP 6175144 ). In JP 6175144 the precursor compounds are decomposed by UV irradiation and converted into ITO.

With the technical approach of hydrolysis, often referred to as sol-gel coating, conductive transparent layers were obtained with thicknesses of 100 nm to 500 nm and surface resistances of 200 to 1500 Ω. An exception forms EP 0192009 in which flame pyrolysis of a mixture of indium formate and dibutyltin oxide describes a layer of ITO having a sheet resistance between 7.5 Ω and 35 Ω at a layer thickness between 90 nm and 300 nm. However, this method has the disadvantage of an unsatisfactorily low transmission of the layer, which is between 79% and 82%. The resistivities of the layers of these processes are typically about 10 ^-3 Ω · cm and can be reduced to as ^{low as} 2 x 10 ^-4 Ω · cm for very thin layers, such as EP 0192009 can be seen. These layers already show a conductivity that is typical for sputtered ITO layers. Experiments have shown that a greater value of partially over 90% transmission at a Flächenwider stand under 100 Ω is obtained when several layers are printed one above the other. However, this is technically far more complex and therefore too expensive for commercial applications.

An alternative approach to the production of highly conductive transparent layers with a sheet resistance below 1000 Ω in a coating or printing process is the use of eg ITO or ATO (antimony-tin oxide) nanoparticles whose average sizes are below 100 nm and thus significantly are smaller than the wavelengths of visible light. With these nanoparticles layers of high transmission of at least 90%, measured at a light wavelength of 550 nm ( JP 2001279137 . US 5,662,962 ).

Instead of nanoparticles, it is also possible to use fine acicular particles described in US Pat US 6,511,614 , When suitably manufactured, the specific resistance within the particles is only a few 10 ^-4 Ω · cm. The macroscopic sheet resistance depends on the contact of the particles with each other, the so-called percolation, or the conductivity of the medium between the particles. Because in US 6,511,614 a non-conductive organic binder is used, which allows a certain, unspecified, mechanical stability of the layer, the resistivity of over 0.1 Ω · cm is clearly too high to obtain highly conductive layers.

Particulate layers can be realized in layer thicknesses of well over 1 μm. Virtually all conventional coating and printing techniques are suitable, provided that the nanoparticles are well dispersed. The layers obtained by the process described in WO 03/004571 are compacted after application and evaporation of the solvent by sintering processes. For this required energies are registered by laser radiation or in a thermal manner. However, the layers thus obtained are highly porous. The porosity can not be cured even by treatment at temperatures between 500 ° C and 800 ° C. The resistivity of 10 ^-2 Ω · cm, therefore, is well above the values of the other methods mentioned above. A sheet resistance below 100 Ω, which is desirable for highly conductive layers, therefore makes layer thicknesses above 1 micron necessary. However, the use of such large layer thicknesses in modern displays is technically disadvantageous and does not make economic sense. Another disadvantage of particulate layers is the low mechanical stability, which is so weak due to the sintering of the particles with each other and with the carrier material that the layers can be easily wiped off the carrier. Therefore, binders are additionally used. Binders in turn cause the increase in sheet resistance.

It Although there is a possibility conductive Use binders to both mechanical stability as well electric conductivity to increase. In the simplest case, you can for conductive polymers be used. Since the usual However, polymers are p-type, while most and best conductive Metal oxides are n-type, these materials are usually not compatible.

Another approach is to use the TCO itself as a binder. An embodiment of the use of precipitated metal oxides as a binder between metal oxide nanoparticles in a sol-gel approach describes JP 05314820 , In the JP 05314820 The disclosed formulation consists of indium oxide and tin oxide nanoparticles and hydrolyzable indium and tin salts in a solvent. The mass fraction of the particles of 2 g is significantly smaller than that of the metal salts, of which 45 g are used. The formulation is applied to a substrate, dried, thereby hydrolyzed and calcined at 500 ° C. The resulting layer thicknesses are less than 100 nm, and surface resistances of at least 430 Ω are realized. These values are too high for applications in displays or photovoltaic devices. Obviously, several layers must be applied one after the other, dried and calcined in order to produce smaller surface resistances. A variation of this approach is in DE 19754664 described. Therein, in a first operation, conductive transparent layers of metal oxide particles, eg ITO or ATO, are applied in a solvent and dried. Then a sol-gel coating is applied which contains oxidation-resistant metal particles or their salts, which are incorporated in the TCO layer. The resulting layer has a very good mechanical stability, pencil hardness 8H, but surface resistances above 1000 Ω.

