DE102004027124A1 - Beschichtete Prägeschicht für die Nano-Präge-Lithographie - Google Patents

Beschichtete Prägeschicht für die Nano-Präge-Lithographie Download PDF

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Publication number
DE102004027124A1
DE102004027124A1 DE102004027124A DE102004027124A DE102004027124A1 DE 102004027124 A1 DE102004027124 A1 DE 102004027124A1 DE 102004027124 A DE102004027124 A DE 102004027124A DE 102004027124 A DE102004027124 A DE 102004027124A DE 102004027124 A1 DE102004027124 A1 DE 102004027124A1
Authority
DE
Germany
Prior art keywords
layer
release layer
polymer
embossable
release
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE102004027124A
Other languages
German (de)
English (en)
Inventor
Andrew Morgan Hill Homola
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
WD Media LLC
Original Assignee
Komag Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Komag Inc filed Critical Komag Inc
Publication of DE102004027124A1 publication Critical patent/DE102004027124A1/de
Withdrawn legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8408—Processes or apparatus specially adapted for manufacturing record carriers protecting the magnetic layer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Landscapes

  • Engineering & Computer Science (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
DE102004027124A 2003-06-04 2004-06-03 Beschichtete Prägeschicht für die Nano-Präge-Lithographie Withdrawn DE102004027124A1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US45564503A 2003-06-04 2003-06-04
US10/455,645 2003-06-04

Publications (1)

Publication Number Publication Date
DE102004027124A1 true DE102004027124A1 (de) 2005-01-05

Family

ID=33510418

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102004027124A Withdrawn DE102004027124A1 (de) 2003-06-04 2004-06-03 Beschichtete Prägeschicht für die Nano-Präge-Lithographie

Country Status (3)

Country Link
JP (1) JP4454394B2 (ja)
DE (1) DE102004027124A1 (ja)
MY (1) MY146088A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008083506A1 (en) * 2007-01-08 2008-07-17 Singulus Technologies Ag Method and apparatus for ensuring quality in storage media production

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010537867A (ja) * 2007-09-06 2010-12-09 スリーエム イノベイティブ プロパティズ カンパニー 型を形成する方法及びかかる型を使用して物品を成形する方法
WO2020116397A1 (ja) * 2018-12-07 2020-06-11 日産化学株式会社 インプリント用レプリカモールド及びその作製方法
DE102019106081B4 (de) * 2019-03-11 2024-05-08 Joanneum Research Forschungsgesellschaft Mbh Oligomere Hexafluorpropylenoxidderivate

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008083506A1 (en) * 2007-01-08 2008-07-17 Singulus Technologies Ag Method and apparatus for ensuring quality in storage media production

Also Published As

Publication number Publication date
MY146088A (en) 2012-06-29
JP4454394B2 (ja) 2010-04-21
JP2004358969A (ja) 2004-12-24

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Legal Events

Date Code Title Description
R005 Application deemed withdrawn due to failure to request examination

Effective date: 20110603