DE102004032533A1 - Production of multiple layer ceramic composite used in electronics industry comprises forming metallic layer structures on film-like intermediate support, positioning support between films and forming composite - Google Patents
Production of multiple layer ceramic composite used in electronics industry comprises forming metallic layer structures on film-like intermediate support, positioning support between films and forming composite Download PDFInfo
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- DE102004032533A1 DE102004032533A1 DE102004032533A DE102004032533A DE102004032533A1 DE 102004032533 A1 DE102004032533 A1 DE 102004032533A1 DE 102004032533 A DE102004032533 A DE 102004032533A DE 102004032533 A DE102004032533 A DE 102004032533A DE 102004032533 A1 DE102004032533 A1 DE 102004032533A1
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B18/00—Layered products essentially comprising ceramics, e.g. refractory products
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/20—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
- H05K3/4626—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials
- H05K3/4629—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials laminating inorganic sheets comprising printed circuits, e.g. green ceramic sheets
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
- C04B2235/658—Atmosphere during thermal treatment
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/65—Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
- C04B2235/658—Atmosphere during thermal treatment
- C04B2235/6581—Total pressure below 1 atmosphere, e.g. vacuum
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/30—Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
- C04B2237/32—Ceramic
- C04B2237/34—Oxidic
- C04B2237/343—Alumina or aluminates
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/50—Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
- C04B2237/56—Using constraining layers before or during sintering
- C04B2237/562—Using constraining layers before or during sintering made of alumina or aluminates
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/50—Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
- C04B2237/66—Forming laminates or joined articles showing high dimensional accuracy, e.g. indicated by the warpage
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
- C04B2237/50—Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
- C04B2237/68—Forming laminates or joining articles wherein at least one substrate contains at least two different parts of macro-size, e.g. one ceramic substrate layer containing an embedded conductor or electrode
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/64—Burning or sintering processes
- C04B35/645—Pressure sintering
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/01—Tools for processing; Objects used during processing
- H05K2203/0147—Carriers and holders
- H05K2203/0156—Temporary polymeric carrier or foil, e.g. for processing or transferring
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/02—Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
- H05K2203/0278—Flat pressure, e.g. for connecting terminals with anisotropic conductive adhesive
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/386—Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive
Abstract
Description
Die Erfindung betrifft ein Verfahren zur Herstellung eines mehrschichtigen Keramikverbundes mit innenliegenden metallischen Strukturen nach den Merkmalen des ersten Patentanspruches.The The invention relates to a method for producing a multilayered Ceramic composite with internal metallic structures according to the features of the first claim.
Nach dem Stand der Technik werden metallische Schichtstrukturen, die vorwiegend als Leiterbahnen für den elektrischen Strom genutzt werden, direkt auf ungebrannte Keramik- oder Glaskeramikfolien mit Hilfe von zumindest teilweise aus Metallpartikeln bestehenden Pasten oder Schlickern aufgebracht. Dies geschieht hauptsächlich durch Siebdruck, teilweise auch in Kombination mit fotolithografischen Verfahren. Die mit den metallischen Strukturen versehenen Keramikfolien werden anschließend unter Einfluss von Druck und Temperatur verbunden. In dem folgenden Ausbrenn- und Sinterprozess entsteht ein Keramikverbund mit innenliegenden Leitbahnen und gegebenenfalls mit Wirkstrukturen wie Widerständen, Kapazitäten u.ä. Um während des Herstellungsprozesses des Keramikverbundes seine laterale Schrumpfung zu verringern oder zu verhindern, können an den Außenseiten des Verbundes höhersinternde Keramikfolien aufgebracht und/oder während des Brennprozesses ein uniaxialer Druck auf den herzustellenden Verbund ausgeübt werden.To the prior art are metallic layer structures, the mainly as tracks for Electricity can be used directly on unfired ceramic or glass-ceramic foils with the aid of at least partially of metal particles applied to existing pastes or slips. This happens mainly through Screen printing, sometimes in combination with photolithographic Method. The provided with the metallic structures ceramic films are then submerged Influence of pressure and temperature connected. In the following burnout and sintering process creates a ceramic composite with internal Channels and possibly with active structures such as resistors, capacitances and the like. To during the manufacturing process the ceramic composite to reduce its lateral shrinkage or to prevent on the outside of the association of higher - order Applied ceramic films and / or during the firing process uniaxial pressure on the composite to be produced.