The essential commonality of all processes for the production of transparent conductive layers based on TCO nanoparticles is the thermal treatment of the layer or the sintering of the particles. Only this step leads to a closed layer which is mechanically stable and has a high transparency and at the same time high electrical conductivity. The prior art is heating the layer on the substrate in an oven. However, the thermal behavior of the substrate must be considered when heating. For example, the thermal expansion, deformations and changes make to the substrate surface During heating, or the construction of mechanical stresses that must be kept within limits, if the TCO layer is not to be affected, a time-consuming and therefore costly control of the time course of the temperature necessary. For the same reasons, the temperature that can be set during the thermal treatment is limited. Some substrates, such as plastics, must not be heated as high as would be required to achieve optimum electrical conductivity and transparency of the TCO layer.

DE 199 40 458 A1 discloses a method of thermally altering electrically at least semiconductive coating materials exposed to a high frequency electromagnetic field. The thermal effect of the electromagnetic field is due to material-induced eddy currents. The frequency of the electromagnetic field, which is applied in one step to the thermally modified coating material, is in the range of a few kilohertz to a maximum of less than one megahertz, preferably in the range of 100 to 500 kHz.

The prior art is that the skin effect in the coating material and thus the extent of the area heated by the induced electrical eddy currents in the coating material can be influenced by the choice of the frequency and depending on the electrical conductivity of the coating material. In DE 199 40 458 A1 It is not disclosed how the conductivity and transparency of the thermally altered coating materials can be controlled. Also, it is not disclosed which method is suitable for applying radiofrequency electromagnetic radiation to coating materials when the heating of the substrate is not desired or only a temperature increase can be allowed which is limited such that the substrate itself remains unchanged.

task Therefore, it was the object of the present invention to provide a State of the art to provide improved method, with even with limited thermal resistance of the substrate transparent, conductive TCO Layers can be generated.

• A) eine flüssige Zusammensetzung, enthaltend zumindest ein elektrisch leitfähiges Metalloxid in Form von Nanopartikeln und ein Dispersionsmittel, in Form einer Schicht auf ein Substrat aufgebracht,
• B) die in Form einer Schicht aufgebrachte Zusammensetzung von 1-mal bis 5000-mal mit Mikrowellenstrahlung mit gleichen oder ungleichen Strahlungsleistungen und einer Dauer von 0,1 s bis 5000 s je Bestrahlung, wobei die Dauern der Bestrahlungen mit Mikrowellenstrahlung gleich oder ungleich sind, und Frequenzen von 300 MHz bis 30 GHz, und Strahlungsleistungen von 50 W bis 50000 W verwendet werden, bestrahlt wird.

Surprisingly, it has been found that transparent conductive layers with resistivities below 100 Ω · cm and a transmission of more than 50% are obtained by

• A) a liquid composition comprising at least one electrically conductive metal oxide in the form of nanoparticles and a dispersion medium, applied in the form of a layer on a substrate,
• B) the composition applied in the form of a layer of 1 to 5000 times with microwave radiation with equal or unequal radiant powers and a duration of 0.1 s to 5000 s per irradiation, the durations of the irradiations with microwave radiation being equal or unequal, and frequencies of 300 MHz to 30 GHz, and radiation powers of 50 W to 50,000 W are used.

By the combination of frequencies, durations, radiant powers and Number of microwave irradiations can be adjusted at what depth the layer has which conductivity and transparency.

object The present invention is therefore a process for the preparation an electrically conductive transparent layer of sintered particles comprising the steps

• A) applying a liquid composition containing at least one electrically conductive Metal oxide in the form of nanoparticles, and a dispersant, in the form of a layer, on a substrate,
• B) sintering the composition applied in the form of a layer by irradiating with microwave radiation 1 to 5000 times with equal or unequal radiant powers, and a duration of 0.1 s to 5000 s per irradiation, the durations of the irradiations are equal or unequal with microwave radiation, and frequencies from 300 MHz to 30 GHz, and radiation powers from 50 W to 50,000 W be used.

Also Object of the present invention is a layer with the method according to the invention and an electronic component comprising a layer according to the method of the invention having.

Advantage of this invention is that a substrate under low thermal stress can be equipped with a transparent, electrically conductive layer. Another advantage of the method according to the invention is that the energy of the microwave radiation due to the skin effect produced due to the high-frequency alternating fields predominantly in the TCO applied according to the method according to the invention containing composition is introduced, so that the substrate and / or deeper areas of the substrate are hardly or not heated. Furthermore, the process according to the invention has the advantage that the compositions according to the invention can be applied to the substrate by means of printing technology, which can be carried out faster, continuously, for example in a roll-to-roll process, compared to the processes according to the prior art. and are cheaper. Another advantage of the method according to the invention is therefore that the transparent, electrically conductive layer can be obtained in a much shorter time than in the prior art on the substrate.

The inventive method also has the advantage that the temperature of the composition according to the invention higher by short-term radiation can be, as the temperature, which assumes the substrate. With the inventive method may therefore be the composition of the invention also be brought to a temperature that after standing in the The technique known to the art can not be achieved without that the substrate would take thermal damage. But such temperatures can be necessary to the composition of the invention largely to be able to sinter and to be able to obtain a substrate after sintering, the fewer pores and / or Has cracks. These are undesirable as an error in the layer, since she the sheet resistance increase the layer and in the worst case also affect transparency would.

The inventive method has the further advantage that the sintering temperature due to high radiation power reached quickly and then by repeated irradiation over shorter Duration of irradiation is maintained. The inventive method has therefore the advantage that defects in the transparent conductive Layer by repeated irradiation with microwaves on average significantly lower radiation power can be cured thermally can, as by single irradiation with microwaves high radiation power.

In the case, successively applying a plurality of different compositions according to the invention be, has the inventive method the advantage that a mixing of the compositions on the Substrate during of sintering can be prevented.

The inventive method has the further advantage that layers can be obtained which across from the prior art, a higher Have a mass density and a lower porosity.

With the method according to the invention can be layers with a specific resistance of at most 100 Ω · cm. Particularly advantageous can be with the inventive method size Layer thicknesses over 500 nm with specific resistances below 1 Ω · cm, preferably Layer thicknesses over 800 nm with specific resistances below 0.5 Ω · cm at At the same time achieve good mechanical stability, which for robust Applications are better suited than obtained according to the prior art Layers. Likewise advantageous to the inventively obtained Layer is that this has a transmission of at least 50%.

following For example, the present invention will be described by way of example without the invention, the scope of which is defined in the claims and of the description, be limited to this embodiment should.

For the preparation of the composition used in the process according to the invention, the electrically conductive metal oxides used are preferably electrically conductive nanoparticles selected from ternary systems such as In ₂ O ₃ : Sn (ITO), SnO ₂ : Sb (ATO), SnO ₂ : F, ZnO: Al, ZnO: In, Zn-Sn-O, Mg-In-O, Ga-In-O, Zn-In-O, or quaternary systems such as Zn-In-Sn-O (Zito), Zn-In Li-O, or chemically and / or physically modified variants of these nanoparticles, or a mixture of these nanoparticles and / or systems used. Very particular preference is given to using ITO nanoparticles in the process according to the invention. In the context of the present invention, nanoparticles are understood as meaning particles which have a mean particle size d _50% , measured by dynamic light scattering with a device type LB550 from Horiba, of 1 nm to 999 nm.

The Transparency of the finished layer may depend on the scattering power of the Nanoparticles for Depend on visible light. It may therefore be advantageous if nanoparticles with a medium Particle size of 4 nm to 500 nm, preferably from 10 nm to 250 nm, particularly preferably from 20 nm to 100 nm.