Nachteil dieser bekannten Verfahren ist, dass die Aufbringung der metallhaltigen Schichtstrukturen auf die ungebrannten Keramik- oder Glaskeramikfolien nur mit Verfahren erfolgen kann, die die ungebrannten Keramikfolien chemisch nicht belasten. In Folge dessen sind die geometrischen und elektrischen Eigenschaften der erzeugten metallischen Schichtstrukturen im Vergleich zu Schichtstrukturen auf anderen Substraten erheblich eingeschränkt und die allgemeinen Vorzüge keramischer Mehrschichtsysteme können folglich nur teilweise genutzt werden.disadvantage This known method is that the application of the metal-containing layer structures on the unfired ceramic or glass ceramic foils only with process can be done, which does not chemically the unfired ceramic films strain. As a result, the geometric and electrical Properties of the generated metallic layer structures in comparison significantly limited to layer structures on other substrates and the general benefits ceramic multilayer systems can consequently only partially used.
Zur Minimierung dieser chemischen Belastungen sind Verfahren bekannt, bei denen für die Aufbringung der Schichtstrukturen Zwischenträger verwendet werden. Die in einem ersten Verfahrensschritt auf dem Zwischenträger strukturierten Schichten werden anschließend auf die ungebrannten Keramikfolien mechanisch übertragen.to Minimization of these chemical stresses are known methods where for the application of the layer structures intermediate carrier can be used. In the structured a first step on the intermediate carrier Layers are subsequently mechanically transferred to the unfired ceramic films.
Bei diesen Verfahren sind die Schichtstrukturen sowie die ungebrannten Keramikfolien entsprechend starken mechanischen Belastungen ausgesetzt.at These methods are the layer structures as well as the unfired ones Ceramic films exposed to correspondingly strong mechanical loads.
Aus
der
Die mittels aller dieser bekannten Verfahren aufgebrachten Wirkstrukturen aus zumindest teilweise aus Metallpartikeln bestehenden Pasten oder Schlicker weisen hinsichtlich ihrer Auflösung, Schichtdicke, Kontur, Form und elektrischen Parameter Nachteile auf. Sie besitzen eine geringe Formstabilität und infolge der Sinterschrumpfung ist ihre Endform sehr toleranzbehaftet. Daneben haben sie eine geringe Leitfähigkeit und ein schlechtes Rauschverhalten.The by means of all these known methods applied active structures from at least partially made of metal particles pastes or slip with regard to their resolution, layer thickness, Contour, shape and electrical parameters disadvantages. You own a low dimensional stability and due to the sintering shrinkage their final shape is very tolerant. In addition, they have a low conductivity and a poor noise performance.
Zur Überwindung dieser Nachteile sollen die aufzubringenden Wirkstrukturen aus einem massiven metallischen bzw. vollmetallischen Material gefertigt werden. Problematisch bei der Herstellung dieser vollmetallischen Strukturen ist jedoch, dass die zu deren Aufbringung notwendigen chemischen oder elektrochemischen Prozesse und/oder Dünnschichtprozesse, wie Aufdampfen und Sputtern, nur mit sehr hohem Aufwand oder unter starker Beanspruchung der ungesinterten Keramikfolien durchgeführt werden können.To overcome These disadvantages are the applied active structures of a solid metallic or full metallic material are made. Problematic in the production of these fully metallic structures is, however, that necessary for their application chemical or electrochemical processes and / or thin-film processes, such as vapor deposition and sputtering, only with great effort or under heavy use of the unsintered ceramic films can be performed.
Aufgabe der vorliegenden Erfindung ist es deshalb, ein Verfahren zur Herstellung eines mehrschichtigen Keramikverbundes bereitzustellen, mit dem die chemische und mechanische Belastung der ungebrannten Keramikfolien und der aufzubringenden Wirkstrukturen minimiert und gleichzeitig die elektrischen und die Formgebungseigenschaften der Wirkstrukturen verbessert werden.task Therefore, the present invention is a process for production to provide a multilayer ceramic composite, with the the chemical and mechanical loading of the unfired ceramic films and the applied active structures minimized and simultaneously the electrical and the shaping properties of the active structures be improved.
Erfindungsgemäß gelingt die Lösung dieser Aufgabe mit den Merkmalen des ersten Patentanspruches.According to the invention succeeds the solution this task with the features of the first claim.