In the process according to the invention, the dispersant used may be at least one organic protic acid a, aprotic, polar or non-polar liquid, or an inorganic liquid can be used. Preferred dispersants in the process according to the invention are an acid, a glycol, C ₁ -C ₈ -hydrocarbons, aromatic hydrocarbons, aliphatic hydrocarbons, aromatic or aliphatic halogenated hydrocarbons, S-, P- or Si-hetero-substituted hydrocarbons, or supercritical solvents , or silicones, or organic compounds selected from mono-, oligo-, polymers, dyes, conductive organic compounds, non-oxidic inorganic compounds, organometallic compounds, reactive intermediates forming organic compounds selected from benzoyl peroxide, azo-bis-isobutyronitrile, or a mixture of these organic compounds, or a mixture of these compounds. In the process according to the invention, a C ₁ -C ₁₂ -alcohol, ester or ether can particularly preferably be used as dispersing agent.

The Composition can preferably be applied to a solid substrate, the glass, Quartz glass, metal, stone, wood, concrete, paper, textiles or plastic contains or is, be applied. As a plastic, e.g. Polyester, Polyamide, polyimide, polyacrylate, polycarbonate (PC), polyethersulfone (PES), polyetheretherketone (PEEK), polyvinylchloride (PVC), polyethylene (PE), polypropylene (PP), polyacetal (POM), or a mixture of these Polymers are used.

As the polyester, polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polybutylene terephthalate (PBT), polyhydroxybutyrate (PHB), or a mixture of these polyesters can be used. Polyamide 6 can be polyamide 6, polyamide 6.6, polyamide 11, polyamide 12, or a mixture of these polyamides. As polyimide Kapton ^® can be used. As the polyacrylate, polymethyl methacrylate (PMMA) may preferably be used.

In the method according to the invention can the composition by flexo printing, inkjet printing, offset printing, Screen printing, spraying, Pad printing, thermal transfer printing, laser printing, spin coating, Dipping, flooding, knife-coating, or pouring are applied. Preferably can in the process according to the invention the dispersion on the substrate by means of a doctor blade in a thickness of 1 μm up to 25 μm be applied.

In the method according to the invention It may be beneficial if the composition is in the form of several Layers one after the other is applied to the substrate. Prefers can in the method according to the invention multiple layers, the same or different compositions have to be applied to the substrate. It can continue in the method according to the invention be advantageous if between step A and B, a drying of the applied layer occurs. The applied layer is preferred dried until the weight of the substrate with the applied Layer or layers no longer changes. Preferably The applied layer can be dried in an oven. Especially Preferably, the applied layer by flowing with warmed Gas or warmed Air dried.

It may be advantageous to the composition after each application to irradiate with microwave energy. In the method according to the invention Any other order can be advantageous, the composition applied to the substrate and irradiated with microwave energy.

In the method according to the invention It may be advantageous if microwave radiation with irradiation periods from 0.1 s to 5000 s, preferably from 0.5 s to 1000 s, especially preferably from 1 s to 100 s is used. The irradiation time can preferably by turning on and off the microwave radiator, furthermore preferably by opening and closing with one in front of the emission opening realized by the microwave radiator metal panel can be realized. In the method according to the invention For example, the layered composition may be preferred from 1 time to 5000 times, more preferably from 2 times to 5 times or 5 times to Irradiated 1000 times with microwave radiation.

If in the method according to the invention More than 1 time irradiation with microwaves can be used It will continue to be beneficial if the durations of the irradiations with microwave radiation and any combination of durations same or are unequal. Furthermore, it may be advantageous if the Radiation powers and any combination of radiant powers are equal or unequal. In the method according to the invention, it can continue be advantageous if the frequencies and any combination of the frequencies are the same or are unequal.

If more than one exposure to microwaves is used in the method according to the invention, it may furthermore be advantageous if a time duration of 0.01 until every subsequent irradiation s is used up to 60 s. In the process according to the invention, particular preference is given to using identical or unequal time periods.

It may be advantageous when in the inventive process during step B cooled the substrate becomes. It may be particularly advantageous if the substrate passes through Dry ice, by chilled Nitrogen, or by liquid Nitrogen cooled becomes.

In a further embodiment the method according to the invention For example, the substrate with the composition of the invention may be localized Area in which the microwave radiation is irradiated, with a defined speed are passed. In the method according to the invention it is furthermore preferred if the substrate with the composition according to the invention in a roll-to-roll process through the microwave irradiated localized Area led becomes. By stacking such areas can multiple irradiation be achieved. By the size of such areas and the rate at which the composition of the invention according to the method of the invention passed through such areas , the duration of the irradiation can be adjusted.

In the method according to the invention it may also be advantageous if the same and / or unequal Frequencies from 550 MHz to 25 GHz, preferably from 750 MHz to 15 GHz, more preferably from 900 MHz to 12 GHz, continues to be particularly preferably from 1.2 GHz to 10.5 GHz, very particularly preferably frequencies which are ISM frequencies.

In the method according to the invention It may also be advantageous if the same and / or unequal Power from 50 W to 50 kW, preferably from 250 W to 25 kW, especially preferably from 500 W to 15 kW are used.

advantageously, can the layer during the duration of irradiation with microwave energy with a gas, prefers forming gas or inert gas, e.g. with argon, to be flown. Preferably, the layer may be at least during one of the part of the duration the irradiation with microwave energy with a gas, preferably Forming gas or inert gas, e.g. with argon, to be flown. Further preferred can the layer during a portion of the duration of irradiation with microwave energy with an oxidizing gas flows be, for example, with air to organic components from the To remove layer. Further preferably, the layer may during a remaining part of the duration with a reducing gas, for example flowed with forming gas become. Under a part of the duration of the irradiation becomes a time interval understood that with the beginning of the irradiation with microwave energy starts and its length preferably selected can be 10%, 20%, 30%, 40%, 50%, 60%, 70%, 80%, or 90% of the duration of the irradiation. Under a remaining part of the Duration of irradiation is understood as a time interval with the end of the irradiation with microwave energy ends and be selected can be from 90%, 80%, 70%, 60%, 50%, 40%, 30%, 20%, or 10 % of the duration of the irradiation.

Farther it can in the process according to the invention be advantageous if the layer after irradiation with microwave energy flowed with forming gas becomes. Furthermore, it may be advantageous in the method according to the invention if each layer after irradiation with microwave energy with Forming gas flows becomes. Furthermore, it may be advantageous in the method according to the invention if every layer after each irradiation with microwave energy flowed with forming gas becomes.

During the Irradiation with microwave energy decreases the thickness of the applied Composition off. The after the implementation of the method according to the invention the layer thickness obtained is called in the following dry film thickness. An object of the present invention is also a layer which with the method according to the invention is obtained. The inventively obtained Layer preferably has a dry film thickness of 10 nm to 100 microns, further preferably from 200 nm to 5 μm, more preferably from 500 nm to 2 μm.

Prefers has the method according to the invention obtained layer has a sheet resistance of 10 Ω to 100 Ω on. Further preferably, the layer obtained by the method according to the invention has a Transmission from 50% to 99%, more preferably from 60% to 97%, most preferably from 80% to 95%.

The layer according to the invention or the layer produced according to the invention is particularly well suited for use in electronic components. The invention therefore also relates to an electronic component which has a layer according to the invention or produced according to the invention. Such construction Parts can be advantageously used in a display, photovoltaic element, touch-sensitive screen, resistance heating element, infrared protection film, antistatic housing, chemical sensor, electromagnetic sensor.

The inventive method will be explained in more detail by way of example, without the invention to this embodiment limited should be.

Example 1:

7.5 g of nanoscale indium tin oxide (ITO) powder having an average particle size d of _50% below 100 nm were mixed with 0.25 g of 3,6,9-trioxadecanoic acid and 3 g of ethylene glycol monoisopropyl ether, onto a three-roll mill (Netzsch). given and thus dispersed for 10 minutes. 5 g of this highly viscous paste were diluted with thorough mixing with 9 g of isopropanol.

glass panes made of borosilicate glass, type BOROFLOAT 33, Schott GmbH, Jena, Germany, were alkaline-cleaned in a laboratory dishwasher, flushed neutral and dried. The thus cleaned glass sheets were spincoated coated at 2000 U / min with the previously prepared dispersion.