Vorteilhafte Ausgestaltungen des erfindungsgemäßen Verfahrens sind in den Unteransprüchen angegeben.advantageous Embodiments of the method according to the invention are in the dependent claims specified.
Die Erfindung wird im Folgenden anhand von Zeichnungen näher erläutert. Die zugehörigen Zeichnungen zeigen:The The invention is explained in more detail below with reference to drawings. The associated Drawings show:
Im
ersten Schritt des erfindungsgemäßen Verfahrens
(
Der
folienförmige
Zwischenträger
(
In
dem nächsten
Verfahrensschritt (
Bei dem erfindungsgemäßen Herstellungsverfahren wird das sogenannte druckunterstützte 0-Schrumpfungsverfahren, bei dem während des Ausbrenn- und Sinterprozesses zumindest zeitweise ein uniaxialer Druck auf das Substrat ausgeübt wird, angewendet. Dadurch kann die Sinterschrumpfung der Keramikmaterialien so gesteuert werden, dass die Herstellung von mehrschichtigen Keramikverbünden mit innenliegenden Wirkstrukturen aus vollmetallischen Materialien, die im Gegensatz zu Pasten oder Schlickern während des Sinterprozesses nicht oder nur minimal schrumpfen (< 10%), in Kombination mit einem sich während des Sinterprozesses auflösenden Trägermaterials möglich wird.at the production process according to the invention becomes the so-called pressure-assisted 0-shrinkage process, during that the Ausbrenn- and sintering process at least temporarily a uniaxial Pressure exerted on the substrate is applied. This can reduce the sintering shrinkage of the ceramic materials be controlled so that the production of multilayer ceramic composites internal active structures made of fully metallic materials, unlike pastes or slips during the sintering process or shrink only minimally (<10%), in combination with a while of the sintering process dissolving support material possible becomes.
Der Ausbrenn- und Sinterprozess kann durch den Einsatz von oxidierenden, reduzierenden oder inerten Gasen oder durch Arbeiten unter Vakuum gesteuert werden.Of the Burn-out and sintering process can be achieved by the use of oxidizing, reducing or inert gases or by working under vacuum to be controlled.
Durch das beschriebene Verfahren ist es möglich, einen mehrlagigen Keramikverbund mit innenliegenden metallischen Strukturen in hoher Präzision und Strukturauflösung herzustellen. Dabei können die metallischen Strukturen auf dem folienförmigen Zwischenträger hergestellt werden, ohne dass die ungebrannten Keramikfolien chemisch oder mechanisch beansprucht werden. Die Lösung der erzeugten Strukturen vom Zwischenträger erfolgt während des Brennprozesses innerhalb des Verbundes, wodurch die Strukturen fixiert und durch das langsame Entfernen (Ausgasen) des Zwischenträgermaterials kaum mechanischen Belastungen ausgesetzt sind.By The method described makes it possible to have a multilayer ceramic composite with internal metallic structures in high precision and structural resolution manufacture. It can the metallic structures made on the foil-shaped intermediate carrier be without the unfired ceramic films chemically or mechanically be claimed. The solution the generated structures from the subcarrier takes place during the Burning process within the composite, which fixes the structures and by the slow removal (outgassing) of the intermediate carrier material are hardly exposed to mechanical stress.
Das erfindungsgemäße Verfahren wird an einem Ausführungsbeispiel näher erläutert.The inventive method is an embodiment explained in more detail.