The layers thus obtained were dried at 80.degree. The 100 × 100 mm ² glass pieces thus coated were sintered in a microwave oven at a microwave frequency of 2.45 GHz and a continuous magnetron power of 900 watts with different irradiation time. The sample was continuously rotated during each exposure to ensure uniform microwave energy over the surface. The dry film thickness was in each case 600 nm, measured by means of a mechanical profilometer using a notched step. The results of the resistance measurements on these samples are listed in Table 1 depending on the irradiation times. The measurement of the surface resistance was carried out in accordance with DIN IEC 163 by contacting a 10 × 10 mm ² rectangle from the layer by means of conductive silver. A DC voltage of 1 V was applied. Table 1:

Claims (20)

Process for producing an electrically conductive transparent Layer of sintered particles comprising the steps A) Applying a liquid Composition containing at least one electrically conductive metal oxide in the form of nanoparticles, and a dispersant, in the form of a Layer, on a substrate, B) sintering in the form of a layer applied composition by 1 to 5000 times irradiation with microwave radiation with equal or unequal radiant powers, and a duration of 0.1 s to 5000 s per irradiation, the durations the irradiations with microwave radiation are equal or unequal, and frequencies from 300 MHz to 30 GHz, and radiation powers from 50 W to 50,000 W are used. Method according to claim 1, characterized in that that between step A and B drying of the applied layer he follows. A method according to claim 1, characterized in that as electrically conductive metal oxide electrically conductive nanoparticles selected from In ₂ O ₃ : Sn (ITO), SnO ₂ : Sb (ATO), SnO ₂ : F, ZnO: Al, ZnO: In, Zn-Sn-O, Mg-In-O, Ga-In-O, Zn-In-O, Zn-In-Sn-O (ZITO), Zn-In-Li-O, or chemically and / or physically modified Variants of these nanoparticles, or a mixture of these nanoparticles and / or systems be used. Method according to at least one of claims 1 to 3, characterized in that the composition on a solid Substrate, the glass, quartz glass, metal, stone, wood, concrete, paper, Textiles or plastic contains or selected from these materials. Method according to at least one of claims 1 or 4, characterized in that the substrate is cooled. Method according to claim 4, characterized in that that as plastic polyester, polyamide, polyimide, polyacrylate, Polycarbonate (PC), Polyethersulfone (PES), Polyetheretherketone (PEEK), Polyvinyl chloride (PVC), polyethylene (PE), polypropylene (PP), polyacetal (POM), or a mixture of these polymers is used. Method according to at least one of claims 4 or 6, characterized in that as polyester polyethyleneterephthalate (PET), polyethylene naphthalate (PEN), polybutylene terephthalate (PBT), Polyhydroxybutyrate (PHB), or a mixture of these polyesters used becomes. Method according to at least one of claims 4 or 6, characterized in that as polyamide polyamide 6, polyamide 6.6, polyamide 11, polyamide 12, or a mixture of these polyamides is used. Method according to at least one of claims 4 or 6, characterized in that as the polyacrylate polymethylmethacrylate (PMMA) is used. Method according to at least one of claims 1 to 9, characterized in that the composition by flexo printing, inkjet printing, offset printing, screen printing, spraying, pad printing, thermal transfer printing, Laser printing, spincoating, dipping, flooding, knife coating, or pouring applied becomes. Method according to at least one of claims 1 to 10, characterized in that the layer at least during a Part of the duration of irradiation with microwave radiation with a Gas is flowed. Method according to at least one of claims 1 to 11, characterized in that the composition in the form of several Layers one after the other is applied to the substrate. Method according to claim 12, characterized in that that multiple layers, the same or different compositions have to be applied successively to a substrate. Method according to claim 12, characterized in that that the composition after each application with microwave radiation is irradiated. Layer, using a method after at least one of the claims 1 to 14 is obtained. Layer according to claim 15, characterized the layer has a dry film thickness of 10 nm to 100 μm. Layer according to claim 15, characterized that the layer has a resistivity of at most 100 Ω · cm. Layer according to at least one of claims 15 to 17, characterized in that the layer has a transmission of at least 50%. Electronic component, a layer according to at least one of the claims 15 to 18 having. Use of the electronic component according to claim 19 in a display, lighting module, photovoltaic element, touch-sensitive Screen, resistance heating element, infrared protection film, antistatic Casing, chemical sensor, electromagnetic sensor.