Auf einem Zwischenträger aus Polyimidfolie wird durch Aufsputtern von Silber eine für die galvanische Abscheidung erforderliche, leitfähige Startschicht aufgebracht. Diese wird dann mit einem Resist versehen, der fotolithografisch strukturiert wird. Anschließend wird die Silberschicht in den Öffnungen des Resists galvanisch verstärkt. Dann werden Resist und unbedeckte Teile der Startschicht entfernt, so dass nur die galvanisch verstärkten Strukturen verbleiben. Anschließend wird der Zwischenträger zwischen mehrere Lagen ungebrannter Keramikfolien, im speziellen Fall LTCC (Low Temperature Cofired Ceramics) positioniert. An der Ober- und Unterseite wird noch jeweils eine als Releasetape bezeichnete ungebrannte Keramikfolie (z.B. Aluminiumoxidkeramik) aufgebracht, die einerseits die laterale Sinterschrumpfung verringert und andererseits ein späteres Anhaften des Verbundes am Drucksinterofen bzw. den Druckverteilerplatten verhindert. Durch Zusammenpressen der übereinander geschichteten Folien werden diese bei Temperaturen über 30°C miteinander verbunden. Dabei kann das LTCC- Material selbst noch metallische und/oder nichtmetallische Strukturen sowie Durchführungen enthalten.On an intermediate carrier made of polyimide film, a conductive starting layer required for the electrodeposition is applied by sputtering on silver. This is then provided with a resist, which is structured photolithographically. Subsequently, the silver layer is galvanically reinforced in the openings of the resist. Then resist and uncovered parts of the starting layer are removed, so that only the galvanically reinforced structures remain. Subsequently, the intermediate carrier between several layers of unfired ceramic films, in the special case LTCC (Low Temperature Cofired Ceramics) positioned. At the top and bottom of each still designated as a release tape unfired ceramic film (eg alumina ceramic) is applied, on the one hand reduces the lateral sintering shrinkage and on the other hand prevents subsequent adhesion of the composite pressure sintering or the pressure distribution plates. By compressing the stacked films, these are bonded together at temperatures above 30 ° C. The LTCC material itself may still contain metallic and / or non-metallic structures as well as feedthroughs.
Anschließend wird das Substrat einem Sinterprozess unterzogen, bei dem erfindungsgemäß eine uniaxiale Kraft auf dass Substrat ausgeübt wird. Ab einer bestimmten Temperatur (ca. 250°C) findet ein Ausbrand der organischen Binder des LTCC- Materials statt. Gleichzeitig oder später beginnt der Zwischenträger zu verbrennen und/oder zu sublimieren. Dabei können die entstehenden, hauptsächlich gasförmigen Abprodukte durch das nun poröse LTCC- Material austreten. Nachdem der Zwischenträger weitgehend aus dem Substrat entwichen und der Ausbrand der Bindermaterialien beendet ist, verbleiben die ehemals auf dem Zwischenträger befindlichen Strukturen im LTCC- Verbund und dieser wird unter Temperaturen zwischen 800°C und 1000°C versintert.Subsequently, will subjected the substrate to a sintering process, in accordance with the invention a uniaxial Force on that substrate is exercised becomes. From a certain temperature (about 250 ° C) is a burnout of the organic Binder of the LTCC material. At the same time or later begins the subcarrier to burn and / or sublimate. In this case, the resulting, mainly gaseous waste products through the now porous Leak LTCC material. After the intermediate carrier largely from the substrate escaped and the burnout of the binder materials is completed, remain the former on the intermediate carrier structures in the LTCC composite and this is under temperatures between 800 ° C and sintered at 1000 ° C.
Am Ende des Prozesses liegt ein mehrschichtiger Keramikverbund mit innenliegenden metallischen Strukturen vor, der gegenüber den auf herkömmliche Weise hergestellten Keramikverbünden verbesserte elektrische und Formgebungseigenschaften (Auflösung, Formstabilität, Kontur, Schichtdicke) aufweist.At the End of the process is a multi-layer ceramic composite with inside metallic structures in front of the on conventional Improved manner produced ceramic composites electrical and shaping properties (resolution, dimensional stability, contour, Layer thickness).
- 11
- metallische Strukturenmetallic structures
- 22
- Zwischenträgersubcarrier
- 33
- ungebrannte „grüne" Keramikfolienunfired "green" ceramic films
- 44
- ungebrannte Keramikfolien (Releasetape) mitunfired Ceramic films (release tape) with
- höherer Sintertemperaturhigher sintering temperature
- 55
- versinterter Keramikverbundversinterter ceramic Composition
Claims (9)
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DE102004032533A DE102004032533A1 (en) | 2003-07-17 | 2004-07-06 | Production of multiple layer ceramic composite used in electronics industry comprises forming metallic layer structures on film-like intermediate support, positioning support between films and forming composite |
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DE10333874.8 | 2003-07-17 | ||
DE10333874 | 2003-07-17 | ||
DE102004032533A DE102004032533A1 (en) | 2003-07-17 | 2004-07-06 | Production of multiple layer ceramic composite used in electronics industry comprises forming metallic layer structures on film-like intermediate support, positioning support between films and forming composite |
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DE102004032533A Withdrawn DE102004032533A1 (en) | 2003-07-17 | 2004-07-06 | Production of multiple layer ceramic composite used in electronics industry comprises forming metallic layer structures on film-like intermediate support, positioning support between films and forming composite |
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